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    • 61. 发明授权
    • Process for formation of base and light-sensitive material
    • 形成基质和感光材料的方法
    • US4970307A
    • 1990-11-13
    • US84789
    • 1987-08-13
    • Keiji TakedaJiro TsukaharaKozo Sato
    • Keiji TakedaJiro TsukaharaKozo Sato
    • G03C1/61
    • G03C1/615
    • A process for formation of a base from a base precursor, which comprises decomposing the base precursor in the presence of a catalyst. The base precursor has the following formula (I) or (II):(R.sup.1 --C.tbd.C--CO.sub.2 H).sub.x .multidot.B (I)R.sup.2 (--C.tbd.C--CO.sub.2 H).sub.2 .multidot.B.sub.y (II)wherein R.sup.1 is a monovalent group selected from the group consisting of hydrogen, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, an aralkyl group, an acyl group, an alkoxycarbonyl group, carbamoyl, --CO.sub.2 M (M is an alkali metal) and --CO.sub.2 H.B, each of which may have one or more substituent groups; R.sup.2 is a divalent group selected from the group consisting of an alkylene group, an arylene group and a divalent heterocyclic group, each of which may have one or more substituent groups; B is an organic base; x is 1 when B is a monoacidic base, and x is 2 when B is a diacidic base; and y is 2 when B is a monoacidic base, and y is 1 when B is a diacidic base. The catalyst is selected from the group consisting of silver, a silver compound, copper and a copper compound. A light-sensitive material containing the base precursor and the catalyst is also disclosed.
    • 从碱性前体形成碱的方法,其包括在催化剂存在下分解碱前体。 碱前体具有下式(I)或(II):(R1-C3B2C-CO2H)xxB(I)R2(-C3BcC-CO2H)2xBy(Ⅱ)其中R1是选自 由氢,烷基,环烷基,烯基,炔基,芳基,杂环基,芳烷基,酰基,烷氧基羰基,氨基甲酰基,-CO 2 M(M是碱 金属)和-CO 2 H B,其各自可以具有一个或多个取代基; R2是选自亚烷基,亚芳基和二价杂环基的二价基团,每个可以具有一个或多个取代基; B是有机碱; 当B是一元酸碱时x是1,当B是二酸基时x是2; 并且当B是一元酸碱时y是2,当B是二酸基时y是1。 催化剂选自银,银化合物,铜和铜化合物。 还公开了含有碱前体和催化剂的感光材料。
    • 62. 发明授权
    • Metal-containing organic polymer and use thereof
    • 含金属有机聚合物及其用途
    • US4927897A
    • 1990-05-22
    • US214062
    • 1988-07-01
    • Ken KawataKozo SatoMasayoshi Tsuboi
    • Ken KawataKozo SatoMasayoshi Tsuboi
    • C08F38/00C23C18/20C23C18/30H05K3/18
    • C23C18/20C08F38/00C23C18/30H05K3/181
    • A metal-containing organic polymer produced by the step of polymerizing a compound represented by formula (I):(R--C.tbd.C.sub.lk S).sub.m (I)whereinS represents a hydrogen atom, a hydroxy group, an amino group, a mercapto group, a polyoxyether group, a polyaminoether group, a polythioether group, a sulfino group or a salt thereof, a sulfo group or a salt thereof, a carboxyl group or a salt thereof or a polymerizable group;R represents a metallic atom, a hydrogen atom, or a group --COOM wherein M represents a hydrogen atom or a metallic atom;provided that when R represents a carboxyl group or a hydrogen atom, said compound represented by formula (I) is polymerized in the presence of a metallic salt;L represents a chemical bond or a group having a valency of (k+m); andl, k and m each represents an integer of 1 or more.
    • 通过使由式(I)表示的化合物:(RC 3BOND ClkS)m(I)聚合的步骤制备的含金属的有机聚合物,其中S表示氢原子,羟基,氨基,巯基, 聚氧醚基,聚氨基醚基,聚硫醚基,亚磺酰基或其盐,磺基或其盐,羧基或其盐或可聚合基团; R表示金属原子,氢原子或-COOM基团,其中M表示氢原子或金属原子; 条件是当R表示羧基或氢原子时,由式(I)表示的所述化合物在金属盐的存在下聚合; L表示化学键或价数为(k + m)的基团。 并且l,k和m各自表示1以上的整数。
    • 68. 发明授权
    • Heat-developable light-sensitive material
    • US4657848A
    • 1987-04-14
    • US782811
    • 1985-10-02
    • Kozo SatoYoshiharu YabukiHiroyuki HiraiKen Kawata
    • Kozo SatoYoshiharu YabukiHiroyuki HiraiKen Kawata
    • G03C1/06G03C1/498G03C7/00G03C8/40G03C1/02
    • G03C1/49845G03C8/4086Y10S430/156
    • A heat-developable light-sensitive material is described, containing a compound represented by formula (I) ##STR1## wherein R.sub.1 represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted heterocyclic group, a substituted or unsubstituted alkylene group, a substituted or unsubstituted cycloalkylene group, a substituted or unsubstituted alkenylene group, a substituted or unsubstituted alkynylene group, a substituted or unsubstituted aralkylene group, a substituted or unsubstituted arylene group, or a substituted or unsubstituted divalent heterocyclic group; R.sub.2 represents a hydrogen atom, a substituted or unsubstituted alkyl group; R.sub.3 represents an alkyl group, an alkoxyl group, a halogen atom, an acylamino group, a sulfonylamino group, an alkylamino group, a dialkylamino group, an alkylsulfonyl group, an arylsulfonyl group, a cyano group, a substituted or unsubstituted carbamoyl group, a substituted or unsubstituted sulfamoyl group or an alkoxycarbonyl group; X represents a divalent group selected from ##STR2## (wherein R.sub.4 represents a hydrogen atom, a substituted or unsubstituted alkyl group), ##STR3## (wherein R.sub.5 represents a substituted or unsubstituted alkyl group), and ##STR4## M represents an alkali metal, an alkaline earth metal, a quaternary ammonium group, or an ammonium group represented by BH (wherein B represents an organic base); l is an integer of 0 to 3; and m and n are each an integer of 1 or 2, such that the electric charge of carboxylate anion is equivalent to that of M.This material is improved in activity and storage stability. That is, the material providing an image of high density and decreased fog, and which even when stored under high temperature/high humidity conditions, maintained good photographic performance.
    • 69. 发明授权
    • Heat-developable light-sensitive material
    • 可热成像的感光材料
    • US4650749A
    • 1987-03-17
    • US769274
    • 1985-08-26
    • Kozo SatoYoshiharu YabukiHiroyuki HiraiKen Kawata
    • Kozo SatoYoshiharu YabukiHiroyuki HiraiKen Kawata
    • G03C8/40B41M5/26C07C51/00C07C59/58C07C59/64C07C59/66C07C67/00C07C239/00C07C279/02C07C301/00C07C311/03C07D207/22C07D231/12C07D231/56C07D233/60C07D235/06C07D235/22C07D249/18C07D257/04C07D317/30C07D317/46C07D521/00G03C1/06G03C1/498G03C7/00G03C1/02
    • G03C1/49845Y10S430/156
    • A heat developable light-sensitive material containing a compound represented by formula (I) or (II) ##STR1## wherein R.sub.1 and R.sub.2 each represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group, a heterocyclic group, a carboxyl group or a salt thereof, a halogen atom, a cyano group, an alkylsulfonyl or arylsulfonyl group, a sulfamoyl group, a carbamoyl group, an alkoxycarbonyl or aryloxycarbonyl group, a di- or mono-alkylphosphoryl or arylphosphoryl group, a di- or mono-alkylphosphinyl or arylphosphinyl group, an alkylsulfinyl or arylsulfinyl group, an acyl group, an amino group, an acylamino group, an acyloxy group or a group represented by X; X represents a decarboxylation accelerating group; or any two of R.sub.1, R.sub.2, and X may combine to form a ring; and the groups represented by R.sub.1, R.sub.2 and X may further be substituted with a substituent; B represents an organic base; and n represents 1 when B represents a monoacid base or 2 when B represents a diacid base, provided that when ##STR2## is a free dibasic acid, n is 1/2 of the above described numbers, respectively.The heat developable light-sensitive material containing a base precursor represented by formula (I) or (II) has excellent stability during preservation before use, and provides a color image having a high color density and low fog in a short time.
    • 含有式(I)或(II)表示的化合物的热显影性感光材料其中R 1和R 2各自表示氢原子,烷基,环烷基, 烯基,炔基,芳烷基,芳基,杂环基,羧基或其盐,卤素原子,氰基,烷基磺酰基或芳基磺酰基,氨磺酰基,氨基甲酰基, 烷氧基羰基或芳氧基羰基,二 - 或单烷基磷酰基或芳基磷酰基,二 - 或单烷基氧膦基或芳基氧膦基,烷基亚磺酰基或芳基亚磺酰基,酰基,氨基,酰氨基,酰氧基或 由X代表的组; X表示脱羧加成基团; 或者R1,R2和X中的任何两个可以结合形成环; 并且由R 1,R 2和X表示的基团可以进一步被取代基取代; B表示有机碱; 当B代表一酸基时,n表示1,B表示二酸基时,n表示1,条件是当为游离二元酸时,n分别为上述数字的1/2。 含有由式(I)或(II)表示的碱前体的可热显影的感光材料在使用前的保存期间具有优异的稳定性,并且在短时间内提供具有高着色密度和低雾度的彩色图像。