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71. 发明申请

US20100136486A1 RESIST PROTECTIVE COATING COMPOSITON AND PATTERNING PROCESS 有权
标题翻译：耐腐蚀涂料组合物和方法
公开(公告)号：US20100136486A1
公开(公告)日：2010-06-03
申请号：US12628705
申请日：2009-12-01
申请人： Yuji HARADA , Jun Hatakeyama , Koji Hasegawa
发明人： Yuji HARADA , Jun Hatakeyama , Koji Hasegawa
IPC分类号： G03F7/20 , C08F214/18 , C08F218/14 , C08F218/02 , C08L27/12
CPC分类号： C09D127/12 , C08F220/18 , C08F220/24 , C08F220/26 , C08F220/30 , C08L33/16 , C09D125/18 , C09D133/16 , G03F7/0046 , G03F7/11 , G03F7/2041 , C08L2666/04 , C08F212/14 , C08F232/08 , C08F212/32
摘要： A protective coating composition comprising a polymer of acyl-protected hexafluoroalcohol structure as a base polymer, optionally in admixture with a second polymer containing sulfonic acid amine salt in recurring units is applied onto a resist film. The protective coating is transparent to radiation of wavelength up to 200 nm.
摘要翻译：包含酰基保护的六氟醇结构的聚合物作为基础聚合物的保护性涂料组合物，任选地与含有重复单元的磺酸胺盐的第二聚合物的混合物施加到抗蚀剂膜上。保护涂层对波长高达200nm的辐射是透明的。

72. 发明授权

US07666572B2 Resist top coat composition and patterning process 有权
标题翻译：抵抗面漆组合和图案化工艺
公开(公告)号：US07666572B2
公开(公告)日：2010-02-23
申请号：US11808543
申请日：2007-06-11
申请人： Yuji Harada , Jun Hatakeyama
发明人： Yuji Harada , Jun Hatakeyama
IPC分类号： G03F7/09 , G03F7/20 , G03F7/30 , G03C1/76
CPC分类号： G03F7/11 , C08F2/38 , C08F20/18 , C08F220/18 , C08F220/22 , C08F220/28 , C08F232/08 , G03F7/0046 , G03F7/2041 , Y10S430/106 , Y10S430/108
摘要： There is disclosed a resist top coat composition, comprising at least a polymer that has an amino group or a sulfonamide group at a polymer end and that is represented by the following general formula (1); and a patterning process comprising: at least, a step of forming a photoresist film on a substrate; a step of forming a resist top coat on the photoresist film by using the resist top coat composition; a step of exposing the substrate; and a step of developing the substrate with a developer. There can be provided a resist top coat composition that makes it possible to provide more certainly rectangular and excellent resist patterns when a top coat is formed on a photoresist film; and a patterning process using such a composition.
摘要翻译：公开了一种抗蚀剂面漆组合物，其至少包含在聚合物末端具有氨基或磺酰胺基团并由以下通式（1）表示的聚合物; 以及图案化工艺，包括：至少在衬底上形成光致抗蚀剂膜的步骤; 通过使用抗蚀剂面漆组合物在光致抗蚀剂膜上形成抗蚀剂面涂层的步骤; 使基板曝光的工序; 以及用显影剂显影衬底的步骤。可以提供抗蚀剂面漆组合物，当在光致抗蚀剂膜上形成顶涂层时，可以提供更确定的矩形和优异的抗蚀剂图案; 以及使用这种组合物的图案化工艺。

73. 发明授权

US07622242B2 Resist composition and patterning process 有权
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US07622242B2
公开(公告)日：2009-11-24
申请号：US12236359
申请日：2008-09-23
申请人： Jun Hatakeyama , Koji Hasegawa , Takeru Watanabe , Yuji Harada
发明人： Jun Hatakeyama , Koji Hasegawa , Takeru Watanabe , Yuji Harada
IPC分类号： G03F7/039 , G03F7/038 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0382 , G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/143
摘要： A resist composition comprises a base polymer which changes its alkali solubility under the action of an acid, and an additive copolymer comprising recurring units (a) and (b). R1 is F or CF3, R2 and R3 are H or alkyl or form a ring, R4 is H or an acid labile group, R5 to R6 are H, F, or alkyl, or two of R5 to R8 may together form a ring, m=0 or 1, 0.2≦a≦0.8, and 0.1≦b≦0.6. A resist film of the composition has good barrier property against water so that leaching of the resist film with water is controlled, minimizing a change of pattern profile due to leach-out.
摘要翻译：抗蚀剂组合物包含在酸的作用下改变其碱溶解性的基础聚合物和包含重复单元（a）和（b）的添加剂共聚物。 R1是F或CF3，R2和R3是H或烷基或形成环，R4是H或酸不稳定基团，R5至R6是H，F或烷基，或R5至R8中的两个可以一起形成环， m = 0或1，0.2 <= a <= 0.8，0.1 <= b <= 0.6。该组合物的抗蚀剂膜对水具有良好的阻隔性，从而控制抗蚀剂膜与水的浸出，从而最小化由于浸出而导致的图案轮廓的变化。

74. 发明申请

US20070185226A1 NOVEL POLYMERIZABLE COMPOUND, POLYMER, POSITIVE-RESIST COMPOSITION, AND PATTERNING PROCESS USING THE SAME 有权
标题翻译：新型可聚合化合物，聚合物，阳离子组合物和使用该方法的方法
公开(公告)号：US20070185226A1
公开(公告)日：2007-08-09
申请号：US11672917
申请日：2007-02-08
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai
IPC分类号： C08G59/14
CPC分类号： G03F7/0046 , C07C69/54 , C07C2602/42 , C08F220/18 , C08F220/28 , G03F7/0397
摘要： The present invention provides a polymer which has at least one or more of a repeating unit represented by a following general formula (1a), a repeating unit represented by a following general formula (2a) and a repeating unit represented by a following general formula (3b), and a repeating unit represented by a following general formula (1c), and a positive resist composition which contains as a base resin the polymer. Thereby, there can be provided a positive-resist composition having high sensitivity and high resolution in exposure with a high energy beam, wherein line edge roughness is small since swelling at the time of development is suppressed, and the residue after development is few.
摘要翻译：本发明提供一种聚合物，其具有以下通式（1a）表示的重复单元，下述通式（2a）表示的重复单元和下述通式（ 3b）和由以下通式（1c）表示的重复单元和含有聚合物作为基础树脂的正性抗蚀剂组合物。因此，可以提供一种在高能量束曝光时具有高灵敏度和高分辨率的正光刻胶组合物，其中线边缘粗糙度小，因为在显影时的膨胀被抑制，并且显影后的残留物很少。

75. 发明申请

US20070178407A1 Polymer, resist protective coating material, and patterning process 有权
标题翻译：聚合物，抗蚀剂保护涂层材料和图案化工艺
公开(公告)号：US20070178407A1
公开(公告)日：2007-08-02
申请号：US11699485
申请日：2007-01-30
申请人： Jun Hatakeyama , Koji Hasegawa , Yuji Harada
发明人： Jun Hatakeyama , Koji Hasegawa , Yuji Harada
IPC分类号： G03C1/00
CPC分类号： G03F7/11 , C08F220/18 , C08F220/24 , C08F220/26 , C08F220/28 , C08F232/08 , G03F7/0046 , G03F7/2041
摘要： A polymer comprising repeat units having formula (1) wherein R1 and R2 are hydrogen or C1-C12 alkyl, or R1 and R2 may bond together to form a ring, and R30 is hydrogen or methyl is used to formulate a resist protective coating material. A protective coating formed therefrom on a resist film is water-insoluble, dissolvable in alkali aqueous solution or alkaline developer, and immiscible with the resist film so that the immersion lithography can be conducted in a satisfactory manner. During alkali development, development of the resist film and removal of the protective coating can be simultaneously achieved.
摘要翻译：包含具有式（1）的重复单元的聚合物，其中R 1和R 2均为氢或C 1 -C 12烷基，亚烷基或R 1和R 2可以键合在一起形成环，并且R 30是氢或甲基以配制抗蚀剂保护涂层材料。在抗蚀剂膜上形成的保护涂层是水不溶性的，可溶于碱性水溶液或碱性显影剂中，与抗蚀剂膜不混溶，使浸渍光刻可以以令人满意的方式进行。在碱显影过程中，可以同时实现抗蚀剂膜的开发和保护涂层的去除。

76. 发明授权

US07232641B2 Polymerizable compound, polymer, positive-resist composition, and patterning process using the same 有权
标题翻译：可聚合化合物，聚合物，正性抗蚀剂组合物和使用其的图案化工艺
公开(公告)号：US07232641B2
公开(公告)日：2007-06-19
申请号：US10953334
申请日：2004-09-30
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai
IPC分类号： G03F7/039 , G03F7/38
CPC分类号： G03F7/0046 , C07C69/54 , C07C2602/42 , C08F220/18 , C08F220/28 , G03F7/0397
摘要： The present invention provides a polymer which has at least one or more of a repeating unit represented by a following general formula (1a), a repeating unit represented by a following general formula (2a) and a repeating unit represented by a following general formula (3b), and a repeating unit represented by a following general formula (1c), and a positive resist composition which contains as a base resin the polymer. Thereby, there can be provided a positive-resist composition having high sensitivity and high resolution in exposure with a high energy beam, wherein line edge roughness is small since swelling at the time of development is suppressed, and the residue after development is few
摘要翻译：本发明提供一种聚合物，其具有以下通式（1a）表示的重复单元，下述通式（2a）表示的重复单元和下述通式（ 3b）和由以下通式（1c）表示的重复单元和含有聚合物作为基础树脂的正性抗蚀剂组合物。由此，可以提供一种在高能量照射下具有高灵敏度和高分辨率的正光刻胶组合物，其中线边缘粗糙度小，因为显影时的膨胀被抑制，显影后的残留物很少

77. 发明申请

US20070122736A1 RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD 审中-公开
标题翻译：耐腐蚀膜材料和图案形成方法
公开(公告)号：US20070122736A1
公开(公告)日：2007-05-31
申请号：US11550204
申请日：2006-10-17
申请人： Jun Hatakeyama , Yuji Harada , Takeru Watanabe
发明人： Jun Hatakeyama , Yuji Harada , Takeru Watanabe
IPC分类号： G03C1/00
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041
摘要： The invention is a protective film material for immersion lithography that enables desirable immersion lithography, can be removed simultaneously with development of a photoresist layer, and has excellent process adaptability. The invention also includes a method for forming a pattern using the material. More specifically, the invention is a protective film material comprising (i) a blend of a polymer comprising a repeating unit having a fluorine-containing alkyl or alkylene group which contains at least one fluorine atom and an optional alkali soluble repeating unit and a polymer comprising a repeating unit having a fluorine-free alkyl group and an optional alkali soluble repeating unit, or (ii) a polymer comprising a repeating unit having a fluorine-containing alkyl or alkylene group which contains at least one fluorine atom and a repeating unit having a fluorine-free alkyl group and an optional alkali-soluble repeating unit.
摘要翻译：本发明是用于浸没式光刻的保护膜材料，其能够进行希望的浸渍光刻，可以与光致抗蚀剂层的显影同时除去，并且具有优异的工艺适应性。本发明还包括使用该材料形成图案的方法。更具体地说，本发明是一种保护膜材料，其包含（i）包含具有含有至少一个氟原子的含氟烷基或亚烷基的重复单元和任选的碱可溶重复单元的聚合物的共混物和包含具有无氟烷基和任选的碱可溶重复单元的重复单元，或（ii）含有含有至少一个氟原子的含氟烷基或亚烷基的重复单元的聚合物和具有至少一个氟原子的重复单元无氟烷基和任选的碱溶性重复单元。

78. 发明授权

US07169869B2 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07169869B2
公开(公告)日：2007-01-30
申请号：US11179606
申请日：2005-07-13
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
IPC分类号： C08F12/30
CPC分类号： C08F28/02 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.
摘要翻译：包含具有氟化亲水基团的乙烯基磺酸酯单元作为基础树脂的聚合物的抗蚀剂组合物具有优异的透明性，底物粘合性和显影剂渗透性以及耐等离子体耐蚀刻性，并且适用于光刻微处理。

79. 发明申请

US20070003867A1 Resist protective coating material and patterning process 有权
标题翻译：抵抗保护涂料和图案化过程
公开(公告)号：US20070003867A1
公开(公告)日：2007-01-04
申请号：US11451498
申请日：2006-06-13
申请人： Jun Hatakeyama , Takeru Watanabe , Yuji Harada
发明人： Jun Hatakeyama , Takeru Watanabe , Yuji Harada
IPC分类号： G03C1/00
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041
摘要： A resist protective coating material is provided comprising a polymer having a partial structure of formula (1) wherein R0 is H, F, alkyl or alkylene, and R1 is fluorinated alkyl or alkylene. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography. During alkali development, development of the resist film and removal of the protective coating can be simultaneously achieved.
摘要翻译：提供抗蚀剂保护涂层材料，其包含具有式（1）的部分结构的聚合物，其中R 0是H，F，烷基或亚烷基，R 1是氟化的烷基或亚烷基。在图案形成过程中，材料在抗蚀剂膜上形成保护性涂层，其是不溶于水的，可溶于碱性显影剂中并且与抗蚀剂膜不混溶，从而有效地实施浸渍光刻。在碱显影过程中，可以同时实现抗蚀剂膜的开发和保护涂层的去除。

80. 发明授权

US07067231B2 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07067231B2
公开(公告)日：2006-06-27
申请号：US10968971
申请日：2004-10-21
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0046 , C08F220/24 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A polymer comprising recurring units having a partial structure of formula (1) wherein R1 is a single bond or alkylene or fluoroalkylene, R2 and R3 are H or alkyl or fluoroalkyl, at least one of R2 and R3 contains at least one fluorine atom is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance
摘要翻译：包含具有式（1）的部分结构的重复单元的聚合物，其中R 1是单键或亚烷基或氟代亚烷基，R 2和R 3， SUP>是H或烷基或氟代烷基，R 2和R 3中的至少一个含有至少一个氟原子用作基础树脂以配制抗蚀剂组合物，其中具有波长高达200nm的辐射的高透明度，底物粘附性，显影剂亲和性和耐干蚀刻性的优点

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