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    • 66. 发明申请
    • Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    • 适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物
    • US20070100096A1
    • 2007-05-03
    • US11516644
    • 2006-09-07
    • Yukako HaradaIsao YoshidaYoshiyuki Takata
    • Yukako HaradaIsao YoshidaYoshiyuki Takata
    • C08F4/06C07C309/12
    • C07C309/17C07C381/12C07C2601/14
    • The present invention provides a salt of the formula (I): wherein X represents divalent or trivalent residue of acyclic hydrocarbon having 1 to 30 carbon atoms or divalent or trivalent residue of hydrocarbon having 3 to 30 carbon atoms which contains monocyclic or bicyclic ring, wherein —CH2— in the hydrocarbon may be substituted with —O— and one or more hydrogen atom in X is optionally substituted with alkoxy group having 1 to 6 carbon atoms, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q1 and Q2each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; Y represents hydroxyl group, cyano group or methoxy group; and n shows 1 or 2. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
    • 本发明提供式(I)的盐:其中X表示碳原子数1〜30的无环烃的二价或三价残基或含有单环或双环的碳原子数3〜30的二价或三价残基,其中, 在烃中的-CH 2 - 2可以被-O-取代,X中的一个或多个氢原子任选被具有1至6个碳原子的烷氧基,具有1至4个碳原子的全氟烷基取代 ,具有1-6个碳原子的羟基烷基,羟基或氰基; Q 1和Q 2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; A + 代表有机抗衡离子; Y表示羟基,氰基或甲氧基; 并且n表示1或2.本发明还提供包含式(I)的盐的化学放大抗蚀剂组合物。
    • 67. 发明申请
    • Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    • 适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物
    • US20070027336A1
    • 2007-02-01
    • US11390319
    • 2006-03-28
    • Isao YoshidaYukako HaradaSatoshi YamaguchiNobuo Ando
    • Isao YoshidaYukako HaradaSatoshi YamaguchiNobuo Ando
    • C07C309/51
    • C07C309/17C07C2603/74
    • The present invention provides a salt of the formula (L) A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ≡O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R10 and R20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).
    • 本发明提供式(L)的盐式(L)的盐:其中Q表示-CO-基或-C(OH) - 基; 环X表示当Q为-C(OH) - 基团或其中两个氢原子被≡O基团取代时,其中氢原子被Q位羟基取代的具有3-30个碳原子的单环或多环烃基 在Q为-CO-基的Q位置,单环或多环烃基中的至少一个氢原子可以任选被具有1至6个碳原子的烷基,具有1至6个碳原子的烷氧基,具有1至6个碳原子的烷氧基, 1至4个碳原子,具有1至6个碳原子的羟基烷基,羟基或氰基; R 10和R 20各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; 而A +表示有机抗衡离子。 本发明还提供了包含式(L)的盐的化学放大抗蚀剂组合物。