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    • 70. 发明专利
    • NONVOLATILE SEMICONDUCTOR MEMORY DEVICE
    • JPH02130798A
    • 1990-05-18
    • JP28476388
    • 1988-11-10
    • TOSHIBA CORP
    • ITO YASUOMOMOTOMI MASAKIIWATA YOSHIHISATANAKA TOMOHARUMASUOKA FUJIO
    • G11C17/00G11C16/06
    • PURPOSE:To assure a high-speed performance for the title memory device by utilizing an external power source for a bit line boosting circuit. CONSTITUTION:When an H level is supplied to a gate terminal N at the time of rewriting data, MOS transistors (TR) Q1 and Q2 are simultaneously turned on and charging is started to a bit line BL1. The voltage across the terminal N rises to the output high voltage VPP2 of an internal boosting circuit by the action of a bootstrap circuit after prescribed time. Therefore, when the threshold voltage Vth of the Tr Q1 is lower than about VPP2-VPP1=2V, the bit line BL1 is charged to the output voltage VPP1 of an external power source. Even when the threshold voltage Vth of the MOS Tr Q1 is >=2V, the voltage across the bit line BL1 rises to VPP2-Vth. In this case, when 20V is supplied to the gate signal SG1 of a selected gate S11 and 0V is supplied to the control gate signal line CG1 of a memory cell M11, the high potential at the bit line BL1 is almost transmitted to drains of memory cells M11,... and electrons are injected into a floating gate from a substrate. In the case the electrons in the floating gate of the cell M11 are discharged, the bit line BL1 is set to 0V by applying a high voltage across signals lines SG1 and CG1.