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71. 发明授权

US07508291B2 Inductor element and integrated electronic component 有权
标题翻译：电感元件和集成电子元件
公开(公告)号：US07508291B2
公开(公告)日：2009-03-24
申请号：US11892451
申请日：2007-08-23
申请人： Tsuyoshi Matsumoto , Xiaoyu Mi , Yoshihiro Mizuno
发明人： Tsuyoshi Matsumoto , Xiaoyu Mi , Yoshihiro Mizuno
IPC分类号： H01F5/00
CPC分类号： H01F19/04 , H03H2001/0092
摘要： An inductor element and an integrated electronic component that facilitate achieving a higher Q value are provided. The inductor element includes a substrate, a coil unit spaced from the substrate, and a plurality of conductive columns. The coil unit includes a plurality of spiral coils each constituted of a spiral-shaped coil lead. The spiral coils are disposed such that their winding directions are the same, and that the coil lead of each spiral coil includes a portion extending between the coil lead of at least one of the other spiral coils. End portions of the spiral coils are fixed to the substrate via the conductive columns. The integrated electronic component of the invention includes such inductor element.
摘要翻译：提供了有助于实现更高Q值的电感元件和集成电子元件。电感器元件包括衬底，与衬底间隔开的线圈单元和多个导电柱。线圈单元包括由螺旋形线圈引线构成的多个螺旋线圈。螺旋线圈被布置成使得它们的缠绕方向相同，并且每个螺旋线圈的线圈引线包括在至少一个其它螺旋线圈的线圈引线之间延伸的部分。螺旋线圈的端部通过导电柱固定到基板。本发明的集成电子部件包括这种电感元件。

72. 发明申请

US20080075924A1 Method of making microstructure device, and microstructure device made by the same 有权
标题翻译：制造微结构器件的方法及其制造的微结构器件
公开(公告)号：US20080075924A1
公开(公告)日：2008-03-27
申请号：US11902011
申请日：2007-09-18
申请人： Norinao Kouma , Yoshihiro Mizuno , Hisao Okuda , Hiromitsu Soneda , Tsuyoshi Matsumoto , Osamu Tsuboi , Ippei Sawaki
发明人： Norinao Kouma , Yoshihiro Mizuno , Hisao Okuda , Hiromitsu Soneda , Tsuyoshi Matsumoto , Osamu Tsuboi , Ippei Sawaki
IPC分类号： B32B3/30 , H01B13/00
CPC分类号： B81C1/00682 , B81B2203/0136 , Y10T428/24025 , Y10T428/2457 , Y10T428/24612
摘要： A microstructure device is made by processing a material substrate consisting of e.g. a first process layer, a second process layer and a middle layer arranged between the first and the second process layers. The microstructure device includes a first structural part and a second structural part that has a portion facing the first structural part via a gap. The first and the second structural parts are connected to each other by a connecting part extending across the gap. This connecting part is formed in the first process layer to be in contact with the middle layer. The microstructure device also includes a protective part extending from the first structural part toward the second structural part or vice versa. The protective part is formed in the first or second process layer to be in contact with the middle layer.
摘要翻译：微结构装置是通过加工由例如玻璃，布置在第一和第二处理层之间的第一处理层，第二处理层和中间层。微结构装置包括第一结构部分和第二结构部分，其具有经由间隙面对第一结构部分的部分。第一和第二结构部件通过跨越间隙延伸的连接部分相互连接。该连接部形成在第一处理层中以与中间层接触。微结构装置还包括从第一结构部件朝向第二结构部件延伸的保护部件，反之亦然。保护部分形成在第一或第二处理层中以与中间层接触。

73. 发明申请

US20070281478A1 Plasma processing method and apparatus 失效
标题翻译：等离子体处理方法和装置
公开(公告)号：US20070281478A1
公开(公告)日：2007-12-06
申请号：US11502416
申请日：2006-08-11
申请人： Eiji Ikegami , Shoji Ikuhara , Takeshi Shimada , Kenichi Kuwabara , Takao Arase , Tsuyoshi Matsumoto
发明人： Eiji Ikegami , Shoji Ikuhara , Takeshi Shimada , Kenichi Kuwabara , Takao Arase , Tsuyoshi Matsumoto
IPC分类号： C23F1/00 , H01L21/302 , C23C16/00
CPC分类号： H01J37/32963 , H01J37/32082 , H01J37/32091 , H01J37/321 , H01J37/3211 , H01J37/32192 , H01J37/32917 , H01J37/32926 , H01J37/32935 , H01J37/32981 , H01J37/3299 , H01J2237/1825 , H01J2237/327 , H01L21/67069 , H01L21/67242 , H05H1/46
摘要： Plasma processing of plural substrates is performed in a plasma processing apparatus, which is provided with a plasma processing chamber having an antenna electrode and a lower electrode for placing and retaining the plural substrates in turn within the plasma processing chamber, a gas feeder for feeding processing gas into the processing chamber, a vacuum pump for discharging gas from the processing chamber via a vacuum valve, and a solenoid coil for forming a magnetic field within the processing chamber. At least one of the plural substrates is placed on the lower electrode, and the processing gas is fed into the processing chamber. RF power is fed to the antenna electrode via a matching network to produce a plasma within the processing chamber in which a magnetic field has been formed by the solenoid coil. This placing of at least one substrate and this feeding of the processing gas are then repeated until the plasma processing of all of the plural substrates is completed. An end of seasoning is determined when a parameter including an internal pressure of the processing chamber has become stable to a steady value with plasma processing time.
摘要翻译：在具有等离子体处理室的等离子体处理装置中进行多个基板的等离子体处理，该等离子体处理室具有用于在等离子体处理室内依次放置和保持多个基板的天线电极和下部电极，供给处理用气体供给装置气体进入处理室，用于经由真空阀从处理室排出气体的真空泵和用于在处理室内形成磁场的螺线管线圈。多个基板中的至少一个被放置在下电极上，并且处理气体被馈送到处理室中。 RF功率经由匹配网络馈送到天线电极，以在处理室内产生等离子体，其中已经由螺线管线圈形成了磁场。然后重复这种至少一个基板的放置和该处理气体的进料，直至完成所有多个基板的等离子体处理。当包括处理室的内部压力的参数在具有等离子体处理时间的稳定值变得稳定时，确定调味品的结束。

74. 发明申请

US20070158848A1 Electronic component 有权
标题翻译：电子元器件
公开(公告)号：US20070158848A1
公开(公告)日：2007-07-12
申请号：US11585877
申请日：2006-10-25
申请人： Tsuyoshi Matsumoto , Yoshihiro Mizuno , Xiaoyu Mi , Hisao Okuda , Satoshi Ueda
发明人： Tsuyoshi Matsumoto , Yoshihiro Mizuno , Xiaoyu Mi , Hisao Okuda , Satoshi Ueda
IPC分类号： H01L23/52 , H01L23/48 , H01L29/40
CPC分类号： H01G4/008 , H01G4/232 , H01G4/33 , H01L24/18 , H01L28/10 , H01L28/75
摘要： An electronic component includes a substrate, and a capacitor unit on the substrate. The capacitor unit has a laminate structure including a first electrode layer provided on the substrate, a second electrode layer opposed to the first electrode layer, and a dielectric layer disposed between the first and the second electrode layers. The first electrode layer has a multilayer structure including an adhesion metal layer joined to the dielectric layer. The adhesion metal layer is provided with an oxide coating on a side of the dielectric layer.
摘要翻译：电子部件包括基板和基板上的电容器单元。电容器单元具有包括设置在基板上的第一电极层，与第一电极层相对的第二电极层和设置在第一和第二电极层之间的电介质层的层压结构。第一电极层具有包含与电介质层接合的粘附金属层的多层结构。附着金属层在电介质层一侧设置有氧化物涂层。

75. 发明申请

US20070133911A1 Hydrodynamic bearing device, motor, recording disc driving apparatus and assembly jig 有权
标题翻译：流体动力轴承装置，电动机，记录盘驱动装置和装配夹具
公开(公告)号：US20070133911A1
公开(公告)日：2007-06-14
申请号：US11312579
申请日：2005-12-21
申请人： Youichi Nishimoto , Naoshi Kainoh , Tsuyoshi Matsumoto
发明人： Youichi Nishimoto , Naoshi Kainoh , Tsuyoshi Matsumoto
IPC分类号： F16C32/06
CPC分类号： F16C33/107 , F16C17/107 , F16C33/74 , F16C43/02 , F16C2370/12
摘要： Object: To prevent the lubricant that fills a bearing from leaking out, and prevent air bubbles from infiltrating the bearing, even if the open end of a bearing should be blocked off by a finger or the like in the course of assembling a hydrodynamic bearing device, etc. Means for Solution: A hydrodynamic bearing device 4 comprises a shaft 41, a second thrust flange 41c, a sleeve 42, a radial bearing 71, and a thrust bearing 73. The second thrust flange 41c is fixed near one end of the shaft 41. A third cylindrical protrusion 42e that protrudes farther in the axial direction than the second thrust flange is fixed to or integrally machined at one end of the sleeve 42. A notch 50 that communicates between a radial inner space and a radial outer space separated by the third cylindrical protrusion 42e is provided to the third cylindrical protrusion 42e.
摘要翻译：目的：为了防止填充轴承的润滑剂泄漏，并且防止气泡渗入轴承，即使在组装流体动力轴承装置的过程中轴承的开口端应被手指等堵塞解决方案：液力轴承装置4包括轴41，第二推力凸缘41c，套筒42，径向轴承71和止推轴承73。第二推力凸缘41c固定在轴41的一端附近。在轴向方向上比第二推力凸缘更远的第三圆柱形突起42e固定到套筒42的一端或整体加工。在径向内部空间和由第三圆柱形突起42e分隔的径向外部空间之间连通的凹口50设置到第三圆柱形突起42e。

76. 发明申请

US20070122992A1 Electronic component manufacturing method and electronic component 失效
标题翻译：电子元件制造方法和电子元器件
公开(公告)号：US20070122992A1
公开(公告)日：2007-05-31
申请号：US11595913
申请日：2006-11-13
申请人： Yoshihiro Mizuno , Xiaoyu Mi , Tsuyoshi Matsumoto , Hisao Okuda , Satoshi Ueda
发明人： Yoshihiro Mizuno , Xiaoyu Mi , Tsuyoshi Matsumoto , Hisao Okuda , Satoshi Ueda
IPC分类号： H01L27/108 , H01L21/20
CPC分类号： H05K1/162 , H01F17/0006 , H01L23/5223 , H01L23/5227 , H01L27/016 , H01L2924/0002 , H05K1/165 , H05K3/108 , H05K3/4644 , H05K3/4647 , H05K3/465 , H05K2201/09563 , H05K2201/09763 , H05K2201/09845 , H05K2203/0733 , H05K2203/1476 , H01L2924/00
摘要： The electronic component includes a base material, a capacitor unit, and a wiring portion. The capacitor unit has a stacked structure including a first electrode portion provided on the base material, a second electrode portion including a first surface opposing the first electrode portion and a second surface opposite to the first surface, and a dielectric portion interposed between the electrode portions. The wiring portion includes a via portion having a surface on the base material side, and joined to the second surface of the second electrode portion via the surface on the base material side. The surface of the via portion on the base material side includes an extending portion extending outward of the periphery of the second surface of the second electrode portion.
摘要翻译：电子部件包括基材，电容器单元和布线部。电容器单元具有包括设置在基材上的第一电极部分的层叠结构，包括与第一电极部分相对的第一表面和与第一表面相对的第二表面的第二电极部分和插入在电极部分之间的电介质部分。布线部包括在基材侧具有表面的通路部，经由基材侧的表面与第二电极部的第二面接合。基材侧的通孔部分的表面包括从第二电极部分的第二表面的周边向外延伸的延伸部分。

77. 发明申请

US20070047145A1 Magnetic head device having slider and magnetic function unit 失效
标题翻译：具有滑块和磁功能单元的磁头装置
公开(公告)号：US20070047145A1
公开(公告)日：2007-03-01
申请号：US11506020
申请日：2006-08-17
申请人： Tsuyoshi Matsumoto
发明人： Tsuyoshi Matsumoto
IPC分类号： G11B5/60
CPC分类号： G11B5/60
摘要： A magnetic head device is disclosed. The magnetic head device having a levitation attitude formed by an air stream on a surface thereof when a recording medium moves. A levitation height of a magnetic function unit can be stabilized even when air density of an operating environment is changed. In a middle region of a slider of a magnetic head device, a deep concave bottom portion is provided and a levitation pressure is not substantially generated. The levitation is exerted to a front positive pressure surface located in front of the middle region and a rear positive pressure surface located in the rear of the middle region.
摘要翻译：公开了一种磁头装置。磁头装置在记录介质移动时具有由表面上的气流形成的悬浮姿态。即使改变操作环境的空气密度，也可以使磁功能单元的悬浮高度稳定。在磁头装置的滑块的中间区域中，设置深凹底部，并且基本上不产生悬浮压力。悬浮被施加到位于中间区域前方的前正压表面和位于中间区域后部的后正压表面。

78. 发明申请

US20060256668A1 Magnetooptic head 审中-公开
标题翻译：磁光头
公开(公告)号：US20060256668A1
公开(公告)日：2006-11-16
申请号：US11413515
申请日：2006-04-28
申请人： Hiroyasu Yoshikawa , Tsuyoshi Matsumoto , Goroh Kawasaki , Nobuyuki Kanto
发明人： Hiroyasu Yoshikawa , Tsuyoshi Matsumoto , Goroh Kawasaki , Nobuyuki Kanto
IPC分类号： G11B11/00
CPC分类号： G11B11/10534 , G11B11/10554
摘要： A magnetooptic head includes a lens (11b) which forms a beam spot on a disc, a magnetic field generating coil (2) between the lens (11b) and the disc, and a magnetic layer (3) between the coil (2) and the lens (11b). The magnetic layer (3) is provided by a plurality of magnetic members (30) disposed radially of an optical axis of the lens (11b). The magnetic layer (3) and the lens (11b) are mediated by a thermal conduction layer (5), and the thermal conduction layer (5) is provided, integrally therewith, a thermal conduction section (50) which extends a space between mutually adjacent magnetic members (30) in the magnetic layer (3), for reception of heat.
摘要翻译：磁光头包括在光盘上形成光斑的透镜（11b），透镜（11b）和光盘之间的磁场产生线圈（2）和线圈（2）之间的磁性层（3））和透镜（11b）。磁性层（3）由设置在透镜（11b）的光轴径向的多个磁性部件（30）提供。磁性层（3）和透镜（11b）由导热层（5）介导，并且导热层（5）与其一体地设置有热传导部分（50），该导热部分在磁性层（3）中相互相邻的磁性构件（30），用于接收热量。

79. 发明申请

US20050230049A1 Method and apparatus for plasma processing 有权
标题翻译：等离子体处理方法和装置
公开(公告)号：US20050230049A1
公开(公告)日：2005-10-20
申请号：US10902032
申请日：2004-07-30
申请人： Ryoji Nishio , Tadamitsu Kanekiyo , Yoshiyuki Oota , Tsuyoshi Matsumoto
发明人： Ryoji Nishio , Tadamitsu Kanekiyo , Yoshiyuki Oota , Tsuyoshi Matsumoto
IPC分类号： H01L21/3065 , C23F1/00 , H01J37/32
CPC分类号： G06F17/5081 , G06F17/5086 , H01J37/32082 , H01J37/32642 , H01J37/32935 , H01L21/67069 , H01L21/6875
摘要： The invention provides a plasma processing apparatus capable of minimizing the non-uniformity of potential distribution around wafer circumference, and providing a uniform process across the wafer surface. The apparatus is equipped with a focus ring formed of a dielectric, a conductor or a semiconductor and having RF applied thereto, the design of which is optimized for processing based on a design technique clarifying physical conditions for flattening a sheath-plasma interface above a wafer and the sheath-plasma interface above the focus ring. A surface voltage of the focus ring is determined to be not less than a minimum voltage for preventing reaction products caused by wafer processing from depositing thereon. The surface height, surface voltage, material and structure of the focus ring are optimized so that the height of an ion sheath formed on the focus ring surface is either equal or has a height difference within an appropriate tolerance range to the height of the ion sheath formed on the wafer surface. Optimization of the structure is realized by setting up an appropriate tolerance range taking into consideration the variation caused by consumption of the focus ring.
摘要翻译：本发明提供一种等离子体处理装置，其能够最小化晶片周边周围的电位分布的不均匀性，并且跨晶片表面提供均匀的工艺。该装置配备有由电介质，导体或半导体形成的并且施加RF的聚焦环，其设计被优化用于基于澄清用于使晶片上的鞘等离子体界面平坦化的物理条件的设计技术进行处理以及聚焦环上方的鞘 - 等离子体界面。聚焦环的表面电压被确定为不低于用于防止由晶片加工引起的反应产物沉积在其上的最小电压。聚焦环的表面高度，表面电压，材料和结构被优化，使得形成在聚焦环表面上的离子鞘的高度相等或具有在离子鞘高度适当的公差范围内的高度差形成在晶片表面上。通过考虑由聚焦环的消耗引起的变化，建立适当的公差范围来实现结构的优化。

80. 发明申请

US20050036241A1 Rotary disk storage device and method 审中-公开
标题翻译：旋转盘存储装置及方法
公开(公告)号：US20050036241A1
公开(公告)日：2005-02-17
申请号：US10890302
申请日：2004-07-12
申请人： Shingo Tsuda , Yasunori Kawamoto , Tsuyoshi Matsumoto , Taichi Nakamura
发明人： Shingo Tsuda , Yasunori Kawamoto , Tsuyoshi Matsumoto , Taichi Nakamura
IPC分类号： G11B21/21 , G11B5/41 , G11B5/48 , G11B5/55 , G11B5/596 , G11B5/60 , G11B21/02
CPC分类号： G11B5/41 , G11B5/4826 , G11B5/4833 , G11B5/4853 , G11B5/6082
摘要： Embodiments of the invention provide a rotary disk storage device in which dust particles are less likely to deposit on the air bearing surface of each head/slider. The actuator head suspension assembly is configured so as to make the skew angle of the head/slider positive at about 80% or more of all the tracks. Specifically, the actuator head suspension assembly is configured in such a manner that the distance L2 between the center of the pivot shaft and the intersection point P of the trailing edge of the head/slider is made longer than a given length or there is an angle β between the reference line Y and the pivot line Z.
摘要翻译：本发明的实施例提供一种旋转盘存储装置，其中灰尘颗粒不太可能沉积在每个头/滑块的空气支承表面上。致动器头部悬挂组件被构造成使得头部/滑块的歪斜角度在所有轨道的大约80％或更多处正向。具体地说，致动器头部悬挂组件被构造成使得枢转轴的中心与头/滑块的后缘的交点P之间的距离L2被制成长于给定的长度，或者有一个角度 β在参考线Y和枢转线Z之间。

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