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    • 61. 发明授权
    • Liquid composition, recording method, and recorded matter
    • 液体组成,记录方法和记录物
    • US08722175B2
    • 2014-05-13
    • US13159942
    • 2011-06-14
    • Hiroshi Goto
    • Hiroshi Goto
    • B32B3/10B41F33/00C09D7/00
    • C09D11/38B05C1/083B05C1/0834B41M5/0017C09D11/324Y10T428/24802
    • A liquid composition, which contains: a water-soluble organic acid represented by the following general formula (1); a water-soluble amine represented by the following general formula (2); a water-soluble organic solvent; and water, wherein an amount of the water-soluble amine contained in the liquid composition is 0.9 or larger molar equivalent relative to acid groups contained in the water-soluble organic acid, where R1 is a hydroxyl group, a methyl group, or a hydrogen atom; and R2 is a hydroxyl group, or a methyl group, where R3 is a hydroxymethyl group; R4 is a methyl group, an ethyl group, or a hydroxymethyl group; and R5 is a hydrogen atom, a C1-4 alkyl group, or a hydroxymethyl group. The water-soluble organic acid and the water-soluble amine form a salt in the composition.
    • 一种液体组合物,其包含:由以下通式(1)表示的水溶性有机酸; 由以下通式(2)表示的水溶性胺; 水溶性有机溶剂; 和水,其中所述液体组合物中所含的水溶性胺的量相对于水溶性有机酸中所含的酸基为0.9以上摩尔当量,其中R 1为羟基,甲基或氢 原子; 并且R 2是羟基或甲基,其中R 3是羟甲基; R4是甲基,乙基或羟甲基; R5为氢原子,C1-4烷基或羟甲基。 水溶性有机酸和水溶性胺在组合物中形成盐。
    • 69. 发明授权
    • Pattern inspection method and its apparatus
    • 图案检验方法及其装置
    • US07711178B2
    • 2010-05-04
    • US11869217
    • 2007-10-09
    • Kaoru SakaiShunji MaedaTakafumi OkabeHiroshi GotoMasayuki KuwabaraNaoya Takeuchi
    • Kaoru SakaiShunji MaedaTakafumi OkabeHiroshi GotoMasayuki KuwabaraNaoya Takeuchi
    • G06K9/00
    • G06T7/001G06T7/0002G06T7/32G06T7/33G06T2207/30148
    • A pattern inspection method including: sequentially imaging plural chips formed on a substrate; selecting a pattern which is suitable for calculating position gap between an inspection image of a subject chip and reference image stored in memory from an image of a firstly imaged chip among said sequentially imaged plural chips formed on the substrate; computing position gap between an inspection image of a chip obtained by the sequential imaging and reference image stored in a memory by using a positional information of a pattern image included in the inspection image and a reference pattern image included in the reference image which are both corresponding to the pattern selected at the selecting; aligning the inspection image and the reference image by using information of the calculated position gap; and comparing the aligned inspection image with the reference image and extracting a difference as a defect candidate.
    • 一种图案检查方法,包括:顺序成像形成在基板上的多个芯片; 从形成在所述基板上的所述顺序成像的多个芯片中,选择适合于计算被检体图像的检查图像与存储在存储器中的参考图像之间的位置间隔的图案, 通过使用包括在检查图像中的图案图像的位置信息和包括在参考图像中的参考图案图像来计算通过顺序成像获得的芯片的检查图像和存储在存储器中的参考图像之间的位置间隙, 到选择时选择的图案; 通过使用计算出的位置间隙的信息对准检查图像和参考图像; 并且将对准的检查图像与参考图像进行比较,并提取差异作为缺陷候选。