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71. 发明专利

JP2004235113A Softer x ray generation tube 审中-公开
标题翻译： SOFTER X RAY生成管
公开(公告)号：JP2004235113A
公开(公告)日：2004-08-19
申请号：JP2003025247
申请日：2003-01-31
申请人： Tadahiro Omi , Takasago Thermal Eng Co Ltd , 忠弘大見 , 高砂熱学工業株式会社
发明人： OMI TADAHIRO , MORIMOTO AKITA , INABA HITOSHI
IPC分类号： G21K5/00 , G21K5/08 , H01J35/08 , H01J35/12 , H01J35/16 , H01J35/18
摘要： PROBLEM TO BE SOLVED: To provide a softer X-ray generation tube in which the life of a target is prolonged by improving the heat radiation efficiency of a target portion in the softer X-ray generation tube.
SOLUTION: In the softer X-ray generation tube 10 that generates X-rays by colliding emitted thermoelectrons with a target 4 and transmits the X-rays through an X-ray transmission aperture 5, a cooling mechanism is provided around the X-ray transmission aperture 5.
COPYRIGHT: (C)2004,JPO&NCIPI
摘要翻译：要解决的问题：通过提高较软的X射线发生管中的目标部分的散热效率，提供更长的X射线产生管，其中靶的寿命延长。解决方案：在通过使发射的热电子与目标4相撞而产生X射线的较软的X射线发生管10中，通过X射线透射孔5透射X射线，在X周围设置冷却机构版本：（C）2004，JPO＆NCIPI

72. 发明专利

JP2004228183A Microwave excitation gas laser equipment and exposure device 有权
标题翻译：微波激发气体激光设备和曝光装置
公开(公告)号：JP2004228183A
公开(公告)日：2004-08-12
申请号：JP2003011878
申请日：2003-01-21
申请人： Tadahiro Omi , 忠弘大見
发明人： OMI TADAHIRO , TAKEHISA KIWAMU , TAKAHASHI ICHIRO
IPC分类号： H01L21/027 , H01S3/03 , H01S3/0973
摘要： PROBLEM TO BE SOLVED: To provide microwave excitation ultraviolet laser equipment that enables continuous operation by providing a device for generating micro wave discharge in a fine and small volume in a laser gas. SOLUTION: The microwave excitation gas laser equipment is provided with a wave guide for propagating a micro wave; a gas circulation route for circulating the laser gas; and a chamber constituting part of the gas circulation route, introducing the micro wave from the wave guide and generating laser light. The micro wave excitation gas laser equipment is installed so as to extend a member consisting of a material transmitting the micro wave from the inside of a chamber side edge of the wave guide to the inside of the chamber. On the member, a taper part is provided on a first part extending to the inside of the edge of the wave guide to receive the microwave propagating the wave guide, and the microwave is discharged from a second part extending to the inside of the chamber to the inside of the chamber to excite the laser gas in the inside of the chamber. COPYRIGHT: (C)2004,JPO&NCIPI
摘要翻译：要解决的问题：提供通过提供在激光气体中以微细和小体积产生微波放电的装置来实现连续操作的微波激发紫外激光设备。
解决方案：微波激发气体激光设备设有用于传播微波的波导; 用于循环激光气体的气体循环路线; 以及构成气体循环路线的一部分的室，引入来自波导的微波并产生激光。微波激发气体激光设备被安装成将由波导管的腔室侧边缘的内部传递微波的材料延伸到腔室的内部。在构件上，在延伸到波导边缘的内部的第一部分上设置锥形部分，以接收传播波导的微波，并且微波从延伸到腔室内部的第二部分排出到腔室的内部激发室内的激光气体。版权所有（C）2004，JPO＆NCIPI

73. 发明专利

JP2004150541A Duct heating structure and duct heating heat insulating material 审中-公开
公开(公告)号：JP2004150541A
公开(公告)日：2004-05-27
申请号：JP2002316765
申请日：2002-10-30
申请人： Nichias Corp , Tadahiro Omi , Tokyo Electron Ltd , ニチアス株式会社 , 忠弘大見 , 東京エレクトロン株式会社
发明人： OMI TADAHIRO , SUENAGA OSAMU , MOTOYOSHI YOSHIYUKI , WADASAKO MITSUYUKI , OMURA TAKAHIRO , KOBAYASHI TSUTOMU
IPC分类号： F16L53/00
摘要： PROBLEM TO BE SOLVED: To provide a duct heating structure which reduces an influence to a peripheral unit such as precise equipment, etc.
SOLUTION: The duct heating structure heats a duct 10 covered with heat insulating materials 50, 50 by using a heater wire 23. In order to reduce a magnetic action of an electromagnetic field generated by energizing the heater wire 23, the heater wire 23b to be energized in a facing direction is approached to the heater wire 23a to be energized in one direction and is arranged on the surface of the duct 10.
COPYRIGHT: (C)2004,JPO

74. 发明专利

JP2003066864A Substrate having embedding structure and display device using the same and method of manufacturing the same 有权
标题翻译：具有嵌入结构的基板和使用其的显示装置及其制造方法
公开(公告)号：JP2003066864A
公开(公告)日：2003-03-05
申请号：JP2001255353
申请日：2001-08-24
申请人： Tadahiro Omi , Sharp Corp , シャープ株式会社 , 忠弘大見
发明人： KOBAYASHI KAZUKI , FUJINO MASAAKI , SAKONO IKUO , OMI TADAHIRO , SUGAWA SHIGETOSHI , MORIMOTO AKITA
IPC分类号： G02F1/1333 , C03C15/00 , G02F1/13 , G02F1/1335 , G02F1/1343 , G02F1/1362 , G02F1/1368 , G09F9/30 , H01L21/336 , H01L21/768 , H01L23/522 , H01L29/417 , H01L29/786
CPC分类号： G02F1/136286 , G02F1/136213 , H01L29/41733 , H01L29/78633
摘要： PROBLEM TO BE SOLVED: To provide a substrate having an embedding structure and a display device using the same and a method of manufacturing the same.
SOLUTION: This method includes a process step for preparing a glass substrate having a main surface, a process step of forming grooves by using a wet etching method on the main surface of the glass substrate and a process step of forming the embedding structure having a surface approximately flush with the main surface by depositing a first material within the grooves, in which the process step of forming the grooves is executed by using an etchant containing a hydrofluoric acid, ammonium fluoride, hydrochloric acid or oxalic acid.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供具有嵌入结构的基板和使用其的显示装置及其制造方法。解决方案：该方法包括用于制备具有主表面的玻璃基板的工艺步骤，在玻璃基板的主表面上使用湿蚀刻法形成凹槽的工艺步骤和形成具有表面的嵌入结构的工艺步骤通过在凹槽内沉积第一材料而与主表面大致平齐，其中通过使用含有氢氟酸，氟化铵，盐酸或草酸的蚀刻剂来进行形成凹槽的工艺步骤。

75. 发明专利

JP2003051493A Plasma processing apparatus 有权
标题翻译：等离子体加工设备
公开(公告)号：JP2003051493A
公开(公告)日：2003-02-21
申请号：JP2001237880
申请日：2001-08-06
申请人： Tadahiro Omi , Sharp Corp , シャープ株式会社 , 忠弘大見
发明人： TADERA TAKAMITSU , YAMAMOTO TATSUSHI , HIRAYAMA MASAKI , OMI TADAHIRO
IPC分类号： H05H1/46 , C23C16/511 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065
CPC分类号： H01J37/32211 , H01J37/32192 , H01J37/32266
摘要： PROBLEM TO BE SOLVED: To provide a plasma processing apparatus which can maintain the uniformity of plasma processing, even when the material of an object film to be processed on a large-area substrate or wafer is different or process conditions of processing of a laminated film formed of a plurality of materials change greatly.
SOLUTION: The plasma processing apparatus is equipped with a slot plate 4, which has a slot formation part for passing a microwave from a waveguide 3 to a microwave guide-in window 11 and a slot plate drive means which drives the slot plate 4 so that it can change its position about the microwave guide-in window 11; and then the slot plate 4 moves toward and away from the microwave guide-in window 11, and at least one of the position, the number, and the area of parts passing the microwaves at the slot formation part can be changed.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：为了提供能够保持等离子体处理的均匀性的等离子体处理装置，即使当在大面积基板或晶片上被处理的被处理物的材料不同或处理层叠膜的处理条件由多种材料形成的变化很大。解决方案：等离子体处理装置配备有槽板4，槽板4具有用于使微波从波导3传递到微波导入窗口11的槽形成部分和驱动狭槽板4的槽板驱动装置，它可以改变其关于微波导入窗口11的位置; 然后槽板4朝向和远离微波引入窗口11移动，并且可以改变通过槽形成部分处的微波的部件的位置，数量和面积中的至少一个。

76. 发明专利

JP2008235288A Device for plasma processing, and wave retardation plate 审中-公开
标题翻译：用于等离子体处理的装置和波浪延迟板
公开(公告)号：JP2008235288A
公开(公告)日：2008-10-02
申请号：JP2008144961
申请日：2008-06-02
申请人： Tadahiro Omi , Tokyo Electron Ltd , 忠弘大見 , 東京エレクトロン株式会社
发明人： OMI TADAHIRO , HIRAYAMA MASAKI , SUGAWA SHIGETOSHI , GOTO TETSUYA
IPC分类号： H05H1/46 , B01J19/08 , H01J37/32
CPC分类号： H01J37/32211 , H01J37/32192
摘要： PROBLEM TO BE SOLVED: To improve an intimate contact between a wave retardation plate and a slot plate constituting a microwave radiation surface so as to prevent an abnormal electric discharge in a microwave plasma processing apparatus that uses a radial line slot antenna. SOLUTION: A slot plate 16 is formed by a material having a thermal expansion rate close to the wave retardation plate 18. Alternatively, the slot plate 16 is formed by depositing a metal on a dielectric plate constituting the wave retardation plate 18. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了防止构成微波辐射面的波片延伸板和狭槽板之间的紧密接触，以防止使用径向线槽天线的微波等离子体处理装置中的异常放电。解决方案：槽板16由具有接近波长相对板18的热膨胀率的材料形成。或者，槽板16通过在构成波延迟板18的电介质板上沉积金属而形成。版权所有（C）2009，JPO＆INPIT

77. 发明专利

JP2007210033A Long life welding electrode and its welding head 有权
标题翻译：长寿命焊接电极及其焊接头
公开(公告)号：JP2007210033A
公开(公告)日：2007-08-23
申请号：JP2007124777
申请日：2007-05-09
申请人： Fujikin Inc , Tadahiro Omi , 忠弘大見 , 株式会社フジキン
发明人： OMI TADAHIRO , NITTA TAKEHISA , SHIRAI YASUYUKI , NAKAMURA OSAMU
IPC分类号： B23K35/02 , B23K9/29 , B23K35/04 , B23K35/32 , C22C27/04 , C22C32/00
摘要： PROBLEM TO BE SOLVED: To provide a fixing structure for a welding electrode and a welding head capable of enhancing the durability of the welding electrode, enhancing the work efficiency in welding, reducing the changing time, and executing the welding for a long time with high reliability.
SOLUTION: A fixed section 305 of a welding electrode 301 is inserted via a thermally conductive material 303 into an inserting section 304 of a fixing base 302 having the inserting section 304 for inserting the welding electrode 301. A peripheral surface of the fixed section 305 of the welding electrode 301 is uniformly contacted to the fixing base 302 to fix the welding electrode 301 to the fixing base 304.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供能够提高焊接电极的耐久性的焊接电极和焊接头的固定结构，提高焊接中的工作效率，减少变化时间和长时间执行焊接时间高可靠性。解决方案：焊接电极301的固定部分305通过导热材料303插入到具有用于插入焊接电极301的插入部分304的固定基座302的插入部分304中。固定的外部表面焊接电极301的部分305与固定基座302均匀接触，以将焊接电极301固定到固定基座304上。（C）2007，JPO＆INPIT

78. 发明专利

JP2007183672A Substrate having embedded structure and display device having the same 审中-公开
标题翻译：具有嵌入式结构的基板和具有该结构的显示装置
公开(公告)号：JP2007183672A
公开(公告)日：2007-07-19
申请号：JP2007070793
申请日：2007-03-19
申请人： Tadahiro Omi , Sharp Corp , シャープ株式会社 , 忠弘大見
发明人： KOBAYASHI KAZUKI , FUJINO MASAAKI , SAKONO IKUO , OMI TADAHIRO , SUGAWA SHIGETOSHI , MORIMOTO AKITA
IPC分类号： G09F9/30 , C03C15/00 , G02F1/1333 , G02F1/1368
摘要： PROBLEM TO BE SOLVED: To provide a substrate having an embedded structure, and to provide a display device that uses the substrate. SOLUTION: The substrate 100 having an embedded structure comprises a glass substrate 101, having a groove formed on the main surface, and an embedded structure 102 made of a first material deposited in the groove and having a surface substantially being flush with the main surface. The depth d and the radius of curvature r of a sidewall of the groove have the relation d≥r. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有嵌入结构的基板，并提供使用该基板的显示装置。解决方案：具有嵌入结构的基板100包括：玻璃基板101，其具有形成在主表面上的凹槽;以及嵌入结构102，其由沉积在凹槽中的第一材料制成，并且具有基本上与主表面。槽的侧壁的深度d和曲率半径r具有d≥r的关系。版权所有（C）2007，JPO＆INPIT

79. 发明专利

JP2005292340A Weather-resistant lens or prism 有权
标题翻译：耐候镜片或镜片
公开(公告)号：JP2005292340A
公开(公告)日：2005-10-20
申请号：JP2004105336
申请日：2004-03-31
申请人： Nippon Zeon Co Ltd , Tadahiro Omi , 忠弘大見 , 日本ゼオン株式会社
发明人： OMI TADAHIRO , TANAHASHI NAOKI , FUJII TOSHIHIRO
IPC分类号： G02B1/11 , C08J7/00 , G02B1/04
摘要： PROBLEM TO BE SOLVED: To provide a weather-resistant lens or prism having improved optical characteristics such as low reflectance and high transmittance for light as well as showing water repellency and a stain-proof effect.
SOLUTION: A lens or prism base material comprising an alicyclic structure-containing polymeric resin is heated in an inert gas atmosphere and left to stand in an atmosphere containing fluorine gas so as to bring the fluorine gas into contact with the surface of the lens or prism base material. Then the lens or prism base material is re-heated in an inert gas atmosphere to obtain the weather-resistant lens or prism having a phase of the alicyclic structure-containing polymeric resin having a higher fluorine atom content than in the inner layer region of the lens or prism onto the surface layer region of the lens or prism comprising the alicyclic structure-containing polymeric resin.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供具有改善的光学特性如抗反射率低和光透射率高的耐候性透镜或棱镜，以及具有防水性和防污效果。解决方案：将含有脂环结构的聚合物树脂的透镜或棱镜基材在惰性气体气氛中加热，在含氟气体的气氛中放置，使氟气与透镜或棱镜基材。然后将透镜或棱镜基材在惰性气体气氛中再加热，得到耐候性透镜或棱镜，该透镜或棱镜的含氟聚合物树脂的相位比氟原子含量高于在透镜或棱镜到包含含脂环结构的聚合物树脂的透镜或棱镜的表面层区域上。版权所有（C）2006，JPO＆NCIPI

80. 发明专利

JP2005288803A Mold or stamper made of resin 有权
标题翻译：树脂模具或压印机
公开(公告)号：JP2005288803A
公开(公告)日：2005-10-20
申请号：JP2004105255
申请日：2004-03-31
申请人： Nippon Zeon Co Ltd , Tadahiro Omi , 忠弘大見 , 日本ゼオン株式会社
发明人： OMI TADAHIRO , TANAHASHI NAOKI , TAKAHASHI HARUHIKO
IPC分类号： B29C33/38 , B29C45/26 , G11B7/26
CPC分类号： B29C33/38 , B29C45/2632
摘要： PROBLEM TO BE SOLVED: To provide a mold or stamper which has a high light transmittance, exhibits furthermore high mold releasing properties or water repellency, and has no problem on releasing of a laminated film or the like.
SOLUTION: The mold or stamper with a phase of an alicyclic structure-containing polymer resin containing higher fluorine atom content than that of the inner layer part of the mold or stamper on the surface layer part of the mold or stamper consisting of the alicyclic structure-containing polymer resin, is obtained by heating a base material of the mold or stamper consisting of the alicyclic structure-containing polymer resin in an inert gas atmosphere or under vacuum, bringing the surface of the base material of the mold or stamper into contact with fluorine gas by leaving the base material of the mold or stamper in a fluorine gas-containing atmosphere, and then, re-heating the base material of the mold or stamper in the inert gas atmosphere or under vacuum.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供具有高透光率的模具或压模，表现出更高的脱模性或防水性，并且层压膜等的释放没有问题。解决方案：含有比含有模具或压模的内层部分的氟原子含量高的含脂环结构的聚合物树脂的相的模具或压模在由模具或压模组成的模具或压模的表面层部分上含脂环结构的聚合物树脂通过在惰性气体气氛或真空中加热由含脂环式结构的聚合物树脂组成的模具或压模的基材，使模具或压模的基材的表面进入通过将模具或压模的基材留在含氟气体的气氛中与氟气接触，然后在惰性气体气氛中或在真空下再加热模具或压模的基材。版权所有（C）2006，JPO＆NCIPI

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