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    • 73. 发明申请
    • Piezoelectric vibrator and manufacturing method thereof
    • 压电振子及其制造方法
    • US20070209177A1
    • 2007-09-13
    • US11796443
    • 2007-04-27
    • Satoshi ShimizuMasaru Matsuyama
    • Satoshi ShimizuMasaru Matsuyama
    • H01L41/22H01L41/00
    • H03H9/1035H03H9/1021Y10T29/42Y10T29/49005
    • A small piezoelectric vibrator having low equivalent series resistance is realized. In the piezoelectric vibrator of the invention, a gettering substance for gettering inner gas is provided in a sealed space formed by a hermetic container where a piezoelectric vibrator piece is arranged. The gettering substance is formed on a surface of the piezoelectric vibrator piece or an inside wall of the hermetic container. A manufacturing process for the piezoelectric vibrator includes a process in which the gettering substance is provided inside the hermetic container which contains the piezoelectric vibrator piece inside the hermetic container, a process in which the hermetic container is hermetic-sealed so that the piezoelectric vibrator piece is sealed in the hermetic container, and a process in which the gettering substance is heated by a laser beam from outside to perform gettering of the inner gas of the hermetic container.
    • 实现了具有低等效串联电阻的小型压电振动器。 在本发明的压电振动器中,用于吸入内部气体的吸气物质设置在由设置有压电振动片的密封容器形成的密封空间中。 吸气物质形成在压电振动片的表面或密封容器的内壁上。 压电振动器的制造方法包括在气密容器内含有压电振动片的密封容器内部设置吸气物质的方法,将密封容器密封地密封,使得压电振动片为 密封在密封容器中,并且其中通过来自外部的激光束加热吸气物质以进行密封容器的内部气体的吸气的过程。
    • 76. 发明授权
    • Semiconductor device with dummy electrode
    • 具有虚拟电极的半导体器件
    • US07154132B2
    • 2006-12-26
    • US10716614
    • 2003-11-20
    • Satoshi Shimizu
    • Satoshi Shimizu
    • H01L29/76
    • H01L27/11521H01L21/76897H01L27/115H01L29/7881H01L2924/0002H01L2924/00
    • A semiconductor device includes a gate electrode having a straight portion, a dummy electrode located at a point on the extension of the straight portion, a stopper insulating film, a sidewall insulating film, an interlayer insulating film, and a linear contact portion extending, when viewed from above, parallel to the straight portion. The longer side of the rectangle defined by the linear contact portion is, when viewed from above, located beyond the sidewall insulating film and within the top region of the gate electrode and the dummy electrode. A gap G between the gate electrode and the dummy electrode appearing, when viewed from above, in the linear contact portion is filled with the sidewall insulating film such that the semiconductor substrate is not exposed.
    • 一种半导体器件包括:具有直线部分的栅极电极,位于直线部分延伸点上的虚拟电极,阻挡绝缘膜,侧壁绝缘膜,层间绝缘膜和延伸的线性接触部分 从上方观察,平行于直线部分。 当从上方观察时,由线性接触部分限定的矩形的长边位于侧壁绝缘膜之外并且位于栅电极和虚拟电极的顶部区域内。 当从上方观察时,在直线接触部分中出现的栅电极和虚拟电极之间的间隙G被填充有侧壁绝缘膜,使得半导体衬底不暴露。
    • 78. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20050275063A1
    • 2005-12-15
    • US10617667
    • 2003-07-14
    • Jun SuminoSatoshi Shimizu
    • Jun SuminoSatoshi Shimizu
    • H01L21/76H01L21/762H01L21/8247H01L27/115H01L29/788H01L29/792H01L29/00H01L21/336
    • H01L27/11521H01L21/76232H01L21/76235H01L27/115
    • A semiconductor device includes: a silicon substrate, having a main surface, in which trenches are formed; element isolation oxide films filling in trenches; a tunnel oxide film, formed on main surface located between element isolation oxide film and element isolation oxide film, having birds beak portions in birds beak forms that bring into contact with element isolation oxide film and element isolation oxide film, respectively; and a polysilicon film, formed on tunnel oxide film, having a thickness exceeding 0 and being less than 50 nm in an intermediate portion between element isolation oxide film and element isolation oxide film, and being thinner than the above thickness on birds beak portions. Thereby, it is possible to provide a semiconductor device wherein birds beaks are formed in the gate insulating film so as to have the desired dimensions and wherein the gate insulating film has excellent electrical characteristics.
    • 半导体器件包括:具有主表面的硅衬底,其中形成沟槽; 填充在沟槽中的元件隔离氧化膜; 形成在元件隔离氧化膜和元件隔离氧化膜之间的主表面上的隧道氧化膜,分别具有与元件隔离氧化膜和元件隔离氧化膜接触的鸟喙部分的鸟嘴部分; 以及在元件隔离氧化膜和元件隔离氧化膜之间的中间部分中,在隧道氧化膜上形成的厚度超过0且小于50nm的多晶硅膜,并且在鸟嘴部分上比上述厚度薄。 由此,可以提供一种半导体器件,其中在栅极绝缘膜中形成鸟喙以具有期望的尺寸,并且其中栅极绝缘膜具有优异的电气特性。
    • 80. 发明申请
    • Semiconductor integrated circuit having built-in PLL circuit
    • 具有内置PLL电路的半导体集成电路
    • US20050134391A1
    • 2005-06-23
    • US10739117
    • 2003-12-19
    • Yasuyuki KimuraSatoshi ShimizuMasakatsu YokotaKen SuyamaAleksander Dec
    • Yasuyuki KimuraSatoshi ShimizuMasakatsu YokotaKen SuyamaAleksander Dec
    • H03L7/093H03L7/00H03L7/087H03L7/089H03L7/107
    • H03L7/0893H03L7/087H03L7/0898H03L7/107H03L7/1072H03L7/1075
    • A semiconductor integrated circuit having a built-in PLL circuit which has two charge pump circuits for charging and discharging capacitive elements of a loop filter in response to signals generated by a phase comparator circuit. One of the two charge pump circuits has current sources which generate current values smaller than those generated by current sources of the other charge pump circuit. The loop filter has a first capacitive element connected to a charge/discharge node, and a second capacitive element connected to the charge/discharge node through a resistive element. The first capacitive element is charged and discharged by the one charge pump circuit, while the second capacitive element is charged and discharged by the other charge pump circuit. A charging current source of the one charge pump circuit operates simultaneously with a discharging current source of the other charge pump circuit, i.e., the charge pump circuits operate in opposite phase.
    • 一种具有内置PLL电路的半导体集成电路,其具有响应于由相位比较器电路产生的信号而具有用于对环路滤波器的电容元件进行充电和放电的两个电荷泵电路。 两个电荷泵电路中的一个具有产生比另一个电荷泵电路的电流源产生的电流值小的电流源的电流源。 环路滤波器具有连接到充电/放电节点的第一电容元件和通过电阻元件连接到充电/放电节点的第二电容元件。 第一电容元件由一个电荷泵电路充电和放电,而第二电容元件被另一个电荷泵电路充电和放电。 一个电荷泵电路的充电电流源与另一个电荷泵电路的放电电流源同时操作,即电荷泵电路以相反的相位工作。