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71. 发明申请

US20160329193A1 ATMOSPHERIC-PRESSURE PLASMA TREATMENT SYSTEM 审中-公开
标题翻译：大气压力等离子体处理系统
公开(公告)号：US20160329193A1
公开(公告)日：2016-11-10
申请号：US14704373
申请日：2015-05-05
申请人： Eastman Kodak Company
发明人： Kurt D. Sieber , Ronald Steven Cok
IPC分类号： H01J37/32
CPC分类号： H01J37/32449 , H05H1/46 , H05H2001/466
摘要： An atmospheric-pressure plasma treatment system includes a plasma source including an AC power supply, at least one electrode, and a gas in a gas chamber. A radial-flow surface has a jet nozzle through which the gas flows. A pre-cursor distributor feeds one or more precursor chemicals into the gas flow.
摘要翻译：大气压等离子体处理系统包括等离子体源，其包括AC电源，至少一个电极和气体室中的气体。径向流动表面具有喷嘴，气体流过该喷嘴。前置光标分配器将一种或多种前体化学物质馈送到气流中。

72. 发明授权

US09418820B2 Cold plasma treatment devices and associated methods 有权
标题翻译：冷等离子体处理装置及相关方法
公开(公告)号：US09418820B2
公开(公告)日：2016-08-16
申请号：US13620104
申请日：2012-09-14
申请人： Gregory A. Watson , David J. Jacofsky
发明人： Gregory A. Watson , David J. Jacofsky
IPC分类号： H01J7/24 , H01J37/32 , A61M16/06 , A61M16/12 , A61M15/02 , H05H1/24 , A61L2/00 , H05H1/46 , A61L2/14 , A61N1/44 , A61N1/40
CPC分类号： H05H1/46 , A61L2/00 , A61L2/0011 , A61L2/0094 , A61L2/14 , A61L2202/11 , A61M15/02 , A61M16/06 , A61M16/12 , A61M2202/0208 , A61M2202/025 , A61N1/40 , A61N1/44 , H01J37/321 , H01J37/32348 , H01J37/3244 , H01J37/3266 , H05H1/2406 , H05H2001/2412 , H05H2001/466 , H05H2001/4682 , H05H2240/20 , H05H2245/1225 , H05H2277/10
摘要： A cold plasma helmet application device for delivery of cold plasma benefits to the head of a patient. An appropriate gas is introduced into a helmet receptacle within a containment dome of the helmet. The gas is energized by one or more dielectric barrier devices that receive energy from a pulsed source. The dielectric barrier devices can be configured to match the treatment area. Such a device and method can be used to treat large surface areas treatment sites associated with the head, head trauma, brain cancer, the control of brain swelling with closed head injury or infection, as well as treating male pattern baldness.
摘要翻译：一种冷等离子头盔应用装置，用于将冷血浆益处输送到患者的头部。将合适的气体引入头盔的安全壳顶部内的头盔插座中。气体由一个或多个从脉冲源接收能量的电介质阻挡装置通电。电介质阻挡装置可以被配置成匹配处理区域。这种装置和方法可用于治疗与头部，头部创伤，脑癌相关的大面积治疗部位，用闭合头部损伤或感染控制脑部肿胀，以及治疗男性型秃发。

73. 发明授权

US09384947B2 Cold plasma treatment devices and associated methods 有权
标题翻译：冷等离子体处理装置及相关方法
公开(公告)号：US09384947B2
公开(公告)日：2016-07-05
申请号：US13620092
申请日：2012-09-14
申请人： Gregory A. Watson , Robert M. Hummel , Marc C. Jacofsky , David J. Jacofsky
发明人： Gregory A. Watson , Robert M. Hummel , Marc C. Jacofsky , David J. Jacofsky
IPC分类号： H01J7/24 , H01J37/32 , A61M16/06 , A61M16/12 , A61M15/02 , A61N1/44 , H05H1/24 , A61N1/40 , A61L2/00 , H05H1/46 , A61L2/14
CPC分类号： H05H1/46 , A61L2/00 , A61L2/0011 , A61L2/0094 , A61L2/14 , A61L2202/11 , A61M15/02 , A61M16/06 , A61M16/12 , A61M2202/0208 , A61M2202/025 , A61N1/40 , A61N1/44 , H01J37/321 , H01J37/32348 , H01J37/3244 , H01J37/3266 , H05H1/2406 , H05H2001/2412 , H05H2001/466 , H05H2001/4682 , H05H2240/20 , H05H2245/1225 , H05H2277/10
摘要： A cold plasma mask application device for delivery of a cold plasma to the face of a patient. An appropriate gas is introduced into a gas containment area that is energized by one or more electrodes that receive energy from a pulsed source. The plasma can be prevented from contact with the patient's face, or can be allowed to make contact with the patient's face at the appropriate treatment area. A three-layer approach to the manufacture of the cold plasma mask application device is also described. Such a device and method can be used to treat acne as well as complex facial wounds such as those resulting from trauma, melanoma, and other cancers of the face, rosacea, and psoriasis.
摘要翻译：一种用于将冷血浆递送到患者面部的冷等离子体掩模施加装置。将合适的气体引入到由一个或多个从脉冲源接收能量的电极激励的气体容纳区域中。可以防止等离子体与患者的面部接触，或者允许在适当的治疗区域与患者的面部接触。还描述了制造冷等离子体掩模施加装置的三层方法。这种装置和方法可以用于治疗痤疮以及复杂的面部伤口，例如由创伤，黑素瘤和面部，酒渣鼻和牛皮癣的其它癌症引起的面部创伤。

74. 发明授权

US09377004B2 Plasma generation apparatus 有权
标题翻译：等离子体发生装置
公开(公告)号：US09377004B2
公开(公告)日：2016-06-28
申请号：US14631142
申请日：2015-02-25
申请人： IMAGINEERING, INC.
发明人： Yuji Ikeda
IPC分类号： H05H1/46 , F02P23/04 , F02P3/01 , F02P9/00 , F02M27/08
CPC分类号： F02P23/045 , F02M27/08 , F02P3/01 , F02P9/007 , H05H1/46 , H05H2001/463 , H05H2001/466 , H05H2001/4682
摘要： The present invention addresses the issue of improving generation efficiency of plasma in relation to usage power in a plasma generation apparatus. The present invention is directed to a plasma generation apparatus provided with an electromagnetic wave emission antenna and a discharge electrode. The plasma generation apparatus includes a plasma control device that controls generation of plasma, and is characterized that the plasma control device causes the electromagnetic wave emission antenna to intermittently emit electromagnetic waves by way of a drive sequence control. Especially, the plasma control device may preferably control an oscillating frequency, a power, output timing, a pulse width, a pulse cycle, and a duty cycle of the electromagnetic waves.
摘要翻译：本发明涉及等离子体发生装置中的使用功率相对于提高等离子体的发电效率的问题。本发明涉及一种具有电磁波发射天线和放电电极的等离子体发生装置。等离子体产生装置包括等离子体控制装置，其控制等离子体的产生，其特征在于等离子体控制装置使得电磁波发射天线通过驱动顺序控制间歇地发射电磁波。特别地，等离子体控制装置可以优选地控制电磁波的振荡频率，功率，输出定时，脉冲宽度，脉冲周期和占空比。

75. 发明授权

US09236227B2 Cold plasma treatment devices and associated methods 有权
标题翻译：冷等离子体处理装置及相关方法
公开(公告)号：US09236227B2
公开(公告)日：2016-01-12
申请号：US13620205
申请日：2012-09-14
申请人： Gregory A. Watson , Marc C. Jacofsky
发明人： Gregory A. Watson , Marc C. Jacofsky
IPC分类号： H01J37/32 , A61M16/06 , H05H1/24 , A61M15/02 , A61M16/12 , A61N1/44 , A61N1/40 , A61L2/00 , H05H1/46 , A61L2/14
CPC分类号： H05H1/46 , A61L2/00 , A61L2/0011 , A61L2/0094 , A61L2/14 , A61L2202/11 , A61M15/02 , A61M16/06 , A61M16/12 , A61M2202/0208 , A61M2202/025 , A61N1/40 , A61N1/44 , H01J37/321 , H01J37/32348 , H01J37/3244 , H01J37/3266 , H05H1/2406 , H05H2001/2412 , H05H2001/466 , H05H2001/4682 , H05H2240/20 , H05H2245/1225 , H05H2277/10
摘要： An inhalable cold plasma mask device for generation of a breathable cold plasma for delivery to a patient. A biocompatible gas is received in a dielectric barrier discharge (DBD) device that is energized by an electrode that receives energy from a pulsed source. The DBD device can be grounded by a grounding structure. A grounding screen can be used prior to inhalation of the cold plasma. The inhalable cold plasma mask device includes the use of a single-layer or a two-layer approach to its construction. The inhalable cold plasma mask device can have one or two DBD devices. Such a device and associated method can be used to treat upper respiratory tract infections, as well as reducing inflammation, sinus and esophageal polyps in both size and frequency of occurrence.
摘要翻译：一种可吸入的冷等离子体掩模装置，用于产生用于输送给患者的透气冷等离子体。在由从脉冲源接收能量的电极激励的介电阻挡放电（DBD）器件中接收生物相容性气体。 DBD设备可以通过接地结构接地。在吸入冷等离子体之前可以使用接地屏。可吸入的冷等离子体掩模装置包括使用单层或双层方法来构建其。可吸入的冷等离子体掩模装置可以具有一个或两个DBD装置。这种装置和相关方法可用于治疗上呼吸道感染，以及减少发生的大小和频率的炎症，窦和食道息肉。

76. 发明申请

US20160005575A1 PLASMA SOURCE 有权
标题翻译：等离子体源
公开(公告)号：US20160005575A1
公开(公告)日：2016-01-07
申请号：US14765817
申请日：2013-02-06
申请人： ARCELORMITTAL INVESTIGACIÓN Y DESARROLLO SL
发明人： Florin Daniel Duminica , Vincent LeClercq , Eric Silberberg , Alain Daniel
IPC分类号： H01J37/32
CPC分类号： H01J37/32871 , C23C16/50 , H01J37/3244 , H01J37/32541 , H01J37/32568 , H01J37/32623 , H01J37/3266 , H01J37/32669 , H01J2237/3321 , H01J2237/3323 , H05H1/46 , H05H2001/466
摘要： The invention relates to a plasma source (1) for depositing a coating onto a substrate (9), which is connectable to a power source (P) and includes: an electrode (2); a magnetic assembly (4) located circumferentially relative to said electrode and including a set of magnets mutually connected by a magnetic bracket (46) including a first and second central magnet (43, 44) and at least one head magnet (45); and an electrically insulating enclosure (5) arranged such as to surround the electrode and the magnets.
摘要翻译：本发明涉及一种用于将涂层沉积在可连接到电源（P）上的衬底（9）上的等离子体源（1），包括：电极（2）; 磁性组件（4），其位于周向相对于所述电极并且包括通过包括第一和第二中心磁体（43,44）和至少一个磁头磁体（45）的磁性支架（46）相互连接的一组磁体; 以及布置成围绕电极和磁体的电绝缘外壳（5）。

77. 发明授权

US09155182B2 Tuning a parameter associated with plasma impedance 有权
标题翻译：调整与等离子体阻抗相关的参数
公开(公告)号：US09155182B2
公开(公告)日：2015-10-06
申请号：US13740047
申请日：2013-01-11
申请人： John C. Valcore, Jr. , Bradford J. Lyndaker
发明人： John C. Valcore, Jr. , Bradford J. Lyndaker
IPC分类号： H05H1/46 , H01J37/32
CPC分类号： H01J37/32183 , H01J37/32082 , H01J37/321 , H01J37/3244 , H01J37/32935 , H01J37/3299 , H05H1/46 , H05H2001/466 , H05H2001/4682
摘要： Systems and methods for tuning a parameter associated with plasma impedance are described. One of the methods includes receiving information to determine a variable. The information is measured at a transmission line and is measured when the parameter has a first value. The transmission line is used to provide power to a plasma chamber. The method further includes determining whether the variable is at a local minima and providing the first value to tune the impedance matching circuit upon determining that the variable is at the local minima. The method includes changing the first value to a second value of the parameter upon determining that the variable is not at the local minima and determining whether the variable is at a local minima when the parameter has the second value.
摘要翻译：描述了用于调整与等离子体阻抗相关联的参数的系统和方法。其中一种方法包括接收信息以确定变量。该信息是在传输线路上测量的，并且在该参数具有第一个值时进行测量。传输线用于向等离子体室供电。该方法还包括确定变量是否处于局部最小值，并且在确定变量处于局部最小值时提供第一值以调整阻抗匹配电路。该方法包括在确定变量不在局部最小值时将第一值改变为参数的第二值，并且当参数具有第二值时确定变量是否处于局部最小值。

78. 发明申请

US20150238248A1 VARIABLE FREQUENCY EXCITATION PLASMA DEVICE FOR THERMAL AND NON-THERMAL TISSUE EFFECTS 审中-公开
标题翻译：用于热和非热组织效应的可变频率激发等离子体装置
公开(公告)号：US20150238248A1
公开(公告)日：2015-08-27
申请号：US14549022
申请日：2014-11-20
申请人： COVIDIEN LP
发明人： JAMES E. THOMPSON , DANIEL A. FRIEDRICHS
IPC分类号： A61B18/14
CPC分类号： H05H1/46 , A61B18/042 , A61B18/1206 , A61B2018/00732 , A61B2018/00863 , H05H2001/466 , H05H2245/122 , H05H2277/10
摘要： A plasma system is disclosed. The plasma system includes a plasma instrument having an elongated body defining a lumen therethrough and a first electrode and a second electrode; an ionizable media source in fluid communication with the lumen and configured to supply ionizable media thereto; and a variable frequency energy source adapted to be coupled to the first and second electrodes and configured to supply energy to the first and second electrodes sufficient to ignite ionizable media supplied by the ionizable media source to generate a plasma influent, wherein a frequency of the energy is adjustable to modify at least one property of the plasma effluent.
摘要翻译：公开了一种等离子体系统。等离子体系统包括等离子体仪器，其具有限定通过其中的腔的细长主体和第一电极和第二电极; 与所述内腔流体连通并被配置为向其提供可电离介质的可离子化介质源; 以及适于耦合到所述第一和第二电极并被配置为向所述第一和第二电极提供足够的能量以便点燃由所述可电离介质源供应的可离子化介质以产生等离子体流入物的可变频能量源，其中所述能量的频率可调节以修改等离子体流出物的至少一个性质。

79. 发明申请

US20150206717A1 Tuning A Parameter Associated With Plasma Impedance 审中-公开
标题翻译：调整与等离子体阻抗相关的参数
公开(公告)号：US20150206717A1
公开(公告)日：2015-07-23
申请号：US14673567
申请日：2015-03-30
申请人： Lam Research Corporation
发明人： John C. Valcore, JR. , Bradford J. Lyndaker
IPC分类号： H01J37/32 , H05H1/46
CPC分类号： H01J37/32183 , H01J37/32082 , H01J37/321 , H01J37/3244 , H01J37/32935 , H01J37/3299 , H05H1/46 , H05H2001/466 , H05H2001/4682
摘要： Systems and methods for tuning a parameter associated with plasma impedance are described. One of the methods includes receiving information to determine a variable. The information is measured at a transmission line and is measured when the parameter has a first value. The transmission line is used to provide power to a plasma chamber. The method further includes determining whether the variable is at a local minima and providing the first value to tune the impedance matching circuit upon determining that the variable is at the local minima. The method includes changing the first value to a second value of the parameter upon determining that the variable is not at the local minima and determining whether the variable is at a local minima when the parameter has the second value.
摘要翻译：描述了用于调整与等离子体阻抗相关联的参数的系统和方法。其中一种方法包括接收信息以确定变量。该信息是在传输线路上测量的，并且在该参数具有第一个值时进行测量。传输线用于向等离子体室供电。该方法还包括确定变量是否处于局部最小值，并且在确定变量处于局部最小值时提供第一值以调整阻抗匹配电路。该方法包括在确定变量不在局部最小值时将第一值改变为参数的第二值，并且当参数具有第二值时确定变量是否处于局部最小值。

80. 发明授权

US08980046B2 Semiconductor processing system with source for decoupled ion and radical control 有权
标题翻译：半导体处理系统，具有去耦离子和自由基控制的源
公开(公告)号：US08980046B2
公开(公告)日：2015-03-17
申请号：US13431836
申请日：2012-03-27
申请人： Akira Koshiishi , Peter L. G. Ventzek , Jun Shinagawa , John Patrick Holland
发明人： Akira Koshiishi , Peter L. G. Ventzek , Jun Shinagawa , John Patrick Holland
IPC分类号： C23F1/00
CPC分类号： C23C16/45565 , C23C16/45574 , C23C16/509 , H01J37/32422 , H05H1/46 , H05H1/48 , H05H2001/466
摘要： A top plate assembly is positioned above and spaced apart from the substrate support, such that a processing region exists between the top plate assembly and the substrate support. The top plate assembly includes a central plasma generation microchamber and a plurality of annular-shaped plasma generation microchambers positioned in a concentric manner about the central plasma generation microchamber. Adjacently positioned ones of the central and annular-shaped plasma generation microchambers are spaced apart from each other so as to form a number of axial exhaust vents therebetween. Each of the central and annular-shaped plasma generation microchambers is defined to generate a corresponding plasma therein and supply reactive constituents of its plasma to the processing region between the top plate assembly and the substrate support.
摘要翻译：顶板组件位于基板支撑件的上方并与其间隔开，使得在顶板组件和基板支撑件之间存在处理区域。顶板组件包括中心等离子体生成微型室和围绕中心等离子体产生微室以同心方式定位的多个环形等离子体产生微室。中心和环形等离子体产生微室中的相邻定位的等离子体生成微室彼此间隔开，以便在它们之间形成多个轴向排气孔。中心和环形等离子体产生微室中的每一个被定义为在其中产生相应的等离子体，并且将其等离子体的反应性组分提供给顶板组件和衬底支撑件之间的加工区域。

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