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    • 76. 发明授权
    • Apparatus for mixing vaporized precursor and gas and method therefor
    • 用于混合蒸发的前体和气体的装置及其方法
    • US08840858B2
    • 2014-09-23
    • US13176804
    • 2011-07-06
    • Lewis A BernsteinDana Craig BookbinderJason A DillardJennifer L PorterBalram SumanPushkar Tandon
    • Lewis A BernsteinDana Craig BookbinderJason A DillardJennifer L PorterBalram SumanPushkar Tandon
    • C01B33/12C03B37/014
    • C01B33/183B01J12/00C03B37/01413C03B2207/42C03B2207/46
    • An apparatus for mixing a vaporized precursor with a gas for producing silica particles is provided. The apparatus includes a mixer housing, a precursor delivery chamber having an output in communication with the mixer housing for delivering a vaporized precursor in the mixer housing, and an oxidizing gas delivery chamber having an output in communication with the mixer housing for delivering an oxidizing gas to be mixed with the vaporized precursor. The apparatus further includes a flashback member disposed within the mixer housing and between the output of the precursor delivery chamber and the output of the oxidizing gas delivery chamber. The flashback member is located at a minimum distance from the output of the oxidizing gas delivery chamber defined by Lminimum (cm)=0.453 U (Re)−0.5567, wherein U is the flow rate in cm/sec of precursor and Re is the flow Reynolds number. The flashback member may include a tapered surface on at least one side to reduce recirculation of vaporized gas.
    • 提供了一种用于混合蒸发的前体与用于生产二氧化硅颗粒的气体的装置。 该装置包括混合器壳体,前体输送室,其具有与混合器壳体连通的输出,用于将混合器壳体内的蒸发前体输送;以及氧化气体输送室,具有与混合器壳体连通的输出,用于输送氧化气体 与蒸发的前体混合。 该装置还包括设置在混合器壳体内并且在前体输送室的输出和氧化气体输送室的输出之间的回火构件。 回闪构件位于距离最小(cm)= 0.453U(Re)-0.5567所限定的氧化气体输送室的输出的最小距离处,其中U是前体的流速(cm / sec),Re是流量 雷诺数。 闪回构件可以在至少一侧上包括锥形表面以减少气化气体的再循环。