会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 81. 发明申请
    • Liquid ejection apparatus and method of controlling the same
    • 液体喷射装置及其控制方法
    • US20050212851A1
    • 2005-09-29
    • US11081834
    • 2005-03-17
    • Takashi AkaseMasahiro Kimura
    • Takashi AkaseMasahiro Kimura
    • B41J2/175B41J2/165B41J2/205
    • B41J2/16526
    • A liquid ejection head is caused to eject liquid droplets at a region where no target medium is placed, such that such that a first prescribed number of liquid droplets are flushed from each of the nozzle orifices in the nozzle arrays of the first group, and a second prescribed number of liquid droplets are flushed from each of the nozzle orifices in the nozzle arrays of the second group. At least a part of the first prescribed number of liquid droplets and at least a part of the second prescribed number of liquid droplets are flushed by alternately performing a first unit operation for flushing a third prescribed number of liquid droplets which is smaller than the first prescribed number and a second unit operation for flushing a fourth prescribed number of liquid droplets which is smaller than the second prescribed number.
    • 使液体喷射头在不存在目标介质的区域喷射液滴,从而使第一规定数量的液滴从第一组的喷嘴阵列中的每个喷嘴孔冲洗,并且 从第二组的喷嘴阵列中的每个喷嘴孔冲洗第二规定数量的液滴。 通过交替地执行第一单元操作来冲洗第一规定数量的液滴的至少一部分和第二规定数量的液滴的至少一部分,用于冲洗小于第一规定数量的液滴的第三规定数量的液滴 数量和用于冲洗小于第二规定数量的第四规定数量的液滴的第二单元操作。
    • 82. 发明授权
    • Electronic device and program
    • 电子设备和程序
    • US06922157B2
    • 2005-07-26
    • US10716607
    • 2003-11-20
    • Masahiro Kimura
    • Masahiro Kimura
    • G09B29/00G01C21/00G01C21/32G06F17/00G06K9/00G06T11/60G06T17/05G08G1/123G08G1/137G09B29/10
    • G06T17/05G01C21/32
    • An electronic device detects a discontinuous figure in an old-new connection portion between old and new data and performs shape correction so as to restore the continuous figure. In this case, only the old data is corrected. Particular shape correction methods are as follows: (a) only the old-data side shape point P1 in the old-new connection portion is moved to match the new-data side shape point SP1; (b) other shape points P2 to P5 are moved in parallel by the same amount as that of movement of the shape point P1 in the old-new connection portion; and (c) among the old-data side shape points P1 to P5, the farthest shape point P5 from the shape point P1 in the old-new connection portion is not moved as a reference, and the other shape points P1 to P4 are moved in accordance with distance from the farthest shape point P5.
    • 电子设备检测旧数据和新数据之间的旧新连接部分中的不连续图形,并执行形状校正,以恢复连续图形。 在这种情况下,只有旧数据被更正。 特殊的形状校正方法如下:(a)仅新旧连接部分中的旧数据侧形状点P 1移动以匹配新数据侧形状点SP 1; (b)其他形状点P 2〜P 5平行移动与新旧连接部中的形状点P 1的移动量相同的量; 和(c)在旧数据侧形状点P 1〜P 5中,与新旧连接部中的形状点P 1的最远的形状点P 5不作为基准移动,其他形状点P 1至P 4根据距最远形状点P 5的距离移动。
    • 86. 发明授权
    • Substrate dryer
    • 底物烘干机
    • US06401353B2
    • 2002-06-11
    • US09800537
    • 2001-03-07
    • Masahiro Kimura
    • Masahiro Kimura
    • F26B2114
    • H01L21/67034
    • A substrate dryer causing no water mark on a substrate having a refined·complicated structure and capable of suppressing increase of a cost required for a drying treatment is provided. Drying gas of low-molecular silicone generated in a drying gas generation part is heated by a heater and thereafter supplied from a drying gas supply nozzle. The drying gas is supplied to the main surface of a substrate being pulled up from de-ionized water stored in a cleaning bath as a stream. Silicone contained in the drying gas is condensed on the surface of the substrate, substitutes for moisture, and thereafter vaporizes. Silicone is excellent in permeability·dryability, and hence can suppress formation of a water mark also on a substrate having a refined·complicated structure. Further, silicone applies no load to the environment, and hence increase of a cost required for the drying treatment can be suppressed without requiring specific treatment for disposal.
    • 提供了在具有精炼结构并且能够抑制干燥处理所需成本增加的基板上不产生水痕的基板干燥器。 在干燥气体发生部产生的低分子硅氧烷的干燥气体被加热器加热,之后从干燥气体供给喷嘴供给。 将干燥气体供给到从存储在洗涤槽中的去离子水作为流被提拉的基板的主表面。 包含在干燥气体中的硅氧烷在基材的表面上被冷凝,代替水分,然后蒸发。 硅氧烷渗透性优异,因此也可以抑制在具有精细化结构的基材上形成水痕。 此外,硅氧烷对环境没有负担,因此可以抑制干燥处理所需的成本的增加,而不需要特别处理以进行处理。
    • 87. 发明授权
    • Substrate drying apparatus and substrate processing apparatus
    • 基板干燥装置和基板处理装置
    • US06354311B1
    • 2002-03-12
    • US09522205
    • 2000-03-09
    • Masahiro KimuraHiroyuki Araki
    • Masahiro KimuraHiroyuki Araki
    • B08B704
    • H01L21/67034H01L21/67028Y10S134/902
    • A deionized water temperature control part cools deionized water which is supplied from a deionized water supply source into a processing bath through a pipe after completely cleaning a substrate in the processing bath for maintaining the deionized water at a constant temperature which is lower than the ordinary temperature. A supply port of an IPA.N2 supply part provided in a casing of a multi-functional processing part is directed upward, thereby supplying IPA vapor upward with carrier gas of N2 for forming an atmosphere containing IPA vapor in high concentration above the processing bath. Thus, the substrate cooled to a low temperature is dried in the atmosphere containing the IPA vapor of the ordinary temperature in the upper portion of the processing bath when pulled up from the processing bath. Thus, the amount of the IPA vapor dissolved in the deionized water stored in the processing bath may be small, whereby consumption of the IPA vapor as well as generation of particles can be suppressed.
    • 去离子水温度控制部件在去离子水中冷却去离子水,所述去离子水在完全清洁处理槽中的基底之后通过管道从加工槽中提供到处理槽中,以将去离子水保持在低于常温的恒定温度 。 设置在多功能处理部件的壳体中的IPA.N2供给部的供给口朝向上方,从而向N 2的载气向上供给IPA蒸气,以形成含有高浓度的IPA蒸汽的气氛,高于处理槽。 因此,在从处理槽拉出时,在含有处理槽上部的常温的IPA蒸气的气氛中冷却到低温的基板被干燥。 因此,溶解在处理槽中的去离子水中的IPA蒸气的量可能较小,从而可以抑制IPA蒸气的消耗以及颗粒的产生。