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81. 发明申请

US20090053535A1 Reduced Residual Formation in Etched Multi-Layer Stacks 审中-公开
标题翻译：蚀刻多层堆叠中残留形成的减少
公开(公告)号：US20090053535A1
公开(公告)日：2009-02-26
申请号：US12196959
申请日：2008-08-22
申请人： Frank Y. Xu , Weijun Liu , Cynthia B. Brooks , Dwayne L. LaBrake , David J. Lentz
发明人： Frank Y. Xu , Weijun Liu , Cynthia B. Brooks , Dwayne L. LaBrake , David J. Lentz
IPC分类号： B32B27/00 , C08F2/46 , B05D3/00 , B44C1/22
CPC分类号： G03F7/027 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/24612
摘要： A multi-layer stack for imprint lithography is formed by applying a first polymerizable composition to a substrate, polymerizing the first polymerizable composition to form a first polymerized layer, applying a second polymerizable composition to the first polymerized layer, and polymerizing the second polymerizable composition to form a second polymerized layer on the first polymerized layer. The first polymerizable composition includes a polymerizable component with a glass transition temperature less than about 25° C., and the first polymerized layer is substantially impermeable to the second polymerizable composition.
摘要翻译：通过将第一可聚合组合物施加到基底上，聚合第一可聚合组合物以形成第一聚合层，向第一聚合层施加第二可聚合组合物，并将第二可聚合组合物聚合成在第一聚合层上形成第二聚合层。第一可聚合组合物包括玻璃化转变温度低于约25℃的可聚合组分，并且第一聚合层对于第二可聚合组合物基本上是不可渗透的。

82. 发明授权

US07270533B2 System for creating a turbulent flow of fluid between a mold and a substrate 有权
标题翻译：用于在模具和基底之间产生紊流流体的系统
公开(公告)号：US07270533B2
公开(公告)日：2007-09-18
申请号：US10898037
申请日：2004-07-23
申请人： Ian M. McMackin , Nicholas A. Stacey , Daniel A. Babbs , Duane J. Voth , Mathew P. C. Watts , Van N. Truskett , Frank Y. Xu , Ronald D. Voisin , Pankaj B. Lad
发明人： Ian M. McMackin , Nicholas A. Stacey , Daniel A. Babbs , Duane J. Voth , Mathew P. C. Watts , Van N. Truskett , Frank Y. Xu , Ronald D. Voisin , Pankaj B. Lad
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： The present invention is directed toward a system for introducing a flow of a fluid between a mold, disposed on a template, and a substrate, the system including, a fluid supply system; and a chuck body having a baffle and first and second apertures, the first and second apertures disposed between the baffle and the template, with the first and second apertures in fluid communication with the fluid supply system to produce a turbulent flow of the fluid between the mold and said substrate.
摘要翻译：本发明涉及一种用于在设置在模板上的模具和基板之间引入流体流的系统，该系统包括：流体供应系统; 以及具有挡板和第一和第二孔的卡盘体，所述第一和第二孔设置在挡板和模板之间，其中第一和第二孔与流体供应系统流体连通，以在流体供应系统之间产生紊流模具和所述基板。

83. 发明授权

US06204343B1 Room temperature curable resin 失效
标题翻译：室温固化树脂
公开(公告)号：US06204343B1
公开(公告)日：2001-03-20
申请号：US09319353
申请日：1999-06-03
申请人： Dieter Barucha , Dean M. Moren , Manfred Stepputtis , Frank Y. Xu
发明人： Dieter Barucha , Dean M. Moren , Manfred Stepputtis , Frank Y. Xu
IPC分类号： C08L6100
CPC分类号： C08G65/3322 , C08F283/00 , C08F290/06
摘要： A curable composition for electrical applications, the curable composition comprising (i) a compound having at least two &agr;,&bgr;-unsaturated groups and an equivalent weight of less than 250 g/mol, (ii) a catalyst capable of initiating a Michael reaction and (iii) a Michael donor having an equivalent weight of less than 250 g/mol, and a package for using this composition in electical splices.
摘要翻译：一种用于电气应用的可固化组合物，所述可固化组合物包含（i）具有至少两个α，β-不饱和基团和当量重量小于250g / mol的化合物，（ii）能够引发迈克尔反应的催化剂和（iii）当量重量小于250g / mol的迈克尔供体，以及一种在电接头中使用该组合物的包装。

84. 发明申请

US20140117574A1 Strain and Kinetics Control During Separation Phase of Imprint Process 审中-公开
标题翻译：压印过程分离阶段的应变和动力学控制
公开(公告)号：US20140117574A1
公开(公告)日：2014-05-01
申请号：US14150261
申请日：2014-01-08
申请人： Niyaz Khusnatdinov , Frank Y. Xu , Mario Johannes Meissl , Michael N. Miller , Ecron D. Thompson , Gerard M. Schmid , Pawan Kumar Nimmakayala , Xiaoming Lu , Byung- Jin Choi
发明人： Niyaz Khusnatdinov , Frank Y. Xu , Mario Johannes Meissl , Michael N. Miller , Ecron D. Thompson , Gerard M. Schmid , Pawan Kumar Nimmakayala , Xiaoming Lu , Byung- Jin Choi
IPC分类号： B29C37/00 , B82Y40/00
CPC分类号： B29C37/0003 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
摘要翻译：描述了在压印光刻工艺的分离过程期间改进鲁棒层分离的系统和方法。包括在待印刷的基底与模板之间匹配应变的方法，改变或改变在分离期间施加到模板和/或基底的力，或改变或改变分离过程的动力学。

85. 发明授权

US08211214B2 Single phase fluid imprint lithography method 有权
标题翻译：单相流体压印光刻法
公开(公告)号：US08211214B2
公开(公告)日：2012-07-03
申请号：US12026022
申请日：2008-02-05
申请人： Frank Y. Xu , Niyaz Khusnatdinov
发明人： Frank Y. Xu , Niyaz Khusnatdinov
IPC分类号： B01D19/00
CPC分类号： B01D19/0005 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to either the viscous liquid, the substrate, the template, or a combination thereof. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.
摘要翻译：本发明涉及通过减少存在于沉积在基底上的粘性液体层中的气穴来减少压印层中的图案失真的方法。为此，该方法包括改变靠近粘性液体设置的气体的输送。具体地说，其中待记录图案的衬底附近的气氛相对于粘性液体，衬底，模板或其组合而被高度可溶，高度扩散或两者的气体饱和。另外，或者代替饱和气氛，可以降低气氛的压力。

86. 发明申请

US20120114559A1 NANOIMPRINT LITHOGRAPHY FORMATION OF FUNCTIONAL NANOPARTICLES USING DUAL RELEASE LAYERS 有权
标题翻译： NANOIMPRINT LITHOGRAPHY使用双重释放层形成功能纳米颗粒
公开(公告)号：US20120114559A1
公开(公告)日：2012-05-10
申请号：US13289601
申请日：2011-11-04
申请人： Vikramjit Singh , Frank Y. Xu , Sidlgata V. Sreenivasan
发明人： Vikramjit Singh , Frank Y. Xu , Sidlgata V. Sreenivasan
IPC分类号： A61K9/14 , A61K49/00 , B44C1/22 , B82Y5/00
CPC分类号： G03F7/0002 , A61K9/51 , A61K9/5192 , B82Y5/00 , B82Y10/00 , B82Y15/00 , B82Y40/00 , Y10S977/701 , Y10S977/712 , Y10S977/713
摘要： Functional nanoparticles may be formed using at least one nanoimprint lithography step. In one embodiment, sacrificial material may be patterned on a multilayer substrate including one or more functional layers between removable layers using an imprint lithography process. At least one of the functional layers includes a functional material such as a pharmaceutical composition or imaging agent. The pattern may be further etched into the multilayer substrate. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Removing the removable layers releases the pillars from the patterned structure to form functional nanoparticles such as drug or imaging agent carriers.
摘要翻译：可以使用至少一个纳米压印光刻步骤形成功能纳米颗粒。在一个实施例中，牺牲材料可以使用压印光刻工艺在多层衬底上图案化，包括可移除层之间的一个或多个功能层。至少一个功能层包括诸如药物组合物或成像剂的功能材料。可以将图案进一步蚀刻到多层基板中。然后可以去除功能材料的至少一部分以提供暴露柱的冠表面。去除可移除的层从图案化结构释放柱以形成功能性纳米颗粒，例如药物或成像剂载体。

87. 发明申请

US20120112385A1 PATTERNING OF NON-CONVEX SHAPED NANOSTRUCTURES 有权
标题翻译：非形式形状纳米结构的构图
公开(公告)号：US20120112385A1
公开(公告)日：2012-05-10
申请号：US13290770
申请日：2011-11-07
申请人： Sidlgata V. Sreenivasan , Vikramjit Singh , Frank Y. Xu , Byung-Jin Choi
发明人： Sidlgata V. Sreenivasan , Vikramjit Singh , Frank Y. Xu , Byung-Jin Choi
IPC分类号： B29C59/02 , B44C1/22
CPC分类号： B29C59/022 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L29/0673
摘要： Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles.
摘要翻译：描述了制造具有几何横截面的纳米级结构的方法，包括凸形或非凸形横截面。该方法可以用于直接图案化衬底和/或创建压印光刻模板或模具，其可以随后用于将纳米形图案直接复制到其它衬底中，例如形成功能性或牺牲抗蚀剂以形成功能纳米颗粒。

88. 发明申请

US20110319516A1 RELEASE AGENT PARTITION CONTROL IN IMPRINT LITHOGRAPHY 有权
标题翻译：释放代理分割控制在印刷图
公开(公告)号：US20110319516A1
公开(公告)日：2011-12-29
申请号：US13226635
申请日：2011-09-07
申请人： Frank Y. Xu , Weijun Liu
发明人： Frank Y. Xu , Weijun Liu
IPC分类号： C08L23/24 , C07C43/13 , C07F5/02 , C07C235/06 , C07D403/12 , C07C69/708 , C07C69/63
CPC分类号： C07D237/24 , B82Y10/00 , B82Y40/00 , C07C233/18 , G03F7/0002
摘要： Release agents with increased affinity toward nano-imprint lithography template surfaces interact strongly with the template during separation of the template from the solidified resist in a nano-imprint lithography process. The strong interaction between the surfactant and the template surface reduces the amount of surfactant pulled off the template surface during separation of a patterned layer from the template in an imprint lithography cycle. Maintaining more surfactant associated with the surface of the template after the separation of the patterned layer from the template may reduce the amount of surfactant needed in a liquid resist to achieve suitable release of the solidified resist from the template during an imprint lithography process. Strong association of the release agent with the surface of the template facilitates the formation of ultra-thin residual layers and dense fine features in nano-imprint lithography.
摘要翻译：在纳米压印光刻工艺中将模板与固化的抗蚀剂分离期间，与纳米压印光刻模板表面的亲和性增加的脱模剂与模板相互作用强烈。表面活性剂和模板表面之间的强相互作用减少了在压印光刻循环中将图案化层与模板分离期间从模板表面上拉出的表面活性剂的量。在将图案化层与模板分离之后，维持与模板表面相关的更多表面活性剂可以减少液体抗蚀剂中所需的表面活性剂的量，以在压印光刻过程中从模板中实现固化的抗蚀剂的合适释放。脱模剂与模板表面的强相关有助于在纳米压印光刻中形成超薄的残余层和致密的精细特征。

89. 发明授权

US08075299B2 Reduction of stress during template separation 有权
标题翻译：减少模板分离过程中的应力
公开(公告)号：US08075299B2
公开(公告)日：2011-12-13
申请号：US12581236
申请日：2009-10-19
申请人： Frank Y. Xu , Sidlgata V. Sreenivasan
发明人： Frank Y. Xu , Sidlgata V. Sreenivasan
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Separation of an imprint lithography template and a patterned layer in an imprint lithography process may result in stress to features of the template and/or features of the patterned layer. Such stress may be reduced by minimizing open areas on the template, including dummy features within the open areas, and/or selective positioning of features on the template.
摘要翻译：在压印光刻工艺中分离压印光刻模板和图案化层可能导致模板的特征和/或图案化层的特征的应力。可以通过使模板上的开放区域最小化，包括开放区域内的虚拟特征和/或特征在模板上的选择性定位来减小这种应力。

90. 发明申请

US20110277827A1 NANOSTRUCTURED SOLAR CELL 有权
标题翻译：纳米结构太阳能电池
公开(公告)号：US20110277827A1
公开(公告)日：2011-11-17
申请号：US13105422
申请日：2011-05-11
申请人： Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
发明人： Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
IPC分类号： H01L31/06 , H01L31/0216 , H01L31/0236 , B82Y99/00
CPC分类号： H01L31/02363 , B82Y20/00 , C23C14/34 , H01L31/022466 , H01L31/0236 , H01L31/035263 , H01L31/035281 , H01L31/03762 , H01L31/0392 , H01L31/03921 , H01L31/03926 , H01L31/0463 , H01L31/075 , H01L31/076 , H01L31/202 , Y02E10/548 , Y02P70/521
摘要： Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
摘要翻译：描述了具有纳米结构阵列的纳米结构太阳能电池的制造系统和方法，包括具有金字塔纳米结构重复图案的纳米结构太阳能电池，为具有改进的PCE的低成本薄膜太阳能电池提供。

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