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    • 62. 发明授权
    • Memory device
    • 内存设备
    • US07092278B2
    • 2006-08-15
    • US11071082
    • 2005-03-03
    • Minoru IshidaKatsuhisa ArataniAkira KouchiyamaTomohito Tsushima
    • Minoru IshidaKatsuhisa ArataniAkira KouchiyamaTomohito Tsushima
    • G11C11/00G11C19/08G11C7/02
    • G11C13/0011G11C11/5614G11C13/004G11C13/0069G11C2013/0054G11C2013/009G11C2213/34G11C2213/79
    • Data reading can be easily and precisely performed by setting specific conditions in writing into a selected memory cell. A memory cell has a structure, in which an interelectrode material layer is sandwiched between a first electrode and a second electrode. Data is stored by a change in a resistance value between the first electrode and the second electrode. The resistance value when a memory element is in a high resistance state is expressed as R_mem_high; the resistance value when the memory element is in a low resistance state is expressed as R_mem_low1; the resistance value of a load circuit is expressed as R_load; the reading voltage is expressed as Vread by setting the voltage of a second power supply line to the reference voltage; and the threshold voltage is expressed as Vth_critical. In writing data into the memory cell, the low resistance state is created so that these parameters satisfy specific relations. The load circuit is formed by an element having the same structure as of the memory element of the memory cell.
    • 通过将特定条件写入选定的存储单元,可以容易且精确地执行数据读取。 存储单元具有其中电极间材料层夹在第一电极和第二电极之间的结构。 通过第一电极和第二电极之间的电阻值的变化来存储数据。 当存储元件处于高电阻状态时的电阻值表示为R_mem_high; 当存储元件处于低电阻状态时的电阻值表示为R_mem_low1; 负载电路的电阻值表示为R_load; 通过将第二电源线的电压设置为参考电压,将读取电压表示为Vread; 阈值电压表示为Vth_critical。 在将数据写入存储单元时,产生低电阻状态,使得这些参数满足特定关系。 负载电路由具有与存储单元的存储元件相同结构的元件形成。
    • 66. 发明申请
    • Memory device
    • 内存设备
    • US20050174840A1
    • 2005-08-11
    • US11037554
    • 2005-01-18
    • Tomohito TsushimaKatsuhisa ArataniAkira Kouchiyama
    • Tomohito TsushimaKatsuhisa ArataniAkira Kouchiyama
    • G11C11/15G11C8/00G11C11/56G11C13/02G11C16/02G11C16/04G11C16/10
    • G11C11/5685G11C11/5614G11C13/0007G11C13/0011G11C13/0069G11C13/0097G11C2013/0071G11C2213/32G11C2213/34G11C2213/79
    • A memory device is provided in which recording of multi-valued data can be performed at a high speed and the recording of multi-valued data can be performed with a drive circuit having comparatively simple configuration. The memory device is formed of a memory cell including a memory element which stores information according to a state of electric resistance and a MIS transistor as a load connected in series to the memory element; and when an operation to change the memory cell from a state of high resistance value to a state of low resistance value is defined as writing and when an operation to change the memory cell from the state of low resistance value to the state of high resistance value is defined as erasing respectively, a resistance value of the memory element after writing is set to a plurality of different levels by controlling gate voltages VG1, VG2 and VG3, or the like, which are applied to the MIS transistor at the time of writing, so that different information is respectively assigned to each of the plurality of levels and to the state of high resistance value after erasing to store information of three values or more respectively into a memory element of each memory cell.
    • 提供一种存储器件,其中可以高速度执行多值数据的记录,并且可以用具有相对简单配置的驱动电路来执行多值数据的记录。 存储器件由存储单元形成,该存储单元包括存储元件,该存储单元根据电阻状态存储信息,并将MIS晶体管作为负载与存储元件串联连接; 并且当将存储单元从高电阻值状态改变为低电阻值状态的操作被定义为写入时,并且当将存储单元从低电阻值状态改变为高电阻值状态的操作 分别定义为擦除,通过控制此时施加到MIS晶体管的栅极电压VG 1,VG 2和VG 3等将写入后的存储元件的电阻值设置为多个不同的电平 的写入,使得不同的信息分别分配给多个电平中的每个电平,并且分别分配给擦除之后的高电阻值的状态以将三个值或更多个的信息分别存储到每个存储器单元的存储元件中。
    • 70. 发明授权
    • Method of making master for manufacturing optical disc and method of manufacturing optical disc
    • 制造光盘的制造方法和制造光盘的方法
    • US08119043B2
    • 2012-02-21
    • US10505455
    • 2003-12-24
    • Shinichi KaiKatsuhisa ArataniAkira KouchiyamaKenzo NakagawaYoshihiro Takemoto
    • Shinichi KaiKatsuhisa ArataniAkira KouchiyamaKenzo NakagawaYoshihiro Takemoto
    • B29D11/00B29D17/00
    • G11B7/261Y10S425/81
    • The method of the present invention includes: an exposing process in which an inorganic resist layer 101 formed on a substrate 100 is irradiated with recording laser light modulated by an information signal corresponding to an information signal of an information concave and convex pattern formed on an optical disc to form an exposed pattern corresponding to the information concave and convex pattern on the optical disc, and after the above process a development process in which development processing is performed on the inorganic resist layer to form a concave and convex pattern corresponding to the information concave and convex pattern of the inorganic resist layer; in the above exposing process, after a trial exposure is performed on a non-recording area of the above resist layer, the exposed portion is irradiated with evaluation laser light and a recording signal characteristic of the above resist layer is evaluated from the reflected light to determine based on the evaluation result an optimum focus position of recording laser light which is later performed; and accordingly the recording signal characteristic (jitter value) of the optical disc is predicted and evaluated in the exposing process from the recording characteristic of the exposed portion on the resist to appropriately adjust an exposure focusing position based on the evaluation result and thus, a master having an appropriate concave and convex pattern and consequently an optical disc having an excellent characteristic can be manufactured.
    • 本发明的方法包括:曝光处理,其中形成在基板100上的无机抗蚀剂层101被记录激光照射,该记录激光由对应于在光学上形成的信息凹凸图案的信息信号的信息信号调制 形成对应于光盘上的信息凹凸图案的曝光图案,在上述处理之后,对无机抗蚀剂层进行显影处理以形成对应于信息凹部的凹凸图案的显影处理 和无机抗蚀剂层的凸起图案; 在上述曝光处理中,在对上述抗蚀剂层的非记录区域进行试验曝光之后,用评价激光照射曝光部分,并将上述抗蚀剂层的记录信号从反射光评估为 基于评价结果确定记录稍后进行的激光的最佳聚焦位置; 因此根据曝光部分的抗蚀剂的记录特性,在曝光处理中预测和评估光盘的记录信号特性(抖动值),以根据评估结果适当地调整曝光聚焦位置,因此,主 具有适当的凹凸图案,因此可以制造具有优异特性的光盘。