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    • 71. 发明专利
    • DE2644654C2
    • 1988-06-09
    • DE2644654
    • 1976-10-02
    • BBC BROWN BOVERI AG, BADEN, AARGAU, CH
    • JAECKLIN, ANDRE, DR., ENNETBADEN, CH
    • H01L29/06H01L29/74H01L29/743
    • A semiconductor device including at least four zones of alternately opposite conductivity types, the two inner zones and the outer zone adjoining each of them in each case possessing a common surface, on which there is provided a main electrode making contact with both the inner and the outer zone, the first main electrode comprising a central recess in which the first inner zone is in contact with a control electrode, and there being on the surface of the two inner zones heavily doped regions, surrounding the two outer zones, of the same conductivity type as the adjoining inner zone and which are at a distance of at least two carrier-diffusion lengths for the purpose of forming a guard zone for the outer zone disposed on the same surface, and wherein there is provided on the surface of an inner zone, between the outer zone disposed on the same surface and the heavily doped region surrounding that outer zone, an annular guard zone of the opposite conductivity type to that of the adjacent inner zone.
    • 76. 发明专利
    • POWER THYRISTOR
    • DE3173128D1
    • 1986-01-16
    • DE3173128
    • 1981-08-20
    • TOSHIBA KK
    • ARAKI YOUICHIOGAWA TOSHIO
    • H01L29/08H01L29/74H01L29/743H01L29/52
    • Disclosed is a semiconductor device comprising: a semiconductor body having a first semiconductor layer (32) of the N conductivity type, second and third semiconductor layers (34,36) of the P conductivity type, and first and second regions (38, 40) of the N conductivity type formed in the second semiconductor layer (34); a cathode electrode (42) having first and second portions (42A, 42 8 ) formed on the first semiconductor region (38); a gate electrode (44) provided in the second semiconductor layer (34) in opposition to the cathode electrode (42) with the second semiconductor region (40) interposed therebetween; an anode electrode (46) provided on the third semiconductor layer (36); an auxiliary electrode (48) consisting of two first portions (48 Al , 48 A2 ) and one second portion (48 8 ) connected at ends respectively to the first portions (48 A1 , 48 A2 ), said first portions (48 A1 , 48 A2 ) being formed on said second region (34) and having free ends spaced from each other, and said second portion (48 B ) formed on said second layer (34) and extending along the periphery of the first portion (42A) of said cathode electrode (42); and the second portion (42 8 ) of the cathode electrode (42) being between free ends of the first portion of the auxiliary electrode (48).