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    • 71. 发明申请
    • Optical sending apparatus and optical transmission system
    • 光发送装置和光传输系统
    • US20080037997A1
    • 2008-02-14
    • US11716581
    • 2007-03-12
    • Toru YamazakiHisaya Sakamoto
    • Toru YamazakiHisaya Sakamoto
    • H04B10/02
    • H04B10/505H04B10/25137H04B10/5167
    • The invention provides an optical sending apparatus which improves the characteristics near zero dispersion without sacrificing the characteristics at high dispersion in an optical duo binary scheme. The apparatus comprises an optical modulation sending unit, a driving signal processing unit, and a modulation operation switch-over unit for switching over the modulation operation so as to switch over the modulation waveform modulated in intensity in the optical modulation sending unit, in either a first modulation waveform in which the intensity of modulated light to the median value of the duo binary signal is minimum and the intensity of modulated light to other two values of the duo binary signal is maximum, and a second modulation waveform in which the intensity of modulated light to the median value of the duo binary signal is maximum and the intensity of modulated light to other two values of the duo binary signal is minimum.
    • 本发明提供了一种光学发送装置,其在零色散附近提高了特性,而不牺牲光学二进制方案中高色散下的特性。 该装置包括光调制发送单元,驱动信号处理单元和调制操作切换单元,用于切换调制操作,以切换在光调制发送单元中以强度调制的调制波形, 第一调制波形,其中调制光的强度与二进制二进制信号的中值最小,并且调制的光对二进制二进制信号的其他两个值的强度是最大的,以及第二调制波形,其中调制的 对于二进制二进制信号的中值的光是最大的,并且二进制二进制信号的其他两个值的调制光的强度是最小的。
    • 78. 发明授权
    • Semiconductor device having an improved trench isolation and method for
forming the same
    • 具有改进的沟槽隔离的半导体器件及其形成方法
    • US5966598A
    • 1999-10-12
    • US912066
    • 1997-08-15
    • Toru Yamazaki
    • Toru Yamazaki
    • H01L21/316H01L21/331H01L21/76H01L21/762H01L21/763H01L29/73H01L29/732H01L29/72
    • H01L21/76202H01L21/76235H01L21/763
    • The invention provides a trench isolation structure comprising a semiconductor region, a first insulation film formed on a top surface of the semiconductor region, a trench groove extending vertically from the first insulation film into the semiconductor region so that a bottom of the trench groove lies below an interface between the first insulation film and the semiconductor region, and an inter-layer insulator being formed which resides not only on the first insulation film but also within the trench groove so that the inter-layer insulator fills up the trench groove.The present invention still further provides a method for forming a trench isolation in a semiconductor region. The method comprises the following steps. A first insulation film is formed on a top surface of a semiconductor region. A trench groove is selectively formed which extends vertically from the first insulation film into the semiconductor region so that a bottom of the trench groove lies below an interface between the first insulation film and the semiconductor region. An inter-layer insulator is formed which resides not only on the first insulation film but also within the trench groove so that the inter-layer insulator fills up the trench groove. The trench groove is formed after the device is formed in the semiconductor region.
    • 本发明提供了一种沟槽隔离结构,其包括半导体区域,形成在半导体区域的顶表面上的第一绝缘膜,从第一绝缘膜垂直延伸到半导体区域中的沟槽,使沟槽的底部位于下方 第一绝缘膜和半导体区域之间的界面,以及形成的层间绝缘体,其不仅存在于第一绝缘膜上,而且驻留在沟槽内,使得层间绝缘体填充沟槽。 本发明还提供了一种在半导体区域中形成沟槽隔离的方法。 该方法包括以下步骤。 第一绝缘膜形成在半导体区域的顶表面上。 选择性地形成沟槽,其从第一绝缘膜垂直延伸到半导体区域中,使得沟槽槽的底部位于第一绝缘膜和半导体区域之间的界面之下。 形成层间绝缘体,其不仅驻留在第一绝缘膜上,而且驻留在沟槽内,使得层间绝缘体填满沟槽。 在半导体区域中形成器件之后形成沟槽。
    • 79. 发明授权
    • Polishing apparatus which causes a polishing tape to advance and rotate
    • 抛光装置使抛光带前进并旋转
    • US5951384A
    • 1999-09-14
    • US991138
    • 1997-12-16
    • Izuru MoriokaToru Yamazaki
    • Izuru MoriokaToru Yamazaki
    • B24B21/00B24B7/22B24B21/04B24B21/12
    • B24B7/228B24B21/04B24B21/12
    • A polishing apparatus has a spindle disposed rotatably through an opening of a base plate, a pair of side walls attached to the spindle, a compression roller attached rotatably to an end part of and between the side walls for compressing a polishing tape onto a target object, a tape-supplying roller and a take-up roller which are both attached rotatably between and to the side walls between the spindle and the compression roller, and a tape-running roller attached rotatably between and to the side walls for causing the polishing tape to travel. The axis of rotation of the compression roller intersects that of the spindle perpendicularly and both the tape-supplying and take-up rollers are parallel to the compression roller and their axes of rotation intersect that of the spindle such that the center of gravity of the apparatus is always on the axis of rotation of the spindle. The center part of the compression roller has a smaller diameter than the end parts which sandwich it so as to prevent the polishing tape from becoming twisted or wrinkled.
    • 抛光装置具有通过基板的开口可旋转地设置的心轴,连接到心轴的一对侧壁,可旋转地附接到侧壁之间和侧壁之间的压缩辊,用于将研磨带压缩到目标物体上 ,带式供给辊和卷取辊,它们都可转动地安装在主轴和压缩辊之间的侧壁之间,并且可旋转地附接到侧壁之间并且与侧壁相连接,以使抛光带 去旅行。 压缩辊的旋转轴垂直于主轴的旋转轴线,并且带供给辊和卷带辊平行于压缩辊并且其旋转轴线与主轴相交,使得装置的重心 始终在主轴的旋转轴上。 压缩辊的中心部分具有比夹着它的端部部分更小的直径,以防止抛光带扭曲或起皱。