专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

61. 发明授权

US6093534A Monoclonal antibody specifically recognizing adeno-associated virus cap protein 失效
标题翻译：特异性识别腺相关病毒帽蛋白的单克隆抗体
公开(公告)号：US6093534A
公开(公告)日：2000-07-25
申请号：US913667
申请日：1997-09-11
申请人： Takashi Shimada , Hidekazu Kuma , Yosuke Suzuki
发明人： Takashi Shimada , Hidekazu Kuma , Yosuke Suzuki
IPC分类号： C07K16/08 , C12N5/20 , C12P21/08 , G01N33/569 , G01N33/68 , C12Q1/70
CPC分类号： G01N33/6878 , C07K16/081 , G01N33/56983 , G01N2333/075
摘要： A monoclonal antibody specifically recognizing adeno-associated virus CAP protein, which is produced by hybridomas obtained by fusing lymphocytes prepared from a mammal which has been immunized with the adeno-associated virus CAP protein or a recombinant thereof as an antigen with a myeloma cell line. The monoclonal antibody of the present invention is a novel antibody and capable of specifically recognizing the adeno-associated virus CAP protein. Thus, it is applicable to the detection of the adeno-associated virus and the purification of adeno-associated virus vectors for gene therapy.
摘要翻译： PCT No.PCT / JP96 / 00655 Sec。 371日期：1997年9月11日 102（e）1997年9月11日PCT PCT 1996年3月15日PCT公布。 WO96 / 29349 PCT公开号日期1996年9月26日一种特异性识别腺相关病毒CAP蛋白的单克隆抗体，其通过将由已经用腺相关病毒CAP蛋白免疫的哺乳动物制备的淋巴细胞或其重组体作为抗原融合获得的杂交瘤产生，骨髓瘤细胞系。本发明的单克隆抗体是新型抗体，能够特异性识别腺相关病毒CAP蛋白。因此，适用于腺相关病毒的检测和用于基因治疗的腺相关病毒载体的纯化。

62. 发明授权

US6054366A Two-layered gate structure for a semiconductor device and method for producing the same 失效
标题翻译：用于半导体器件的两层栅极结构及其制造方法
公开(公告)号：US6054366A
公开(公告)日：2000-04-25
申请号：US33468
申请日：1998-03-02
申请人： Machio Yamagishi , Takashi Shimada
发明人： Machio Yamagishi , Takashi Shimada
IPC分类号： H01L21/28 , H01L29/423 , H01L29/78 , H01L21/10
CPC分类号： H01L29/42324 , H01L21/28123
摘要： In order to avoid any concentration of an electric field to gate edges of a two-layered structure and to improve an accumulation performance of charge, a semiconductor device includes a semiconductor substrate; an element isolation region formed to define an element formation region in the semiconductor substrate; a first gate insulating layer formed in a part of a surface of the element formation region; a first gate electrode formed on the first gate insulating layer; an insulating layer for surrounding the first gate electrode with a top surface of the insulating layer being substantially in the same plane as that of a top surface of the first electrode; a second gate insulating layer formed on the first gate electrode; and a second gate electrode formed on the second gate insulating layer. Also, a method therefor is provided.
摘要翻译：为了避免电场对两层结构的栅极边缘的集中，并且为了提高电荷的积累性能，半导体器件包括半导体衬底; 形成为限定半导体衬底中的元件形成区域的元件隔离区域; 形成在所述元件形成区域的表面的一部分中的第一栅极绝缘层; 形成在所述第一栅极绝缘层上的第一栅电极; 用于围绕所述第一栅极的绝缘层，所述绝缘层的顶表面基本上在与所述第一电极的顶表面相同的平面中; 形成在所述第一栅电极上的第二栅极绝缘层; 以及形成在所述第二栅极绝缘层上的第二栅电极。另外，提供了一种方法。

63. 发明授权

US5675325A Information transmitting apparatus using tube body 失效
标题翻译：使用管体的信息发送装置
公开(公告)号：US5675325A
公开(公告)日：1997-10-07
申请号：US546128
申请日：1995-10-20
申请人： Ryosuke Taniguchi , Takashi Shimada , Takahiro Sakamoto
发明人： Ryosuke Taniguchi , Takashi Shimada , Takahiro Sakamoto
IPC分类号： B06B1/04 , E21B47/16 , G01V1/40
CPC分类号： B06B1/04 , E21B47/16
摘要： An information transmitting apparatus using a tube includes a magnetostrictive vibrator to generate a first elastic wave depending upon underground information, a resonance tube body resonating with the elastic wave to generate a second elastic wave having a natural frequency, and a drill string to propagate the second elastic wave, thereby permitting a long transmission distance.
摘要翻译：使用管的信息发送装置包括：磁致伸缩振动器，其根据地下信息产生第一弹性波，共振管体与弹性波共振，产生具有固有频率的第二弹性波;以及钻柱，以使第二弹性波传播弹性波，从而允许长的传输距离。

64. 发明授权

US5662872A Process for cleaning harmful gas 失效
标题翻译：清洁有害气体的过程
公开(公告)号：US5662872A
公开(公告)日：1997-09-02
申请号：US560171
申请日：1995-11-17
申请人： Takashi Shimada , Toshio Okumura , Toshiya Hatakeyama
发明人： Takashi Shimada , Toshio Okumura , Toshiya Hatakeyama
IPC分类号： B01D53/46 , B01D53/54 , B01D53/58 , B01D53/86 , B01J20/06
CPC分类号： B01D53/54 , B01D53/46 , B01D53/58 , B01D53/8621 , B01D53/8634 , B01D53/8671 , B01J20/06
摘要： There is disclosed a process for cleaning a harmful gas which comprises bringing a gas containing a basic gas as a harmful component such as ammonia and amines into contact with a cleaning agent comprising a cupric salt supported on an inorganic carrier composed of an metallic oxide such as silica and alumina or a metallic oxide mixture of cupric oxide and manganese dioxide to remove the harmful component from the gas containing a basic gas.According to the above process, it is made possible to effectively remove a basic gas such as ammonia and trimethylamine contained in the exhaust gas from semiconductor production process; and a harmful basic gas contained in dilution gas such as air or nitrogen which dilutes the harmful gas suddenly leaked in emergency from a gas bomb filled inside with the harmful gas. Moreover, the process enables to prevent the occurrence of fire even in the coexistence of other gas such as silane, while maintaining excellent effect on the removal of the harmful gas.
摘要翻译：公开了一种清洗有害气体的方法，该方法包括使含有碱性气体的气体作为有害成分如氨和胺与包含负载在由金属氧化物构成的无机载体上的铜盐的清洗剂接触，所述无机载体由金属氧化物二氧化硅和氧化铝或氧化铜和二氧化锰的金属氧化物混合物以从含有碱性气体的气体中除去有害成分。根据上述方法，能够从半导体制造工序有效地除去废气中所含的氨，三甲基胺等碱性气体，以及稀释有害气体等稀释气体中所含有的有害碱性气体，在从有害气体填充的气体炸弹的紧急情况下突然泄漏。此外，该方法即使在其它气体如硅烷的共存下也能够防止火灾的发生，同时对除去有害气体具有优异的效果。

65. 发明授权

US5597540A Process for cleaning harmful gas 失效
标题翻译：清洁有害气体的过程
公开(公告)号：US5597540A
公开(公告)日：1997-01-28
申请号：US308648
申请日：1994-09-19
申请人： Noboru Akita , Toshiya Hatakeyama , Takashi Shimada , Keiichi Iwata
发明人： Noboru Akita , Toshiya Hatakeyama , Takashi Shimada , Keiichi Iwata
IPC分类号： B01D53/68 , C01B7/07
CPC分类号： B01D53/68
摘要： There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gaseous halogenide such as chlorine, hydrogen chloride, dichlorosilane, silicon tetrachloride, phosphorus trichloride, chlorine trifluoride, boron trichloride, boron trifluoride, tungsten hexafluoride, silicon tetrafluoride, fluorine, hydrogen fluoride and hydrogen bromide into contact with a cleaning agent comprising zinc oxide, aluminum oxide and an alkali compound to remove the above halogenide. The above process is extremely effective for promptly and efficiently removing the above gaseous halogenide that is contained in the gas discharged from semiconductor manufacturing process.
摘要翻译：公开了一种清洁有害气体的方法，该方法包括使氯，氯化氢，二氯硅烷，四氯化硅，三氯化磷，三氟化氯，三氯化硼，三氟化硼，六氟化钨，四氟化硅，氟，氢等有害的气态卤化物氟化物和溴化氢与包含氧化锌，氧化铝和碱性化合物的清洗剂接触以除去上述卤化物。上述方法对于迅速有效地除去从半导体制造过程中排出的气体中所含有的上述气态卤化物是非常有效的。

66. 发明授权

US5559827A Vacuum melting-pressure pouring induction furnace 失效
标题翻译：真空熔压浇注感应炉
公开(公告)号：US5559827A
公开(公告)日：1996-09-24
申请号：US418326
申请日：1995-04-07
申请人： Takashi Shimada , Kenji Kitanaka , Akio Kaneshiro , Michio Kawasaki
发明人： Takashi Shimada , Kenji Kitanaka , Akio Kaneshiro , Michio Kawasaki
IPC分类号： B22D39/06 , B22D41/00 , F27B14/04 , F27B14/06 , F27B14/08 , F27B14/12 , F27B14/18 , F27D1/18 , H05B6/26 , F27D3/00
CPC分类号： F27B14/0806 , B22D39/06 , F27B14/04 , F27B14/061 , F27D1/1808 , H05B6/26
摘要： A furnace in the invention includes an induction melting furnace housed in an air-tight container which can be pressurized to the desired level of maximum allowable pressure and can be vacuum evacuated to a desired level of pressure; a vacuum melting furnace cover having a vacuum evacuating pipe; and a pressure pouring furnace cover, which has a pressure piping to impress the pouring pressure controlled by a pouring pressure control device onto the inside of the furnace and has a pouring siphon, which has its lower end opened to the bottom part within the induction melting furnace and has its upper end connected to a pouring chamber having a pouring nozzle, penetrated therethrough. In the furnace with the construction, the molten metal having been vacuum melted in the induction melting furnace within the air-tight container, which has been tightly closed with the vacuum melting furnace cover and has been vacuum evacuated with the vacuum evacuating pipe, can be poured from the pouring nozzle using the pouring siphon by replacing the vacuum melting furnace cover with the pressure pouring furnace cover and impressing the pressure from the pressure piping to the inside of the air-tight container, which has been tightly closed by the pressure pouring furnace cover, to the maximum allowable pressure.
摘要翻译：本发明的炉子包括一个容纳在气密容器中的感应熔化炉，可以将其加压至所需的最大允许压力水平，并将其真空抽真空至所需的压力水平; 具有真空排气管的真空熔化炉盖; 以及压力浇注炉盖，其具有压力管道，用于将由倾倒压力控制装置控制的倾倒压力压入炉内，并具有倾倒虹吸管，其下端在感应熔化状态下向底部开口并且其上端连接到具有穿过其中的倾倒嘴的倾倒室。在具有这种结构的炉中，在真空熔化炉盖紧密关闭并用真空抽气管真空抽真空的气密容器内的感应熔炼炉中真空熔融的熔融金属可以是通过使用倾倒式虹吸从浇注嘴倾倒，用压力浇注炉盖更换真空熔化炉盖，并将压力管道压力压到由压力浇注炉紧密关闭的气密容器的内部盖，达到最大允许压力。

67. 发明授权

US5378444A Process for cleaning harmful gas 失效
标题翻译：清洁有害气体的过程
公开(公告)号：US5378444A
公开(公告)日：1995-01-03
申请号：US975698
申请日：1992-11-13
申请人： Noboru Akita , Toshiya Hatakeyama , Takashi Shimada , Keiichi Iwata
发明人： Noboru Akita , Toshiya Hatakeyama , Takashi Shimada , Keiichi Iwata
IPC分类号： B01D53/68 , C01B7/07
CPC分类号： B01D53/68
摘要： There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gaseous halogenide such as chlorine, hydrogen chloride, dichlorosilane, silicon tetrachloride, phosphorus trichloride, chlorine trifluoride, boron trichloride, boron trifluoride, tungsten hexafluoride, silicon tetrafluoride, fluorine, hydrogen fluoride and hydrogen bromide into contact with a cleaning agent comprising zinc oxide, aluminum oxide and an alkali compound to remove the above halogenide. The above process is extremely effective for promptly and efficiently removing the above gaseous halogenide that is contained in the gas discharged from semiconductor manufacturing process or leaked suddenly from a gas bomb in an emergency.
摘要翻译：公开了一种清洁有害气体的方法，该方法包括使氯，氯化氢，二氯硅烷，四氯化硅，三氯化磷，三氟化氯，三氯化硼，三氟化硼，六氟化钨，四氟化硅，氟，氢等有害的气态卤化物氟化物和溴化氢与包含氧化锌，氧化铝和碱性化合物的清洗剂接触以除去上述卤化物。上述过程对于迅速有效地除去在半导体制造过程中排出的气体中所含的上述气态卤化物或在紧急情况下突然从气体炸弹泄漏而非常有效。

68. 发明授权

US5019364A Method for purifying gaseous hydrides 失效
标题翻译：气态氢化物的净化方法
公开(公告)号：US5019364A
公开(公告)日：1991-05-28
申请号：US611603
申请日：1990-11-13
申请人： Koichi Kitahara , Takashi Shimada , Keiichi Iwata
发明人： Koichi Kitahara , Takashi Shimada , Keiichi Iwata
IPC分类号： C01G28/00 , C01B6/34 , C01B17/16 , C01B19/04 , C01B25/06 , C01B33/04
CPC分类号： C01B6/34 , C01B17/168 , C01B19/04 , C01B25/06 , C01B33/046 , C01P2006/80
摘要： A method for purifying a gaseous hydride, which comprises bringing a crude gaseous hydride into contact with at least one material selected from copper arsenides, copper phosphides, copper silicides, copper selenides, copper borides or copper sulfides to remove oxygen contained in the crude gaseous hydride.
摘要翻译：一种纯化气态氢化物的方法，其包括使粗气态氢化物与选自砷化铜，磷化铜，硅化铜，硒化铜，铜硼化物或硫化铜中的至少一种材料接触，以除去粗制氢化物中所含的氧。

69. 发明授权

US4996030A Method for cleaning exhaust gases 失效
标题翻译：排气净化方法
公开(公告)号：US4996030A
公开(公告)日：1991-02-26
申请号：US200886
申请日：1988-06-01
申请人： Koichi Kitahara , Takashi Shimada , Noboru Akita , Tadashi Hiramoto , Kohhei Sasaki
发明人： Koichi Kitahara , Takashi Shimada , Noboru Akita , Tadashi Hiramoto , Kohhei Sasaki
IPC分类号： B01D53/46 , B01D53/86 , C01B3/56 , C01B21/04 , C01B23/00
CPC分类号： C01B23/00 , B01D53/46 , B01D53/8671 , C01B21/0427 , C01B3/56 , C01B2203/042 , C01B2203/0465 , C01B2210/0043
摘要： A method for cleaning an exhaust gas comprising a base gas and at least one toxic component selected from the group consisting of arsine, phosphine, diborane and hydrogen selenide is disclosed. The method comprises contacting the exhaust gas with a molded cleaning agent having a composition consisting essentially of (1) cupric oxide, (2) manganese dioxide, and (3) at least one metal oxide selected from the group consisting of silicon oxide, aluminum oxide and zinc oxide and having a density of from 0.6 to 1.5 g/ml, said composition having a metal atomic ratio M/(M+Cu+Mn) in the range of from 0.02 to 0.70 and a metal atomic ratio Cu/(Cu+Mn) in the range of from 0.1 to 0.9; wherein Cu represents a number of gram atom of copper; Mn represents a number of gram atom of manganese; and M represents a total number of gram atom of silicon, aluminum and/or zinc, to remove the toxic component from the exhaust gas. The method is effective even at low temperatures below 10.degree. C.

70. 发明授权

US4731333A Method for detecting gaseous hydrides 失效
标题翻译：检测气态氢化物的方法
公开(公告)号：US4731333A
公开(公告)日：1988-03-15
申请号：US878537
申请日：1986-06-25
申请人： Koichi Kitahara , Takashi Shimada
发明人： Koichi Kitahara , Takashi Shimada
IPC分类号： G01N31/00 , G01N31/22 , G01N21/78
CPC分类号： G01N31/22 , Y10S436/902 , Y10S436/904 , Y10T436/16 , Y10T436/19 , Y10T436/204998
摘要： A solid detecting reagent for gaseous hydrides and a gaseous hydride detecting method are disclosed, said reagent comprising a basic copper carbonate as a color changing component and undergoing color change upon contact with at least one gaseous hydride selected from the group consisting of arsine, phosphine, diborane, hydrogen selenide, germane, monosilane, disilane and dichlorosilane. The reagent is applicable to all of these gaseous hydrides and, upon contact therewith, rapidly changes from an initial blue color to a black color, said black color standing for a long period of time.
摘要翻译：公开了一种用于气态氢化物的固体检测试剂和气态氢化物检测方法，所述试剂包含碱性碳酸铜作为变色组分，并且与至少一种选自胂，膦，乙硼烷，硒化氢，锗烷，甲硅烷，乙硅烷和二氯硅烷。该试剂适用于所有这些气态氢化物，并且与其接触时，从初始蓝色迅速变化为黑色，所述黑色长时间放置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式