专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

61. 发明授权

US07539572B2 Image display 有权
标题翻译：图像显示
公开(公告)号：US07539572B2
公开(公告)日：2009-05-26
申请号：US10272856
申请日：2002-10-18
申请人： Noriyuki Kamikawa , Yasuo Matsumoto , Takashi Ohta , Takao Yamaguchi , Shoji Fujimoto , Hiroshi Takeuchi
发明人： Noriyuki Kamikawa , Yasuo Matsumoto , Takashi Ohta , Takao Yamaguchi , Shoji Fujimoto , Hiroshi Takeuchi
IPC分类号： G08G1/137 , G08G1/13 , G01C21/26
CPC分类号： G01C21/3647 , G01C21/367 , G01C21/3682
摘要： An image display whereby one can extremely easily know the current position of one's own vehicle and also grasp the actual situation around the current position of the vehicle, and with which the user gets highly satisfied. The image display includes a display device to display a photo picture on a prescribed reduced scale which is prepared based on photo data on a first scale that is read from a storage device in which photo data of two or more types in different scales to one area is stored, and a display switching device to conduct display switching according to a user's command to a photo picture on another reduced scale which is prepared based on photo data in a second scale that is different from the first scale.
摘要翻译：能够非常容易地知道自身车辆的当前位置并且掌握车辆当前位置周围的实际情况的图像显示，并且用户非常满意。图像显示器包括：显示设备，用于以规定的缩小比例显示照片图像，所述显示设备是基于从存储设备读取的第一刻度上的照片数据准备的，其中将两种或更多类型的照片数据以不同比例尺的照片数据读取到一个区域以及显示切换装置，用于根据用户的命令对以与第一刻度不同的第二刻度的照片数据准备的另一缩小比例的照片进行显示切换。

62. 发明授权

US07402527B2 Dry etching method, fabrication method for semiconductor device, and dry etching apparatus 有权
标题翻译：干式蚀刻法，半导体装置的制造方法以及干蚀刻装置
公开(公告)号：US07402527B2
公开(公告)日：2008-07-22
申请号：US11545528
申请日：2006-10-11
申请人： Takeshi Yamashita , Takao Yamaguchi , Hideo Niko
发明人： Takeshi Yamashita , Takao Yamaguchi , Hideo Niko
IPC分类号： H01L21/302
CPC分类号： H01L21/67069 , H01J37/32 , H01J37/32706 , H01J2237/334 , H01L21/02057 , H01L21/02071 , H01L21/02238 , H01L21/02252 , H01L21/02255 , H01L21/3065 , H01L21/31662 , H01L21/32137 , H01L21/76232
摘要： When etching is performed with respect to a silicon-containing material by using a dry etching apparatus having a dual power source, the application of bias power is initiated before oxidization proceeds at a surface of the silicon-containing material. Specifically, the application of the bias power is initiated before the application of source power is initiated. Alternatively, the source power and the bias power are applied such that the effective value of the source power reaches a second predetermined value after the effective value of the bias power reaches a first predetermined value.
摘要翻译：当使用具有双电源的干蚀刻装置对含硅材料进行蚀刻时，在含硅材料的表面进行氧化之前开始施加偏压功率。具体地说，在启动源功率的应用之前启动偏置功率的应用。或者，施加源功率和偏置功率，使得在偏置功率的有效值达到第一预定值之后，源功率的有效值达到第二预定值。

63. 发明授权

US07377992B2 Method and apparatus for detecting end point 有权
标题翻译：检测终点的方法和装置
公开(公告)号：US07377992B2
公开(公告)日：2008-05-27
申请号：US11340540
申请日：2006-01-27
申请人： Takeshi Yamashita , Takao Yamaguchi
发明人： Takeshi Yamashita , Takao Yamaguchi
IPC分类号： C23F1/00
CPC分类号： G03F7/70608 , H01J37/32935
摘要： A mask layer and a to-be-processed layer are irradiated with light to measure interference light formed of reflected lights from the mask layer and reflected lights from the to-be-processed layer. Thereafter, an interference component brought by the mask layer is removed from the waveform of the measured interference light, thereby calculating the waveform of the interference light brought by the to-be-processed layer. The thickness of the remaining to-be-processed layer is determined on the basis of the calculated waveform of the interference light and the thickness of the remaining to-be-processed layer is compared with a desired thickness thereof. In this way, an end point of processing on the to-be-processed layer is detected.
摘要翻译：用光照射掩模层和待处理层，以测量由掩模层反射的光和来自待处理层的反射光形成的干涉光。然后，从测定的干涉光的波形中除去由掩模层带来的干涉成分，计算被处理层带来的干涉光的波形。基于干涉光的计算波形确定剩余待处理层的厚度，并将剩余待处理层的厚度与其期望厚度进行比较。以这种方式，检测待处理层的处理终点。

64. 发明申请

US20070169539A1 Friction testing apparatus and friction testing method 审中-公开
标题翻译：摩擦试验装置和摩擦试验方法
公开(公告)号：US20070169539A1
公开(公告)日：2007-07-26
申请号：US11569344
申请日：2005-05-17
申请人： Yusaku Fujii , Takao Yamaguchi
发明人： Yusaku Fujii , Takao Yamaguchi
IPC分类号： G01N21/84 , G01L5/00 , G01L1/24 , G01N19/02
CPC分类号： G01N19/02
摘要： In a friction testing apparatus and method for accurately detecting a physical quantity relating to a friction such as a friction force or the like indicating a friction characteristic between objects to be measured in a dynamic states a first object (21) to be measured is mounted to a movable portion (10C) provided so as to be movable along a guide portion (10B), a second object (22) to be measured is pressed against the first object (21) to be measured mounted to the movable portion (10C), an object, in which the first object to be measured and the movable portion are integrated with each other, is moved in a state in which the second object to be measured is pressed against the first object to be measured, and an inertia force of the object at a time of moving the object is detected as a friction force acting between the first object to be measured and the second object to be measured.
摘要翻译：在用于精确地检测与在动态状态下表示被测量物体之间的摩擦特性的摩擦力等摩擦力相关的物理量的摩擦试验装置和方法中，将要测量的第一物体（21）安装到设置成能够沿着引导部分（10B）移动的可动部分（10C），待测量的第二物体（22）被压靠在被安装到可动部分（10）上的待测量的第一物体其中第一被测量物体和可动部分彼此一体化的物体在被测量的第二物体压靠在第一待测物体上的状态下移动，并且惯性检测到物体在移动物体时的力作为在待测量的第一被测物体和第二待测物体之间的摩擦力。

65. 发明申请

US20070056008A1 Updating system of music database, transmission apparatus of music database, terminal having update function of music database, updating method of music database, transmission method of music database, and updating method of music database in terminal 审中-公开
标题翻译：音乐数据库的更新系统，音乐数据库的传输装置，具有音乐数据库的更新功能的终端，音乐数据库的更新方法，音乐数据库的传输方法以及终端中音乐数据库的更新方法
公开(公告)号：US20070056008A1
公开(公告)日：2007-03-08
申请号：US10569541
申请日：2004-08-25
申请人： Satoru Nagamoto , Takao Yamaguchi , Ikuo Ohta , Naruhiko Nihira , Shoichi Izaki , Takahito Iida
发明人： Satoru Nagamoto , Takao Yamaguchi , Ikuo Ohta , Naruhiko Nihira , Shoichi Izaki , Takahito Iida
IPC分类号： H04N7/173 , H04N7/16
CPC分类号： H04H20/40 , H04H20/16 , H04H20/28 , H04H20/86 , H04H60/25 , H04H60/73
摘要： An updating system able to easily and cheaply update the content of a music database in a terminal having a music database, including (i) a transmission apparatus 20 including a transmission use music database 21 for storing music database information comprised of identification information and corresponding music information and a broadcast function unit 23 for broadcasting the music database information from the database 21 multiplexed on a broadcast wave and (ii) a terminal 30 including a reception function unit 33 for receiving the broadcast wave from the broadcast function unit 23, an extraction function unit 34 for extracting the music database information from the received broadcast wave, and an update function unit 32 for storing the extracted music database information in the reception side music database.
摘要翻译：一种能够容易且便宜地更新具有音乐数据库的终端中的音乐数据库的内容的更新系统，包括：（i）包括用于存储由识别信息和相应音乐组成的音乐数据库信息的传输使用音乐数据库21的发送装置20 信息和广播功能单元23，用于从广播波上复用的数据库21广播音乐数据库信息;以及（ii）包括用于从广播功能单元23接收广播波的接收功能单元33的终端30，提取功能用于从接收到的广播波提取音乐数据库信息的单元34，以及用于将所提取的音乐数据库信息存储在接收侧音乐数据库中的更新功能单元32。

66. 发明申请

US20060258117A1 Dry etching method, fabrication method for semiconductor device, and dry etching apparatus 有权
标题翻译：干式蚀刻法，半导体装置的制造方法以及干蚀刻装置
公开(公告)号：US20060258117A1
公开(公告)日：2006-11-16
申请号：US11487968
申请日：2006-07-18
申请人： Takeshi Yamashita , Takao Yamaguchi , Hideo Niko
发明人： Takeshi Yamashita , Takao Yamaguchi , Hideo Niko
IPC分类号： H01L21/76
CPC分类号： H01L21/67069 , H01J37/32 , H01J37/32706 , H01J2237/334 , H01L21/02057 , H01L21/02071 , H01L21/02238 , H01L21/02252 , H01L21/02255 , H01L21/3065 , H01L21/31662 , H01L21/32137 , H01L21/76232
摘要： When etching is performed with respect to a silicon-containing material by using a dry etching apparatus having a dual power source, the application of bias power is initiated before oxidization proceeds at a surface of the silicon-containing material. Specifically, the application of the bias power is initiated before the application of source power is initiated. Alternatively, the source power and the bias power are applied such that the effective value of the source power reaches a second predetermined value after the effective value of the bias power reaches a first predetermined value.
摘要翻译：当使用具有双电源的干蚀刻装置对含硅材料进行蚀刻时，在含硅材料的表面进行氧化之前开始施加偏压功率。具体地说，在启动源功率的应用之前启动偏置功率的应用。或者，施加源功率和偏置功率，使得在偏置功率的有效值达到第一预定值之后，源功率的有效值达到第二预定值。

67. 发明授权

US07119020B2 Method for fabricating semiconductor device 失效
标题翻译：制造半导体器件的方法
公开(公告)号：US07119020B2
公开(公告)日：2006-10-10
申请号：US10720197
申请日：2003-11-25
申请人： Hideaki Okamura , Takao Yamaguchi , Tomoyuki Sasaki
发明人： Hideaki Okamura , Takao Yamaguchi , Tomoyuki Sasaki
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01L21/0274 , H01L21/31144
摘要： A silicon oxide film is formed on a semiconductor substrate made of silicon. Subsequently, a resist film containing carbon is formed on the silicon oxide film, and thereafter the formed resist film is patterned, thereby forming a resist pattern. Subsequently, the resist pattern is exposed to a sulfur dioxide gas, and then dry etching is performed on the silicon oxide film by using the resist pattern exposed to the sulfur dioxide gas as a mask.
摘要翻译：在由硅制成的半导体衬底上形成氧化硅膜。随后，在氧化硅膜上形成含有碳的抗蚀剂膜，然后对所形成的抗蚀剂膜进行图案化，从而形成抗蚀剂图案。随后，将抗蚀剂图案暴露于二氧化硫气体，然后通过使用暴露于二氧化硫气体的抗蚀剂图案作为掩模对氧化硅膜进行干法蚀刻。

68. 发明授权

US07019817B2 Edge-holding aligner 有权
标题翻译：边缘固定对准器
公开(公告)号：US07019817B2
公开(公告)日：2006-03-28
申请号：US10884989
申请日：2004-07-07
申请人： Yasuhiko Hashimoto , Yasuo Hirooka , Takao Yamaguchi , Hiroshi Kanda
发明人： Yasuhiko Hashimoto , Yasuo Hirooka , Takao Yamaguchi , Hiroshi Kanda
IPC分类号： G03B27/58 , G03B27/62
CPC分类号： G03B27/58
摘要： The angular position of a notch (17) is determined on the basis of data provided by second notch detectors (24a) and (24b) and an encoder (25). A controller (38) turns a rotational arm (22) for angular displacement such that holders (26) and (27) are displaced in a circumferential direction B from the notch (17), and then the holders (26) and (27) hold a wafer (19). Since the holders (26) and (27) are in touch with edges in which the notch (17) is not formed, the first notch detector (23) is able to detect the notch (17) without difficulty. Thus the position of the wafer (19) relative to the rotational arm (22) does not need to be changed several times depending on positions at which the holders (26) and (27) hold the wafer (19), which is necessary in the prior technology. The aligner (20) touches parts, not including the notch (17), of the wafer (19) and is capable of adjusting the position of the wafer (19) in a short time.
摘要翻译：基于由第二陷波检测器（24a）和（24b）和编码器（25）提供的数据确定凹口（17）的角位置。控制器（38）转动用于角位移的旋转臂（22），使得保持器（26）和（27）从凹口（17）沿圆周方向B移位，然后保持器（26）和（27）握住晶片（19）。由于保持器（26）和（27）与未形成切口（17）的边缘接触，所以第一切口检测器（23）能够毫无困难地检测凹口（17）。因此，根据保持器（26）和（27）保持晶片（19）的位置，晶片（19）相对于旋转臂（22）的位置不需要改变几次，这是在先前的技术。对准器（20）接触不包括晶片（19）的凹口（17）的部分，并且能够在短时间内调节晶片（19）的位置。

69. 发明申请

US20050054123A1 Method and apparatus for detecting end point 失效
标题翻译：检测终点的方法和装置
公开(公告)号：US20050054123A1
公开(公告)日：2005-03-10
申请号：US10858402
申请日：2004-06-02
申请人： Takeshi Yamashita , Takao Yamaguchi
发明人： Takeshi Yamashita , Takao Yamaguchi
IPC分类号： H01L21/3065 , C23F1/00 , G03F7/20 , H01J37/32 , H01L21/00 , H01L21/66
CPC分类号： G03F7/70608 , H01J37/32935
摘要： A mask layer and a to-be-processed layer are irradiated with light to measure interference light formed of reflected lights from the mask layer and reflected lights from the to-be-processed layer. Thereafter, an interference component brought by the mask layer is removed from the waveform of the measured interference light, thereby calculating the waveform of the interference light brought by the to-be-processed layer. The thickness of the remaining to-be-processed layer is determined on the basis of the calculated waveform of the interference light and the thickness of the remaining to-be-processed layer is compared with a desired thickness thereof. In this way, an end point of processing on the to-be-processed layer is detected.
摘要翻译：用光照射掩模层和待处理层，以测量由掩模层反射的光和来自待处理层的反射光形成的干涉光。然后，从测定的干涉光的波形中除去由掩模层带来的干涉成分，计算被处理层带来的干涉光的波形。基于干涉光的计算波形确定剩余待处理层的厚度，并将剩余待处理层的厚度与其期望厚度进行比较。以这种方式，检测待处理层的处理终点。

70. 发明授权

US06830341B2 Projector with adjustably positioned image plate 有权
标题翻译：投影机具有可调定位的图像板
公开(公告)号：US06830341B2
公开(公告)日：2004-12-14
申请号：US10423442
申请日：2003-04-25
申请人： Koichi Ejiri , Takao Yamaguchi , Shin Aoki , Haike Guan
发明人： Koichi Ejiri , Takao Yamaguchi , Shin Aoki , Haike Guan
IPC分类号： G03B2100
CPC分类号： H04N9/317 , G03B21/14 , H04N5/74 , H04N9/3185 , H04N17/04
摘要： A projector is often positioned so that its optical axis is at an imperfect orthogonal angle with respect to a projection screen. This position causes a keystone distortion as well as imperfect focus in the projected image. To correct these undesirable problems, initially, a lens and/or an image-forming plate is independently repositioned to bring the projected image into focus based upon user input data. The keystone distortion is also corrected by redrawing the image on an image-forming surface based upon additional user input data.
摘要翻译：投影仪通常被定位成使得其光轴相对于投影屏幕处于不正确的正交角度。该位置会导致梯形失真以及投影图像中的不完全对焦。为了纠正这些不期望的问题，首先，透镜和/或图像形成板被独立地重新定位，以基于用户输入数据使投影图像成为焦点。梯形失真还通过基于附加用户输入数据重绘图像形成表面上的图像来校正。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式