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61. 发明申请

US20100203452A1 RADIATION-SENSITIVE COMPOSITION 审中-公开
标题翻译：辐射敏感组合物
公开(公告)号：US20100203452A1
公开(公告)日：2010-08-12
申请号：US12732220
申请日：2010-03-26
申请人： Yukio Nishimura , Hiromu Miyata
发明人： Yukio Nishimura , Hiromu Miyata
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/2041
摘要： A radiation-sensitive composition includes a polymer (A) which includes a repeating unit (1) shown by the following formula (1) and a repeating unit (2) shown by the following formula (2), and a radiation-sensitive acid generator (B). wherein R1 is a methyl group, R2 is a linear or branched alkyl group having 1 to 12 carbon atoms, and R3 is a linear or branched alkyl group having 1 to 4 carbon atoms, and n is an integer from 1 to 5. The composition is useful as a chemically-amplified resist having excellent resolution performance and exhibiting low LWR, low PEB temperature dependency, excellent pattern collapse resistance, and low defect-incurring properties.
摘要翻译：辐射敏感性组合物包括聚合物（A），其包含由下式（1）表示的重复单元（1）和由下式（2）表示的重复单元（2），和辐射敏感性酸发生剂（B）。其中R1为甲基，R2为碳原子数1〜12的直链或支链烷基，R3为碳原子数1〜4的直链或支链烷基，n为1〜5的整数。可用作具有优异的分辨率性能并且具有低LWR，低PEB温度依赖性，优异的图案抗塌陷性和低缺陷引发性能的化学增幅抗蚀剂。

62. 发明申请

US20070269734A1 Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern 有权
标题翻译：用于液体浸渍的Uper层成膜组合物和形成光刻胶图案的方法
公开(公告)号：US20070269734A1
公开(公告)日：2007-11-22
申请号：US10586187
申请日：2005-01-14
申请人： Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
发明人： Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
IPC分类号： G03F7/20 , G03F7/11 , H01L21/027
CPC分类号： G03F7/2041 , C08F214/182 , C08F214/186 , C08F216/10 , C08F220/18 , C08F220/24 , G03F7/11 , C08F220/06 , C08F2222/1013
摘要： An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of α-position.
摘要翻译：提供了对于曝光波长248nm（KrF）和193nm（ArF）显示足够的透明度的浸没上层膜组合物，可以在光致抗蚀剂膜上形成保护膜而不与光致抗蚀剂膜混合，不会被洗脱到水中在浸渍曝光期间使用以保持稳定的膜，并且可以容易地溶解在碱性显影剂中。当使用通过设置在透镜和光致抗蚀剂膜之间的水照射的浸没曝光装置时，该组合物涂覆在光致抗蚀剂膜上，该组合物包含在照射期间形成水稳定膜并溶解在随后的显影剂中的树脂，和含有6个以下碳原子的一元醇的溶剂，该树脂含有至少在α-位的碳原子上在侧链上含有氟烷基的具有醇羟基的树脂成分。

63. 发明授权

US07217492B2 Onium salt compound and radiation-sensitive resin composition 有权
标题翻译： ium盐化合物和辐射敏感性树脂组合物
公开(公告)号：US07217492B2
公开(公告)日：2007-05-15
申请号：US10743809
申请日：2003-12-24
申请人： Eiji Yoneda , Yong Wang , Yukio Nishimura
发明人： Eiji Yoneda , Yong Wang , Yukio Nishimura
IPC分类号： G03F7/038 , G03F7/039 , C07C303/00 , C07C307/00 , C07C315/00
CPC分类号： C07D317/72 , C07C317/14 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07D319/08 , C07D333/46 , G03F7/0045 , G03F7/0392 , G03F7/0757 , Y10S430/115 , Y10S430/122
摘要： An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1–10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.
摘要翻译：公开了具有下式（1）的阳离子部分的鎓盐化合物。其中A表示I或S，m为1或2，n为0或1，x为1-10，Ar 1和Ar 2为（取代的）芳族烃基，P为-O-SO 2，（O）R或-SO 2 R，其中R表示氢原子，（取代的）烷基或（取代的）脂环族烃基。鎓盐化合物适合作为正色散辐射敏感性树脂组合物的光致抗蚀剂的光致酸发生剂。含有该化合物的正色散辐射敏感性树脂组合物可用作高灵敏度的高分辨率的化学扩增光致抗蚀剂，对各种辐射有响应，并且具有优异的储存稳定性。

64. 发明申请

US20050214680A1 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US20050214680A1
公开(公告)日：2005-09-29
申请号：US11116269
申请日：2005-04-28
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , G03C1/76
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译：包含特定共聚物和光酸产生剂的化学放大的辐射敏感性树脂组合物，其中所述共聚物包含以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 3 H 4是氢，C 1-12烷基，C 6-15芳族，C 1-12烷氧基，，或R 3和R 4可以与R 3和R 4的氮原子组合形成，基团键合，C 3-15-15环状结构，条件是R 3和R 4不是氢原子同时。该组合物有效响应各种辐射，显示出优异的分辨率和图案配置以及最小的等密度偏差，并能以高精度和稳定的方式形成精细图案。

65. 发明授权

US06943826B1 Apparatus for debugging imaging devices and method of testing imaging devices 失效
标题翻译：用于调试成像装置的装置和测试成像装置的方法
公开(公告)号：US06943826B1
公开(公告)日：2005-09-13
申请号：US09605509
申请日：2000-06-28
申请人： Hiroshi Tatekawa , Yukio Nishimura , Katsumi Sakamoto
发明人： Hiroshi Tatekawa , Yukio Nishimura , Katsumi Sakamoto
IPC分类号： G06F11/22 , G01R31/26 , G01R31/28 , H04N5/335 , H04N5/372 , H04N5/378 , H04N17/00 , H05N7/18 , H04N7/18
CPC分类号： G01R31/2825 , H04N17/002
摘要： To facilitate the debugging an imaging device having a large number of pixels, a debugging apparatus has an image view display for qualitatively displaying pixel characteristics in a first range of the imaging device, and a code view displaying unit for quantitatively displaying numerical or symbolic data of individual pixels in a second range that is smaller than the first range and designated in an area displayed by the image view display.
摘要翻译：为了便于调试具有大量像素的成像装置，调试装置具有用于在成像装置的第一范围内定性显示像素特性的图像视图显示单元，以及用于定量显示数字或符号数据的数字或符号数据的代码视图显示单元在第二范围内的小于第一范围并在由图像视图显示显示的区域中指定的单个像素。

66. 发明申请

US20050053861A1 Onium salt compound and radiation-sensitive resin composition 有权
标题翻译： ium盐化合物和辐射敏感性树脂组合物
公开(公告)号：US20050053861A1
公开(公告)日：2005-03-10
申请号：US10743809
申请日：2003-12-24
申请人： Eiji Yoneda , Yong Wang , Yukio Nishimura
发明人： Eiji Yoneda , Yong Wang , Yukio Nishimura
IPC分类号： C07C317/14 , C07C381/12 , C07D317/72 , C07D319/08 , C07D333/46 , G03C1/76 , G03F7/004 , G03F7/039 , G03F7/075
CPC分类号： C07D317/72 , C07C317/14 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07D319/08 , C07D333/46 , G03F7/0045 , G03F7/0392 , G03F7/0757 , Y10S430/115 , Y10S430/122
摘要： An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1-10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.
摘要翻译：公开了具有下式（1）的阳离子部分的鎓盐化合物。其中A表示I或S，m为1或2，n为0或1，x为1-10，Ar1和Ar2为（取代）芳族烃基，P为-O-SO2R，-OS（O） R或-SO 2 R，其中R表示氢原子，（取代的）烷基或（取代的）脂环族烃基。鎓盐化合物适合作为正色散辐射敏感性树脂组合物的光致抗蚀剂的光致酸发生剂。含有该化合物的正色散辐射敏感性树脂组合物可用作高灵敏度的高分辨率的化学扩增光致抗蚀剂，对各种辐射有响应，并且具有优异的储存稳定性。

67. 发明授权

US06800414B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06800414B2
公开(公告)日：2004-10-05
申请号：US09879894
申请日：2001-06-14
申请人： Yukio Nishimura , Noboru Yamahara , Masafumi Yamamoto , Toru Kajita , Tsutomu Shimokawa , Hiroshi Ito
发明人： Yukio Nishimura , Noboru Yamahara , Masafumi Yamamoto , Toru Kajita , Tsutomu Shimokawa , Hiroshi Ito
IPC分类号： G03F7004
CPC分类号： G03F7/0046 , G03F7/0233 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), wherein R1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.
摘要翻译：公开了一种包含含酸不稳定基团的树脂和光致酸发生剂的辐射敏感性树脂组合物。该树脂具有式（1）的结构，其中R 1表示氢原子，一价酸不稳定基团，不具有酸不稳定基团的具有1-6个碳原子的烷基，或不具有酸不稳定基团的具有2-7个碳原子的烷基羰基，X 1表示具有1-4个碳原子的直链或支链氟代烷基，R 2表示氢原子，直链或具有1-10个碳原子的支链烷基或具有1-10个碳原子的直链或支链氟代烷基。树脂组合物表现出高的透射率，高灵敏度，分辨率和图案形状，并且可以以高产率制造半导体的化学放大抗蚀剂。

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