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    • 89. 发明授权
    • Method for producing a semiconductor crystal
    • 半导体晶体的制造方法
    • US08216365B2
    • 2012-07-10
    • US12073178
    • 2008-02-29
    • Seiji NagaiShiro YamazakiTakayuki SatoKatsuhiro ImaiMakoto IwaiTakatomo SasakiYusuke MoriFumio Kawamura
    • Seiji NagaiShiro YamazakiTakayuki SatoKatsuhiro ImaiMakoto IwaiTakatomo SasakiYusuke MoriFumio Kawamura
    • C30B25/18
    • C30B29/403C30B9/00C30B9/10
    • Objects of the invention are to further enhance crystallinity and crystallinity uniformity of a semiconductor crystal produced through the flux method, and to effectively enhance the production yield of the semiconductor crystal. The c-axis of a seed crystal including a GaN single-crystal layer is aligned in a horizontal direction (y-axis direction), one a-axis of the seed crystal is aligned in the vertical direction, and one m-axis is aligned in the x-axis direction. Thus, three contact points at which a supporting tool contacts the seed crystal are present on m-plane. The supporting tool has two supporting members, which extend in the vertical direction. One supporting member has an end part, which is inclined at 30° with respect to the horizontal plane α. The reasons for supporting a seed crystal at m-plane thereof are that m-plane exhibits a crystal growth rate, which is lower than that of a-plane, and that desired crystal growth on c-plane is not inhibited. Actually, a plurality of seed crystals and supporting tools are periodically placed along the y-axis direction.
    • 本发明的目的是进一步提高通过助焊剂法生产的半导体晶体的结晶度和结晶度均匀性,并有效提高半导体晶体的制造成品率。 包括GaN单晶层的晶种的c轴在水平方向(y轴方向)上排列,晶种的一个a轴在垂直方向上排列,并且一个m轴对齐 在x轴方向。 因此,在m平面上存在支撑工具与晶种接触的三个接触点。 支撑工具具有在垂直方向上延伸的两个支撑构件。 一个支撑构件具有相对于水平面α倾斜30°的端部。 在m面支撑晶种的原因在于,m面的晶体生长速度低于a面的晶体生长速度,c面上的期望的晶体生长没有被抑制。 实际上,沿着y轴方向周期性地放置多个晶种和支撑工具。