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    • 61. 发明申请
    • Process for the offset printing of functional patterns
    • 功能图案的胶版印刷工艺
    • US20050235852A1
    • 2005-10-27
    • US11121732
    • 2005-05-04
    • Luc LeendersEddie Daems
    • Luc LeendersEddie Daems
    • B41M1/06B41N3/08C09D11/02B41N3/00
    • B41M1/06B41N3/08C09D11/037
    • An offset printing process comprising the steps of: applying a hydrophilic phase to a printing plate with an oleophilic phase, the hydrophilic phase comprising at least one moiety having at least colouring, pH-indicating, whitening, fluorescent, phosphorescent, X-ray phosphor or conductive properties, and applying the hydrophilic phase applied to the printing plate to a receiving medium thereby realizing a functional pattern of the at least one moiety having at least colouring, pH-indicating, whitening, fluorescent, phosphorescent, X-ray phosphor or conductive properties on the receiving medium, wherein the oleophilic and hydrophilic phases are either applied separately from an ink and a fountain medium or are applied together in the form of a single fluid ink, the single fluid ink consisting of a dispersing phase and a dispersed phase.
    • 一种胶版印刷方法,包括以下步骤:将亲水相施加到具有亲油相的印版上,所述亲水相包含至少一个至少具有着色剂,pH-指示,增白,荧光,磷光,X射线荧光体或 导电性能,以及将施加到印版的亲水相应用于接收介质,从而实现至少一个部分的功能图案,其至少具有着色,pH指示,增白,荧光,磷光,X射线荧光体或导电性能 在接收介质上,其中亲油亲水相或亲油相分别与油墨和喷墨介质一起使用,或者以单一流体油墨的形式一起施用,单一流体油墨由分散相和分散相组成。
    • 62. 发明授权
    • Method for on-site preparation of a relief image
    • 现场准备浮雕图像的方法
    • US06759175B2
    • 2004-07-06
    • US09832660
    • 2001-04-11
    • Eddie DaemsLuc Leenders
    • Eddie DaemsLuc Leenders
    • G03C176
    • G03F7/202G03F7/095
    • An method is disclosed for on-site preparation of a relief image comprising the following steps: (a) laminating a material comprising, in the order given, a first peelable support (1), an image recording layer (2) and an adhesive layer (3) onto a UV-sensitive material comprising a support (7), an UV-sensitive layer (6) wherein the adhesive layer (3) is laminated to the UV-sensitive layer (6); (b) image-wise exposing the image recording layer (2) to form a mask; (c) flood exposing the UV-sensitive material through the mask; (d) developing the UV-sensitive material; wherein the peelable support (1) is removed either before step (b), (c) or (d). Steps (a) to (d) are performed within a period of less than 2 months. As a result the extent of monomer diffusion from the UV-sensitive layer to the image recording layer is reduced. Additionally the adhesion between the image recording layer and the UV-sensitive material is optimised. Furthermore, almost all conventional imaging materials, that are normally used for contact exposure, can be applied in this method.
    • 公开了一种用于浮雕图像的现场准备的方法,包括以下步骤:(a)按照给定的顺序层叠包含第一可剥离载体(1),图像记录层(2)和粘合剂层 (3)到包含支撑体(7)的紫外线敏感材料上,其中所述粘合剂层(3)层压到所述UV敏感层(6)上的UV敏感层(6);(b)成像曝光 所述图像记录层(2)形成掩模;(c)使所述UV敏感材料暴露于所述掩模中;(d)显影所述UV敏感材料;其中所述可剥离载体(1)在步骤(b ),(c)或(d)。 步骤(a)至(d)在少于2个月的时间内进行。 结果,从UV敏感层到图像记录层的单体扩散的程度降低。 此外,图像记录层和UV敏感材料之间的粘附性被优化。 此外,通常用于接触曝光的几乎所有常规成像材料都可以应用于该方法中。