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    • 85. 发明授权
    • Non-volatile memory and semiconductor device
    • 非易失性存储器和半导体器件
    • US07298652B2
    • 2007-11-20
    • US11109325
    • 2005-04-19
    • Shunpei YamazakiJun KoyamaKiyoshi Kato
    • Shunpei YamazakiJun KoyamaKiyoshi Kato
    • G11C11/34
    • G11C11/5621G11C11/5628G11C11/5642G11C11/5671G11C16/0433G11C16/10G11C16/16G11C16/26G11C16/32
    • There is provided a non-volatile memory which enables high accuracy threshold control in a writing operation. In the present invention, a drain voltage and a drain current of a memory transistor are controlled to carry out a writing operation of a hot electron injection system, which is wherein a charge injection speed does not depend on a threshold voltage. FIGS. 1A and 1B are views of a circuit structure for controlling the writing. In FIGS. 1A and 1B, an output of an operational amplifier 103 is connected to a control gate of a memory transistor 101, a constant current source 102 is connected to a drain electrode, and a source electrode is grounded. The constant current source 102 and a voltage Vpgm are respectively connected to two input terminals of the operational amplifier 103.
    • 提供了一种在写入操作中实现高精度阈值控制的非易失性存储器。 在本发明中,控制存储晶体管的漏极电压和漏极电流,进行热电子注入系统的写入动作,其中电荷注入速度不依赖于阈值电压。 图 图1A和1B是用于控制写入的电路结构的视图。 在图 如图1A和1B所示,运算放大器103的输出端连接到存储晶体管101的控制栅极,恒流源102连接到漏电极,源电极接地。 恒流源102和电压Vpgm分别连接到运算放大器103的两个输入端。