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    • 86. 发明授权
    • Nanostructured thin films and their uses
    • 纳米结构薄膜及其用途
    • US07391018B2
    • 2008-06-24
    • US11226075
    • 2005-09-14
    • Chunming NiuRobert Hugh DanielsRobert S. DubrowJay L. Goldman
    • Chunming NiuRobert Hugh DanielsRobert S. DubrowJay L. Goldman
    • H01J49/04
    • A61L27/303A61L31/122H01J49/0418Y10S977/701Y10T428/12736Y10T428/12743
    • The present invention generally discloses the use of a nanostructured non-silicon thin film (such as an alumina or aluminum thin film) on a supporting substrate which is subsequently coated with an active layer of a material such as silicon or tungsten. The base, underlying non-silicon material generates enhanced surface area while the active layer assists in incorporating and transferring energy to one or more analytes adsorbed on the active layer when irradiated with a laser during laser desorption of the analyte(s). The present invention provides substrate surfaces that can be produced by relatively straightforward and inexpensive manufacturing processes and which can be used for a variety of applications such as mass spectrometry, hydrophobic or hydrophilic coatings, medical device applications, electronics, catalysis, protection, data storage, optics, and sensors.
    • 本发明一般公开了在支撑衬底上使用纳米结构非硅薄膜(例如氧化铝或铝薄膜),随后用诸如硅或钨的材料的活性层涂覆。 底层的非硅材料产生增强的表面积,而活性层有助于在分析物的激光解吸附中用激光照射时,将能量并入和转移到吸附在活性层上的一种或多种分析物。 本发明提供了可以通过相对直接和廉价的制造方法制造的衬底表面,其可用于各种应用,例如质谱,疏水或亲水涂层,医疗器械应用,电子学,催化,保护,数据存储, 光学和传感器。