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    • 81. 发明专利
    • HEAT CONDUCTIVE COOLING MODULE DEVICE
    • JPS60239048A
    • 1985-11-27
    • JP9286784
    • 1984-05-11
    • HITACHI LTD
    • KURIHARA YASUTOSHISOGA TASAOYATSUNO KOUMEIMIYATA KENJIOKAMURA MASAHIROKOBAYASHI FUMIYUKIOOGURO TAKAHIRO
    • H01L23/40H01L23/36H01L23/433
    • PURPOSE:To obtain a heat conductive cooling module device having an almost equal working temperature by a method wherein, when a cooling means in going to be provided outside the airtight container wherein a heat generating device having different heating power, the thermal resistivity of a heat transfer device is increased or decreased corresponding to the intensity of the heating power. CONSTITUTION:A plurality of LSI chips 10 to be used for large power consumption and a plurality of LSI chips 10a to be used for small power consumption are fixed to the surface of a ceramic multilayer wiring substrate 12 using microscopic solder balls 11, the connection pin 14 protruding to the other surface of the substrate 12 is inserted and fixed to the through hole of the wiring board 13 which is supporting an auxiliary circuit. Then, chips 10 and 10a are surrounded by an airtight container 19 and a housing 16, He gas and the like of excellent heat conductivity is filled in there, and the piston-like protruded part 20 protruding to the inner surface of the housing 16 is pressed to each chip through the intermediary of a spring. According to this constitution, the spring is surrounded by a heat conductive connecting member 20a, but at this time, the surface of the member 20a on the side of the chip 10a is to be coated by an SiO2 film 20a having a high thermal resistivity.
    • 84. 发明专利
    • Insulated type semiconductor device
    • 绝缘型半导体器件
    • JPS59175733A
    • 1984-10-04
    • JP4888283
    • 1983-03-25
    • Hitachi Ltd
    • KURIHARA YASUTOSHIMINAGAWA TADASHIYATSUNO KOUMEI
    • H01L21/52H01L21/58H01L29/74
    • H01L24/32H01L24/83H01L2224/291H01L2224/8319H01L2224/8385H01L2924/01029H01L2924/014H01L2924/07802
    • PURPOSE:To eliminate the possibility of denaturation or damage based on thermal strain by bonding a metallic plate for loading a semiconductor base body onto a metallic layer consisting of a plurality of inorganic insulating members with a metallic solder. CONSTITUTION:An alumina plate 2 is bonded with one main surface of a metallic support plate 1, and a metallized layer 201 and a copper layer 203 are formed on the bonding surface. A metallized layer 202 and a copper layer 204 are shaped on one surface of the plate 2. A metallic plate 3 is bonded on the layer 204 with a solder layer 102. The layers 203, 204 are unified, and a thermal expansion coefficient as the whole of the composite alumina plate 2 is brought close to that of the metallic plate 3. According to such constitution, heat cycle resistance can be improved without substantially lowering radiant property.
    • 目的:为了消除基于热应变的变性或损伤的可能性,通过将用于将半导体基体加载到由具有金属焊料的多个无机绝缘构件组成的金属层上的金属板。 构成:将氧化铝板2与金属支撑板1的一个主面接合,在接合面上形成金属化层201和铜层203。 金属化层202和铜层204在板2的一个表面上成形。金属板3用焊料层102结合在层204上。层203,204是统一的,并且热膨胀系数为 使整个复合氧化铝板2靠近金属板3。根据这种结构,可以提高耐热循环性,而不会显着降低辐射性。
    • 85. 发明专利
    • Semiconductor device
    • 半导体器件
    • JPS5952853A
    • 1984-03-27
    • JP16236182
    • 1982-09-20
    • Hitachi Ltd
    • KURIHARA YASUTOSHIMINAGAWA TADASHIOOGAMI MICHIOWAKUI TAKAYUKIYATSUNO KOUMEI
    • H01L21/52H01L23/12H01L25/07H01L25/18
    • H01L25/072H01L24/32
    • PURPOSE:To reduce thermal strain applied to the end section of a solder layer, and to prevent the deformation and thermal fatigue breakdown of each member by forming a notch section or a recessed section to at least one of the fringe sections of the surfaces of a semiconductor base body and an insulating member and the surface section of a metallic member opposite to the fringe sections. CONSTITUTION:A metallic support member 11 is formed by a copper plate, and the recessed section 28 of 3mm. width X 0.5mm. depth is formed to a section opposite to the fringe section of the insulating member 12 placed in the upper surface of the member 11. The insulating members 12 consisting of two alumina plates are bonded by the solder layers 29 while being conformed to the positions of the recessed sections 28 of the metallic support member 11, and metallic plates 13 are bonded on each insulating member 12 by the solder layers 30. Sections opposite to the solder layers 29, 30 of the insulating members 12 are metallized. The metallic plate 13 is formed by a copper plate in 2mm. thickness, and the notch section 31 of 3mm. width X 0.5mm. depth is formed to the fringe section of the lower surface of the plate 13 and the recessed sections 28 of 1.5mm. width X0.5mm. depth to sections opposite to the fringe sections of semiconductor base bodies 14, 15, 16 placed on the upper surface of the plate 13 by a press.
    • 目的:为了减少施加在焊料层的端部上的热应变,并且为了防止每个部件的变形和热疲劳击穿,通过将凹口部分或凹部形成至一个边缘部分 半导体基体和绝缘构件以及与边缘部相对的金属构件的表面部。 构成:金属支撑构件11由铜板形成,凹部28由3mm构成。 宽X 0.5mm。 深度形成在与放置在构件11的上表面中的绝缘构件12的边缘部分相对的部分上。由两个氧化铝板构成的绝缘构件12通过焊料层29接合,同时符合 金属支撑构件11的凹部28和金属板13通过焊料层30接合在每个绝缘构件12上。与绝缘构件12的焊料层29,30相对的部分被金属化。 金属板13由2mm的铜板形成。 厚度,切口部31为3mm。 宽X 0.5mm。 深度形成在板13的下表面的边缘部分和1.5mm的凹部28中。 宽X0.5mm。 深度与通过压机放置在板13的上表面上的半导体基体14,15,16的边缘部分相对的部分。
    • 86. 发明专利
    • Insulated semiconductor device
    • 绝缘半导体器件
    • JPS5947736A
    • 1984-03-17
    • JP15656182
    • 1982-09-10
    • Hitachi Ltd
    • KURIHARA YASUTOSHIMINAGAWA TADASHIOOGAMI MICHIOWAKUI TAKAYUKIYATSUNO KOUMEI
    • H01L25/07H01L21/52H01L21/58H01L23/12H01L25/18
    • H01L24/83H01L24/32H01L2224/32014H01L2224/8319H01L2224/8385H01L2924/01029H01L2924/014H01L2924/07802
    • PURPOSE:To reduce thermal distortion during manufacture of operation and eliminate fear of deformation, change of characteristic and breakdown of each member by providing recess part in the form of closed loop to the area corresponding to periphery of insulating member at the surface where is in contact with said insulating member, of a metal supporting plate bonding an inorganic insulating member with a metal brazing material. CONSTITUTION:Two sheets of alumina plate 2 are bonded onto a metal supporting plate 1, a metal plate 3 which is almost the same shape as said alumina plate is respectively bonded to each alumina plate 2 and thereby a circuit is assembled on the metal plate 3. The supporting plate 1 is provided with the recess part 111 in the form of closed loop with the width of 3mm. and depth of 0.5mm. at the area corresponding to the periphery of alumina plate 2, for example, of the one main surface 11 of a copper plate in the thickness of 3.2mm.. Two sheets of alumina plate 2 are bonded by solder layer 101 on the main surface 11 of the supporting plate 11. Thickness of solder layer 101 is about 0.1mm. at the center while about 0.6mm. at the periphery. The metallizing is executed to the entire part of bonding surface of alumina plate 2, except for the periphery, in view of giving wetness for soldering.
    • 目的:为了减少制造过程中的热变形,通过将闭环形式的凹部设置在与接触面相对应的绝缘部件的周围的区域,减少变形的担心,变形,改变各部件的特性和破坏 所述绝缘构件具有将无机绝缘构件与金属钎焊材料接合的金属支撑板。 构成:将两片氧化铝板2接合到金属支撑板1上,将与所述氧化铝板几乎相同形状的金属板3分别接合到每个氧化铝板2上,从而将电路组装在金属板3上 支撑板1设置有宽度为3mm的闭环形式的凹部111。 深度为0.5mm。 在与铝板2的周围相对应的区域,例如铜板的一个主表面11的厚度为3.2mm。两片氧化铝板2通过焊料层101在主表面11上 焊料层101的厚度约为0.1mm。 在中心约0.6mm。 在周边。 考虑到给予焊接湿度,除了外围之外,对氧化铝板2的接合表面的整个部分进行金属化。
    • 87. 发明专利
    • INSULATED SEMICONDUCTOR DEVICE
    • JPS5852859A
    • 1983-03-29
    • JP15062581
    • 1981-09-25
    • HITACHI LTD
    • KURIHARA YASUTOSHIOOGAMI MICHIOYATSUNO KOUMEI
    • H01L23/40H01L23/373H05K1/16
    • PURPOSE:To reduce the thermal strain caused in case of manufacture or during operation by a method wherein, in the semiconductor device where the metallic supporting members are electrically insulated but thermally and mechanically connected, the thermal expansion coefficient of the insulated members is made approximately coincident with that of the supporting members and the thermal expansion coefficient of composite metallic sheet is made coincident with that of semiconductor substrate. CONSTITUTION:The metallic supporting sheet 1 made of aluminum sheet is provided with the thermal expansion coefficient of 23.9X10 / deg.C while the composite resin film 2, an integrated film comprising fluorine resin films 221 and 222 on the both main surfaces of polyamide film 21 is also provided with the apparent thermal expansion coefficient of about 21X10 / deg.C approximateing to that of said metallic supporting sheet 1. The composite metallic sheet 3, a directly integrated sheet by cold rolled process comprising alloy sheets 321 and 322 made of 0.2mm. thick iron and 36% nickel is provided with the apparent thermal expansion coefficient of about 6.0X10 / deg.C set between the thermal expansion coefficient (3.5X10 / deg.C) of silicon as the material of the composite resin film 2 and the semiconductor substrate.
    • 90. 发明专利
    • SEMICONDUCTOR DEVICE
    • JPS57102057A
    • 1982-06-24
    • JP17725780
    • 1980-12-17
    • HITACHI LTD
    • KURIHARA YASUTOSHIYATSUNO KOUMEI
    • H01L21/52H01L21/60H01L25/07H01L25/18
    • PURPOSE:To enable to arrange easily a circuit element for substitution in a semiconductor device by a method wherein a space is reserved on a conductor plate as to enable to provide a reserve circuit element of the same kind with a circuit element provided on the conductor plate at the electrically and thermally equivalent position with the existing circuit element. CONSTITUTION:The first conductor 1 is provided on a metal supporter 2 interposig an insulator 3 between then. Moreover the second conductors 4, 4' are provided on the first conductor 1 interposing insulators 5, 5' between then. At this time, the second conductors 4, 4' are arranged as to become equivalent electrically and thermally to both of the semiconductor element pellet 6 and another semiconductor element pellet 8 to be substituted therefor. Accordingly even when electric connection between the semiconductor element pellet 6 and the other member is failed, the other semiconductor element pellet 8 for substitution can be arranged at once at the electrically and thermally equivalent position.