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81. 发明申请

US20070052936A1 Method and device for irradiating spots on a layer 有权
标题翻译：用于在层上照射斑点的方法和装置
公开(公告)号：US20070052936A1
公开(公告)日：2007-03-08
申请号：US10539313
申请日：2003-11-20
申请人： Jacobus Neijzen , Helmar Van Santen
发明人： Jacobus Neijzen , Helmar Van Santen
IPC分类号： G03B23/04
CPC分类号： G03F7/70341 , G11B7/122 , G11B7/1374 , G11B7/261
摘要： For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.
摘要翻译：为了照射层，辐射束被引导并聚焦到层上的斑点，引起层相对于透镜的相对运动，使得相继地照射该层的不同部分和透镜表面之间的间隙最靠近层保持。此外，辐射照射到层上的斑点的间隙的至少一部分保持充满液体，液体经由供应导管供给。至少一部分液体填充了辐射照射到该点的凹槽。

82. 发明申请

US20060225840A1 Non-leaching adhesvie system and its use in a liquid immersion objective 有权
标题翻译：非浸出粘合体系及其在液浸物中的应用
公开(公告)号：US20060225840A1
公开(公告)日：2006-10-12
申请号：US10568837
申请日：2004-08-05
申请人： Emile Verstegen , Johan Kloosterboer , Hendrik Stapert , Jacobus Neijzen , Helmar Van Santen
发明人： Emile Verstegen , Johan Kloosterboer , Hendrik Stapert , Jacobus Neijzen , Helmar Van Santen
IPC分类号： B32B37/12 , B32B38/00
CPC分类号： C09J135/02
摘要： A non-leaching adhesive system and its use in a liquid immersion objective for immersion-writing of masters for optical discs are disclosed. The adhesive system comprises at least one monomer, selected from among the group of acrylate and methacrylate monomers, allylic monomers, norbornene monomers, hybrid monomers thereof, containing chemically different polymeriazble groups, and multifunctional thiol monomers, provided that said thiol is used in combination with at least one of said non-thiol monomers; and a polymerization initiator. At least one of said monomers, not being a thiol, is provided with at least two functional polymerizable groups to obtain a crosslinked polymer network. The polymerization initiator is preferably an initiator that can be activated both thermally and with UV radiation. The adhesive system may further contain a reactive diluent. Further the use of the present adhesive system in mounting a liquid immersion objective is disclosed.
摘要翻译：公开了一种非浸出粘合剂系统及其在用于浸入式写入光盘的液浸物镜中的用途。粘合剂体系包含至少一种选自丙烯酸酯和甲基丙烯酸酯单体的单体，烯丙基单体，降冰片烯单体，含有化学上不同的聚合物基团的杂化单体和多官能硫醇单体，条件是所述硫醇与所述非硫醇单体中的至少一种; 和聚合引发剂。至少一种所述单体（不是硫醇）具有至少两个官能的可聚合基团以获得交联的聚合物网络。聚合引发剂优选是能够以热辐射和UV辐射活化的引发剂。粘合剂体系还可以含有反应性稀释剂。此外，公开了本发明的粘合剂系统在安装液浸物镜中的用途。

83. 发明授权

US06568841B2 Illumination unit for a device having a multi-color reflective liquid crystal display 失效
标题翻译：具有多色反射型液晶显示装置的照明装置
公开(公告)号：US06568841B2
公开(公告)日：2003-05-27
申请号：US09840207
申请日：2001-04-23
申请人： Helmar Van Santen , Willem Gerard Ophey
发明人： Helmar Van Santen , Willem Gerard Ophey
IPC分类号： G02F11335
CPC分类号： G02B6/0038 , G02B6/0056
摘要： A reflective liquid crystal display (1) is provided with a front illumination unit. The front illumination unit comprises a flat waveguide (2), at least one surface of which is provided with a diffraction grating (7). A period of the diffraction grating (7) is of the order of the wavelength of the light. A light source (4) generates light of one or more colors, and the colors of light are sequentially coupled into the flat waveguide (2). The diffraction grating (7) is divided into separate areas (10, 11, 12). Each of these separate areas (10, 11, 12) is tuned to one particular wavelength of the light generated by the light source (4). Each separate area (10, 11, 12) is subdivided into various small areas so that the surface of the flat waveguide is subdivided into a large number of small areas (10-1, 11-1, 12-1, . . . 10-11, . . . 12-41). Each small area (10-1, 11-1, 12-1, . . . 10-11, . . . 12-41) is bounded by small areas (10-1, 11-1, 12-1, . . . 10-11, . . . 12-41) tuned to other light wavelengths. A polarizer (6) is present above the waveguide (2) to reflect light polarized in one direction back to the reflective liquid crystal display (1) and to transmit image-wise polarized light in a direction transverse to the one direction.
摘要翻译：反射型液晶显示器（1）设置有前照明单元。前照明单元包括平坦波导（2），其至少一个表面设置有衍射光栅（7）。衍射光栅（7）的周期为光的波长的数量级。光源（4）产生一种或多种颜色的光，并且光的颜色顺序地耦合到平坦波导（2）中。衍射光栅（7）被分成独立的区域（10,11,12）。这些分离区域（10,11,12）中的每一个被调谐到由光源（4）产生的光的特定波长。每个分离区域（10,11,12）被细分成各种小的区域，使得平坦波导的表面被细分为大量的小区域（10-1,11-1,12-1 ... 10 -11，... 12-41）。每个小区域（10-1,11-1,12-1，...，10-11，...，12-41）都被小区域（10-1,11-1,12-1，...）限定。 10-11，... 12-41）调谐到其他光波长。在波导（2）上方存在偏振器（6），以将在一个方向上偏振的光反射回反射型液晶显示器（1）并且在横向于该一个方向的方向上透射成像的偏振光。

84. 发明授权

US09396854B2 Process and apparatus for removing gaseous contaminants from gas stream comprising gaseous contaminants 有权
标题翻译：用于从包含气态污染物的气流中除去气态污染物的方法和装置
公开(公告)号：US09396854B2
公开(公告)日：2016-07-19
申请号：US13061435
申请日：2009-08-27
申请人： Henricus Abraham Geers , Helmar Van Santen
发明人： Henricus Abraham Geers , Helmar Van Santen
IPC分类号： F25J3/08 , B01D9/04 , H01F5/04 , F25J3/06 , C10L3/10 , H01F27/28 , H01R13/66 , H01R24/64
CPC分类号： H01F5/04 , B01D53/002 , B01D2256/24 , C10L3/10 , C10L3/102 , C10L3/104 , F25J3/061 , F25J3/0635 , F25J3/067 , F25J2205/02 , F25J2205/20 , F25J2210/60 , F25J2215/04 , F25J2215/60 , F25J2215/80 , F25J2220/64 , F25J2220/66 , F25J2240/02 , F25J2240/40 , F25J2240/60 , F25J2245/02 , F25J2270/12 , F25J2270/60 , F25J2270/66 , F25J2290/42 , H01F27/2895 , H01R13/6633 , H01R13/6658 , H01R24/64
摘要： The invention provides a process and a device for removing gaseous contaminants from a feed gas stream which comprises methane and gaseous contaminants, in which process the feed gas stream is cooled to obtain a slurry which comprises solid contaminant, liquid phase contaminant and a methane enriched gaseous phase, the slurry so obtained is introduced into a cryogenic separation device (4) in which from the top the methane enriched gaseous phase is removed (5), the slurry is diluted with liquid phase contaminant (6) and introduced as suction fluid into an ejector (9) via which it is passed into a heat exchanger (10) arranged outside the separation device and wherein solid contaminant is melted into liquid phase contaminant, part of the liquid phase contaminant so obtained is recycled (6) to dilute the slurry of contaminants inside the separation device and part (13) is introduced into the bottom part of the separation device, liquid phase is withdrawn (14) from the bottom part of the separation device, and part of the withdrawn liquid phase contaminant is recovered as a stream product (16) and part is recycled (17) to the ejector for use a motive fluid.
摘要翻译：本发明提供一种用于从包含甲烷和气态污染物的进料气流中除去气态污染物的方法和装置，在该方法中，将进料气流冷却以获得包含固体污染物，液相污染物和甲烷富集气体的浆料将如此获得的浆液引入低温分离装置（4），其中从顶部除去甲烷富集的气相（5），将浆液用液相污染物（6）稀释并作为抽吸流体引入喷射器（9）通过其被传送到布置在分离装置外部的热交换器（10）中，并且其中固体污染物被熔化成液相污染物，所得到的部分液相污染物被再循环（6）以稀释分离装置和部件（13）内的污染物被引入分离装置的底部，液相从罐底部排出（14）回收的液相污染物的一部分作为流产物（16）被回收，并且部分被再循环（17）到喷射器以使用运动流体。

85. 发明授权

US09341944B2 Imprint lithography 有权
公开(公告)号：US09341944B2
公开(公告)日：2016-05-17
申请号：US12705018
申请日：2010-02-12
申请人： Aleksey Yurievich Kolesnychenko , Helmar Van Santen , Yvonne Kruijt-Stegeman
发明人： Aleksey Yurievich Kolesnychenko , Helmar Van Santen , Yvonne Kruijt-Stegeman
IPC分类号： G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.

86. 发明申请

US20080186549A1 Device for Directing Radiation to a Layer, Apparatus with Such Device and Method Using Such Apparatus 失效
标题翻译：用于将辐射定向到层的装置，具有这种装置的装置和使用这种装置的方法
公开(公告)号：US20080186549A1
公开(公告)日：2008-08-07
申请号：US11911559
申请日：2006-04-13
申请人： Jacobus Hermanus Maria Neijzen , Helmar Van Santen
发明人： Jacobus Hermanus Maria Neijzen , Helmar Van Santen
IPC分类号： G02B26/08
CPC分类号： G11B7/261 , G03F7/70383 , G03F7/70583
摘要： A device for directing radiation to a layer (1) is described. The device includes a first optical element (L1) for focusing a first radiation beam (B1) originating from a first radiation source (S1) onto said layer, a second optical element (L2) for focusing a second radiation beam (B2) originating from a second radiation source (S2) onto said layer. The wavelengths of the radiation from said first and said second radiation source are different from each other. The first and second optical element are jointly movable with respect to said radiation sources, wherein the focal points of the two radiation beams at least substantially coincide with various movements of the first optical element and the second optical element with respect to the radiation sources. The second optical element (L2) has an aperture (A2) which allows optically undisturbed passage of the first radiation beam (B1). In this way a compact and light configuration of L1 and L2 is achieved as well as an improved radiation beam quality. Further an apparatus comprising such a device and a method using such an apparatus are disclosed.
摘要翻译：描述了用于将辐射引导到层（1）的装置。该装置包括用于将源自第一辐射源（S1）的第一辐射束（B 1）聚焦到所述层上的第一光学元件（L 1），用于聚焦第二辐射束的第二光学元件（L 2） B 2）源自第二辐射源（S 2）到所述层上。来自所述第一和第二辐射源的辐射的波长彼此不同。第一和第二光学元件可相对于所述辐射源共同移动，其中两个辐射束的焦点至少基本上与第一光学元件和第二光学元件相对于辐射源的各种运动重合。第二光学元件（L 2）具有允许第一辐射束（B 1）的光学上不受干扰地通过的孔径（A 2）。以这种方式，实现了L 1和L 2的紧凑和轻型结构以及改进的辐射束质量。此外，公开了一种包括这种装置的装置和使用这种装置的方法。

87. 发明授权

US07354698B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US07354698B2
公开(公告)日：2008-04-08
申请号：US11030326
申请日：2005-01-07
申请人： Helmar Van Santen , Aleksey Yurievich Kolesnychenko , Jacobus Hermanus Maria Neijzen , Emile Verstegen
发明人： Helmar Van Santen , Aleksey Yurievich Kolesnychenko , Jacobus Hermanus Maria Neijzen , Emile Verstegen
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the irradiating, contacting the medium with a template to form an imprint in the medium, allowing the medium to substantially cure such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while the medium is in the substantially non-flowable state.
摘要翻译：公开了一种压印方法，其包括在辐射下以可流动状态在基板上照射可光固化的可印刷介质以引发介质的固化，在照射之后，使介质与模板接触以在介质中形成印记，介质基本上固化，使得介质处于基本不可流动的状态，同时介质与模板接触，并且当介质处于基本上不可流动的状态时将模板与介质分离。

88. 发明申请

US20060246378A1 Photolithographic process, stamper, use of said stamper and optical data storage medium 审中-公开
标题翻译：光刻工艺，压模，使用所述压模和光学数据存储介质
公开(公告)号：US20060246378A1
公开(公告)日：2006-11-02
申请号：US10553720
申请日：2004-04-22
申请人： Jacobus Neijzen , Helmar Van Santen
发明人： Jacobus Neijzen , Helmar Van Santen
IPC分类号： G03F7/26
CPC分类号： G11B7/263 , G03F7/0015 , G03F7/30 , G11B7/261
摘要： A photolithographic process is described. It comprises the steps of: applying a photoresist layer (2) on a substrate (1), locally exposing the photoresist layer (2) to a radiation source with a suitable wavelength, providing a suitable liquid developer composition on the substrate (1), dissolving an exposed or unexposed region of the photoresist layer (2) with the developer composition, rinsing and drying the photoresist layer (2) thereby interrupting said dissolving step. The substrate (1) has a metallic surface (1c) in contact with the photoresist layer (2) and the photoresist layer (2) has a thickness dr
摘要翻译：描述光刻工艺。它包括以下步骤：将光致抗蚀剂层（2）施加到基底（1）上，将光刻胶层（2）局部地曝光到具有合适波长的辐射源上，在基底（1）上提供合适的液体显影剂组合物，用显影剂组合物溶解光致抗蚀剂层（2）的曝光或未曝光区域，漂洗并干燥光致抗蚀剂层（2），从而中断所述溶解步骤。基板（1）具有与光致抗蚀剂层（2）接触的金属表面（1c），并且光致抗蚀剂层（2）的厚度dr <100nm。达到70度以上的相对高的光致抗蚀剂壁陡度。该方法可以用于通过使用通过所述方法生产的压模（3）来生产高密度光学数据存储介质。

89. 发明申请

US20060144275A1 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US20060144275A1
公开(公告)日：2006-07-06
申请号：US11025835
申请日：2004-12-30
申请人： Aleksey Yurievich Kolesnychenko , Helmar Van Santen , Yvonne Kruijt-Stegeman
发明人： Aleksey Yurievich Kolesnychenko , Helmar Van Santen , Yvonne Kruijt-Stegeman
IPC分类号： B41F33/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.
摘要翻译：公开了一种用于制造用于压印光刻的工作模板的方法，其在一个实施例中包括将工作模板基板上的可压印介质的第一目标区域与主模板接触以在介质中形成第一印记，印记定义工作模板模式的一部分，将主模板与压印介质分离，将介质的第二目标区域与主模板接触以在介质中形成第二压印，第二压印定义工作模板的另一部分模式，并将主模板与压印介质分离。

90. 发明授权

US06550941B1 Luminaire 失效
标题翻译：灯具
公开(公告)号：US06550941B1
公开(公告)日：2003-04-22
申请号：US09717507
申请日：2000-11-21
申请人： Matthijs H. Keuper , Helmar Van Santen
发明人： Matthijs H. Keuper , Helmar Van Santen
IPC分类号： F21V500
CPC分类号： F21V5/02 , F21Y2115/10
摘要： A luminaire suitable for accommodating a light source which light source is situated substantially in a first plane. The luminaire has an optical element which is situated substantially in a second plane. The optical element is provided with facets of mutually differing inclination angles at one or both sides. The facets are shaped as substantially parallel prisms. Consecutive facets form a surface which is alternately convex and concave in shape.
摘要翻译：一种适于容纳光源的照明器，该光源基本上位于第一平面中。照明器具有基本上位于第二平面中的光学元件。光学元件设置有在一侧或两侧具有相互不同的倾斜角的小平面。小面成形为基本平行的棱镜。连续小面形成交替凸形和凹形的表面。

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