专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

81. 发明授权

US07514441B2 Substituted pyrazolo [1,5-A]pyrimidines as calcium receptor modulating agents 有权
标题翻译：取代的吡唑并[1,5-A]嘧啶作为钙受体调节剂
公开(公告)号：US07514441B2
公开(公告)日：2009-04-07
申请号：US10525158
申请日：2003-08-21
申请人： Tsuneo Yasuma , Akira Mori , Masahiro Kawase , Hiroyuki Kimura , Masato Yoshida , Albert Charles Gyorkos , Scott Alan Pratt , Christopher Peter Corrette
发明人： Tsuneo Yasuma , Akira Mori , Masahiro Kawase , Hiroyuki Kimura , Masato Yoshida , Albert Charles Gyorkos , Scott Alan Pratt , Christopher Peter Corrette
IPC分类号： C07D487/04 , A61K31/519 , A61P19/08 , A61P19/10
CPC分类号： C07D487/04
摘要： There is provided a calcium receptor modulator comprising a compound of the formula (I): wherein ring A is an optionally substituted 5- to 7-membered ring; ring B is an optionally substituted 5- to 7-membered heterocyclic ring; X1 is CR1, CR1R2, N or NR13; X2 is N or NR3; Y is C, CR4 or N, Z is CR5, CR5R6, N or NR7; Ar is an optionally substituted cyclic group; R is H, an optionally substituted hydrocarbon group, etc.; and is a single bond or a double bond; R1, R2, R3, R4, R5, R6, R7 and R13 are independently H, an optionally substituted hydrocarbon group; or a salt thereof or a prodrug thereof. Compounds of the formula (II) and (III): wherein ring A is an optionally substituted 5- to 7-membered ring; Q is C, CR5 or N; R8, R9, R10, R11 and R12 are independently, H, an optionally substituted hydrocarbon group, etc., or a salt thereof are also provided. Also specify X1, R3, R1, Y and X3 in formula (II) and (III) as before.
摘要翻译：提供了包含式（I）化合物的钙受体调节剂：其中环A是任选取代的5-至7-元环; 环B是任选取代的5-至7-元杂环; X1是CR1，CR1R2，N或NR13; X2是N或NR3; Y为C，CR4或N，Z为CR5，CR5R6，N或NR7; Ar是任选取代的环状基团; R为H，任选取代的烃基等; “=”1.78mm“wi =”3.89mm“file =”US07514441-20090407-P00001.TIF“alt =”自定义字符“img-content =”character“img- format =“tif”/>是单键或双键; R 1，R 2，R 3，R 4，R 5，R 6，R 7和R 13独立地为H，任选取代的烃基; 或其盐或其前药。式（II）和（III）的化合物：其中环A是任选取代的5-至7-元环; Q为C，CR5或N; R8，R9，R10，R11和R12独立地为氢，任选取代的烃基等，或其盐。也如前所述，在式（II）和（III）中指定X1，R3，R1，Y和X3。

82. 发明授权

US07268525B2 Buck-boost converter 有权
标题翻译：降压 - 升压转换器
公开(公告)号：US07268525B2
公开(公告)日：2007-09-11
申请号：US11527441
申请日：2006-09-27
申请人： Takuya Ishii , Masato Yoshida , Mikio Motomori , Jun-ichiro Hara
发明人： Takuya Ishii , Masato Yoshida , Mikio Motomori , Jun-ichiro Hara
IPC分类号： G05F1/575
CPC分类号： H02M3/1582
摘要： A buck-boost converter includes: a buck converter section including a first switch, a first rectifier, and an inductor; a boost converter section sharing the inductor and including a second switch, a second rectifier, and a smoothing circuit; and a control circuit for generating and outputting a first driving signal for opening and closing the first switch and a second driving signal for opening and closing the second switch. The control circuit includes: an error amplifier circuit for amplifying an error between an output value from the smoothing circuit and a predetermined voltage value to thereby generate and output an error signal; an oscillator circuit for generating and outputting a triangular wave signal having a predetermined cycle; a compensatory signal generation circuit for generating and outputting a compensatory signal, which oscillates in a cycle that is at least twice the cycle of the triangular wave signal; a control signal generation circuit for adding together the error signal and the compensatory signal to thereby generate and output a control signal; and a comparator circuit for comparing the triangular wave signal with the control signal to generate and output the first or second driving signal.
摘要翻译：降压 - 升压转换器包括：降压转换器部分，包括第一开关，第一整流器和电感器; 共享电感器并包括第二开关，第二整流器和平滑电路的升压转换器部分; 以及用于产生和输出用于打开和关闭第一开关的第一驱动信号的控制电路和用于打开和关闭第二开关的第二驱动信号。控制电路包括：误差放大器电路，用于放大来自平滑电路的输出值与预定电压值之间的误差，从而产生并输出误差信号; 用于产生并输出具有预定周期的三角波信号的振荡器电路; 补偿信号生成电路，用于产生和输出补偿信号，该补偿信号以至少是三角波信号周期的两倍的周期振荡; 控制信号生成电路，用于将误差信号和补偿信号相加，从而生成并输出控制信号; 以及用于将三角波信号与控制信号进行比较以产生并输出第一或第二驱动信号的比较器电路。

83. 发明申请

US20070084696A1 Escalator and skirt end structure 失效
标题翻译：自动扶梯和裙端结构
公开(公告)号：US20070084696A1
公开(公告)日：2007-04-19
申请号：US10575103
申请日：2004-10-08
申请人： Masato Yoshida
发明人： Masato Yoshida
IPC分类号： B66B29/04
CPC分类号： B66B29/04 , B66B27/00
摘要： There is provided an escalator having a skirt end portion which is improved in the visibility of an indicator, etc. and in the safety of the transport of passengers. The escalator, having a pair of balustrades disposed on both sides of traveling steps, includes: a balustrade end for turning back a handrail belt wound around on each said balustrade; a skirt end portion having a belt entrance port for the handrail belt; and an indicator for indicating the operating conditions of the escalator, wherein the front face of the skirt end portion includes an inclined surface at predetermined angles with a vertical plane and with the direction of passengers' riding from the entrance to the escalator, and the indicator is disposed such that its display face conforms to the inclination of the inclined surface.
摘要翻译：提供了具有裙部端部的自动扶梯，其提高了指示器的可视性等，并且在乘客的运输的安全性方面。自动扶梯具有设置在行进台阶两侧的一对栏杆，包括：用于转回围绕每个所述栏杆的扶手带的栏杆端; 裙部端部具有用于扶手带的带入口; 以及用于指示自动扶梯的操作条件的指示器，其中裙部端部的前表面包括具有垂直平面的预定角度的倾斜表面以及乘客从入口到自动扶梯的乘坐方向，并且指示器被布置成使得其显示面符合倾斜表面的倾斜度。

84. 发明申请

US20060248804A1 Abrasive, method of polishing target member and process for producing semiconductor device 有权
标题翻译：磨料，抛光目标构件的方法和制造半导体装置的方法
公开(公告)号：US20060248804A1
公开(公告)日：2006-11-09
申请号：US11484611
申请日：2006-07-12
申请人： Masato Yoshida , Toranosuke Ashizawa , Hiroki Terazaki , Yuuto Ootuki , Yasushi Kurata , Jun Matsuzawa , Kiyohito Tanno
发明人： Masato Yoshida , Toranosuke Ashizawa , Hiroki Terazaki , Yuuto Ootuki , Yasushi Kurata , Jun Matsuzawa , Kiyohito Tanno
IPC分类号： B24B7/30
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/31053
摘要： To polish polishing target surfaces of SiO2 insulating films or the like at a high rate without scratching the surface, the present invention provides an abrasive comprising a slurry comprising a medium and dispersed therein at least one of i) cerium oxide particles constituted of at least two crystallites and having crystal grain boundaries or having a bulk density of not higher than 6.5 g/cm3 and ii) abrasive grains having pores. Also provided are a method of polishing a target member and a process for producing a semiconductor device which make use of this abrasive.
摘要翻译：本发明提供一种研磨剂，其包含含有介质的浆料，其中分散有i）至少一种，其中i）由至少两个晶体构成并具有晶界或堆积密度不高于6.5g / cm 3的氧化铈颗粒和ii）具有孔的磨料颗粒。还提供了一种抛光目标构件的方法以及利用该研磨剂制造半导体器件的方法。

85. 发明申请

US20050237042A1 Switching power supply circuit and semiconductor device integrating the same 审中-公开
标题翻译：开关电源电路和集成其的半导体器件
公开(公告)号：US20050237042A1
公开(公告)日：2005-10-27
申请号：US11106085
申请日：2005-04-14
申请人： Masato Yoshida , Takashi Ryu , Kazuyuki Moritake
发明人： Masato Yoshida , Takashi Ryu , Kazuyuki Moritake
IPC分类号： G05F1/40 , H02M3/145 , H02M3/156 , H02M3/335
CPC分类号： H02M3/156
摘要： A switching power supply circuit in accordance with the present invention is configured such that a switched-capacitor circuit is provided between an output terminal for outputting an output voltage and an input of an error amplification circuit, the output signal from the error amplification circuit for amplifying the error between a DC output voltage and a reference voltage is compared with a reference signal by a pulse width modulation circuit, and a voltage conversion section is turned ON/OFF continuously using the output signal of a pulse width modulation circuit while having a predetermined period with respect to an input voltage.
摘要翻译：根据本发明的开关电源电路被配置为使得开关电容器电路设置在用于输出输出电压的输出端和误差放大电路的输入之间，来自用于放大的误差放大电路的输出信号通过脉冲宽度调制电路将直流输出电压与参考电压之间的误差与参考信号进行比较，并且使用脉冲宽度调制电路的输出信号连续地使电压转换部分接通/断开，同时具有预定周期相对于输入电压。

86. 发明申请

US20050118820A1 CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate 有权
公开(公告)号：US20050118820A1
公开(公告)日：2005-06-02
申请号：US10990427
申请日：2004-11-18
申请人： Toshihiko Akahori , Toranosuke Ashizawa , Keizo Hirai , Miho Kurihara , Masato Yoshida , Yasushi Kurata
发明人： Toshihiko Akahori , Toranosuke Ashizawa , Keizo Hirai , Miho Kurihara , Masato Yoshida , Yasushi Kurata
IPC分类号： B24B37/00 , B24B37/04 , B24D3/34 , B44C1/22 , C09G1/02 , C09K3/14 , C09K13/00 , H01L21/302 , H01L21/3105 , H01L21/461
CPC分类号： B24D3/34 , B24B37/04 , C09G1/02 , C09K3/1463 , H01L21/31053
摘要： A CMP abrasive comprising a cerium oxide slurry containing cerium oxide particles, a dispersant and water, and a liquid additive containing a dispersant and water; and a liquid additive for the CMP abrasive. A method for polishing a substrate which comprises holding a substrate having, formed thereon, a film to be polished against a polishing pad of a polishing platen, followed by pressing, and moving the substrate and the polishing platen while supplying the above CMP abrasive in between the film to be polished and the polishing pad to thereby polish the film to be polished. The CMP abrasive and the method for polishing can be used for polishing a surface to be polished such as a silicone oxide film or a silicon nitride film without contaminating the surface to be polished with an alkali metal such as sodium ions and with no flaws, and the CMP abrasive is excellent in storage stability.

87. 发明申请

US20050068296A1 Image operation system 有权
标题翻译：图像操作系统
公开(公告)号：US20050068296A1
公开(公告)日：2005-03-31
申请号：US10916509
申请日：2004-08-12
申请人： Masato Yoshida
发明人： Masato Yoshida
IPC分类号： G06F3/00 , G06F3/01 , G06F3/033 , G06F3/048 , G09G5/08
CPC分类号： G06F3/038 , G06F3/011 , G06F3/016 , G06F3/0338 , G06F2203/014
摘要： In an image control system, with a reactive force on an input device that controls a pointer in a display, a bilateral communication of a pointing device can prevent a sense of discomfort while the system is used by an operator. When a screen image is switched from an image A to an image B, the pointing device activates the reactive force data for the image B after a predetermined amount of time based on the type or the amount of the image data of the screen image B. This enables the application of the reactive force for the image B in synchronization with generation of the screen image B, and thus gives an appropriate reactive force to the input portion of the pointing device when the screen images are being replaced from the image A to the image B.
摘要翻译：在图像控制系统中，在控制显示器中的指针的输入设备上具有反作用力，指示设备的双向通信可以在系统由操作者使用时防止不适感。当屏幕图像从图像A切换到图像B时，指示设备基于屏幕图像B的图像数据的类型或量来激活预定时间量之后的图像B的反作用力数据。这使得能够与生成屏幕图像B同步地对图像B施加反作用力，并且因此当屏幕图像被从图像A更换到图像A时向给定装置的输入部分提供适当的反作用力图像B.

88. 发明授权

US06786945B2 Polishing compound and method for polishing substrate 有权
公开(公告)号：US06786945B2
公开(公告)日：2004-09-07
申请号：US10467864
申请日：2003-08-13
申请人： Youichi Machii , Naoyuki Koyama , Masaya Nishiyama , Masato Yoshida
发明人： Youichi Machii , Naoyuki Koyama , Masaya Nishiyama , Masato Yoshida
IPC分类号： C09G102
CPC分类号： C09K3/1454 , C01F17/0043 , C01G25/00 , C01P2004/62 , C01P2004/64 , C01P2006/10 , C01P2006/12 , C09G1/02 , C09K3/1436 , C09K3/1463 , H01L21/31053
摘要： A polishing slurry and a polishing method which are suitably used in a CMP technique for flattening a surface of a substrate in a production process of a semiconductor device. The polishing slurry comprises particles and a medium in which at least a part of the particles are dispersed, wherein the particles are made of at least one of (1) a cerium compound selected from cerium oxide, cerium halide and cerium sulfide and having a density of 3 to 6 g/cm3 and an average particle diameter of secondary particles of 1 to 300 nm and (2) a tetravalent metal hydroxide. A polishing method using the polishing slurry takes advantage of a chemical action of particles in the polishing slurry and minimizes a mechanical action of the particles, thereby achieving a decrease in scratches caused by the particles and an increase in polishing rate at the same time.

89. 发明授权

US06343976B1 Abrasive, method of polishing wafer, and method of producing semiconductor device 有权
标题翻译：磨料，抛光方法和半导体器件的制造方法
公开(公告)号：US06343976B1
公开(公告)日：2002-02-05
申请号：US09581814
申请日：2000-09-08
申请人： Masato Yoshida , Toranosuke Ashizawa , Hiroki Terazaki , Yuuto Ootuki , Yasushi Kurata , Jun Matsuzawa , Kiyohito Tanno
发明人： Masato Yoshida , Toranosuke Ashizawa , Hiroki Terazaki , Yuuto Ootuki , Yasushi Kurata , Jun Matsuzawa , Kiyohito Tanno
IPC分类号： B24B100
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/31053
摘要： To polish polishing target surfaces of SiO2 insulating films or the like at a high rate without scratching the surface, the present invention provides an abrasive comprising a slurry comprising a medium and dispersed therein at least one of i) cerium oxide particles constituted of at least two crystallites and having crystal grain boundaries or having a bulk density of not higher than 6.5 g/cm3 and ii) abrasive grains having pores. Also provided are a method of polishing a target member and a process for producing a semiconductor device which make use of this abrasive.
摘要翻译：为了在不刮擦表面的情况下以高速率抛光SiO 2绝缘膜等的抛光目标表面，本发明提供了一种研磨剂，其包含包含介质的浆料，并分散在其中至少一个i）氧化铈颗粒，其由至少两个微晶并且具有晶界或堆积密度不高于6.5g / cm 3，和ii）具有孔的磨料颗粒。还提供了一种抛光目标构件的方法以及利用该研磨剂制造半导体器件的方法。

90. 发明授权

US5722363A Cylinder-injection type internal combustion engine and a fuel injection control apparatus therefor 失效
标题翻译：气缸喷射型内燃机及其燃料喷射控制装置
公开(公告)号：US5722363A
公开(公告)日：1998-03-03
申请号：US765791
申请日：1997-04-15
申请人： Kazumasa Iida , Yasuki Tamura , Shogo Omori , Katsuhiko Miyamoto , Masato Yoshida , Yuichi Tonomura , Jun Aoki
发明人： Kazumasa Iida , Yasuki Tamura , Shogo Omori , Katsuhiko Miyamoto , Masato Yoshida , Yuichi Tonomura , Jun Aoki
IPC分类号： F02D41/02 , F02D41/10 , F02D41/12 , F02D41/30 , F02B5/00
CPC分类号： F02D41/10 , F02D41/12 , F02D41/126 , F02D41/3029 , F02D41/3076 , F02B2275/18 , F02D2041/389 , F02D2200/023 , F02D2200/501 , F02D41/0215
摘要： A fuel injection control apparatus for a cylinder-injection type internal combustion engine performs a switching of fuel injection control modes in accordance with the operating state of the internal combustion engine when the engine is operating in a steady state. When the internal combustion engine is operating in a transitional state, for example, when the engine is accelerating or decelerating, a fuel injection control mode suited for the transitional operating state is selected preferentially over the mode selection for a steady state by a fuel injection control mode switching means. Consequently, the fuel injection control apparatus permits desirable operation of the internal combustion engine, making it possible to greatly improve the drivability of a vehicle in which the engine is installed.
摘要翻译： PCT No.PCT / JP96 / 01284第 371日期1997年04月15日 102（e）日期1997年4月15日PCT提交1996年5月15日PCT公布。公开号WO96 / 36801 PCT 日期：1996年11月21日燃油喷射型内燃机的燃料喷射控制装置在发动机处于稳定状态时，根据内燃机的运转状态进行燃料喷射控制模式切换。当内燃机工作在过渡状态时，例如，当发动机正在加速或减速时，适于过渡运行状态的燃料喷射控制模式优先选择通过燃料喷射控制的稳态模式选择模式切换装置。因此，燃料喷射控制装置允许内燃机的期望操作，使得可以大大提高其中安装发动机的车辆的驾驶性能。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式