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    • 75. 发明申请
    • APPARATUS FOR ATOMIC LAYER DEPOSITION
    • 用于原子层沉积的装置
    • WO2011014762A1
    • 2011-02-03
    • PCT/US2010/043888
    • 2010-07-30
    • E. I. du Pont de Nemours and CompanyNUNES, GeoffreyKINARD, Richard, Dale
    • NUNES, GeoffreyKINARD, Richard, Dale
    • C23C16/54C23C16/455
    • C23C16/45551C23C16/45582C23C16/545
    • An apparatus for atomic layer deposition of a material on a moving substrate comprises a conveying arrangement for moving a substrate along a predetermined planar or curved path of travel and a coating bar having at least one precursor delivery channel. The precursor delivery channel conducts a fluid containing a material to be deposited on a substrate toward the path of travel. When in use, a substrate movable along the path of travel defines a gap between the outlet end of the precursor delivery channel and the substrate. The gap defines an impedance Z g to a flow of fluid from the precursor delivery channel. A flow restrictor is disposed within the precursor delivery channel that presents a predetermined impedance Z fc to the flow there through. The restrictor is sized such that the impedance Z fc is at least five (5) times, and more preferably at least fifteen (15) times, the impedance Z g . The impedance Z fc has a friction factor f . The restrictor in the precursor delivery channel is sized such that the impedance Z f has a friction factor f that is less than 100, and preferably less than 10.
    • 用于在移动的衬底上原子层沉积材料的装置包括用于沿着预定的平面或弯曲行进路径移动衬底的输送装置和具有至少一个前体输送通道的涂布条。 前体输送通道将包含要沉积在基底上的材料的流体传导到行进路径。 当使用时,沿着行进路径移动的基板限定了前体输送通道的出口端和基底之间的间隙。 间隙限定了来自前体输送通道的流体流动的阻抗Zg。 流量限制器设置在前体输送通道内,其向通过的流动提供预定阻抗Zfc。 限流器的尺寸使得阻抗Zfc为阻抗Zg至少五(5)倍,更优选为至少十五(15)倍。 阻抗Zfc具有摩擦系数f。 前体输送通道中的限制器的尺寸使得阻抗Zf的摩擦系数f小于100,优选小于10。
    • 76. 发明申请
    • PLASMA GASIFICATION REACTOR
    • 等离子体气化反应器
    • WO2010093553A2
    • 2010-08-19
    • PCT/US2010/023184
    • 2010-02-04
    • ALTER NRG CORPDIGHE, Shyam V.DARR, Mark F.MARTORELL, Ivan A.VAN NIEROP, PieterGORODETSKY, AleksandrBOWER, Richard Dale
    • DIGHE, Shyam V.DARR, Mark F.MARTORELL, Ivan A.VAN NIEROP, PieterGORODETSKY, AleksandrBOWER, Richard Dale
    • B01J19/08
    • B01J19/088B01J2219/0894
    • A plasma gasification reactor vessel having a top section with a conical wall extending up from a bottom section, containing a carbonaceous bed into which plasma is injected by plasma torches, to a roof of the vessel is arranged in ways that can contribute to characteristics of gas flow and solids residence time that are favorable for thoroughness of reactions and yield of useful reactions products. In some cases, such a conical wall is combined in arrangements with other features such as one or more feed ports arranged to give more uniform distribution including examples with a feed port that has a distributive feed mechanism. The roof of the vessel, in some examples, has vertical outlet ports that include intrusions into the interior volume of the reactor proximate the conical wall of the top section. The configurations of outlet ports with intrusions and the configurations of feed ports for more uniform distribution of feed material are also applicable to reactor vessels with other geometries.
    • 等离子体气化反应器容器具有顶部,该顶部具有从底部向上延伸的锥形壁,该底部包含通过等离子体喷枪将等离子体注入到其中的碳质床到容器的顶部,其方式可以有助于气体的特性 流动和固体停留时间,有利于反应的完全性和有用的反应产物的产率。 在一些情况下,这样的锥形壁与其它特征结合,例如一个或多个进料口,其被配置成提供更均匀的分布,包括具有分配进料机构的进料口的实例。 在一些示例中,容器的顶部具有垂直的出口端口,其包括进入靠近顶部部分的锥形壁的反应器的内部容积内的入口。 具有入侵的出口端口的结构和用于进料均匀分布的进料口的结构也适用于具有其它几何形状的反应器容器。