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    • 71. 发明申请
    • Method for manufacturing color filter
    • 彩色滤光片制造方法
    • US20070259277A1
    • 2007-11-08
    • US11800489
    • 2007-05-04
    • Hironori Kobayashi
    • Hironori Kobayashi
    • G02F1/1335G02B5/20
    • B82Y30/00G02F1/133516
    • In the present invention, a provision of a method for manufacturing a color filter capable of forming a highly sophisticated pattern, to be formed easily at a low cost is desired. The present invention achieves the above mentioned object by providing a method for manufacturing a color filter comprising: (1) forming a light shielding part on a transparent base material; (2) forming a wettability changeable layer which the wettability changes by the function of a photocatalyst, on the surface of the transparent base material on the side with the light shielding part formed; (3) placing the photocatalyst containing layer of the photocatalyst containing layer side substrate which is the photocatalyst containing layer containing a photocatalyst formed on the base member, and the wettability changeable layer with a gap of 200 μm or less, and irradiating an energy from a predetermined direction to form a pixel part forming part comprising a lyophilic area where the contact angle to a liquid is lowered compared with the state before the energy irradiation to the wettability changeable layer, in a pattern; and (4) coloring the pixel part forming part by the ink jet method so as to form a pixel part.
    • 在本发明中,期望提供一种能够以低成本容易地形成能够形成高度复杂图案的滤色器的方法。 本发明通过提供一种制造滤色器的方法来实现上述目的,包括:(1)在透明基材上形成遮光部分; (2)在形成有遮光部的一侧的透明基材的表面上形成润湿性由光催化剂的功能而变化的润湿性变化层; (3)将含有形成在基材上的含有光催化剂的光催化剂含有层侧光催化剂层侧基板和含有200μm以下间隙的润湿性变化层的含光催化剂层, 形成像素部分形成部分,其形成部分包括亲液性区域,其中液体的接触角与向可润湿性变化层的能量照射之前的状态相比降低; 和(4)通过喷墨法着色像素部分形成部分以形成像素部分。
    • 72. 发明申请
    • Method for manufacturing color filter
    • 彩色滤光片制造方法
    • US20070184364A1
    • 2007-08-09
    • US11654856
    • 2007-01-18
    • Akio SoneharaHironori KobayashiNorikatsu Nakamura
    • Akio SoneharaHironori KobayashiNorikatsu Nakamura
    • G02B5/20
    • G02B5/223G02B5/201G02F1/133516
    • The main object of the present invention is to provide a method for manufacturing a color filter, capable of having the surface of the pixel part flatly even in the case a pixel part is formed by an ink discharging method, and the thickness of each pixel part evenly. In order to achieve the above-mentioned object, the present invention provides a method for manufacturing a color filter comprising at least a pixel part forming process of forming a pixel part of a plurality of colors in a predetermined pattern by adhering an ink on a transparent substrate by a discharging method, and the convex pixel part is formed in the pixel part forming process, wherein a pixel part flattening process of flattening the convex pixel part is executed after the pixel part forming process.
    • 本发明的主要目的在于提供一种制造滤色器的方法,即使在通过喷墨方法形成像素部分的情况下,也可以使像素部分的表面平坦,并且每个像素部分的厚度 均匀 为了实现上述目的,本发明提供了一种制造滤色器的方法,该方法至少包括一个像素部分形成工艺,该工艺通过将墨水粘附到透明的方式上来形成预定图案中的多种颜色的像素部分 通过放电方法形成衬底,并且在像素部分形成处理中形成凸起像素部分,其中在像素部分形成处理之后执行使凸起像素部分平坦化的像素部分平坦化处理。
    • 73. 发明申请
    • Manufacturing method of pattern formed body and pattern formed body manufacturing apparatus
    • 图案形成体和图案成形体制造装置的制造方法
    • US20070128552A1
    • 2007-06-07
    • US11526973
    • 2006-09-26
    • Takashi SawadaKaori YamashitaHironori Kobayashi
    • Takashi SawadaKaori YamashitaHironori Kobayashi
    • G03B27/42G03F7/00
    • G03F7/0007G03F1/82G03F1/84
    • A main object of the invention is to provide a a manufacturing method of a plurality of pattern formed bodies which makes it possible that even if the pattern formed bodies are continuously manufactured, their property varied patterns are each made into a target pattern form with high precision; and a pattern formed body manufacturing apparatus used in the manufacturing method. To achieve the object, the invention provides a manufacturing method of a plurality of pattern formed bodies comprising a pattern forming step and a foreign matter removing step, wherein the pattern forming step is a step of radiating vacuum-ultraviolet light through a photomask to a pattern forming substrate, varying a surface property by the vacuum-ultraviolet light, and forming a property varied pattern with the property varied on a surface of the pattern forming substrate to form a pattern formed body; the pattern forming step is repeated plural times to manufacture a plurality of the pattern formed bodies; and the foreign matter removing step is a step of removing a foreign matter deposited to the photomask performed between the repeated pattern forming steps.
    • 本发明的主要目的在于提供一种多个图形成形体的制造方法,即使连续地制造图案形成体也能够将其特性变化的图案分别高精度地制成目标图形, 以及在制造方法中使用的图案形成体制造装置。 为了实现该目的,本发明提供了一种包括图案形成步骤和异物去除步骤的多个图案形成体的制造方法,其中,图案形成步骤是通过光掩模将真空紫外线照射到图案的步骤 通过真空紫外光改变表面特性,并且在图案形成基板的表面上形成具有不同特性的特性变化的图案,以形成图案形成体; 重复多次图案形成步骤以制造多个图案形成体; 并且异物去除步骤是去除在重复图案形成步骤之间执行的沉积到光掩模上的异物的步骤。
    • 75. 发明授权
    • Boost circuit and semiconductor integrated circuit
    • 升压电路和半导体集成电路
    • US07148740B2
    • 2006-12-12
    • US11099260
    • 2005-04-05
    • Hironori KobayashiHisashi Yamaguchi
    • Hironori KobayashiHisashi Yamaguchi
    • G05F1/10H02M3/18
    • H02M3/07H01L27/092
    • A boost circuit includes: level shifters 3 and 4 for shifting a high level of a clock signal; a first boost means which contains transistors QP3 and QP4 for conducting switching in accordance with the clock signal whose high level has been shifted and capacitors C1 and C2 and, thereby, generates a power source potential VDC2 by conducting a charge pump operation; level shifters 1 and 2 for shifting a high level of a clock signal; inverters IV41 to IV52 for shifting a low level of the clock signal whose high level has been shifted; and a second boost means which contains transistors QP1 and QP2 for conducting the switching in accordance with the clock signal whose high level and low level have been shifted and capacitors C3 and C4 and, thereby, generates a power source potential VDC3 by conducting the charge pump operation.
    • 升压电路包括:用于移位高电平时钟信号的电平移位器3和4; 第一升压装置,其包含用于根据其高电平已经移位的时钟信号和电容器C 1和C 2进行开关的晶体管QP 3和QP 4,从而产生电源电位V DC, SUB> 2通过进行电荷泵操作; 用于移位高电平的时钟信号的电平移位器1和2; 用于移位高电平已移位的时钟信号的低电平的反相器IV 41至IV 52; 以及第二升压装置,其包含用于根据其高电平和低电平已经移位的时钟信号进行开关的晶体管QP 1和QP 2以及电容器C 3和C 4,从而产生电源电位V' 通过进行电荷泵操作来执行SUB> DC <3>。
    • 76. 发明申请
    • Color filter and method of producing same
    • 滤色器及其制造方法
    • US20060222970A1
    • 2006-10-05
    • US11396675
    • 2006-04-03
    • Hironori Kobayashi
    • Hironori Kobayashi
    • G02B5/20
    • G02B5/223G02F1/133512G02F1/133516
    • The main object of the present invention is to provide an efficient color filter with no white spots and the like generated in colored layer, and a method of producing the same. To achiever the object, the invention provides a method of producing a color filter, comprising: a liquid repellent colored layer forming step of forming, on a substrate, a plurality of liquid repellent colored layers having liquid repellency at predetermined intervals; and a light shielding part forming step of coating a light shielding part forming coating solution between the two adjacent the liquid repellent colored layers on the substrate by a discharge method to form a light shielding part.
    • 本发明的主要目的是提供一种在着色层中不产生白斑等的有效的滤色器及其制造方法。 为了实现该目的,本发明提供了一种制造滤色器的方法,包括:拒液着色层形成步骤,在基板上形成以预定间隔具有拒液性的多个防液着色层; 以及遮光部形成步骤,通过放电方法在基板上的两个邻近的防液着色层之间涂覆遮光部分形成涂布液,以形成遮光部。
    • 78. 发明申请
    • Boost circuit and semiconductor integrated circuit
    • 升压电路和半导体集成电路
    • US20050225377A1
    • 2005-10-13
    • US11099260
    • 2005-04-05
    • Hironori KobayashiHisashi Yamaguchi
    • Hironori KobayashiHisashi Yamaguchi
    • H01L27/04G05F1/10H01L21/822H01L27/092H02M3/07
    • H02M3/07H01L27/092
    • A boost circuit includes: level shifters 3 and 4 for shifting a high level of a clock signal; a first boost means which contains transistors QP3 and QP4 for conducting switching in accordance with the clock signal whose high level has been shifted and capacitors C1 and C2 and, thereby, generates a power source potential VDC2 by conducting a charge pump operation; level shifters 1 and 2 for shifting a high level of a clock signal; inverters IV41 to IV52 for shifting a low level of the clock signal whose high level has been shifted; and a second boost means which contains transistors QP1 and QP2 for conducting the switching in accordance with the clock signal whose high level and low level have been shifted and capacitors C3 and C4 and, thereby, generates a power source potential VDC3 by conducting the charge pump operation.
    • 升压电路包括:用于移位高电平时钟信号的电平移位器3和4; 第一升压装置,其包含用于根据其高电平已经移位的时钟信号和电容器C 1和C 2进行开关的晶体管QP 3和QP 4,从而产生电源电位V DC, SUB> 2通过进行电荷泵操作; 用于移位高电平的时钟信号的电平移位器1和2; 用于移位高电平已移位的时钟信号的低电平的反相器IV 41至IV 52; 以及第二升压装置,其包含用于根据其高电平和低电平已经移位的时钟信号进行开关的晶体管QP 1和QP 2以及电容器C 3和C 4,从而产生电源电位V' 通过进行电荷泵操作来执行SUB> DC <3>。
    • 79. 发明授权
    • Method for manufacturing electroluminescent element
    • 电致发光元件制造方法
    • US06949328B2
    • 2005-09-27
    • US10663075
    • 2003-09-16
    • Norihito ItoHironori Kobayashi
    • Norihito ItoHironori Kobayashi
    • H05B33/10B01J35/02H01L27/32H01L51/40H01L51/50H01L51/56H05B33/12H05B33/22H01J9/227
    • H01L51/0015B82Y10/00B82Y30/00H01L27/3295H01L51/0017H01L51/5088H01L51/56
    • A method for manufacturing an electroluminescent element includes forming a hole injecting layer on a first electrode layer a base material with the first electrode layer formed in a pattern; a decomposition removing process of using a photocatalyst treatment layer substrate having at least a photocatalyst treatment layer, placing the base material and the photocatalyst treatment layer substrate facing each other with a gap of 200 μm or less, decomposing and removing the hole injecting layer, in a pattern, on the base material by irradiating from predetermined direction; forming a light emitting layer on the pattern formed hole injecting layer remaining on the base material; and forming a second electrode layer on the light emitting layer; wherein a contact angle to a liquid of the surface of the hole injecting layer is smaller than the contact angle to a liquid of the surface bared by removing the hole injecting layer.
    • 一种电致发光元件的制造方法,其特征在于,在形成有图案的第一电极层的基材的第一电极层上形成空穴注入层, 使用具有至少一种光催化剂处理层的光催化剂处理层基材的分解去除方法,将基材和光催化剂处理层基板彼此面对,间隔200μm以下,分解除去空穴注入层, 通过从预定方向照射而在基材上形成图案; 在保留在基材上的图案形成的空穴注入层上形成发光层; 以及在所述发光层上形成第二电极层; 其中与空穴注入层的表面的液体的接触角小于通过去除空穴注入层而露出的表面的液体的接触角。