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71. 发明专利

JPH05159239A THIN-FILM MAGNETIC HEAD SLIDER AND PRODUCTION THEREOF 失效
公开(公告)号：JPH05159239A
公开(公告)日：1993-06-25
申请号：JP32284991
申请日：1991-12-06
申请人： HITACHI LTD
发明人： SONOBE HIDEKI , AZUMA KAZUFUMI , TAKEMOTO KAZUNARI , NATE KAZUO , MIZUSHIMA AKIKO , ISHIZAKI HIROSHI
IPC分类号： G11B5/31 , G11B5/60
摘要： PURPOSE:To provide protective patterns on an element surface in order to avert the incoming of high-energy particles at the time of dry etching to the element surface at the time of working the head slider using a dry etching process, such as ion etching or sputter etching. CONSTITUTION:The structure to suppress the incoming of the high-energy particles at the time of working rails by forming the protective patterns 11 near the terminal parts 9 of the element surface and on the element side is adopted at the time of etching the thin-film magnetic head slider by the ion etching method or sputter etching method.

72. 发明专利

JPH04187786A PATTERN FORMING METHOD AND THIN-FILM MAGNETIC HEAD FORMED BY THE METHOD 失效
公开(公告)号：JPH04187786A
公开(公告)日：1992-07-06
申请号：JP31404390
申请日：1990-11-21
申请人： HITACHI LTD
发明人： TAKEMOTO KAZUNARI , AMATATSU ATSUSHI , KITO MAKOTO
IPC分类号： C08J7/00 , C23F1/00 , C23F4/00 , G11B5/31
摘要： PURPOSE:To pattern a stepped face to be worked with high precision by forming a uniform and thick resist pattern on a substrate with the face stepped by vapor-deposition polymerization. CONSTITUTION:A resist pattern 1 is formed on a substrate with the face to be worked highly stepped, and a material 2 to be worked at the part free of the resist 1 is removed by dry etching (consisting essentially of physical sputtering). The resist 1 is formed by vapor-deposition polymerization in this method and patterned. The high, low and inclined parts of the step on the substrate are coated with the resist thin film in uniform thickness. The stepped face is patterned in this way with improved precision.

73. 发明专利

JPH03277786A PATTERN FORMING METHOD AND THIN-FILM MAGNETIC HEAD FORMED BY USING THIS METHOD 失效
公开(公告)号：JPH03277786A
公开(公告)日：1991-12-09
申请号：JP7686990
申请日：1990-03-28
申请人： HITACHI LTD
发明人： TAKEMOTO KAZUNARI , AMATATSU ATSUSHI , KITO MAKOTO
IPC分类号： C23C14/12 , C23C14/04 , C23F4/00 , G11B5/31
摘要： PURPOSE:To uniformize the thickness of the resist film within a surface to be processed and to form high-accuracy patterns by forming a resist on a substrate having a large difference in height within the surface to be processed by a vapor deposition polymn. method and subjecting the resist to dry etching after exposing and developing. CONSTITUTION:The vapor deposited and polymerized film 1 having photosensitiveness is formed as the resist on the thin film 2 to be processed on the substrate having the large difference in height. This vapor deposited and polymerized film 1 is formed by bringing a monomer introduced in a vapor state in a vacuum chamber into a polymn. reaction on the substrate and is formed to a uniform thickness in the tall, low and sloped parts of stepped parts. Desired patterns are baked to this vapor deposited and polymerized film 1 and are developed after exposing, by which the resist patterns are formed. The resist patterns are transferred onto the thin film 2 to be processed by the dry process etching essentially consisting of a physical sputtering method, such as ion milling. The high-accuracy patterns are formed in this way. The thin-film magnetic head having the good sectional shape obtd. by patterning the magnetic material of track parts is obtd. by using the above-mentioned pattern forming method.

74. 发明专利

JPH03179057A METHOD FOR FORMING PATTERN 失效
公开(公告)号：JPH03179057A
公开(公告)日：1991-08-05
申请号：JP29534590
申请日：1990-11-02
申请人： HITACHI LTD , HITACHI CHEMICAL CO LTD
发明人： KATAOKA FUMIO , SHOJI FUSAJI , OBARA ISAO , TAKEMOTO KAZUNARI , YOKONO ATARU , ISOGAI TOKIO , KOJIMA MITSUMASA
IPC分类号： G03F7/008 , C08G73/10 , C08K5/17 , C08K5/28 , C08L79/08 , H05K3/00
摘要： PURPOSE:To provide a pattern excellent in the heat resistance and mechanical properties by applying a soln. of a compsn. comprising a specific polymer, a specific arom. bisazide compd., and a specific amine to a substrate, drying the applied soln. to form a film, and specifically treating the film to form a polyimide pattern. CONSTITUTION:A soln. of a compsn. comprising 100 pts.wt. polymer mainly consisting of repeating units of formula I (wherein R is a tri- or tetravalent org. group; R is a divalent org. group; and n is 1 or 2), 0.1-100 pts.wt. arom. bisazide compd. of formula II [Wherein X is -OH, -OR , -R , -OH, SiR, -COOH, -COOR , -NR, or -NH2 (wherein R is lower alkyl; and R is alkylene); and m is 0 or 1], and 1-400 pts.wt. amine of formula III (wherein R to R are each H, lower alkyl, phenyl, or vinyl; and R is R ) is applied to a substrate and dried to form a film. The film is exposed to a mercury lamp through a photomask having a desired pattern, developed, and thermally treated to form a polyimide pattern.

75. 发明专利

JPH01263954A OPTICAL SYSTEM INFORMATION RECORDING MEDIUM AND ITS MANUFACTURE 失效
公开(公告)号：JPH01263954A
公开(公告)日：1989-10-20
申请号：JP9130388
申请日：1988-04-15
申请人： HITACHI LTD
发明人： TAKEMOTO KAZUNARI , AMATATSU ATSUSHI , KITO MAKOTO , KODERA YOSHIE
IPC分类号： B41M5/26 , G11B7/24 , G11B7/26
摘要： PURPOSE:To prevent a thin film layer from decomposing and deteriorating by forming the thin film layer on the surface of a synthetic resin substrate where a low temperature plasma processing is operated. CONSTITUTION:A thin film layer 2 such as a reflecting film, a recording film is formed on the surface of a synthetic resin substrate 1 where the low temperature plasma processing is operated. When the synthetic resin substrate 1 is exposed to a low temperature atmosphere, the surface is activated and made rough, and the adhesive property between the thin film layer 2 and the substrate 1 of the metallic thin film, etc., formed on the surface is enhanced. Thus, water does not enter between the synthetic resin substrate 1 and the thin film 2, the chemical reaction between the thin film layer 2 and the water is prevented, and aged deformation and deterioration are prevented.

76. 发明专利

JPH0125162B2 失效
公开(公告)号：JPH0125162B2
公开(公告)日：1989-05-16
申请号：JP5863083
申请日：1983-04-05
申请人： HITACHI LTD
发明人： TAKEMOTO KAZUNARI , MATSUYAMA HARUHIKO , SHOJI FUSAJI , YOKONO ATARU , KUWAZUKA SHUNICHIRO
IPC分类号： H01B3/30 , G11B5/127 , H05K3/28

77. 发明专利

JPS63317536A PLASMA-TREATMENT APPARATUS 失效
公开(公告)号：JPS63317536A
公开(公告)日：1988-12-26
申请号：JP15112787
申请日：1987-06-19
申请人： HITACHI LTD
发明人： TAKEMOTO KAZUNARI , AMATATSU ATSUSHI , KITO MAKOTO
IPC分类号： C08J7/00
摘要： PURPOSE:To provide a plasma-treatment apparatus capable of uniformly treating the whole surface of the treating object using a high-frequency power source as sole power source and composed of a bottom-closed cylindrical reaction chamber containing specific gas-inlet port and exhaust port each having specific shape. CONSTITUTION:A gas-inlet port which is a ground electrode having plural small holes is opened on the cylindrical inner wall of a bottom-closed cylindrical reaction chamber. A 1st cylindrical exhaust port having plural openings is placed at the center of the cylindrical reactor and a 2nd exhaust port is opened on the wall of the reactor to obtain the objective plasma-treatment apparatus.

78. 发明专利

JPS6253810B2 失效
公开(公告)号：JPS6253810B2
公开(公告)日：1987-11-12
申请号：JP14344078
申请日：1978-11-22
申请人： HITACHI LTD
发明人： SHOJI FUSAJI , WATANABE TAKESHI , SUDO RYOICHI , TAKEMOTO KAZUNARI , YOKONO ATARU
IPC分类号： G02F1/1337 , G02F1/133 , G09F9/00

79. 发明专利

JPS62247076A METHOD FOR COATING PLASTIC PIPE 失效
公开(公告)号：JPS62247076A
公开(公告)日：1987-10-28
申请号：JP8796186
申请日：1986-04-18
申请人： HITACHI LTD
发明人： TAKEMOTO KAZUNARI , KITO MAKOTO
IPC分类号： C08J7/00 , C08J7/04 , C23C16/50 , C23C16/54
摘要： PURPOSE:To uniformly coat the inside of a plastic pipe by plasma polymn. by introducing a polymerizable gas into the central part of the pipe in a direction parallel to the pipe and by causing electric discharge among electrodes for impressing high voltage and earthed electrodes arranged alternately along the pipe. CONSTITUTION:A PVC pipe 7 is placed in a reaction tube 1, the tube 1 is evacuated to a prescribed degree of vacuum and a polymerizable gas such as tetramethylsilane is introduced into the pipe 7 to regulate the degree of vacuum. A prescribed high frequency is then impressed among electrodes 5 for impressing high voltage and earthed electrodes 6 arranged alternately along the tube 1. Thus, the polymerizable gas is uniformly distributed and a uniform plasma discharge state is obtd., so the thickness distribution of a coating film can be uniformized.

80. 发明专利

JPS62108051A PIPING FOR ULTRA-PURE WATER 失效
公开(公告)号：JPS62108051A
公开(公告)日：1987-05-19
申请号：JP24703885
申请日：1985-11-06
申请人： HITACHI LTD
发明人： TAKEMOTO KAZUNARI , KITO MAKOTO
IPC分类号： B32B27/28 , B32B1/08 , C08G61/00 , C08G61/02 , F16L9/12

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