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61. 发明授权

US08916332B2 Resist composition, method of forming resist pattern, and polymeric compound 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案的方法和聚合物
公开(公告)号：US08916332B2
公开(公告)日：2014-12-23
申请号：US13441200
申请日：2012-04-06
申请人： Makiko Irie , Tomoyuki Hirano , Daichi Takaki
发明人： Makiko Irie , Tomoyuki Hirano , Daichi Takaki
IPC分类号： C08F24/00 , C08F224/00 , G03F7/004 , G03F7/027 , G03F7/039 , C08F228/06 , G03F7/20
CPC分类号： G03F7/0397 , C08F224/00 , C08F228/06 , G03F7/2041
摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms).
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在显影液中显示改变的溶解度的碱成分（A）和曝光时产生酸的酸发生剂成分（B），含有树脂成分（A1 ）包括由下述通式（a0-1）表示的结构单元（a0）和衍生自可以具有与被取代基取代的被取代基取代的在α-位上的碳原子键合的丙烯酸酯的结构单元，并且含有通过酸（其中R表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的卤代烷基）的作用而显示出极性增加的酸可分解基团。

62. 发明申请

US20110237014A1 METHOD FOR MANUFACTURING SOLID-STATE IMAGING DEVICE 失效
标题翻译：制造固态成像装置的方法
公开(公告)号：US20110237014A1
公开(公告)日：2011-09-29
申请号：US13153941
申请日：2011-06-06
申请人： Susumu Hiyama , Tomoyuki Hirano
发明人： Susumu Hiyama , Tomoyuki Hirano
IPC分类号： H01L31/18
CPC分类号： H01L27/14601 , H01L27/14603 , H01L27/1462 , H01L27/14685 , H01L27/14689
摘要： A method for manufacturing a solid-state imaging device in which a charge generator that detects an electromagnetic wave and generates signal charges is formed on a semiconductor substrate and a negative-charge accumulated layer having negative fixed charges is formed above a detection plane of the charge generator. The method includes the steps of: forming an oxygen-feed film capable of feeding oxygen on the detection plane of the charge generator; forming a metal film that covers the oxygen-feed film on the detection plane of the charge generator; and performing heat treatment for the metal film in an inactive atmosphere to thereby form an oxide of the metal film between the metal film and the oxygen-feed film on the detection plane of the charge generator, the oxide being to serve as the negative-charge accumulated layer.
摘要翻译：一种制造固态成像装置的方法，其中在半导体衬底上形成检测电磁波并产生信号电荷的电荷产生器，并且在电荷的检测平面上方形成具有负固定电荷的负电荷累积层发电机。该方法包括以下步骤：在电荷发生器的检测面上形成能够供给氧的氧供给膜; 形成覆盖所述电荷发生器的检测面上的氧供给膜的金属膜; 在惰性气氛中对金属膜进行热处理，从而在电荷发生器的检测面上形成金属膜与氧气供给膜之间的金属膜的氧化物，氧化物用作负电荷累积层

63. 发明授权

US07968365B2 Method for manufacturing solid-state imaging device 有权
标题翻译：固态成像装置的制造方法
公开(公告)号：US07968365B2
公开(公告)日：2011-06-28
申请号：US12364130
申请日：2009-02-02
申请人： Susumu Hiyama , Tomoyuki Hirano
发明人： Susumu Hiyama , Tomoyuki Hirano
IPC分类号： H01L31/06 , H01L31/0216
CPC分类号： H01L27/14601 , H01L27/14603 , H01L27/1462 , H01L27/14685 , H01L27/14689
摘要： A method for manufacturing a solid-state imaging device in which a charge generator that detects an electromagnetic wave and generates signal charges is formed on a semiconductor substrate and a negative-charge accumulated layer having negative fixed charges is formed above a detection plane of the charge generator, the method includes the steps of: forming an oxygen-feed film capable of feeding oxygen on the detection plane of the charge generator; forming a metal film that covers the oxygen-feed film on the detection plane of the charge generator; and performing heat treatment for the metal film in an inactive atmosphere to thereby form an oxide of the metal film between the metal film and the oxygen-feed film on the detection plane of the charge generator, the oxide being to serve as the negative-charge accumulated layer.
摘要翻译：一种制造固态成像装置的方法，其中在半导体衬底上形成检测电磁波并产生信号电荷的电荷产生器，并且在电荷的检测平面上方形成具有负固定电荷的负电荷累积层该方法包括以下步骤：形成能够在电荷产生器的检测平面上供氧的氧气进料膜; 形成覆盖所述电荷发生器的检测面上的氧供给膜的金属膜; 在惰性气氛中对金属膜进行热处理，从而在电荷发生器的检测面上形成金属膜与氧气供给膜之间的金属膜的氧化物，氧化物用作负电荷累积层

64. 发明申请

US20090280431A1 MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST PATTERN FORMATION USING THE SAME 审中-公开
标题翻译：用于保护膜形成的材料，以及使用其形成光电子图案的方法
公开(公告)号：US20090280431A1
公开(公告)日：2009-11-12
申请号：US12066127
申请日：2006-09-08
申请人： Tomoyuki Hirano , Kotaro Endo , Keita Ishiduka
发明人： Tomoyuki Hirano , Kotaro Endo , Keita Ishiduka
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/11 , G03F7/2041
摘要： To provide a material for protective film formation that can simultaneously prevent a change in quality of a resist film during liquid immersion exposure and a change in quality of a liquid for liquid immersion exposure used, and, at the same time, can form a resist pattern having a good shape without increasing the number of treatment steps. A material for protective film formation, comprising at least an alkali-soluble polymer comprising constitutional units represented by general formula (1): wherein R1 represents a hydrogen atom or a methyl group; R2 represents an alkylene chain having 1 to 5 carbon atoms; R3 represents a fluorinated alkylene chain having 1 to 10 carbon atoms in which a part or all of hydrogen atoms have been substituted by a fluorine atom; and m is a repeating unit.
摘要翻译：为了提供可以同时防止浸液曝光期间抗蚀剂膜的质量变化和用于液浸曝光的液体的质量变化的保护膜形成材料，并且同时可以形成抗蚀剂图案具有良好的形状而不增加治疗步骤的数量。一种用于保护膜形成的材料，至少包含含有由通式（1）表示的结构单元的碱溶性聚合物：其中R1表示氢原子或甲基; R2表示碳原子数为1〜5的亚烷基链; R3表示其中一部分或全部氢原子被氟原子取代的碳原子数1〜10的氟化亚烷基链; m是重复单元。

65. 发明授权

US06712077B1 Method for forming capacitor 失效
公开(公告)号：US06712077B1
公开(公告)日：2004-03-30
申请号：US09545549
申请日：2000-04-07
申请人： Tomoyuki Hirano , Hayato Iwamoto
发明人： Tomoyuki Hirano , Hayato Iwamoto
IPC分类号： H01L21302
CPC分类号： H01L28/84 , H01L21/02068 , H01L27/10852 , H01L28/91
摘要： The invention provides a method for forming a capacitor that enables to form HSG-Si on the entire surface of the exposed surface of a cylindrical bottom electrode. A core pattern is formed on the cylinder core layer on a semiconductor substrate, and an amorphous silicon film is formed so as to cover the core pattern. The amorphous silicon film on the cylinder core layer is removed so that the amorphous silicon film remains on the inside wall of the core pattern, and a bottom electrode comprising the amorphous silicon film is formed on the inside wall of the core pattern. The cylinder core layer that is the component of the core pattern is etching-removed, and then the natural oxide film generated on the surface of the bottom electrode and the amorphous silicon surface layer that is the component of the bottom electrode is etching-removed. Thereafter, HSG-Si is formed on the surface of the bottom electrode.

66. 发明授权

US4324449A Noise reduction connectors 失效
标题翻译：降噪连接器
公开(公告)号：US4324449A
公开(公告)日：1982-04-13
申请号：US217492
申请日：1980-12-17
申请人： Mitsugu Watanabe , Tomoyuki Hirano
发明人： Mitsugu Watanabe , Tomoyuki Hirano
IPC分类号： B60R16/02 , H01R13/533 , H01R43/00 , H01R43/18 , H01R13/62 , H01R3/00
CPC分类号： H01R43/18 , H01R13/533 , Y10S439/936
摘要： Plastic wiring connectors used in an automobile electric circuit often produce noise to the discomfort of the passengers. Connectors of this invention are coated with a suitable fiber strand material on their surfaces etc., considerably reducing such noise.
摘要翻译：在汽车电路中使用的塑料接线连接器常常会产生噪音，导致乘客的不适。本发明的连接器在其表面等上涂覆合适的纤维束材料，大大减少了这种噪音。

67. 发明授权

US08609320B2 Resist composition, method of forming resist pattern, polymeric compound and compound 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案的方法，聚合物和化合物
公开(公告)号：US08609320B2
公开(公告)日：2013-12-17
申请号：US13305545
申请日：2011-11-28
申请人： Yoshiyuki Utsumi , Takehiro Seshimo , Tomoyuki Hirano , Daichi Takaki , Junichi Tsuchiya
发明人： Yoshiyuki Utsumi , Takehiro Seshimo , Tomoyuki Hirano , Daichi Takaki , Junichi Tsuchiya
IPC分类号： G03F7/04 , G03F7/00 , C07D313/20 , C08F24/00
CPC分类号： C07D307/00 , C08F2220/285 , G03F7/0392 , G03F7/0397
摘要： A resist composition, a method of forming a resist pattern using the resist composition, a novel polymeric compound and a compound useful as a monomer for the polymeric compound, the resist composition including a base component (A) that exhibits changed solubility in a developing solution under action of acid and an acid generator component (B) that generates acid upon exposure, the base component (A) containing a resin component (A0) including a structural unit (a0) represented by general formula (a0) shown below in which A represents a divalent linking group; and R1 represents a hydrogen atom or a hydrocarbon group of 1 to 6 carbon atoms which may have a substituent.
摘要翻译：抗蚀剂组合物，使用抗蚀剂组合物形成抗蚀剂图案的方法，新颖的聚合化合物和可用作高分子化合物的单体的化合物，抗蚀剂组合物包含在显影液中显示出改变的溶解度的基础组分（A）在酸和产生酸的酸产生剂组分（B）的作用下，包含含有下述通式（a0）表示的结构单元（a0）的树脂组分（A0）的基础组分（A），其中A 表示二价连接基团; 并且R 1表示氢原子或可以具有取代基的1至6个碳原子的烃基。

68. 发明授权

US08574941B2 Method for manufacturing solid-state imaging device 失效
标题翻译：固态成像装置的制造方法
公开(公告)号：US08574941B2
公开(公告)日：2013-11-05
申请号：US13153941
申请日：2011-06-06
申请人： Susumu Hiyama , Tomoyuki Hirano
发明人： Susumu Hiyama , Tomoyuki Hirano
IPC分类号： H01L31/103
CPC分类号： H01L27/14601 , H01L27/14603 , H01L27/1462 , H01L27/14685 , H01L27/14689
摘要： A method for manufacturing a solid-state imaging device in which a charge generator that detects an electromagnetic wave and generates signal charges is formed on a semiconductor substrate and a negative-charge accumulated layer having negative fixed charges is formed above a detection plane of the charge generator. The method includes the steps of: forming an oxygen-feed film capable of feeding oxygen on the detection plane of the charge generator; forming a metal film that covers the oxygen-feed film on the detection plane of the charge generator; and performing heat treatment for the metal film in an inactive atmosphere to thereby form an oxide of the metal film between the metal film and the oxygen-feed film on the detection plane of the charge generator, the oxide being to serve as the negative-charge accumulated layer.
摘要翻译：一种制造固态成像装置的方法，其中在半导体衬底上形成检测电磁波并产生信号电荷的电荷产生器，并且在电荷的检测平面上方形成具有负固定电荷的负电荷累积层发电机。该方法包括以下步骤：在电荷发生器的检测面上形成能够供给氧的氧供给膜; 形成覆盖所述电荷发生器的检测面上的氧供给膜的金属膜; 在惰性气氛中对金属膜进行热处理，从而在电荷发生器的检测面上形成金属膜与氧气供给膜之间的金属膜的氧化物，氧化物用作负电荷累积层

69. 发明申请

US20130020667A1 SOLID-STATE IMAGING DEVICE AND ELECTRONIC APPARATUS 有权
标题翻译：固态成像装置和电子装置
公开(公告)号：US20130020667A1
公开(公告)日：2013-01-24
申请号：US13426685
申请日：2012-03-22
申请人： Masashi Nakazawa , Tomoyuki Hirano
发明人： Masashi Nakazawa , Tomoyuki Hirano
IPC分类号： H01L31/0232
CPC分类号： H01L27/14636 , H01L27/1464
摘要： A solid-state imaging device includes a photoelectric conversion film which is interposed between two transparent electrodes outside a semiconductor substrate, wherein a film surface of the photoelectric conversion film is provided so as to incline with respect to a front surface of the semiconductor substrate.
摘要翻译：固态成像装置包括光电转换膜，该光电转换膜介于半导体衬底外部的两个透明电极之间，其中光电转换膜的膜表面设置成相对于半导体衬底的前表面倾斜。

70. 发明申请

US20120264052A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND 有权
标题翻译：耐蚀组合物，形成耐火图案的方法和聚合物
公开(公告)号：US20120264052A1
公开(公告)日：2012-10-18
申请号：US13441200
申请日：2012-04-06
申请人： Makiko Irie , Tomoyuki Hirano , Daichi Takaki
发明人： Makiko Irie , Tomoyuki Hirano , Daichi Takaki
IPC分类号： G03F7/20 , C08F224/00 , C08F228/06 , G03F7/004
CPC分类号： G03F7/0397 , C08F224/00 , C08F228/06 , G03F7/2041
摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms).
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在显影液中显示改变的溶解度的碱成分（A）和曝光时产生酸的酸发生剂成分（B），含有树脂成分（A1 ）包括由下述通式（a0-1）表示的结构单元（a0）和衍生自可以具有与被取代基取代的被取代基取代的在α-位上的碳原子键合的丙烯酸酯的结构单元，并且含有通过酸（其中R表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的卤代烷基）的作用而显示出极性增加的酸可分解基团。

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