专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

81. 发明专利

JP2007019031A Radiation source, lithographic apparatus, and device manufacturing method 审中-公开
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：JP2007019031A
公开(公告)日：2007-01-25
申请号：JP2006211722
申请日：2006-08-03
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ZUKAVISHVILI GIVI GEORGIEVITCH , IVANOV VLADIMIR VITAL EVITCH , KOSHELEV KONSTANTIN NIKOLAEVIT , KOROB EVGENII DMITREEVITCH , BANINE VADIM YEVGENYEVICH , PAVEL STANISLAVOVICH ANTSIFERO
IPC分类号： G21K5/00 , H05G2/00 , F28D15/02 , G03F7/20 , G21K1/00 , G21K5/02 , G21K5/08 , H01L21/027 , H05G1/02 , H05H1/24
CPC分类号： H05G2/003 , B82Y10/00 , F28D15/0266 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： PROBLEM TO BE SOLVED: To improve efficiency of conversion of electrical energy to radiation.
SOLUTION: To improve conversion efficiency of a radiation source including an anode and a cathode, the anode and the cathode being configured and arranged to create a discharge in a substance in a space between the anode and cathode and to form plasma so as to generate electromagnetic radiation, the radiation source unit is constructed to have a low inductance and to operate with a minimum of plasma. To improve heat dissipation, a fluid circulation system is created within the radiation source space and a wick by using a fluid in both its vapor and liquid phases. To prevent contamination from entering a lithographic projection apparatus, the radiation source unit is constructed to minimize the production of contamination, and a trap is employed to capture the contamination without interfering with the emitted radiation.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提高电能转换到辐射的效率。解决方案：为了提高包括阳极和阴极的辐射源的转换效率，阳极和阴极被配置和布置成在阳极和阴极之间的空间中的物质中产生放电并形成等离子体，以便为了产生电磁辐射，辐射源单元被构造为具有低电感并且以最小的等离子体进行操作。为了改善散热，在辐射源空间和油雾中通过在气相和液相中使用流体产生流体循环系统。为了防止污染进入光刻投影装置，辐射源单元被构造成使污染物的产生最小化，并且使用捕集阱来捕获污染物而不干扰所发射的辐射。版权所有（C）2007，JPO＆INPIT

82. 发明专利

JP2006279051A Lithography apparatus, device manufacturing method, and device manufactured by same 有权
标题翻译：平面设备，装置制造方法及其制造的装置
公开(公告)号：JP2006279051A
公开(公告)日：2006-10-12
申请号：JP2006088069
申请日：2006-03-28
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： JACOBS JOHANNES HENRICUS WILHE , BANINE VADIM YEVGENYEVICH , BREWSTER BARRIE DUDLEY , IVANOV VLADIMIR VITALEVITCH , MERTENS BASTIAAN MATTHIAS , MOORS JOHANNES HUBERTUS JOSEPH , LIVESEY ROBERT GORDON , WOLSCHRIJN BASTIAAN THEODOOR
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70933 , G03F7/70908
摘要： PROBLEM TO BE SOLVED: To provide a lithography apparatus that can be used in a vacuum or semi-vacuum environment. SOLUTION: A lithography projection apparatus has a radiation system for supplying projection beams of radiation, a mask table provided with a mask holder for holding a mask, a substrate table provided with a substrate holder for holding a substrate, and a projection system for imaging a mask's radiated part onto a target portion of the substrate, wherein at least one gas purge ceiling opening is provided that operates between different zones of the apparatus, and one or more gases are supplied from the opening, the gases out of groups composed of hydrogen, heavy hydrogen, and a mixture of argon and hydrogen. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供可以在真空或半真空环境中使用的光刻设备。解决方案：光刻投影设备具有用于提供投影射束的辐射系统，设置有用于保持掩模的掩模保持器的掩模台，设置有用于保持基板的基板保持器的基板台，以及投影系统用于将掩模的辐射部分成像到基板的目标部分上，其中提供在设备的不同区域之间操作的至少一个气体吹扫天花板开口，并且一个或多个气体从开口供应，所述气体组成的氢，重氢，以及氩和氢的混合物。版权所有（C）2007，JPO＆INPIT

83. 发明专利

JP2006279036A Multilayer spectral purity filter, lithographic device provided with such spectral purity filter, manufacturing method of device and device manufactured thereby 有权
标题翻译：多层光谱滤光片，具有这种光谱滤光片的光刻设备，器件的制造方法及其制造的器件
公开(公告)号：JP2006279036A
公开(公告)日：2006-10-12
申请号：JP2006067070
申请日：2006-03-13
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： BANINE VADIM YEVGENYEVICH , JOHANNES HUBERTUS JOSEPHINA MO , SJMAENOK LEONID AIZIKOVITCH , SALASHCHENKO NIKOLAY N
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70916 , G03F7/70191 , G03F7/70308 , G03F7/70575 , G03F7/70941
摘要： PROBLEM TO BE SOLVED: To provide a multilayer spectral purity filter, a lithographic device provided with such a spectral purity filter, the manufacturing method of a device, and the device manufactured thereby. SOLUTION: The spectral purity of extreme ultra violet (EUV) radiation beam is improved by the multilayer spectral purity filter and debris emitted from a radiation source is collected. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种多层光谱纯度滤光器，设置有这种光谱纯度滤光器的光刻设备，器件的制造方法以及由此制造的器件。解决方案：通过多层光谱纯度滤光片改善极紫外（EUV）辐射束的光谱纯度，并收集从辐射源发射的碎屑。版权所有（C）2007，JPO＆INPIT

84. 发明专利

JP2006032980A Lithography apparatus, radiation system, contaminant trap, manufacturing method of device, and method for capturing contaminant in the contaminant trap 有权
标题翻译：曝光装置，辐射系统，污染物捕集器，装置的制造方法以及在污染物捕集器中捕集污染物的方法
公开(公告)号：JP2006032980A
公开(公告)日：2006-02-02
申请号：JP2005233742
申请日：2005-07-14
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： LEVINUS PIETER BAKKER , BANINE VADIM YEVGENYEVICH , LUIJKX CORNELIS PETRUS A M , SCHUURMANS FRANK JEROEN PIETER
IPC分类号： H01L21/027 , G21K1/00 , G21K5/02
CPC分类号： G03F7/70908 , G03F7/70916 , G03F7/70933
摘要： PROBLEM TO BE SOLVED: To provide a supply source for generating a radiation beam, a contaminant trap located in the path of the radiation beam, a radiation system provided with an illumination system constituted so as to adjust the radiation beam generated by the supply source, and to provide a lithography apparatus including a support section for supporting a patternizing device.
SOLUTION: This patternizing device works so that a pattern is given to a cross section of an adjusted radiation beam. The apparatus also includes a substrate table holding a substrate, and a projection system for projecting a patternized radiation beam on a target portion of the substrate. The contaminant trap includes a plurality foils, for forming channels disposed almost in parallel with the transmission direction of the radiation beam. This trap is provided with a gas supply system located so that a gas is injected into at least one of the channels of the trap.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供用于产生辐射束的供应源，位于辐射束的路径中的污染物阱，设置有照明系统的辐射系统，其被构造成调节由所述辐射束产生的辐射束并且提供一种包括用于支撑图案化装置的支撑部分的光刻装置。
解决方案：该图案化装置工作，使得图案被赋予调整的辐射束的横截面。该装置还包括一个保持衬底的衬底台，以及用于将图案化的辐射束投射到衬底的目标部分上的投影系统。污染物捕集器包括多个箔，用于形成与辐射束的传播方向几乎平行设置的通道。该陷阱设置有气体供应系统，其被定位成使得气体被注入到阱的至少一个通道中。版权所有（C）2006，JPO＆NCIPI

85. 发明专利

JP2005183950A Lithographic apparatus, illumination system, and method for providing projection beam of euv radiation 有权
标题翻译：光刻设备，照明系统和提供EUV辐射投影光束的方法
公开(公告)号：JP2005183950A
公开(公告)日：2005-07-07
申请号：JP2004350743
申请日：2004-12-03
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： IVANOV VLADIMIR VITALEVICH , BANINE VADIM YEVGENYEVICH , KOSHELEV KONSTANTIN NIKOLAEVIT
IPC分类号： G21K5/02 , G03F7/20 , H01L21/027 , H05G2/00
CPC分类号： G03F7/70858 , G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus that is not influenced by problems caused by particles that are produced by the by-product of EUV radiation production.
SOLUTION: The lithographic apparatus has an illumination system supplying a beam of radiation and a supporting structure supporting a patterning structure arranged. The patterning structure is formed to impart patterns to the cross section of the radiation beam. Moreover, the apparatus has a substrate support supporting a substrate and a projection system for projecting the patterned beam onto the target portion of the substrate. The illumination system has a radiation producing system of producing extreme ultraviolet radiation and a radiation collecting system of collecting extreme ultraviolet radiation arranged. The particles produced as the by-product of extreme ultraviolet radiation production move substantially in a particle movement direction. The radiation collecting system is regulated in such a manner as to collect the extreme ultraviolet radiation that radiates in the collecting direction that is largely different from the particle movement direction.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供不受由由EUV辐射生产的副产物产生的颗粒引起的问题的光刻设备。解决方案：光刻设备具有提供辐射束的照明系统和支撑布置图案化结构的支撑结构。形成图形结构以赋予辐射束横截面图案。此外，该装置具有支撑基板的基板支撑件和用于将图案化的光束投影到基板的目标部分上的投影系统。照明系统具有产生极紫外辐射的辐射产生系统和收集极紫外辐射的辐射收集系统。作为极紫外线辐射产生的副产物产生的颗粒基本上在颗粒移动方向上移动。辐射收集系统被调节成收集与颗粒移动方向大不相同的收集方向辐射的极紫外线辐射。版权所有（C）2005，JPO＆NCIPI

86. 发明专利

JP2005020006A Laser generated plasma radiation system equipped with foil trap 审中-公开
标题翻译：激光发生等离子体辐射系统配备有螺旋捕获
公开(公告)号：JP2005020006A
公开(公告)日：2005-01-20
申请号：JP2004187221
申请日：2004-06-25
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： BAKKER LEVINUS PIETER , BANINE VADIM YEVGENYEVICH , KURT RALPH , SCHUURMANS FRANK JEROEN PIETER , SIDELNIKOV YURII VICTOROVITCH
IPC分类号： G21K1/00 , G03F7/20 , G21K1/06 , G21K5/02 , H01L21/027 , H05H1/24
CPC分类号： G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide a radiation system having a foil trap between a collector such as a vertical incident collector and (plasma) source so that a radiation generated from the source pass the foil trap twice.
SOLUTION: The radiation passes the foil trap at a time before it hits the collector at the first time and at a time after it has been reflected by the collector at the second time. The configuration was considered impossible until now. The radiation is not interrupted by the foil trap because the foil trap has a thin plate parallel to both radiations in which one is generated from the source and the other is reflected by the collector. Therefore, the vertical incident collector used together with a radiation source generated by the plasma is protected from fragments generated from EUV source.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种在诸如垂直入射收集器和（等离子体）源的收集器之间具有箔捕获器的辐射系统，使得从源产生的辐射通过箔阱两次。解决方案：辐射在第一次和第二次被收集器反射之前的时间经过收集器之前通过箔捕获器。到目前为止，配置被认为是不可能的。辐射不被箔陷阱中断，因为箔阱具有平行于两个辐射的薄板，其中一个从源产生并且另一个被收集器反射。因此，与由等离子体产生的辐射源一起使用的垂直入射收集器被保护免于从EUV源产生的碎片。版权所有（C）2005，JPO＆NCIPI

87. 发明专利

JP2012199582A Radiation source, lithographic device, and device manufacturing method 有权
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：JP2012199582A
公开(公告)日：2012-10-18
申请号：JP2012129640
申请日：2012-06-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SCHIMMEL HENDRIKUS GIJSBERTUS , BANINE VADIM YEVGENYEVICH , LOOPSTRA ERIK ROELOF
IPC分类号： H01L21/027 , H05G2/00
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/70175 , H05G2/003
摘要： PROBLEM TO BE SOLVED: To provide a radiation source having a contamination barrier for reducing a deposition rate of ions, atoms, molecules, granular debris and the like on a collector mirror of an EUV radiation source.SOLUTION: A radiation source includes a plasma formation portion, at which fuel comes into contact with a radiation beam to form a plasma. A collector with a mirror collects and reflects EUV radiation generated at a first focal point toward a second focal point. A contamination barrier is positioned so that a peripheral edge of the contamination barrier does not block more than 50% of a solid angle defined by a mirror at the second focal point, and thereby, the EUV radiation reflected by the collector mirror passes through the contamination barrier and is not attenuated excessively. The contamination barrier functions to trap fuel materials such as ions, atoms, molecules or nano droplets from the plasma, so as to prevent them from being accumulated on the collector mirror. A gas extraction port may be provided near the plasma formation portion to restrain diffusion of the fuel debris and contamination toward the collector mirror.
摘要翻译：要解决的问题：提供一种具有污染屏障的辐射源，用于降低EUV辐射源的集光镜上的离子，原子，分子，颗粒状碎屑等的沉积速率。解决方案：辐射源包括等离子体形成部分，燃料与辐射束接触以形成等离子体。具有反射镜的收集器收集并反射在第一焦点处产生的EUV辐射朝向第二焦点。定位污染屏障，使得污染屏障的周边边缘不会阻挡由第二焦点上的反射镜限定的立体角的50％以上，从而由收集镜反射的EUV辐射通过污染物并且不会过度衰减。污染屏障用于从等离子体捕获诸如离子，原子，分子或纳米液滴的燃料材料，以防止它们聚集在收集器反射镜上。可以在等离子体形成部分附近设置气体提取口，以限制燃料碎屑的扩散和污染朝向收集器反射镜。版权所有（C）2013，JPO＆INPIT

88. 发明专利

JP2012109613A RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：JP2012109613A
公开(公告)日：2012-06-07
申请号：JP2012037310
申请日：2012-02-23
申请人： ASML NETHERLANDS BV
发明人： WASSINK ARNOLD CORNELIS , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR VITALEVICH , KOSHELEV KONSTANTIN , CADEE THEODORUS PETRUS MARIA , CLIVITZN VLADIMIR MIKHAILOVICH , DERK JAN WILFRED KLUNDER , WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES , PAUL PETER ANNA ANTONIUS BROM , SOER WOUTER ANTHON , GLUSHKOV DENIS ALEXANDROVICH
IPC分类号： H01L21/027 , G03F7/20 , H05G2/00
摘要： PROBLEM TO BE SOLVED: To provide a radiation system for generating a beam of radiation that defines an optical axis.SOLUTION: The radiation system comprises a plasma-produced discharge source for generating EUV radiation. The discharge source comprises: a pair of electrodes provided with a voltage difference; and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also comprises a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided at a predetermined spherical angle relative to the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

89. 发明专利

JP2012044198A Device having plasma radiation source, method of forming radiation beam, and lithography device 有权
标题翻译：具有等离子体辐射源的装置，形成辐射光束的方法和光刻装置
公开(公告)号：JP2012044198A
公开(公告)日：2012-03-01
申请号：JP2011219337
申请日：2011-10-03
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KRIVTSUN VLADIMIR MIHAILOVITC , BANINE VADIM YEVGENYEVICH , VLADIMIR VITALEVICH IVANOV , KROPE EUGENE DMITRIEVICH , KONSTANTIN NIKOLAEVICH KOSHELEV , SIDELNIKOV YURI VIKTOROVICH , YAKUSHEV OLEG
IPC分类号： H01L21/027
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70858 , G03F7/70883 , G03F7/70983
摘要： PROBLEM TO BE SOLVED: To reduce damage caused on a mirror in a photolithography device which generates EUV radiation by using a plasma source.SOLUTION: A device for forming electromagnetic radiation includes a plasma radiation source (20), and a foil trap (24) provided with a plurality of thin foils (25) substantially extending in parallel with a radiation direction from a plasma radiation source (20). A grid (22) is disposed between the plasma radiation source (20) and the foil trap (24). A space is provided between the grid (22) and the foil trap (24). The device further includes an electrical potential applying circuit (28) for applying an electrical potential to the grid (22) so as to make the grid (22) repel electrons discharged by the plasma radiation source (20) and produce a positive space electrical charge between the grid (22) and the foil trap (24) to deflect ions discharged by the plasma radiation source (20) toward the foil trap.
摘要翻译：要解决的问题：减少通过使用等离子体源产生EUV辐射的光刻装置中的反射镜造成的损伤。解决方案：用于形成电磁辐射的装置包括等离子体辐射源（20）和设置有多个薄箔（25）的箔捕获器（24），其基本上与等离子体辐射源的辐射方向平行延伸（20）。栅极（22）设置在等离子体辐射源（20）和箔阱（24）之间。在栅格（22）和箔捕获器（24）之间设置有空间。该装置还包括用于向电网（22）施加电势的电位施加电路（28），以使电网（22）排斥由等离子体辐射源（20）放电的电子并产生正空间电荷在栅格（22）和箔捕获器（24）之间，以将由等离子体辐射源（20）排出的离子偏转到箔阱。版权所有（C）2012，JPO＆INPIT

90. 发明专利

JP2012033929A Method and device for inspection of items, euv lithography reticle, lithography device, and manufacturing method for device 审中-公开
标题翻译：用于检查项目的方法和装置，EUV算法，平面设备和装置的制造方法
公开(公告)号：JP2012033929A
公开(公告)日：2012-02-16
申请号：JP2011163028
申请日：2011-07-26
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KOOLE ROELOF , BANINE VADIM YEVGENYEVICH , SCACALOSSI LOELOF , OKTAY YILDIRIM
IPC分类号： H01L21/027 , G01N21/64 , G03F1/84
CPC分类号： G01N21/6428 , G01N21/94 , G01N21/956 , G03F1/84
摘要： PROBLEM TO BE SOLVED: To provide an inspection method for detecting a contaminant particle in an item such as an EUV lithography reticle.SOLUTION: An inspection method comprises: coating fluorescent dye material on an item; illuminating the item by using radiation in the wavelength suitable for exciting the fluorescent dye material; monitoring the item about the second radiation emission by the fluorescent dye in the wavelength different from the first radiation; generating a signal to show contamination when the second radiation is detected. In one example, such a means as low affinity coating is coated on a reticle to reduce affinity to the dye molecule while the dye molecule is coupled to a contaminant particle by physical or chemical absorption. The dye can be selected to have fluorescent behavior which can be improved by hydrophobicity and hydrophilicity, and the contaminant surface is processed accordingly by a buffer coating.
摘要翻译：要解决的问题：提供一种检测EUV光刻掩模版等物品中的污染物粒子的检查方法。检测方法包括：在物品上涂布荧光染料; 通过使用适合于激发荧光染料的波长的辐射来照亮物品; 通过荧光染料监测与第一辐射不同的波长的关于第二辐射发射的项目; 当检测到第二辐射时产生显示污染的信号。在一个实例中，将低亲和性涂层的这种方法涂覆在掩模版上以降低对染料分子的亲和力，同时染料分子通过物理或化学吸收与污染物颗粒偶联。可以选择染料具有可以通过疏水性和亲水性改善的荧光行为，并且通过缓冲涂层相应地处理污染物表面。版权所有（C）2012，JPO＆INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式