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81. 发明申请

US20090212462A1 IMPRINT LITHOGRAPHY 有权
公开(公告)号：US20090212462A1
公开(公告)日：2009-08-27
申请号：US12391954
申请日：2009-02-24
申请人： Yvonne Wendela KRUIJT-STEGEMAN , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychenko , Karal Diederick Van Der Mast , Klaus Simon
发明人： Yvonne Wendela KRUIJT-STEGEMAN , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychenko , Karal Diederick Van Der Mast , Klaus Simon
IPC分类号： B28B3/00 , B29C59/02
CPC分类号： B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
摘要翻译：公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由第二阵列散布在由第一阵列印刷的图案之间。

82. 发明授权

US07411650B2 Immersion photolithography system and method using microchannel nozzles 有权
标题翻译：浸入式光刻系统和使用微通道喷嘴的方法
公开(公告)号：US07411650B2
公开(公告)日：2008-08-12
申请号：US11053328
申请日：2005-02-09
申请人： Herman Vogel , Klaus Simon , Antonius Theodorus Anna Maria Derksen
发明人： Herman Vogel , Klaus Simon , Antonius Theodorus Anna Maria Derksen
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70341 , G03F7/20 , G03F7/70358 , G03F7/709 , H01L21/027
摘要： A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
摘要翻译：液浸式光刻系统包括：用电磁辐射曝光基板的曝光系统，包括将电磁辐射聚焦在基板上的投影光学系统。液体供应系统在投影光学系统和基板之间提供液体流动。可选的多个微喷嘴布置在投影光学系统的一侧的周边周围，以便在衬底被暴露的区域中提供基本均匀的液流速度分布。

83. 发明申请

US20070102838A1 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US20070102838A1
公开(公告)日：2007-05-10
申请号：US11364497
申请日：2006-03-01
申请人： Klaus Simon
发明人： Klaus Simon
IPC分类号： B29C35/08 , G03B27/42 , B29C45/76 , B29C57/00 , B29C51/08
CPC分类号： G03F9/7042 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
摘要翻译：公开了一种光刻设备，其具有布置成保持基板的第一基板台和布置成保持基板的第二基板台，布置成保持压印模板的压印模板保持器和可压印介质分配器，其中第一基板台是在位于或邻近可压印介质分配器的第一位置和位于压印模板保持器之间或邻近压印模板保持器的第二位置之间移动，并且第二衬底台可在第一和第二位置之间移动，使得第一和第二衬底表交换位置。

84. 发明申请

US20060146300A1 Radiation exposure apparatus comprising a gas flushing system 有权
公开(公告)号：US20060146300A1
公开(公告)日：2006-07-06
申请号：US11294348
申请日：2005-12-06
申请人： Klaus Simon , Enno Van Den Brink , Gerardus Keijsers , Adrianus Van Dijk , Hubertus Baijens
发明人： Klaus Simon , Enno Van Den Brink , Gerardus Keijsers , Adrianus Van Dijk , Hubertus Baijens
IPC分类号： G03B27/52
CPC分类号： G03F7/70933
摘要： An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for removing gas from an area between the projection system and the substrate.

85. 发明申请

US20060137555A1 Imprint lithography 有权
公开(公告)号：US20060137555A1
公开(公告)日：2006-06-29
申请号：US11019521
申请日：2004-12-23
申请人： Klaus Simon
发明人： Klaus Simon
IPC分类号： B41F33/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprinting method is disclosed that, in embodiment, includes contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium and separating the first and second templates from the imprinted medium.

86. 发明授权

US08753557B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US08753557B2
公开(公告)日：2014-06-17
申请号：US13331985
申请日：2011-12-20
申请人： Yvonne Wendela Kruijt-Stegeman , Johan Frederik Dijksman , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon , Raymond Jacobus Knaapen , Krassimir Todorov Krastev , Sander Frederik Wuister
发明人： Yvonne Wendela Kruijt-Stegeman , Johan Frederik Dijksman , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon , Raymond Jacobus Knaapen , Krassimir Todorov Krastev , Sander Frederik Wuister
IPC分类号： B28B11/08
CPC分类号： B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
摘要翻译：公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由第二阵列散布在由第一阵列印刷的图案之间。

87. 发明授权

US08730450B2 Immersion photolithography system and method using microchannel nozzles 有权
标题翻译：浸入式光刻系统和使用微通道喷嘴的方法
公开(公告)号：US08730450B2
公开(公告)日：2014-05-20
申请号：US13187118
申请日：2011-07-20
申请人： Herman Vogel , Klaus Simon , Antonius Theodorus Anna Maria Derksen
发明人： Herman Vogel , Klaus Simon , Antonius Theodorus Anna Maria Derksen
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/20 , G03F7/70358 , G03F7/709 , H01L21/027
摘要： A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. The liquid supply system including a plurality of inlets to supply the liquid to the space, the inlets located between the table and a surface of the optical element, the surface arranged to be in contact with the liquid.
摘要翻译：液浸式光刻系统包括：用电磁辐射曝光基板的曝光系统，包括将电磁辐射聚焦在基板上的投影光学系统。液体供应系统在投影光学系统和基板之间提供液体流动。所述液体供应系统包括多个入口以将液体供应到所述空间，所述入口位于所述工作台和所述光学元件的表面之间，所述表面布置成与所述液体接触。

88. 发明申请

US20120140200A1 IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING MICROCHANNEL NOZZLES 有权
标题翻译：曝光光刻系统和使用微通道喷嘴的方法
公开(公告)号：US20120140200A1
公开(公告)日：2012-06-07
申请号：US13397223
申请日：2012-02-15
申请人： Herman Vogel , Klaus Simon , Antonius Theodorus Anna Maria Derksen
发明人： Herman Vogel , Klaus Simon , Antonius Theodorus Anna Maria Derksen
IPC分类号： G03B27/32
CPC分类号： G03F7/70341 , G03F7/20 , G03F7/70358 , G03F7/709 , H01L21/027
摘要： A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
摘要翻译：液浸式光刻系统包括：用电磁辐射曝光基板的曝光系统，包括将电磁辐射聚焦在基板上的投影光学系统。液体供应系统在投影光学系统和基板之间提供液体流动。可选的多个微喷嘴布置在投影光学系统的一侧的周边周围，以便在衬底被暴露的区域中提供基本均匀的液流速度分布。

89. 发明申请

US20110273680A1 IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING MICROCHANNEL NOZZLES 有权
公开(公告)号：US20110273680A1
公开(公告)日：2011-11-10
申请号：US13187118
申请日：2011-07-20
申请人： Herman Vogel , Klaus Simon , Antonius Theodorus Anna Maria Derksen
发明人： Herman Vogel , Klaus Simon , Antonius Theodorus Anna Maria Derksen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/20 , G03F7/70358 , G03F7/709 , H01L21/027
摘要： A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.

90. 发明授权

US08004649B2 Immersion photolithography system and method using microchannel nozzles 有权
标题翻译：浸入式光刻系统和使用微通道喷嘴的方法
公开(公告)号：US08004649B2
公开(公告)日：2011-08-23
申请号：US12060514
申请日：2008-04-01
申请人： Herman Vogel , Klaus Simon , Antonius Theodorus Anna Maria Derksen
发明人： Herman Vogel , Klaus Simon , Antonius Theodorus Anna Maria Derksen
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/20 , G03F7/70358 , G03F7/709 , H01L21/027
摘要： A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
摘要翻译：液浸式光刻系统包括：用电磁辐射曝光基板的曝光系统，包括将电磁辐射聚焦在基板上的投影光学系统。液体供应系统在投影光学系统和基板之间提供液体流动。可选的多个微喷嘴布置在投影光学系统的一侧的周边周围，以便在衬底被暴露的区域中提供基本均匀的液流速度分布。

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