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    • 82. 发明申请
    • OPTIMIZATION OF CRITICAL DIMENSIONS AND PITCH OF PATTERNED FEATURES IN AND ABOVE A SUBSTRATE
    • 关键尺寸的优化和基板上及以上图案特征的优化
    • US20130009230A1
    • 2013-01-10
    • US13613956
    • 2012-09-13
    • James M. CleevesRoy E. Scheuerlein
    • James M. CleevesRoy E. Scheuerlein
    • H01L27/088H01L27/02
    • H01L27/105H01L23/528H01L2924/0002H01L2924/00
    • A die is formed with different and optimized critical dimensions in different device levels and areas of those device levels using photolithography and etch techniques. One aspect of the invention provides for a memory array formed above a substrate, with driver circuitry formed in the substrate. A level of the memory array consists of, for example, parallel rails and a fan-out region. It is desirable to maximize density of the rails and minimize cost of lithography for the entire memory array. This can be achieved by forming the rails at a tighter pitch than the CMOS circuitry beneath it, allowing cheaper lithography tools to be used when forming the CMOS, and similarly by optimizing lithography and etch techniques for a device level to produce a tight pitch in the rails, and a more relaxed pitch in the less-critical fan-out region.
    • 在使用光刻和蚀刻技术的不同器件级别和那些器件级别的区域中,使用不同且优化的临界尺寸形成管芯。 本发明的一个方面提供了形成在衬底上的存储器阵列,其中驱动电路形成在衬底中。 存储器阵列的一个级别包括例如平行轨道和扇出区域。 希望使轨道的密度最大化并最小化整个存储器阵列的光刻成本。 这可以通过以比它下面的CMOS电路更紧的间距形成轨道来实现,从而允许在形成CMOS时使用更便宜的光刻工具,并且类似地通过优化用于器件级别的光刻和蚀刻技术以在 轨道,并且在不太关键的扇出区域更放松。