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    • 85. 发明授权
    • Silver halide photographic material
    • 卤化银照相材料
    • US5266457A
    • 1993-11-30
    • US990260
    • 1992-12-14
    • Tetsuro KojimaHiroyuki Mifune
    • Tetsuro KojimaHiroyuki Mifune
    • G03C1/09
    • G03C1/09
    • A silver halide photographic material comprises a silver halide emulsion layer provided on a support. In the photographic material of the present invention, the silver halide emulsion layer contains a compound represented by the formula (I): ##STR1## in which each of R.sup.1, R.sup.2 and R.sup.3 independently is a group of chain structure selected from an alkyl group, an alkenyl group, an alkynyl group and an alkylthio group, each of which may have one or more substituent groups; and the number of the carbon atoms contained in the compound represented by the formula (I) is 3 to 12. A process for sulfur sensitization of a silver halide emulsion using the compound represented by the formula (I) is also disclosed.
    • 卤化银照相材料包括设置在载体上的卤化银乳剂层。 在本发明的照相材料中,卤化银乳剂层含有式(I)表示的化合物:其中R 1,R 2和R 3各自独立地是选自以下的链结构: 烷基,烯基,炔基和烷硫基,每个可以具有一个或多个取代基; 并且式(I)表示的化合物中所含的碳原子数为3〜12。也公开了使用式(I)表示的化合物对卤化银乳剂进行硫敏化的方法。
    • 90. 发明授权
    • Development-processing method for silver halide photographic
light-sensitive material
    • 卤化银照相感光材料的开发处理方法
    • US4634660A
    • 1987-01-06
    • US732819
    • 1985-05-10
    • Hiroyuki MifuneKoki NakamuraShoji Ishiguro
    • Hiroyuki MifuneKoki NakamuraShoji Ishiguro
    • C07D257/04G03C1/34G03C5/305G03C5/30
    • C07D257/04G03C1/34G03C5/305Y02P20/55
    • In the presence of a novel antifoggant represented by the general formula (I), a silver halide photographic material which has at least one light-sensitive silver halide emulsion layer on a support is development-processed. The developing solution is one containing both dihydroxybenzenes and 3-pyrazolidones, a developing solution containing both dihydroxybenzenes and aminophenoles, or a developing solution containing a primary aromatic amine developer to suppress markedly fog generation at much reduced sacrifice of sensitivity: ##STR1## wherein M represents a hydrogen atom, an alkali metal atom, NH.sub.4 or a mercapto group-protecting moiety which can be split-off in the presence of an alkali; n represents 1, 2 or 3; R.sup.1 represents a hydrogen atom or --COOR.sup.2 ; and R.sup.2 represents a hydrogen atom, an alkali metal atom, NH.sub.4, or an unsubstituted or substituted alkyl, aryl or aralkyl group.
    • 在由通式(I)表示的新型防灰雾剂的存在下,在载体上具有至少一个感光卤化银乳剂层的卤化银照相材料进行显影处理。 显影溶液是含有二羟基苯和3-吡唑烷酮的显影液,其是含有二羟基苯和氨基苯酚的显影液,或含有主要芳族胺显影剂的显影液,以在极少的敏感性牺牲下抑制明显的雾产生。 其中M表示氢原子,碱金属原子,NH 4或可在碱存在下分离的巯基保护基; n表示1,2或3; R1表示氢原子或-COOR2; R 2表示氢原子,碱金属原子,NH 4或未取代或取代的烷基,芳基或芳烷基。