专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

71. 发明申请

US20100311240A1 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE 审中-公开
标题翻译：制造半导体器件的方法
公开(公告)号：US20100311240A1
公开(公告)日：2010-12-09
申请号：US12726138
申请日：2010-03-17
申请人： Hideaki Masuda , Kei Watanabe , Kenichi Ootsuka
发明人： Hideaki Masuda , Kei Watanabe , Kenichi Ootsuka
IPC分类号： H01L21/3205
CPC分类号： H01L21/02697 , H01L21/02074 , H01L21/02167 , H01L21/02274 , H01L21/02304 , H01L21/02312 , H01L21/3105 , H01L21/3148 , H01L21/76826 , H01L21/76829 , H01L21/76834 , H01L21/76883
摘要： A method of manufacturing a semiconductor device according to an embodiment, includes forming a wiring in a surface of a first insulating film on a semiconductor substrate, exposing the first insulating film in whose surface the wiring is formed to a plasma containing a rare gas so as to form a densified layer on the surface of the first insulating film, removing an oxide film formed on the wiring, after the densified layer is formed and forming a second insulating film on the wiring from which the oxide film is removed and on the densified layer, wherein the processes from the removal of the oxide film to the formation of the second insulating film are carried out without being atmospherically-exposed.
摘要翻译：根据实施例的制造半导体器件的方法包括在半导体衬底上的第一绝缘膜的表面上形成布线，将其形成布线的表面的第一绝缘膜暴露于含有稀有气体的等离子体，以便在第一绝缘膜的表面上形成致密化层，在形成致密层之后除去形成在布线上的氧化膜，并在除去氧化膜的布线上形成第二绝缘膜，并在致密层上形成第二绝缘膜其中从氧化膜去除到形成第二绝缘膜的过程不经过大气暴露而进行。

72. 发明授权

US07797278B2 Migratable backup and restore 有权
标题翻译：可迁移备份和还原
公开(公告)号：US07797278B2
公开(公告)日：2010-09-14
申请号：US10861857
申请日：2004-06-04
申请人： Hiroshi Katoh , Hirokazu Miyamori , Kei Watanabe , Naoki Yamakoshi
发明人： Hiroshi Katoh , Hirokazu Miyamori , Kei Watanabe , Naoki Yamakoshi
IPC分类号： G06F7/00 , G06F17/00
CPC分类号： G06F21/6218
摘要： A backup system for backing up target data stored in an information processing device comprises a backup program stor for retaining a backup program, a read authentication information stor for retaining read authentication information, a backup function sender which transfers the backup program and the read authentication information to the device, and a data stor which retains the target data to be transferred to the backup system by the device which has executed the backup program, wherein the backup program is invoke-able on the device by a user of the device, and comprises a read authentication mechanism for obtaining permission to read the target data from the device by causing the read authentication information to be authenticated, and a transfer mechanism for causing the device to read the target data and transfer the target data to the backup system.
摘要翻译：用于备份存储在信息处理设备中的目标数据的备份系统包括用于保留备份程序的备份程序存储器，用于保留读取认证信息的读取认证信息存储器，传送备份程序的备份功能发送器和读取认证信息以及数据存储器，其通过已经执行所述备份程序的设备保留要传送到所述备份系统的目标数据，其中所述备份程序可由所述设备的用户在所述设备上调用，并且包括读取认证机制，用于通过使读取的认证信息被认证来获得从设备读取目标数据的许可;以及传送机制，用于使设备读取目标数据并将目标数据传送到备份系统。

73. 发明授权

US07781301B2 Method of fabricating semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US07781301B2
公开(公告)日：2010-08-24
申请号：US12536631
申请日：2009-08-06
申请人： Kei Watanabe , Akifumi Gawase , Kenichi Otsuka
发明人： Kei Watanabe , Akifumi Gawase , Kenichi Otsuka
IPC分类号： H01L21/76
CPC分类号： H01L21/7682 , H01L21/76807 , H01L21/76832 , H01L21/76835
摘要： A method of fabricating a semiconductor device according to one embodiment includes: forming an interlayer sacrificial film and an insulating film located thereon above a semiconductor substrate having a semiconductor element, the interlayer sacrificial film having a wiring provided therein; etching the insulating film, or, etching the insulating film and the interlayer sacrificial film to form a trench reaching the interlayer sacrificial film; forming a gas permeable film in the trench; gasifying and removing the interlayer sacrificial film through the trench and the gas permeable film; and forming a sealing film on the gas permeable film for sealing the vicinity of an opening of the trench after removing the interlayer sacrificial film.
摘要翻译：根据一个实施例的制造半导体器件的方法包括：在具有半导体元件的半导体衬底之上形成层间牺牲膜和绝缘膜，所述层间牺牲膜具有设置在其中的布线; 蚀刻绝缘膜，或者蚀刻绝缘膜和层间牺牲膜以形成到达层间牺牲膜的沟槽; 在沟槽中形成透气膜; 通过沟槽和透气膜气化和去除层间牺牲膜; 在透气膜上形成密封膜，用于在除去层间牺牲膜之后密封沟槽的开口附近。

74. 发明申请

US20100190871A1 Gel Composition And Cosmetic 有权
标题翻译：凝胶组成和化妆品
公开(公告)号：US20100190871A1
公开(公告)日：2010-07-29
申请号：US12670410
申请日：2008-07-24
申请人： Hidefumi Araki , Kei Watanabe , Yasunari Nakama , Teruhiko Hineno , Tomohiro IImura , Tadashi Okawa
发明人： Hidefumi Araki , Kei Watanabe , Yasunari Nakama , Teruhiko Hineno , Tomohiro IImura , Tadashi Okawa
IPC分类号： A61K8/89
CPC分类号： A61Q19/007 , A61K8/042 , A61K8/34 , A61K8/585 , A61K8/891 , A61K2800/544 , A61Q1/02 , A61Q1/10 , A61Q17/04 , C08G77/045 , C08G77/12 , C08G77/14 , C08K5/05 , C08L83/06
摘要： The present invention provides a gel composition having improved texture in use. A gel composition consisting of an organosiloxane derivative represented by the following formula (1) or (3), a monohydric aliphatic alcohol having 10 to 30 carbon atoms, and water.
摘要翻译：本发明提供了一种具有改进的使用质地的凝胶组合物。由下式（1）或（3）表示的有机硅氧烷衍生物，碳原子数为10〜30的一元脂肪醇和水组成的凝胶组合物。

75. 发明申请

US20100143284A1 Water-In-Oil Type Emulsion Composition 审中-公开
标题翻译：油包水型乳液组合物
公开(公告)号：US20100143284A1
公开(公告)日：2010-06-10
申请号：US12601029
申请日：2008-05-14
申请人： Kei Watanabe , Takayuki Sakiguchi , Takashi Teshigawara
发明人： Kei Watanabe , Takayuki Sakiguchi , Takashi Teshigawara
IPC分类号： A61K31/80 , A61K31/231 , A61Q19/00
CPC分类号： A61K8/375 , A61K8/064 , A61K8/39 , A61K8/585 , A61K8/86 , A61K8/891 , A61Q1/02 , A61Q1/10 , A61Q1/14 , A61Q5/12 , A61Q19/00
摘要： A water-in-oil type emulsion with a highly moisturizing effect on the skin has good emulsion stability and achieves a good feeling in use as a massage cream when a large amount of perfume is blended.The water-in-oil type emulsion includes the following components: (A) glyceryl monooleate, (B) a surfactant having branched chains in an alkyl group, (C) an aqueous component, (D) an oil component, and (E) a perfume component, Conditions (1) and (2) are met by the emulsion. Condition (1): the ratio of the sum of glyceryl monooleate (component (A)) and the surfactant having branched chains in an alkyl group (component (B)) with respect to a total composition is from 5 to 10% by mass. Condition (2): the ratio of perfume component (component (E)) with respect to the total composition is 0.3% by mass or more.
摘要翻译：在皮肤上具有高度保湿作用的油包水型乳剂具有良好的乳液稳定性，并且当混合大量香料时，作为按摩膏使用时具有良好的使用感。油包水型乳液包括以下成分：（A）单油酸甘油酯，（B）烷基中具有支链的表面活性剂，（C）水性成分，（D）油性成分，（E）通过乳液满足条件（1）和（2）的香料成分。条件（1）：相对于总成分，烷基（成分（B））中的单油酸甘油酯（组分（A））和支链表面活性剂之和的比例为5〜10质量％。条件（2）：香料成分（成分（E））相对于总成分的比例为0.3质量％以上。

76. 发明授权

US07644968B2 Substrate holding device 有权
标题翻译：基板保持装置
公开(公告)号：US07644968B2
公开(公告)日：2010-01-12
申请号：US10586654
申请日：2005-01-21
申请人： Yasuo Hirooka , Yasuhiko Hashimoto , Kei Watanabe
发明人： Yasuo Hirooka , Yasuhiko Hashimoto , Kei Watanabe
IPC分类号： B25J15/00 , B65G49/07
CPC分类号： H01L21/68707 , Y10S294/902 , Y10S414/141
摘要： A supporting structure is mounted on a hand body facing a circumferential edge of a substrate from below the substrate to support the substrate. First and second guiding members are mounted on the hand body, and having guiding surfaces in contact with an imaginary cylinder having an axis aligned with a reference axis of the hand body. First and second movable members are capable of moving in an imaginary plane perpendicular to the reference axis and are disposed on the radially outer-side of the circumferential edge of the substrate so as to face the circumferential edge. A driving unit simultaneously displaces the first and second movable members in the imaginary plane. The first and second guiding members and the first and second movable members are spaced apart on the circumference of the imaginary cylinder at intervals greater than the length of the arc of a segment in a substrate holding state.
摘要翻译：支撑结构从基板的下方安装在面向基板的周缘的手体上以支撑基板。第一引导构件和第二引导构件安装在手柄上，并且具有与具有与手柄的基准轴线对准的轴线的假想气缸接触的引导表面。第一和第二可移动构件能够在垂直于参考轴线的虚拟平面中移动，并且设置在基板的周向边缘的径向外侧上以面向周向边缘。驱动单元同时在假想平面中移动第一和第二可动构件。第一和第二引导构件以及第一和第二可移动构件在假想圆柱的圆周上以基片保持状态下的段的弧的长度间隔开。

77. 发明申请

US20070216179A1 Substrate Holding Device 有权
标题翻译：基板保持装置
公开(公告)号：US20070216179A1
公开(公告)日：2007-09-20
申请号：US10586654
申请日：2005-01-21
申请人： Yasuo Hirooka , Yasuhiko Hashimoto , Kei Watanabe
发明人： Yasuo Hirooka , Yasuhiko Hashimoto , Kei Watanabe
IPC分类号： H01L21/687
CPC分类号： H01L21/68707 , Y10S294/902 , Y10S414/141
摘要： The present device includes a supporting structure (23) mounted on a hand body (22) so as to face a circumferential edge of a substrate from below the substrate to support it, first and second guiding members (51a, 51b) mounted on the hand body (22) and respectively having guiding surfaces (53a, 53b) in contact with an imaginary cylinder having an axis aligned with a reference axis (L1) of the hand body (22and having a radius equal to that of the substrate, first and second movable members (24, 25) capable of moving in an imaginary plane perpendicular to the reference axis (L1) and disposed on the radially outer side of the circumferential edge of the substrate so as to face the circumferential edge thereof, and driving means (26) for simultaneously displacing the first and second movable members (24, 25) in the imaginary plane. The first and second guiding members (51a, 51b) and the first and second movable member (24, 25) are spaced apart on the circumference of the imaginary cylinder at circumferential intervals greater than the length of the arc of a segment cut to form a circumferential cut part in a substrate holding state where the substrate is held by at least either of the first and second guiding members (51a, 51b) and at least either of the first and second movable members (24, 25).
摘要翻译：本装置包括安装在手柄（22）上的支撑结构（23），以从基板的下方面对基板的周缘，以支撑其;安装在基板上的第一和第二引导构件（51a，51b）手体（22），并且分别具有与具有与手柄（22）的参考轴线（L 1）对准的轴线的虚拟圆筒接触的引导表面（53a，53b），其半径等于基板，能够在与基准轴线（L1）垂直的虚拟平面中移动并且设置在基板的周向边缘的径向外侧上的基板，第一和第二可移动部件（24,25），以面对周缘第一和第二引导构件（51a，51b）以及第一和第二可移动构件（24,25），用于将第一和第二可移动构件（24,25） 25）间隔开假想圆柱体的圆周间隔大于切割成形成圆周切割部分的圆弧长度的圆周间隔的基底保持状态，其中基底由第一和第二引导部件（51a， 51b）和第一和第二可动构件（24,25）中的至少一个。

78. 发明授权

US5827920A Emulsion composition 失效
标题翻译：乳液组成
公开(公告)号：US5827920A
公开(公告)日：1998-10-27
申请号：US793443
申请日：1997-05-12
申请人： Kei Watanabe , Hiroyuki Kakoki , Kenzo Ito
发明人： Kei Watanabe , Hiroyuki Kakoki , Kenzo Ito
IPC分类号： A61K8/06 , A61K8/34 , A61K8/58 , A61K8/81 , A61K8/891 , A61Q19/00 , B01F17/00 , B01F17/52 , C08L31/02 , C08L83/04
CPC分类号： B01F17/0028 , A61K8/06 , A61K8/342 , A61K8/585 , A61K8/8152 , A61K8/891 , A61Q19/00 , A61K2800/33
摘要： An emulsion compositions comprising (i) an alkyl-modified carboxyvinyl polymer, (ii) a C.sub.12 to C.sub.18 higher alcohol solid at room temperature (for example 15.degree. to 20.degree. C.), and (iii) a silicone oil, wherein the weight ratio of the component (i)/component (ii) is not more than 0.5. This emulsion further contains no surfactant.
摘要翻译： PCT No.PCT / JP96 / 01803 Sec。 371日期：1997年5月12日 102（e）日期1997年5月12日PCT提交1996年6月28日PCT公布。公开号WO97 / 02090 日期1997年1月23日一种乳液组合物，其包含（i）烷基改性的羧基乙烯基聚合物，（ii）在室温（例如15℃至20℃）下的C12至C18高级醇固体，和（iii）硅氧烷油，其中组分（i）/组分（ii）的重量比不大于0.5。该乳液还不含表面活性剂。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式