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    • 61. 发明公开
    • A transferred electron effect device
    • 转移电子效应器件
    • EP0343737A3
    • 1991-01-02
    • EP89201295.6
    • 1989-05-22
    • PHILIPS ELECTRONICS UK LIMITEDPhilips Electronics N.V.
    • Battersby, Stephen JohnShannon, John MartinSzubert, Marek
    • H01L47/02
    • H01L47/026
    • A transferred electron effect device has a semiconductor body with an active region (2) of n conductivity type formed of a semiconductor material having a relatively low mass,high mobility conduction band main minimum and at least one relatively high mass, low mobility conduction band satellite minimum, and an injection zone (3) adjoining the active region (2) for causing electrons to be emitted, under the influence of an applied electric field, from the injection zone (3) into the active region (2) with an energy comparable to that of the relatively high mass, low mobility, conduction band satellite minima of the active region. The injection zone (3) is formed by first and second n conductivity type regions (4 and 5) separated by a barrier region (6) which has an impurity concentration characteristic of the-p conductivity type and which is sufficiently thin as to be fully depleted of free charge carriers under zero bias, at least one of the first and second regions (4) being highly doped relative to the active region at least adjacent the barrier region and the barrier region (6) having an impurity concentration sufficient to provide a potential barrier (P) to the flow of electrons of a height such that in operation of the device, electrons with sufficient energy to surmount the potential barrier (P) provided by the barrier region (6) are emitted into the active region (2) with an energy comparable to that of a conduction band satellite minimum of the active region (2).
    • 69. 发明公开
    • Gunn diode, NRD guide gunn oscillator and fabricating method
    • Gunndiode,NRD Leitungsschaltung和Verfahren zur Herstellung
    • EP0954039A1
    • 1999-11-03
    • EP99108231.4
    • 1999-04-27
    • New Japan Radio Corp., Ltd.
    • Atsushi, Nakagawa, c/o New Japan Radio Co., Ltd.Kenichi, Watanabe, c/o New Japan Radio Co., Ltd.
    • H01L47/02H03B7/14H03B9/14
    • H01L47/026H01L2224/48091H01L2224/73257H03B7/14H03B9/14H03B9/147H01L2924/00014
    • A Gunn diode which is formed by sequentially laminating a first semiconductor layer, an active layer and a second semiconductor layer onto a semiconductor substrate. The Gunn diode comprises first and second electrodes arranged on the second semiconductor layer for impressing voltage on the active layer, and a concave portion which is cut from around the first electrode in a direction of the second semiconductor layer and the active layer and which subdivides the second semiconductor layer and the active layer to which the first electrode is connected as a region which functions as a Gunn diode. Since etching for defining a region that is to function as a Gunn diode is performed by self-alignment dry etching utilizing electrode layers formed above this region as masks, variations in characteristics are restricted. There are also disclosed a NRD guide Gunn oscillator attached to the NRD guide for obtaining a high frequency oscillation output of the Gunn diode, a fabricating method of the Gunn diode, and a structure for assembly of the Gunn diode.
    • 耿氏二极管,其通过将第一半导体层,有源层和第二半导体层依次层叠到半导体衬底上而形成。 耿氏二极管包括布置在第二半导体层上的用于在有源层上施加电压的第一和第二电极,以及在第二半导体层和有源层的方向上从第一电极周围切割的凹部, 第二半导体层和第一电极连接的有源层作为用作耿氏二极管的区域。 由于用于限定用作耿氏二极管的区域的蚀刻是通过利用在该区域上形成的电极层作为掩模的自对准干法蚀刻进行的,特性的变化受到限制。 还公开了一种NRD指南Gunn振荡器,其连接到NRD指南,用于获得耿氏二极管的高频振荡输出,耿氏二极管的制造方法以及用于组装耿氏二极管的结构。