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    • 71. 发明专利
    • MONITORING METHOD OF FACILITY STATE
    • JPS60186717A
    • 1985-09-24
    • JP4323884
    • 1984-03-06
    • SUMITOMO METAL IND
    • UEDA SATOSHI
    • G01H1/04G01H17/00
    • PURPOSE:To monitor the state of objective facilities high precision and accuracy by extracting and comparing respective components of the frequency, phase, and amplitude of a physical signal generated by the facilities with a judgement reference. CONSTITUTION:The start of analysis is indicated through a keyboard 5 after the setting of analytic condition is completed. Data fk which is passed through filters 11 and 21 at a cutoff frequency and a sampling frequency set by an adapter 25 on the basis of the rotational frequency of a dust collecting fan, A/D-converted by converters 12 and 22, and quantized is inputted to an arithmetic device 2 through an interface 10. The device 2 stores the signal fk in an external storage device 3 successively and temporarily and then calculates and displays respective components of the frequency, phase, and amplitude on a display device 4 while recording them in the device 3. Those components are used to decide the state of the object of monitoring according to the decision reference.