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    • 77. 发明申请
    • Pattern forming materials and pattern formation method using the materials
    • 图案形成材料和图案形成方法使用材料
    • US20060234168A1
    • 2006-10-19
    • US10531897
    • 2003-10-20
    • Joo-Ho KimJunji Tominaga
    • Joo-Ho KimJunji Tominaga
    • G03C5/00
    • G11B7/261B41M5/26B41M5/368B41M5/46B41M5/465
    • A pattern forming materials includes a thermal sensitive material layer formed on a target substrate, a first light-to-heat converting layer formed between the thermal sensitive material layer and the target substrate, and a second light-to-heat converting layer formed on a surface of the thermal sensitive material layer opposite to the first light-to-heat converting layer, the thermal sensitive material layer being interposed between the first and second light-to-heat converting layers. A higher aspect ratio fine pattern can be formed in the thermal sensitive material layer made of photoresist using heat generated in the first and second light-to-heat converting layers formed on both surfaces of the thermal sensitive material layer.
    • 图案形成材料包括形成在目标基板上的热敏材料层,形成在热敏材料层和目标基板之间的第一光热转换层和形成在热敏材料层上的第二光热转换层 所述热敏材料层的表面与所述第一光热转换层相对,所述热敏材料层插入在所述第一和第二光热转换层之间。 可以在形成在热敏材料层的两个表面上的第一和第二光热转换层中产生的热量的光致抗蚀剂材料层中形成更高的纵横比精细图案。