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    • 71. 发明授权
    • DFB laser with a distributed reflector and photonic band gap
    • DFB激光器具有分布式反射器和光子带隙
    • US07254154B2
    • 2007-08-07
    • US10520837
    • 2003-07-04
    • Bruno Thedrez
    • Bruno Thedrez
    • H01S3/08
    • H01S5/12H01S5/10H01S5/105H01S5/1228H01S5/1237H01S5/125H01S5/2205H01S5/227
    • The invention relates to a semiconductor laser consisting of an active waveguide comprising an active region surrounded by a filling material and which is coupled to a distributed reflector. Said distributed reflector is made from the aforementioned filling material and is disposed along the length of the lateral sides of the active region essentially parallel to same and in the form of a structuring having a photonic band gap along the longitudinal axis of the laser. According to the invention, the structuring defines a first photonic crystal with columns forming diffracting elements, said crystal comprising a mesh having dimensions of the order of the wavelength of photons in the guided mode which circulate in the active waveguide.
    • 本发明涉及一种由有源波导组成的半导体激光器,该有源波导包括由填充材料包围并且与分布式反射器耦合的有源区域。 所述分布式反射器由上述填充材料制成,并且沿着有源区域的横向侧面的长度基本上平行于相同并且具有沿着激光器的纵向轴线的具有光子带隙的结构形式设置。 根据本发明,结构定义了具有形成衍射元件的列的第一光子晶体,所述晶体包括具有在有源波导中循环的引导模式中的光子的波长的尺寸的尺寸的网格。
    • 74. 发明授权
    • Method of making DBR grating
    • 制作DBR光栅的方法
    • US06770499B1
    • 2004-08-03
    • US10625415
    • 2003-07-23
    • Yeong-Ning Chyr
    • Yeong-Ning Chyr
    • H01L2100
    • H01S5/223H01S5/1231H01S5/1237H01S5/125H01S5/168
    • A DBR grating may be created in the cladding of a wafer by defining a non-gain window area, advantageously at the end of the wafer. The non-gain area may be defined either by removing all layers above the cladding layer at the window portion or, preferably, by halting the MOCVD process once the cladding layer has been created and by selectively removing from a portion of the cladding layer a protective coating, advantageously of SiO2, Si3N4, or a metal, to define the window area. A photo resist is applied, and the wafer is exposed to interfering laser beams to create a grating pattern in the photoresist, conveniently without the need for any particular effort to confine either the photoresist or the interfering beams solely to the window area. The photoresist is developed and an etchant used to transfer the pattern into the cladding layer. The protective layer is then removed and non-gain layers may be laid down in the usual manner, the protective layer having prevented the grating pattern from being created anywhere but in the window area.
    • 可以通过限定非增益窗口区域,有利地在晶片的端部,在晶片的包层中产生DBR光栅。 非增益区域可以通过在窗口部分去除包覆层上方的所有层来限定,或者优选地,一旦形成包覆层就停止MOCVD工艺,并且通过从包覆层的一部分选择性地去除保护层 有利地涂覆SiO 2,Si 3 N 4或金属以限定窗口区域。 施加光刻胶,并且晶片暴露于干涉激光束以在光致抗蚀剂中产生光栅图案,而不需要任何特别的努力将光致抗蚀剂或干涉光束仅限于窗口区域。 显影光致抗蚀剂和用于将图案转移到包层中的蚀刻剂。 然后去除保护层,并且以通常的方式可以铺设非增益层,保护层防止了光栅图案在任何地方,但在窗口区域中创建。
    • 75. 发明授权
    • Ridge type semiconductor laser of laterally-coupled distributed feedback and method of manufacturing the same
    • 脊式半导体激光器的横向耦合分布式反馈及其制造方法
    • US06573116B2
    • 2003-06-03
    • US09908560
    • 2001-07-20
    • Yoshiaki WatanabeKiyoshi TakeiNong ChenKiyofumi Chikuma
    • Yoshiaki WatanabeKiyoshi TakeiNong ChenKiyofumi Chikuma
    • H01L2100
    • H01S5/22H01S5/12H01S5/1231H01S5/1237H01S5/209
    • There is provided a method of manufacturing a ridge type LC-DFB semiconductor laser in which a laser substrate having a cladding layer made of a material for a ridge stripe formed on an active layer made of semiconductor. A stripe mask is formed on the cladding layer to form two lateral flat portions from the cladding layer, by a selective wet etching, so as to form a ridge stripe protruding therefrom and having a flat top portion at which the stripe mask capped. A grating mask is formed on the two lateral flat portions, side walls of the ridge stripe and the stripe mask. The grating mask has a periodic structure in the direction in which the ridge stripe extends. The two lateral flat portions and the side walls of the ridge stripe are dry-etched through the grating mask and then the two lateral flat portions and the side walls of the ridge stripe are wet-etched to form a grating of the material for the ridge stripe on the two lateral flat portions, the side walls of the ridge stripe and the active layer, so as to define a bracket grating portion adjacent to the ridge stripe.
    • 提供了一种制造脊型LC-DFB半导体激光器的方法,其中具有由用于形成在由半导体制成的有源层上的用于脊条的材料制成的包层的激光基板。 在包覆层上形成条纹掩模,通过选择性湿蚀刻从包覆层形成两个横向平坦部分,从而形成从其突出的脊条,并且具有条形掩模封盖的平坦的顶部。 在两个侧面平坦部分,脊条和条纹掩模的侧壁上形成光栅掩模。 栅格掩模在脊条延伸的方向上具有周期性结构。 通过光栅掩模对棱条的两个横向平坦部分和侧壁进行干蚀刻,然后将脊条的两个侧向平坦部分和侧壁湿法蚀刻以形成用于脊的材料的光栅 在两个横向平坦部分上的条纹,脊状条的边壁和有源层,以便限定与脊条相邻的托架光栅部分。