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71. 发明授权

US07349072B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07349072B2
公开(公告)日：2008-03-25
申请号：US10960788
申请日：2004-10-08
申请人： Marcel Hendrikus Maria Beems , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Marcel Hendrikus Maria Beems , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G03B27/54 , G03B27/42 , G01B11/02
CPC分类号： G03F7/70941 , G03F7/70775
摘要： Embodiments of the invention include an interferometer measurement system in which at least one reflective surface is arranged such that, in use, the beam path of interferometer radiation of the interferometer measurement system incident on the at least one reflective surface has an offset angle in the range of from 0.1 to 10 milliradians with respect to the normal to the at least one reflective surface. In that way, the effect of spurious radiation on the interferometer measurement system produced within the interferometer measurement system may be suppressed. In another embodiment, a parallel-sided plate is used in an interferometer measurement system to obtain a signal dependent on the angle of a beam of radiation reflected from a mirror. In that way, the flatness of the mirror can be mapped. One surface of the plate is a beam-splitter and the opposite surface of the plate is a reflector.
摘要翻译：本发明的实施例包括干涉仪测量系统，其中布置至少一个反射表面，使得在使用中，入射在至少一个反射表面上的干涉仪测量系统的干涉仪辐射的光束路径具有在该范围内的偏移角相对于至少一个反射表面的法线为0.1至10毫弧度。以这种方式，可以抑制杂散辐射对干涉仪测量系统内产生的干涉仪测量系统的影响。在另一个实施例中，在干涉仪测量系统中使用平行侧板以获得取决于从反射镜反射的辐射束的角度的信号。以这种方式，可以映射镜的平面度。板的一个表面是分束器，并且板的相对表面是反射器。

72. 发明授权

US07348574B2 Position measurement system and lithographic apparatus 有权
标题翻译：位置测量系统和光刻设备
公开(公告)号：US07348574B2
公开(公告)日：2008-03-25
申请号：US11217670
申请日：2005-09-02
申请人： Wouter Onno Pril , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Wouter Onno Pril , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G21G5/00
CPC分类号： G03F7/70775
摘要： A position measurement system for measuring a position of an object is described, the system including: a first incremental measurement unit for measuring a first number of first distance steps in a distance between a reference frame and the object, wherein the first number equals a first integer value plus a first fraction, and a second incremental measurement unit for measuring a second number of second distance steps in a distance between the reference frame and the object, wherein the second number equals a second integer value plus a second fraction, wherein the position measurement system is constructed and arranged to initialize the second incremental measurement unit on the basis of the first number and the second fraction.
摘要翻译：描述了一种用于测量物体位置的位置测量系统，该系统包括：第一增量测量单元，用于测量参考系和物体之间的距离中的第一数量的第一距离步骤，其中第一数量等于第一以及第二增量测量单元，用于测量所述参考帧和所述对象之间的距离中的第二数量的第二距离步长，其中所述第二数字等于第二整数值加上第二分数，其中所述位置测量系统被构造和布置为基于第一数量和第二分数来初始化第二增量测量单元。

73. 发明授权

US07317539B2 Polarizing beam splitter device, interferometer module, lithographic apparatus, and device manufacturing method 失效
标题翻译：偏振分束器，干涉仪模块，光刻设备和器件制造方法
公开(公告)号：US07317539B2
公开(公告)日：2008-01-08
申请号：US10923083
申请日：2004-08-23
申请人： Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G01B9/02
CPC分类号： G02B27/283 , G01B9/02051 , G01B2290/15 , G01B2290/70 , G02B5/122 , G03F7/70775
摘要： The invention relates to a polarizing beam splitter device, an interferometer module system, a lithographic apparatus, and a device manufacturing method. The polarizing beam splitter device includes an optical element and a polarizing beam splitter layer. The optical element includes a retroreflector surface having three mutually perpendicular faces of high optical quality, a radiation beam passage surface and a handling surface. By designing the optical element, in particular the handling portion, to the shape of a beam splitter element, such as a prism, the handling portion, and thus the polarizing optical beam splitter device etc. itself, may be made more compact and with fewer surfaces to be polished and/or antireflection-coated. The positioning of the parts in a beam splitter is more reliable. Devices, systems in which the polarizing beam splitter device has been incorporated, such as a polarizing beam splitter device with quarter wave plates and a reference mirror fixed thereto, may also be made more compact, accurate and reliable.
摘要翻译：本发明涉及一种偏振分束器装置，干涉仪模块系统，光刻设备和装置制造方法。偏振分束器装置包括光学元件和偏振分束器层。光学元件包括具有高光学质量的三个相互垂直的面，辐射束通过表面和操纵表面的后向反射器表面。通过将光学元件（特别是处理部分）设计成诸如棱镜的分束器元件的形状，处理部分以及因此偏振光束分离器装置等本身的形状可以变得更紧凑并且具有更少的待抛光表面和/或抗反射涂层。部件在分束器中的定位更可靠。已经结合了偏振分束器装置的装置，诸如具有四分之一波片的偏振分束器装置和固定在其上的参考镜的系统也可以被制造得更紧凑，准确和可靠。

74. 发明授权

US07230676B1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07230676B1
公开(公告)日：2007-06-12
申请号：US11373529
申请日：2006-03-13
申请人： Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/70775 , G03F7/70341
摘要： A lithographic apparatus includes a liquid confinement system to confine liquid in a space between a final element of a projection system and a substrate, and a first and a second substrate stage that are configured to mutually cooperate in order to perform a joint movement for bringing the lithographic apparatus from a first configuration, in which the liquid is confined between a first substrate held by the first substrate stage and the final element, towards a second configuration, in which the liquid is confined between a second substrate held by the second substrate stage and the final element, such that during the joint movement the liquid is essentially confined within the space with respect to the final element. The apparatus also includes a position measurement system configured to at least during the joint movement measure the position of the first and second substrate stages.
摘要翻译：光刻设备包括液体限制系统，用于将液体限制在投影系统的最终元件与基板之间的空间中;以及第一和第二基板台，其被配置为相互配合以执行关节运动，以使光刻设备，其中液体被限制在由第一基板台保持的第一基板和最终元件之间的第一配置朝向第二配置，其中液体被限制在由第二基板台保持的第二基板和最终元件，使得在联合运动期间，液体基本上被限制在相对于最终元件的空间内。该装置还包括位置测量系统，其配置为至少在联合移动期间测量第一和第二基板台的位置。

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