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71. 发明授权

US08811712B2 Defect inspection method and device thereof 有权
标题翻译：缺陷检查方法及其装置
公开(公告)号：US08811712B2
公开(公告)日：2014-08-19
申请号：US13141375
申请日：2009-10-22
申请人： Shunji Maeda , Kaoru Sakai , Hidetoshi Nishiyama
发明人： Shunji Maeda , Kaoru Sakai , Hidetoshi Nishiyama
IPC分类号： G06K9/00
CPC分类号： H01L22/20 , G01N21/95623 , G06T7/001 , G06T2207/30148 , H01L22/12
摘要： The invention provides a defect inspection method and a defect inspection device which enable a defect to be inspected regardless of optical conditions. The invention comprises the steps of setting a target local region and a plurality of corresponding local regions in the image signals, the target local region including a target pixel and an area surrounding the target pixel, the corresponding local regions including pixels corresponding to the target pixel and areas surrounding the corresponding pixels; searching similarities between the image signal of the target local region and the image signals of the plurality of corresponding local regions; determining a plurality of image signals that represent corresponding local regions and are similar to the image signal of the target local region; and comparing the image signal of the target local region with the image signals that represent the corresponding local regions.
摘要翻译：本发明提供一种缺陷检查方法和缺陷检查装置，其能够在不考虑光学条件的情况下检查缺陷。本发明包括以下步骤：在图像信号中设置目标局部区域和多个对应的局部区域，目标局部区域包括目标像素和围绕目标像素的区域，对应的局部区域包括与目标像素对应的像素和相应像素周围的区域; 搜索所述目标局部区域的图像信号与所述多个对应的局部区域的图像信号之间的相似度; 确定表示对应的局部区域并且与目标局部区域的图像信号相似的多个图像信号; 并将目标局部区域的图像信号与表示对应的局部区域的图像信号进行比较。

72. 发明授权

US08410460B2 Pattern defect inspection method and its apparatus 失效
标题翻译：图案缺陷检查方法及其装置
公开(公告)号：US08410460B2
公开(公告)日：2013-04-02
申请号：US11785432
申请日：2007-04-17
申请人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama , Masahiro Watanabe
发明人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama , Masahiro Watanabe
IPC分类号： G01J3/10
CPC分类号： G01N21/8806 , G01N21/956
摘要： The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.
摘要翻译：本发明的图案缺陷检查装置及其方法包括：配方设定单元，用于设定检查食谱和/或检查食谱; 一种照明光学系统，包括：用于发射紫外线激光的激光源; 光量调节单元，用于调节从激光光源发射的紫外激光的量; 以及照明范围形成单元，用于在样品上形成紫外激光的照明范围; 一致性降低系统; 以及检测光学系统，包括：聚光光学系统; 衍射光控制光学系统; 和检测单元。

73. 发明申请

US20120312104A1 METHOD OF INSPECTING A SEMICONDUCTOR DEVICE AND AN APPARATUS THEREOF 有权
标题翻译：检查半导体器件的方法及其装置
公开(公告)号：US20120312104A1
公开(公告)日：2012-12-13
申请号：US13593171
申请日：2012-08-23
申请人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
发明人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
IPC分类号： G01N21/88
CPC分类号： G06T7/001 , G01N21/8851 , G01N21/9501 , G01N2021/8861 , G01N2021/8867 , G06T7/97 , G06T2207/10152 , G06T2207/30148
摘要： A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
摘要翻译：在多个检查条件下对样本进行检查的检查方法和装置以及在多个检查条件下检查样本而获得的检查数据和对应于检查日期样本的位置信息具有相应的检查条件。多个检查条件中的每一个的检查数据通过使用关于样本的位置信息彼此相对来确定待检查的位置，并且在待检查位置处的样本的图像是详细的获得。对所获得的图像进行分类，确定通过使用图像分类信息的样本的检查条件。

74. 发明申请

US20110284745A1 Sample Holder, Inspection Apparatus, and Inspection Method 审中-公开
标题翻译：样品持有人，检验仪器和检验方法
公开(公告)号：US20110284745A1
公开(公告)日：2011-11-24
申请号：US13099544
申请日：2011-05-03
申请人： Hidetoshi Nishiyama , Nobuo Saotome , Mitsuo Suga
发明人： Hidetoshi Nishiyama , Nobuo Saotome , Mitsuo Suga
IPC分类号： G01N23/22 , G01N23/00 , G21K5/08
CPC分类号： H01J37/20 , G01N23/2204 , H01J2237/2003 , H01J2237/2004
摘要： A sample holder, inspection apparatus, and an inspection method using the sample holder having a film including a first surface and a second surface. A liquid sample may be held on the first surface. The film is made of two or more layers. A primary beam irradiation device is installed in a reduced-pressure space. Consequently, the sample can be observed or inspected while maintaining the sample at the atmospheric pressure.
摘要翻译：使用具有包括第一表面和第二表面的膜的样品保持器的样品保持器，检查装置和检查方法。液体样品可以保持在第一表面上。该片由两层或多层制成。主光束照射装置安装在减压空间中。因此，可以在将样品保持在大气压力的同时观察或检查样品。

75. 发明授权

US07923700B2 Sample inspection apparatus, sample inspection method and sample inspection system 有权
标题翻译：样品检验仪器，样品检验方法和样品检测系统
公开(公告)号：US07923700B2
公开(公告)日：2011-04-12
申请号：US11960267
申请日：2007-12-19
申请人： Hidetoshi Nishiyama
发明人： Hidetoshi Nishiyama
IPC分类号： H01J37/20
CPC分类号： G01N23/2251 , H01J37/20 , H01J37/228 , H01J37/256 , H01J37/28 , H01J2237/206 , H01J2237/208 , H01J2237/2608 , H01J2237/2808
摘要： Sample inspection apparatus, sample inspection method, and sample inspection system are offered which can give a stimulus to a sample held on a film when the sample is inspected by irradiating it with a primary beam (e.g., an electron beam or other charged-particle beam) via the film. The apparatus has the film, a vacuum chamber, primary beam irradiation column, signal detector, and a controller for controlling the operations of the beam irradiation column and signal detector. The sample is held on a first surface of the film opened to permit access to the film. The vacuum chamber reduces the pressure of the ambient in contact with a second surface of the film. The irradiation column irradiates the sample with the primary beam via the film from the second surface side. The detector detects a secondary signal produced from the sample in response to the irradiation.
摘要翻译：提供样品检查装置，样品检查方法和样品检查系统，其可以通过用初级束（例如电子束或其他带电粒子束）照射样品来检查样品时对保持在膜上的样品的刺激）通过电影。该装置具有膜，真空室，主光束照射柱，信号检测器和用于控制光束照射柱和信号检测器的操作的控制器。样品被保持在薄膜的第一表面上，以允许接近薄膜。真空室减小与膜的第二表面接触的环境的压力。照射列从第二表面侧通过膜从主光束照射样品。检测器响应于照射而检测从样品产生的二次信号。

76. 发明申请

US20100053319A1 Method and apparatus for pattern inspection 有权
标题翻译：图案检查方法和装置
公开(公告)号：US20100053319A1
公开(公告)日：2010-03-04
申请号：US12591179
申请日：2009-11-12
申请人： Kaoru Sakai , Shunji Maeda , Hidetoshi Nishiyama
发明人： Kaoru Sakai , Shunji Maeda , Hidetoshi Nishiyama
IPC分类号： G06K9/00 , H04N7/18
CPC分类号： G06T7/001 , G06T2207/30148
摘要： According to the present invention, for a pattern inspection apparatus that compares images in corresponding areas of two patterns that are identical and that determines an unmatched portion between the images is a defect, a plurality of detection systems and a plurality of corresponding image comparison methods are provided. With this configuration, the affect of uneven brightnesses for a pattern that occurs due to differences in film thicknesses can be reduced, a highly sensitive pattern inspection can be performed, a variety of defects can be revealed, and the pattern inspection apparatus can be applied for processing performed within a wide range. Furthermore, the pattern inspection apparatus also includes a unit for converting the tone of image signals of comparison images for a plurality of different processing units, and when a difference in brightness occurs in the same pattern of the images, a defect can be correctly detected.
摘要翻译：根据本发明，对于对相同的两个图案的相应区域中的图像进行比较并且确定图像之间的不匹配部分的图像的图案检查装置是缺陷，多个检测系统和多个对应的图像比较方法是提供。利用这种结构，可以降低由于膜厚度差异而产生的图案的不均匀亮度的影响，可以进行高灵敏度图案检查，可以显示各种缺陷，并且图案检查装置可以应用于在广泛的范围内进行处理。此外，图案检查装置还包括用于转换多个不同处理单元的比较图像的图像信号的色调的单元，并且当在相同图案中出现亮度差时，可以正确地检测缺陷。

77. 发明申请

US20090166536A1 Sample Holder, Method for Observation and Inspection, and Apparatus for Observation and Inspection 有权
标题翻译：样本持有人，观察和检查方法，观察和检查装置
公开(公告)号：US20090166536A1
公开(公告)日：2009-07-02
申请号：US12342897
申请日：2008-12-23
申请人： Mitsuo Suga , Hidetoshi Nishiyama
发明人： Mitsuo Suga , Hidetoshi Nishiyama
IPC分类号： G01N23/02 , G01N21/01
CPC分类号： H01J37/20 , H01J37/26 , H01J2237/2004 , H01J2237/2005 , H01J2237/201 , H01J2237/204 , H01J2237/206 , H01J2237/262 , H01J2237/28
摘要： A sample holder used in SEM (scanning electron microscopy) or TEM (transmission electron microscopy) permitting observation and inspection at higher resolution. The holder has a frame-like member provided with an opening that is covered with a film. The film has a first surface on which a sample is held. The thickness D of the film and the length L of the portion of the film providing a cover over the opening in the frame-like member satisfy a relationship given by L/D
摘要翻译：用于SEM（扫描电子显微镜）或TEM（透射电子显微镜）中的样品架，允许以更高分辨率观察和检查。保持器具有设置有被膜覆盖的开口的框架状构件。该膜具有保持样品的第一表面。膜的厚度D和在框状构件的开口上设置盖的膜的部分的长度L满足由L / D <200,000给出的关系。

78. 发明授权

US07463350B2 Method and apparatus for detecting defects of a sample using a dark field signal and a bright field signal 失效
标题翻译：使用暗场信号和亮场信号来检测样本的缺陷的方法和装置
公开(公告)号：US07463350B2
公开(公告)日：2008-12-09
申请号：US10981721
申请日：2004-11-05
申请人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
发明人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/00
CPC分类号： G01N21/95684
摘要： Disclosed is a method and apparatus for inspecting defects of patterns of a sample at high speed and with high sensitivity while damage of the sample arising from high-power pulsed light is reduced. Light emitted from a pulsed laser light source is transmitted through a pseudo continuous-wave forming optical system having an optical system capable of reducing energy per pulse and yet maintaining the entire amount of light of the pulsed light, a beam formation optical system, and a coherence reduction optical system, and a beam deflected by a deformation illumination optical system is made to reflect on a PBS to be irradiated on a wafer. The apparatus is configured so that the diffracted light from the wafer is focused by an objective lens, transmitted through light modulation units, focused to form a plurality of images on a plurality of image sensors in a visual-field divided parallel detection unit 12, and then defects are detected by a signal processing unit.
摘要翻译：公开了一种用于在高功率脉冲光下产生的样品损坏的情况下高速且高灵敏度地检查样品的图案的缺陷的方法和装置。从脉冲激光光源发出的光通过伪连续波形成光学系统传输，该光学系统具有能够减少每脉冲能量并且仍保持脉冲光的光量，光束形成光学系统和相干降低光学系统和由变形照明光学系统偏转的光束在PBS上反射以照射在晶片上。该装置被配置为使得来自晶片的衍射光被物镜聚焦，透镜通过光调制单元被聚焦以在视野分割并行检测单元12中的多个图像传感器上形成多个图像，以及那么由信号处理单元检测到缺陷。

79. 发明授权

US07411207B2 Method and its apparatus for inspecting particles or defects of a semiconductor device 有权
标题翻译：用于检查半导体器件的颗粒或缺陷的方法及其装置
公开(公告)号：US07411207B2
公开(公告)日：2008-08-12
申请号：US11782760
申请日：2007-07-25
申请人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
发明人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
IPC分类号： G01N21/88
CPC分类号： G01N21/274 , G01N21/47 , G01N21/4738 , G01N21/8806 , G01N21/94 , G01N21/95 , G01N21/956 , G01N2021/8854
摘要： An apparatus for inspecting particles and/or pattern defects of an object under inspection. Data processing means obtains information on size of the particles and/or the pattern defects from an intensity of the scattered light detected by the light detecting means by referring to a relationship between an intensity of scattered light from a standard particle and a size of the standard particle, and using a calibration coefficient for compensating for a change in intensity of the light of the illuminating means from a predetermined intensity.
摘要翻译：一种用于检查被检查物体的颗粒和/或图案缺陷的装置。数据处理装置通过参考来自标准粒子的散射光的强度与标准尺寸之间的关系，从光检测装置检测到的散射光的强度获得关于颗粒尺寸和/或图案缺陷的信息并且使用用于从预定强度补偿照明装置的光的强度变化的校准系数。

80. 发明授权

US07400393B2 Method and apparatus for detecting defects in a specimen utilizing information concerning the specimen 有权
标题翻译：用于利用关于样本的信息来检测样本中的缺陷的方法和装置
公开(公告)号：US07400393B2
公开(公告)日：2008-07-15
申请号：US11478617
申请日：2006-07-03
申请人： Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
发明人： Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/95607 , G01N2021/8822
摘要： This invention provides a defect inspection method and apparatus that can easily and quickly determine, from among a plurality of inspection conditions, a condition that allows for an inspection with high sensitivity. The inspection apparatus has a variety of optical functions to cover a variety of kinds of defects to be inspected (shape, material, nearby pattern, etc.). For each optical function, grayscale depths of defects that the operator wants detected and of pseudo defects that he or she wants undetected are accumulated for future use, so that conditions conducive to a higher sensitivity and a lower pseudo defect detection rate can be selected efficiently. Conditions that can be selected for optical systems include a bright-field illumination, a dark-field illumination and a bright-/dark-field composite illumination, illumination wavelength bands, polarization filters and spatial filters.
摘要翻译：本发明提供一种能够从多个检查条件中容易且快速地确定能够以高灵敏度进行检查的条件的缺陷检查方法和装置。检查装置具有各种光学功能，可以覆盖要检查的各种缺陷（形状，材料，附近图案等）。对于每个光学功能，操作者想要检测到的缺陷的灰度深度和他或她想要未检测到的伪缺陷被累积以供将来使用，使得可以有效地选择有利于更高灵敏度和更低伪缺陷检测率的条件。可以选择用于光学系统的条件包括亮场照明，暗场照明和亮/暗场复合照明，照明波长带，偏振滤光器和空间滤光器。

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