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71. 发明申请

US20030188652A1 Liquid transfer articles and method for producing the same using digital imaging photopolymerization 有权
公开(公告)号：US20030188652A1
公开(公告)日：2003-10-09
申请号：US10119061
申请日：2002-04-09
发明人： Michael E. Mclean , Brett Scherrman , Douglas C. Neckers , Peter Serguievski
IPC分类号： B41F001/18 , B41N003/00 , B41M005/00 , G03F007/00 , G03B027/62 , G03B027/70 , G03B027/58 , B41F007/00 , B41N001/00
CPC分类号： G03F7/00 , G03F7/2002 , G03F7/2057 , G03F7/24
摘要： A liquid transfer article is provided including a support assembly and an imaged surface formed directly on the surface of the support assembly by digital photopolymerization. The support assembly is in the form of a polymeric base, and the liquid transfer article is formed by providing a liquid photopolymer on the surface of the base and then irradiating the polymer with a light source to form the image. The liquid transfer article is reimagable and may be used in gravure printing processes, as well as other printing applications.

72. 发明申请

US20030147063A1 Storage containers for lithography mask and method of use 失效
标题翻译：光刻掩模用储存容器及使用方法
公开(公告)号：US20030147063A1
公开(公告)日：2003-08-07
申请号：US10364282
申请日：2003-02-10
申请人： Applied Materials, Inc.
发明人： Cheng Guo
IPC分类号： G03B027/62
CPC分类号： G03F1/66 , G03B27/62 , G03F7/70741
摘要： A container is provided for storing a lithographic printing mask. A first container section is formed of a sturdy material which defines a central inner recess area that is shaped to house a mask and to hold outer edges of a mask without touching a pattern on the mask. A second identical container section is placed against the first container section with a mask housed within recesses of, both to form a container which has a common pressure level all around and therein. A higher pressure level is then applied outside the container causes the first and second sections of the container to be held together. To remove the mask from the container, the pressure outside the container is reduced to substantially the pressure level inside the container and the first and second sections are pulled apart.
摘要翻译：提供了用于存储平版印刷掩模的容器。第一容器部分由坚固的材料形成，该材料限定了中心内部凹陷区域，该中心内部凹陷区域被成形为容纳掩模并且保持掩模的外边缘而不接触掩模上的图案。将第二相同的容器部分放置在第一容器部分上，其中容纳在其中的凹部内的掩模，以形成其周围和内部具有共同的压力水平的容器。然后在容器外部施加较高的压力水平，使容器的第一和第二部分保持在一起。为了从容器中取出掩模，容器外部的压力降低到容器内的基本上的压力水平，并且第一和第二部分被拉开。

73. 发明申请

US20030098966A1 Stage system and stage driving method for use in exposure apparatus 审中-公开
公开(公告)号：US20030098966A1
公开(公告)日：2003-05-29
申请号：US10340624
申请日：2003-01-13
申请人： CANON KABUSHIKI KAISHA
发明人： Nobushige Korenaga , Ryuichi Ebinuma
IPC分类号： G03B027/62
CPC分类号： H01L21/67242 , G03F7/70725 , H01L21/68
摘要： A stage system includes a stage being movable in a predetermined direction, a first unit for applying a force to the stage in the predetermined direction, a moving mechanism for moving one of the first unit and a structure including the first unit, a first measuring system for measuring at least one of the position and movement amount of the stage, and a second measuring system for measuring at least one of the position and movement amount of one of the first unit and the structure, wherein the stage is controlled on the basis of a measured value of the first measuring system, and wherein the moving system is controlled on the basis of a measured value of the second measuring system.

74. 发明申请

US20020145721A1 STAGE SYSTEM AND STAGE DRIVING METHOD FOR USE IN EXPOSURE APPARATUS 有权
标题翻译：在接触装置中使用的阶段系统和阶段驱动方法
公开(公告)号：US20020145721A1
公开(公告)日：2002-10-10
申请号：US09359911
申请日：1999-07-26
发明人： NOBUSHIGE KORENAGA , RYUICHI EBINUMA
IPC分类号： G03B027/62
CPC分类号： H01L21/67242 , G03F7/70725 , H01L21/68
摘要： A stage system includes a stage being movable in a predetermined direction, a first unit for applying a force to the stage in the predetermined direction, a moving mechanism for moving one of the first unit and a structure including the first unit, a first measuring system for measuring at least one of the position and movement amount of the stage, and a second measuring system for measuring at least one of the position and movement amount of one of the first unit and the structure, wherein the stage is controlled on the basis of a measured value of the first measuring system, and wherein the moving system is controlled on the basis of a measured value of the second measuring system.
摘要翻译：一种舞台系统包括：能够沿预定方向移动的舞台，用于沿预定方向向舞台施加力的第一单元;用于移动第一单元和包括第一单元的结构的移动机构;第一测量系统用于测量平台的位置和移动量中的至少一个以及用于测量第一单元和结构中的一个的位置和移动量中的至少一个的第二测量系统，其中基于第一测量系统的测量值，并且其中基于第二测量系统的测量值来控制移动系统。

75. 发明申请

US20020109828A1 Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby 有权
标题翻译：掩模处理装置，光刻投影装置，装置制造方法以及由此制造的装置
公开(公告)号：US20020109828A1
公开(公告)日：2002-08-15
申请号：US09934698
申请日：2001-08-23
发明人： Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine , Martinus Hendrikus Antonius Leenders , Henri Gerard Cato Werij , Hugo Matthieu Visser , Gerrit-Jan Heerens , Erik Leonardus Ham , Hans Meiling , Erik Roelof Loopstra , Sjoerd Nicolaas Lambertus Donders
IPC分类号： G03B027/62
CPC分类号： G03F7/70558 , G03F7/70741 , G03F7/7085 , G03F7/70908 , G03F7/70916 , G03F7/70983
摘要： In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.
摘要翻译：在光刻投影装置中，通过使用电磁场的粒子屏蔽物将诸如掩模的物体与杂散颗粒屏蔽。这些场可以是均匀的电场，不均匀的电场或光学微风。颗粒屏蔽固定在面罩支架而不是面罩上。

76. 发明申请

US20020089657A1 Stage devices configured for use in a vacuum environment of a charged-particle-beam microlithography apparatus 审中-公开
标题翻译：配置用于带电粒子束微光刻设备的真空环境中的阶段装置
公开(公告)号：US20020089657A1
公开(公告)日：2002-07-11
申请号：US10008689
申请日：2001-11-08
申请人： Nikon Corporation
发明人： Yukiharu Okubo
IPC分类号： G03B027/62
CPC分类号： G03F7/70716 , G03B27/62
摘要： Stage devices are disclosed for use especially in a vacuum environment as encountered in a charged-particle-beam (CPB) microlithography (exposure) apparatus. An embodiment of the stage device includes a bottom plate that serves as a guide plate providing two opposing parallel edge planes that serve as respective guide planes. A top plate and a moving table are sandwiched between the guide planes. Extending from one edge of the moving table is a sample platform desirably configured to carry at least two objects such as two reticles or two wafer substrates. Between the top surface of the bottom plate and the bottom surface of the top plate are air pads that provide near frictionless motion of the moving table relative to the guide planes. The moving table is provided with multiple (e.g., three) linear motor coils that provide motion of the moving table in two dimensions relative to the guide planes (e.g., X and Y directions) as well as about an axis extending orthogonally to the guide planes (null-direction motion).
摘要翻译：公开了用于特别是在带电粒子束（CPB）微光刻（曝光）装置中遇到的真空环境中的阶段装置。舞台装置的实施例包括底板，其用作提供用作相应引导平面的两个相对的平行边缘平面的引导板。顶板和移动台夹在导向平面之间。从移动台的一个边缘延伸的是期望配置为承载至少两个物体的样品平台，例如两个掩模版或两个晶片衬底。在底板的顶表面和顶板的底表面之间是提供移动台相对于引导平面的近无摩擦运动的气垫。移动台设置有多个（例如，三个）线性电动机线圈，其提供移动台相对于导向平面（例如，X和Y方向）两维的运动，以及围绕与引导平面垂直延伸的轴线（θ方向运动）。

77. 发明申请

US20020044266A1 Electronic device for a lithography mask container, semiconductor manufacturing system, and method 有权
标题翻译：用于光刻掩模容器的电子设备，半导体制造系统和方法
公开(公告)号：US20020044266A1
公开(公告)日：2002-04-18
申请号：US09941284
申请日：2001-08-28
发明人： Alain Charles , John Maltabes , Karl Mautz
IPC分类号： G03C005/00 , G03B027/64 , G03B027/62 , G03B027/42 , G03G016/00
CPC分类号： G03F7/70541 , G03F7/70691
摘要： An electronic device (205) is attached to a container (200) that carries a lithography mask (201) through a semiconductor factory (100) form a first station (110) to a second station (120). In the device, a receiver unit (210) receives first data (111) indicating how the first station has used the mask in a first process; a memory unit (220) temporarily stores the first data; a processor unit (230) processes the first data and provides second data (122) indicating how the second station uses the mask in a second future process; and a transmitter unit (240) transmits the second data to the second station or to a factory host.
摘要翻译：电子设备（205）附接到容纳器（200），所述容器（200）通过从第一站（110）到第二站（120）的半导体工厂（100）承载光刻掩模（201）。在该设备中，接收机单元（210）在第一过程中接收指示第一站已经使用掩码的第一数据（111）存储单元（220）临时存储第一数据; 处理器单元（230）处理所述第一数据并提供指示所述第二站在第二未来进程中如何使用所述掩码的第二数据（122）并且发射机单元（240）将第二数据发送到第二站或工厂主机。

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