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61. 发明授权

US06765945B2 Injection seeded F2 laser with pre-injection filter 失效
标题翻译：用预注射过滤器注入F2激光
公开(公告)号：US06765945B2
公开(公告)日：2004-07-20
申请号：US09829475
申请日：2001-04-09
申请人： Richard L. Sandstrom , William N. Partlo , Eckehard D. Onkels
发明人： Richard L. Sandstrom , William N. Partlo , Eckehard D. Onkels
IPC分类号： H01S322
CPC分类号： H01S3/10092 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/0078 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08063 , H01S3/08068 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2258 , H01S3/2325 , H01S3/2333 , H01S3/2366
摘要： A narrow band F2 laser system useful for integrated circuit lithography. An output beam from a first F2 laser gain medium is filtered with a pre-gain filter to produce a seed beam having a bandwidth of about 0.1 pm or less. The seed beam is amplified in a power gain stage which includes a second F2 laser gain medium. The output beam of the system is a pulsed laser beam with a full width half maximum band width of about 0.1 pm or less with pulse energy in excess of about 5 mJ. In a preferred embodiment the pre-gain filter includes a wavelength monitor which permits feedback control over the centerline wavelength so that the pre-gain filter optics can be adjusted to ensure that the desired bandwidth range is injected into the power gain stage.
摘要翻译：用于集成电路光刻的窄带F2激光系统。用预增益滤波器对来自第一F2激光增益介质的输出光束进行滤波，以产生具有约0.1μm或更小带宽的种束。种子束在包括第二F2激光增益介质的功率增益级中被放大。系统的输出光束是具有约0.1μm或更小的全宽半最大带宽的脉冲激光束，脉冲能量超过约5mJ。在优选实施例中，预增益滤波器包括允许对中心线波长进行反馈控制的波长监视器，使得可以调整预增益滤波器光学器件，以确保将期望的带宽范围注入功率增益级。

62. 发明授权

US06327286B1 High speed magnetic modulator voltage and temperature timing compensation circuit 有权
标题翻译：高速磁调制器电压和温度定时补偿电路
公开(公告)号：US06327286B1
公开(公告)日：2001-12-04
申请号：US09465427
申请日：1999-12-21
申请人： Richard M. Ness , William N. Partlo , Richard L. Sandstrom , David M. Johns
发明人： Richard M. Ness , William N. Partlo , Richard L. Sandstrom , David M. Johns
IPC分类号： H01S300
CPC分类号： H01S3/038 , H01S3/097 , H03K3/57 , H03K5/131
摘要： An improvement over prior art voltage timing compensation circuits is achieved by incorporating a function generator to provide a more accurate non-linear compensation to pulse timing delay, which is typically a non-linear function of voltage. An improvement over prior art temperature timing compensation circuits is achieved by providing for actual temperature measurements to be made and used to drive the timing compensation circuitry for a more accurate temperature timing compensation than provided by prior art temperature synthesis, while still using a relatively simple compensating circuit. In some embodiments a timing compensation circuit combines both voltage and temperature timing compensation.
摘要翻译：通过结合功能发生器来提供对脉冲定时延迟的更精确的非线性补偿来实现现有技术的电压定时补偿电路的改进，脉冲定时延迟通常是电压的非线性函数。通过提供实际的温度测量来实现对现有技术的温度定时补偿电路的改进，并且用于驱动定时补偿电路以获得比现有技术的温度合成提供的更精确的温度定时补偿，同时仍然使用相对简单的补偿电路。在一些实施例中，定时补偿电路组合电压和温度定时补偿。

63. 再颁专利

USRE42588E1 Control system for a two chamber gas discharge laser system 有权
标题翻译：双室气体放电激光系统控制系统
公开(公告)号：USRE42588E1
公开(公告)日：2011-08-02
申请号：US11352522
申请日：2006-02-10
申请人： John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
发明人： John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
IPC分类号： H01S3/22
CPC分类号： H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。提供了反馈定时控制技术，即使在脉冲串模式操作中，也可以精确地控制两个室中的放电的相对定时，其精确度在大约2至50亿分之一秒的范围内。该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。

64. 发明申请

US20110122901A1 HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：高功率高脉冲重复率气体放电激光系统
公开(公告)号：US20110122901A1
公开(公告)日：2011-05-26
申请号：US13020330
申请日：2011-02-03
申请人： Richard L. Sandstrom , William N. Partlo , Daniel J.W. Brown
发明人： Richard L. Sandstrom , William N. Partlo , Daniel J.W. Brown
IPC分类号： H01S3/10
CPC分类号： H01S3/08009 , H01S3/08031 , H01S3/08059 , H01S3/097 , H01S3/1055
摘要： A method of line narrowing for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses includes selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive surface of a dispersive wavelength selection optic; changing the curvature of the dispersive surface in a first manner that includes imparting a catenary curvature to the dispersive surface; and changing the curvature of the dispersive surface in a second manner that includes imparting a cylindrical curvature to the dispersive surface.
摘要翻译：窄带DUV高功率高重复率气体放电激光器产生输出激光脉冲束脉冲的脉冲串的方法包括为至少部分地由入射角确定的每个脉冲选择至少一个中心波长，所述激光束在所述分散波长选择光学器件的分散表面上包含相应的脉冲; 以第一种方式改变分散表面的曲率，包括向分散表面施加悬链曲率; 并且以第二种方式改变分散表面的曲率，包括向分散表面施加圆柱形曲率。

65. 发明授权

US07838854B2 Method and apparatus for EUV plasma source target delivery 有权
标题翻译：用于EUV等离子体源目标传递的方法和装置
公开(公告)号：US07838854B2
公开(公告)日：2010-11-23
申请号：US12220560
申请日：2008-07-25
申请人： J. Martin Algots , Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Oscar Hemberg , Alexander N. Bykanov , Dennis W. Cobb
发明人： J. Martin Algots , Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Oscar Hemberg , Alexander N. Bykanov , Dennis W. Cobb
IPC分类号： H01J35/20
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.
摘要翻译：公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

66. 发明申请

US20090080476A1 Immersion lithography laser light source with pulse stretcher 有权
标题翻译：浸没光刻激光光源带脉冲担架
公开(公告)号：US20090080476A1
公开(公告)日：2009-03-26
申请号：US11973671
申请日：2007-10-10
申请人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J.W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Mike Wyatt , Walter Crosby
发明人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J.W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Mike Wyatt , Walter Crosby
IPC分类号： H01S3/139 , H01S3/083
CPC分类号： H01S3/0057 , G03F7/70341 , G03F7/70583
摘要： An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.
摘要翻译：一种可包括可包括种子激光器部分的脉冲气体放电激光器的装置和方法; 接收种子激光输出并放大每个种子脉冲的光强度的放大器部分; 脉冲展开器，其可以包括：与第一延迟路径可操作地连接的第一分束器和与第二延迟路径可操作地连接的第二脉冲展开器; 包含第一分束器的第一光学延迟路径塔; 包含第二分束器的第二光学延迟路径塔; 第一和第二光学延迟路径中的一个可以包括：多个反射镜，其限定相应的光学延迟路径，包括位于第一塔架和第二塔架中的反射镜; 第一和第二光学延迟路径中的另一个可以包括：多个反射镜限定相应的光学延迟路径，其仅包括在第一塔架和第二塔架之一中的镜子。

67. 发明申请

US20080283776A1 Method and apparatus for EUV plasma source target delivery 有权
公开(公告)号：US20080283776A1
公开(公告)日：2008-11-20
申请号：US12220560
申请日：2008-07-25
申请人： J. Martin Algots , Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Oscar Hemberg , Alexander N. Bykanov , Dennis W. Cobb
发明人： J. Martin Algots , Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Oscar Hemberg , Alexander N. Bykanov , Dennis W. Cobb
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

68. 发明授权

US07088758B2 Relax gas discharge laser lithography light source 有权
标题翻译：放气放电激光光刻光源
公开(公告)号：US07088758B2
公开(公告)日：2006-08-08
申请号：US10956784
申请日：2004-10-01
申请人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Thomas A. Yager , Alexander I. Ershov , Robert J. Rafac , German E. Rylov
发明人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Thomas A. Yager , Alexander I. Ershov , Robert J. Rafac , German E. Rylov
IPC分类号： H01S3/22
CPC分类号： G01J1/429 , B23K26/0622 , B23K2101/40 , G01J9/02 , G02B26/002 , G02B26/0875 , G03F7/70041 , G03F7/70575 , H01S3/005 , H01S3/0057 , H01S3/1055 , H01S3/225
摘要： An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.
摘要翻译：公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统的装置和方法，产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括：色散中心波长选择光学选择用于每个脉冲的至少一个中心波长至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定; 调谐机构，用于在色散中心波长选择光学器件上选择包含相应脉冲的激光束脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件，所述可变折射光学元件限定所述激光束的所述第一空间限定部分的多个折射角位移通过所述可变折射光学元件在所述激光的入射的多个位置中的一个位置脉冲光束在可变折射光学元件上。可变折射光学元件可以包括：限定用于激光束脉冲束的入射面的第一大致平坦的面; 以及限定用于激光束的出口的多个大致平坦的表面或出口的连续变化的表面的第二多面或弯曲面。脉冲参数测量和脉冲调制控制的其它方面包括响应来自利用工具的信号，例如涉及具有不同中心波长光谱的适当剂量控制。

69. 发明授权

US07087914B2 High repetition rate laser produced plasma EUV light source 有权
公开(公告)号：US07087914B2
公开(公告)日：2006-08-08
申请号：US10803526
申请日：2004-03-17
申请人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , John Martin Algots , Robert N. Jacques , Frederick Palenschat , Jun Song
发明人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , John Martin Algots , Robert N. Jacques , Frederick Palenschat , Jun Song
IPC分类号： H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

70. 发明授权

US06882674B2 Four KHz gas discharge laser system 有权
标题翻译：四KHz气体放电激光系统
公开(公告)号：US06882674B2
公开(公告)日：2005-04-19
申请号：US10036676
申请日：2001-12-21
申请人： Christian J. Wittak , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov , Thomas D. Steiger , Jerome A. Emilo , Clay C. Titus , Alex P. Ivaschenko , Paolo Zambon , Gamaralalage G. Padmabandu , Mark S. Branham , Sunjay Phatak , Raymond F. Cybulski
发明人： Christian J. Wittak , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov , Thomas D. Steiger , Jerome A. Emilo , Clay C. Titus , Alex P. Ivaschenko , Paolo Zambon , Gamaralalage G. Padmabandu , Mark S. Branham , Sunjay Phatak , Raymond F. Cybulski
IPC分类号： H01S3/097 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/23 , H01S3/22
CPC分类号： G03F7/70025 , G03F7/70933 , H01S3/0057 , H01S3/036 , H01S3/0385 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供了一种准分子激光器，其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的极限内。在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

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