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    • 73. 发明申请
    • OXIME SULFONATES AND THE USE THEROF AS LATENT ACIDS
    • OXIME硫酸酯及其作为酸性物质的用途
    • WO2007147782A3
    • 2008-04-17
    • PCT/EP2007055936
    • 2007-06-15
    • CIBA HOLDING INCYAMATO HITOSHIASAKURA TOSHIKAGENISHIMAE YUICHIIWAI TAKESHIIRIE MAKIKONAKAYAMA KAZUHIKO
    • YAMATO HITOSHIASAKURA TOSHIKAGENISHIMAE YUICHIIWAI TAKESHIIRIE MAKIKONAKAYAMA KAZUHIKO
    • G03F7/039C07C309/00G03C1/73G03F7/027
    • G03F7/0045C07C309/00C07C2603/18C08F20/36G03F7/0046G03F7/0397
    • Compounds of the formula (I), (Il) or (III), wherein R 1 is for example C 1 -C 18 alkylsulfonyl, C 1 -C 10 haloalkylsulfonyl, camphorylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthrylsulfonyl, phenanthrylsulfonyl or heteroarylsulfonyl, R' 1 is for example phenylenedisulfonyl, R 2 is for example CN, C 1 -C 10 haloalkyl or C 1 -C 10 haloalkyl which is substituted by (IV); Ar 1 is for example phenyl optinally substituted by a group of formula (IV); Ar' 1 is for example phenylene which optionally is substituted by a group of formula (IV); A 1 , A 2 and A 3 independently of each other are for example hydrogen, halogen, CN, or C 1 -C 18 alkyl; D 2 is for example a direct bond, O, (CO)O, (CO)S, SO 2 , OSO 2 or C 1 -C 18 alkylene; or A 3 and D 2 together form C 3 -C 30 cycloalkenyl; or A 2 and D 2 together with the carbon of the ethylenically unsaturated double bond to which they are attached form C 3 -C 30 cycloalkyl; D 3 and D 4 for example independently of each other are a direct bond, O, S, C 1 -C 18 alkylene or C 3 -C 30 cycloalkylene provided that at least one of the radicals R 2 , Ar 1 or Ar 1 ' comprises a group of the formula (IV); are suitable as photolatent acid donors and for the preparation of corresponding polymers to be employed in chemically amplified photoresists.
    • 式(I),(II)或(III)的化合物,其中R 1是例如C 1 -C 18烷基磺酰基, C 1 -C 10卤代烷基磺酰基,樟脑磺酰基,苯基-C 1 -C 3烷基磺酰基,苯基磺酰基,萘基磺酰基, 蒽基磺酰基,菲基磺酰基或杂芳基磺酰基,R 1'是例如亚苯基二磺酰基,R 2是例如CN,C 1 -C 10 (IV)取代的卤代烷基或C 1 -C 10 - 卤代烷基; Ar 1是例如被式(IV)基团取代的苯基; Ar'1是例如任选被式(IV)的基团取代的亚苯基; 彼此独立的A 1,A 2,A 3和A 3是例如氢,卤素,CN或C 1〜 SUB> -C 18 烷基; D 2是例如直接键合O,(CO)O,(CO)S,SO 2,OSO 2或C < SUB> 1 -C 18 亚烷基; 或A 3和D 2一起形成C 3〜C 30环烯基; 或者它们所连接的烯属不饱和双键的碳一起形成C 3 -C 3亚烷基, 30 环烷基; D 3和D 4,例如彼此独立地是直接键,O,S,C 1 -C 18, / SUB>亚烷基或C 3 -C 30亚环烷基,条件是基团R 2,Ar 1中的至少一个, SUB或Ar 1'包含式(IV)的基团: 适合作为光潜酸供体,并用于制备用于化学放大光致抗蚀剂的相应聚合物。