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71. 发明申请

US20050030508A1 Scanning exposure method, scanning exposure apparatus and its making method, and device and its manufacturing method 审中-公开
标题翻译：扫描曝光方法，扫描曝光装置及其制作方法，装置及其制造方法
公开(公告)号：US20050030508A1
公开(公告)日：2005-02-10
申请号：US10939334
申请日：2004-09-14
申请人： Noriaki Tokuda , Kenichi Shiraishi
发明人： Noriaki Tokuda , Kenichi Shiraishi
IPC分类号： G03F7/20 , G03B27/72
CPC分类号： G03F7/70066 , G03F7/70191 , G03F7/70358 , G03F7/70558 , G03F7/70941
摘要： A control system adjusts the exposure of a wafer according to the transfer error of a pattern line width caused when a certain integrated exposure over the whole shot areas is made a desired value when a pattern is transferred to a wafer and according to information corresponding to the desired value of the integrated exposure stored in a storage device, then performing scanning exposure. As a result, influences such as of fog exposure due to flare are mitigated, and the uniformity of line width distribution with high precision is ensure over the shot regions on the wafer, achieving pattern transfer to each shot region.
摘要翻译：控制系统根据当将图案转印到晶片时在整个拍摄区域上的某个集成曝光被制成期望值时根据图案线宽度的转印误差调整晶片的曝光，并且根据对应于存储在存储装置中的集成曝光的期望值，然后执行扫描曝光。结果，减轻了由于火炬引起的雾化的影响，并且确保了晶片上的照射区域的高精度的线宽分布的均匀性，从而实现了到每个照射区域的图案转印。

72. 发明授权

US06813321B1 Digital demodulator 有权
标题翻译：数字解调器
公开(公告)号：US06813321B1
公开(公告)日：2004-11-02
申请号：US09582229
申请日：2000-07-21
申请人： Hisakazu Katoh , Akinori Hashimoto , Yuichi Iwadate , Kazuhiko Shibuya , Fumiaki Minematsu , Shigeyuki Itoh , Tomohiro Saito , Kenichi Shiraishi , Akihiro Horii , Shoji Matsuda , Soichi Shinjo
发明人： Hisakazu Katoh , Akinori Hashimoto , Yuichi Iwadate , Kazuhiko Shibuya , Fumiaki Minematsu , Shigeyuki Itoh , Tomohiro Saito , Kenichi Shiraishi , Akihiro Horii , Shoji Matsuda , Soichi Shinjo
IPC分类号： H03D322
CPC分类号： H04L27/2273 , H04L7/042 , H04L27/0014 , H04L2027/0057 , H04L2027/0067 , H04L2027/0077 , H04L2027/0095
摘要： A digital demodulator which will need no absolute phasing circuit is provided. A known-pattern BPSK signal generating circuit 6 generates the same known-pattern BPSK signal as a known-pattern BPSK signal in a received digital modulated wave in synchronism with the known-pattern BPSK signal in the received digital modulated wave, a carrier-reproducing phase error detecting circuit 7 has a phase error table where one of reference phases in a signal point position of a demodulation baseband signal is made a convergence point, a phase error voltage corresponding to a phase error between a phase determined from the signal point position of the demodulation baseband signals and a phase convergence point is sent out, by enable-controlling a carrier-reproducing loop filter 8 according to the known-pattern BPSK signal outputted from the known-pattern BPSK signal generating circuit 6, the phase error voltage is smoothed, and carrier reproduction is performed while controlling the frequency of a reproduced carrier according to the smoothed output so that the phase in the signal point position coincides with the phase convergence point.
摘要翻译：提供了不需要绝对定相电路的数字解调器。已知模式BPSK信号发生电路6与接收的数字调制波中的已知模式BPSK信号同步地产生与接收的数字调制波中已知模式BPSK信号相同的已知模式BPSK信号，载波再现相位误差检测电路7具有相位误差表，其中解调基带信号的信号点位置中的参考相位之一成为会聚点，相位误差电压对应于从信号点位置确定的相位之间的相位误差通过根据从已知模式BPSK信号发生电路6输出的已知模式BPSK信号启用控制载波再现环路滤波器8，发送解调基带信号和相位收敛点，平滑相位误差电压并且在根据平滑输出控制再现载波的频率的同时执行载波再现，使得si中的相位点位置与相位收敛点一致。

73. 发明授权

US06690745B1 Circuit for detecting the phase of received signal 失效
标题翻译：用于检测接收信号相位的电路
公开(公告)号：US06690745B1
公开(公告)日：2004-02-10
申请号：US09463233
申请日：2000-01-21
申请人： Akihiro Horii , Kenichi Shiraishi
发明人： Akihiro Horii , Kenichi Shiraishi
IPC分类号： H04L2706
CPC分类号： H04L27/2332 , H04L2027/0065
摘要： A received signal phase detecting circuit in provided in which the circuit scale is small. The circuit functions so as to capture a frame synchronizing signal from a demodulated baseband signal, extract a symbol stream during the period of frame synchronizing signal from the demodulated baseband signal through delay circuits (41, 42) at a timing matching the bit stream of the captured synchronizing signal, rotating the phase of a corresponding symbol extracted from the symbol stream when the big in the bit in the bit stream is logic “0” by 80°, outputting the symbol after the phase rotation and a corresponding symbol extracted from the symbol stream when the bit in the bit stream is logic “1” from a 0°/180° phase rotating circuit (43), operating the cumulative average of the output from the 0°/180° phase rotating circuit (43) for a specific period through cumulative averaging circuits (45, 46), rotating the phase of the outputs therefrom through a 22.5° phase rotating circuit (48), and determining the phase of the output therefrom by a phase determining circuit (49).
摘要翻译：一种接收信号相位检测电路，其中电路规模小。电路起作用以从解调的基带信号中捕获帧同步信号，在帧同步信号的周期期间，通过延迟电路（41,42），在与捕获的同步信号，当比特流中的比特中的大比特是逻辑“0”80°时，旋转从符号流提取的对应符号的相位，在相位旋转之后输出符号，并从符号中提取相应的符号当位流中的位是从0°/ 180°相位旋转电路（43）的逻辑“1”时，对来自0°/ 180°相位旋转电路（43）的输出的累积平均值进行特定操作通过累积平均电路（45,46），通过22.5°相位旋转电路（48）旋转其输出的相位，并且通过相位确定电路（49）确定其输出的相位。

74. 发明授权

US06678342B1 Absolute-phasing synchronization capturing circuit 有权
标题翻译：绝对定相同步捕捉电路
公开(公告)号：US06678342B1
公开(公告)日：2004-01-13
申请号：US09446460
申请日：1999-12-22
申请人： Akihiro Horii , Kenichi Shiraishi
发明人： Akihiro Horii , Kenichi Shiraishi
IPC分类号： H04L704
CPC分类号： H04L27/2273 , H04L27/22 , H04L27/2332 , H04L2027/0046 , H04L2027/0067
摘要： A small-scale absolute-phasing synchronization capturing circuit for absolute phasing of a received signal by selectively transmitting a baseband signal demodulated through a demodulator (1), a baseband signal subjected to phase rotation through a remapper (11), a baseband signal output from a first inverting means, a baseband signal output from a second inverting means based on the phase angle of the received signal relative to the phase rotation of the transmission signal. The most significant bit in the demodulated baseband signal and the most significant bit in the baseband signal subjected to phase rotation through the remapper (11) are extracted and a frame synchronization signal is captured according to the extracted significant bit.
摘要翻译：一种用于通过选择性地发送通过解调器（1）解调的基带信号，通过再映射器（11）进行相位旋转的基带信号，从基站信号输出的基带信号，用于绝对定相接收信号的小型绝对定相同步捕获电路第一反相装置，基于接收信号相对于发送信号的相位旋转的相位角从第二反相装置输出的基带信号。解调的基带信号中的最高有效位和通过再映射器（11）进行相位旋转的基带信号中的最高有效位被提取，并且根据提取的有效位捕获帧同步信号。

75. 发明授权

US06301295B1 AM modulated wave eliminating circuit 有权
标题翻译： AM调制消除电路
公开(公告)号：US06301295B1
公开(公告)日：2001-10-09
申请号：US09257048
申请日：1999-02-25
申请人： Atsushi Shinoda , Kenichi Shiraishi
发明人： Atsushi Shinoda , Kenichi Shiraishi
IPC分类号： H04L2706
CPC分类号： H04L27/206 , H03D5/00
摘要： The present invention provides an AM modulated wave eliminating circuit which is capable of extracting a digital modulated wave by cancelling an AM modulated wave from an AM data multiplex modulated wave. A composite wave is composed of an AM carrier wave in-phase signal, an AM carrier wave reverse-phase signal and a digital modulated wave is extracted from an AM data multiplex modulated wave composed of an AM stereo modulated wave multiplexed with a digital modulated wave within the same frequency band, values corresponding to different phase deflection angles of an AM stereo output from a phase level generator (21) are multiplied by the AM carrier wave in-phase signal with multipliers (221 through 22n), multiplication outputs are added to the composite wave with adders (231 through 23n), a phase deflection angle corresponding to an output at a minimum level out of addition outputs is determined with a phase presumer (24), a value corresponding to a determined phase deflection angle is selected from an output of a phase level generator (21) with a phase level selector (25), a selected value is multiplied by an AM carrier wave in-phase signal component with a multiplier (26), a multiplication output is added to the composite wave with an adder (27) and an addition output is used as a digital modulated wave.
摘要翻译：本发明提供一种能够通过从AM数据多路复用调制波消除AM调制波来提取数字调制波的AM调制波消除电路。复合波由AM载波同相信号组成，AM载波反相信号和数字调制波从由与数字调制波复用的AM立体声调制波组成的AM数据多路调制波提取在相同频带内，对应于来自相位电平发生器（21）的AM立体声输出的不同相位偏转角的值与乘法器（221至22n）与AM载波同相信号相乘，乘法输出被加到具有加法器（231至23n）的复合波，相对于相位输出的最小电平处的输出的相位偏转角由相位推算器（24）确定，与所确定的相位偏转角对应的值从用相位电平选择器（25）输出相位电平发生器（21），所选择的值与乘法器（26）乘以AM载波同相信号分量，乘法器使用加法器（27）将阳离子输出添加到复合波，并且使用相加输出作为数字调制波。

76. 发明授权

US09335639B2 Exposure method, exposure apparatus, and device manufacturing method 有权
标题翻译：曝光方法，曝光装置和装置制造方法
公开(公告)号：US09335639B2
公开(公告)日：2016-05-10
申请号：US13317169
申请日：2011-10-12
申请人： Kenichi Shiraishi , Ryuichi Hoshika , Tomoharu Fujiwara
发明人： Kenichi Shiraishi , Ryuichi Hoshika , Tomoharu Fujiwara
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70608 , G03F7/2041 , G03F7/70341 , G03F7/70858
摘要： A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.
摘要翻译：一种液浸装置，其具有混合并溶解用于调节液体的电阻率的预定物质的混合机构，所述混合机构被供给到放置在所述光上的投影光学系统的物体（构件）的表面上的防液膜投影光学系统的发射侧，并且通过将预定液体溶解在其上的液体供应到防液膜上而形成液浸区域。

77. 发明授权

US08810767B2 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device 有权
标题翻译：曝光装置，其清洁部件的方法，曝光装置的维护方法，维护装置及其制造方法
公开(公告)号：US08810767B2
公开(公告)日：2014-08-19
申请号：US12453269
申请日：2009-05-05
申请人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
发明人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/7095 , G03F7/70958 , G03F7/70975
摘要： A lithography apparatus includes a part having a photocatalytic coating. The lithography apparatus can be an extreme ultraviolet lithography apparatus or an immersion lithography apparatus.
摘要翻译：光刻设备包括具有光催化涂层的部件。光刻设备可以是极紫外光刻设备或浸没光刻设备。

78. 发明授权

US08724077B2 Exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US08724077B2
公开(公告)日：2014-05-13
申请号：US13299891
申请日：2011-11-18
申请人： Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
发明人： Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
IPC分类号： G03B27/32 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70858 , G03F7/70891
摘要： An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.
摘要翻译：曝光装置包括：浸没空间形成部件，其用第一液体（LQ）填充曝光用光（EL）的光路空间（K1），形成浸渍空间;以及温度调节机构（60），其抑制伴随着形成浸入空间的失活，浸渍空间形成部件（70）的温度变化。

79. 发明授权

US08704997B2 Immersion lithographic apparatus and method for rinsing immersion space before exposure 有权
标题翻译：浸没式光刻设备及曝光前冲洗浸渍空间的方法
公开(公告)号：US08704997B2
公开(公告)日：2014-04-22
申请号：US12134950
申请日：2008-06-06
申请人： Kenichi Shiraishi
发明人： Kenichi Shiraishi
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03B27/42 , G03F7/70341 , G03F7/70916
摘要： There is provided an immersion type lithographic apparatus. The immersion type lithographic apparatus is provided with at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate, and the apparatus is configured to move a substrate holder with respect to a projection system during the rinsing, such that the position of the immersion space changes with respect to the substrate holder during the rinsing.
摘要翻译：提供了浸没式光刻设备。浸没型光刻设备设置有至少一个浸没空间和浸没系统，其被配置为至少部分地用液体填充浸没空间。该装置被配置为在装置用于将图案化的辐射束投影到基板之前用冲洗液冲洗至少一部分浸没空间，并且该装置被配置为在衬底保持器相对于投影系统移动衬底保持器冲洗，使得在冲洗期间浸渍空间的位置相对于衬底保持器改变。

80. 发明授权

US08638422B2 Exposure method, exposure apparatus, method for producing device, and method for evaluating exposure apparatus 有权
标题翻译：曝光方法，曝光装置，制造装置的方法以及曝光装置的评价方法
公开(公告)号：US08638422B2
公开(公告)日：2014-01-28
申请号：US11886506
申请日：2006-03-17
申请人： Kenichi Shiraishi
发明人： Kenichi Shiraishi
IPC分类号： G03B27/32 , G03B27/42 , G03B27/52 , G03B27/58 , G03C5/00
CPC分类号： G03F7/70775 , G03F7/70341 , G03F7/70358 , G03F7/70516 , G03F7/70525 , G03F7/70616 , G03F7/70725
摘要： An exposure method includes a first step for measuring position information of a substrate while controlling a substrate stage to move the substrate stage in a state that an optical path space is filled with a liquid under a predetermined condition; a second step for obtaining a movement control accuracy of the substrate stage based on a result of the measurement; a third step for determining an exposure condition, for exposing the substrate, based on the obtained movement control accuracy; and a fourth step for exposing the substrate based on the determined exposure condition. This makes it possible to satisfactorily expose the substrate at the time of exposing the substrate based on the liquid immersion method.
摘要翻译：曝光方法包括：第一步骤，用于在预定条件下，在光路空间被填充有液晶的状态的同时控制衬底台移动衬底台，同时测量衬底的位置信息; 基于测量结果获得衬底载物台的移动控制精度的第二步骤; 第三步骤，用于基于所获得的移动控制精度来确定用于使基板曝光的曝光条件; 以及基于所确定的曝光条件曝光所述基板的第四步骤。这使得可以在基于浸液方法使基板曝光时令人满意地曝光基板。

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