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    • 86. 发明申请
    • EXPOSURE DEVICE
    • 曝光装置
    • WO1993009469A1
    • 1993-05-13
    • PCT/DE1991000859
    • 1991-10-30
    • FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...VOGT, HolgerKÜCK, HeinzHESS, GüntherGEHNER, Andreas
    • FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...
    • G03F01/00
    • G03F7/70283G03F7/70291G03F7/70358
    • An exposure device (1) useful for producing originals (6) or for directly exposing electronic elements has a light source (2) and a pattern generator (3). In order to shorten the required write or exposure time with an exposure device (1) having a simplified structure, the pattern generator (3) has an optical schlieren system (15, 17) and an active, matrix-addressable surface light modulator (13). The surface light modulator (13) has a reflecting surface whose addressed areas diffractively reflect incident light and whose non-addressed surface areas reflect incident light without diffraction. The schlieren system (15, 17) has a schlieren objective (15), a projection objective (16) and a reflecting device (17) which directs the light from the light source (2) onto the surface of the surface light modulator (13). The schlieren objective (15) is arranged at a short distance from the surface light modulator (13), in relation to its focal depth. A focussing device (4c) focusses the light from the light source (2) in at least one point (P) spaced apart from the reflecting device (17). At least one virtual punctual light source (P') can be associated to the point (P) by reflection of the point (P) on the reflecting device (17). A filtering device (18) is arranged on the diffraction plane of the virtual punctual light source (P'), between the schlieren objective (15) and the projection objective (16), and a movable positioning table (7) is provided, upon which the original (6), the electronic element or the structure may be secured.
    • 用于产生原稿(6)或直接暴露电子元件的曝光装置(1)具有光源(2)和图案发生器(3)。 为了通过具有简化结构的曝光装置(1)缩短所需的写入或曝光时间,图案发生器(3)具有光学均匀系统(15,17)和有源矩阵寻址表面光调制器(13) )。 表面光调制器(13)具有反射表面,其寻址区域衍射地反射入射光,并且其未寻址的表面区域反射入射光而不衍射。 分光光度计系统(15,17)具有均匀物镜(15),投影物镜(16)和反射装置(17),其将来自光源(2)的光引导到表面光调制器(13)的表面上 )。 散射物镜(15)相对于其焦深设置在与表面光调制器(13)相距很短的距离处。 聚焦装置(4c)将来自光源(2)的光聚焦在与反射装置(17)间隔开的至少一个点(P)中。 通过反射装置(17)上的点(P)的反射,至少一个虚拟准时光源(P')可以与点(P)相关联。 过滤装置(18)被布置在虚拟准时光源(P')的衍射平面上,在施胶物镜(15)和投影物镜(16)之间,并且提供可动定位台(7) 原始(6),电子元件或结构可以被固定。