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61. 发明授权

US07541465B2 Substituted 2-aminoacetamides and the use thereof 失效
标题翻译：取代的2-氨基乙酰胺及其用途
公开(公告)号：US07541465B2
公开(公告)日：2009-06-02
申请号：US11443174
申请日：2006-05-31
申请人： Nancy Lan , Yan Wang , Sui Xiong Cai
发明人： Nancy Lan , Yan Wang , Sui Xiong Cai
IPC分类号： C07D211/94 , C07D211/96 , C07D211/98 , A61K31/513
CPC分类号： C07C233/05 , A61K31/165 , C07C237/06 , C07C237/08 , C07C2601/14 , C07D211/46 , C07D213/65 , C07D213/68 , C07D215/20 , C07D239/34 , C07D241/08 , C07D309/12 , C07D317/64
摘要： The invention is directed to substituted 2-aminoacetamides represented by formula (II): and to pharmaceutically acceptable salts and prodrugs thereof, wherein the substituents are defined herein. The invention is also directed to the use of substituted 2-aminoacetamides in methods for the treatment of neuronal damage following global and focal ischemia, and for the treatment, prevention or amelioration of pain, as anticonvulsants, as antimanic depressants, as local anesthetics, as antiarrhythmics and for the treatment or prevention of diabetic neuropathy.
摘要翻译：本发明涉及由式（II）表示的取代的2-氨基乙酰胺及其药学上可接受的盐和前药，其中取代基在本文中定义。本发明还涉及取代的2-氨基乙酰胺在治疗全球和局灶性缺血后的神经元损伤的方法中的用途，以及用作治疗，预防或改善疼痛的抗惊厥药作为抗痉挛剂，作为局部麻醉剂，如抗心律失常药物和治疗或预防糖尿病性神经病变。

62. 发明申请

US20080262004A1 Tgf-Beta Inhibitors 失效
标题翻译： Tgf-β抑制剂
公开(公告)号：US20080262004A1
公开(公告)日：2008-10-23
申请号：US11577094
申请日：2005-11-02
申请人： Clive Gideon Diefenbacher , Thomas Albert Engler , Hong-Yu Li , Sushant Malhotra , Jason Scott Sawyer , Yan Wang
发明人： Clive Gideon Diefenbacher , Thomas Albert Engler , Hong-Yu Li , Sushant Malhotra , Jason Scott Sawyer , Yan Wang
IPC分类号： A61K31/519 , C07D471/04 , A61K31/437 , A61P25/28 , A61P35/00 , C07D487/04
CPC分类号： C07D487/04 , C07D471/04 , C07D519/00
摘要： The present invention is directed to inhibitors of TGF-β of Formula I:
摘要翻译：本发明涉及式I的TGF-β抑制剂：

63. 发明申请

US20080038999A1 RETAINING RING WITH CONDUCTIVE PORTION 审中-公开
标题翻译：带导电部件的保持环
公开(公告)号：US20080038999A1
公开(公告)日：2008-02-14
申请号：US11865303
申请日：2007-10-01
申请人： Antoine Manens , Suresh Shrauti , Alain Duboust , Yan Wang , Liang-Yuh Chen
发明人： Antoine Manens , Suresh Shrauti , Alain Duboust , Yan Wang , Liang-Yuh Chen
IPC分类号： H01L21/302 , B24B5/00
CPC分类号： B23H5/08 , B24B37/32
摘要： A retaining ring for use with electrochemical mechanical processing is described. The retaining ring has a generally annular body formed with a conductive portion and a non-conductive portion. The non-conductive portion contacts the substrate during polishing. The conductive portion is electrically biased during polishing to reduce the edge effect that tends to occur with conventional electrochemical mechanical processing systems.
摘要翻译：描述了一种用于电化学机械加工的保持环。保持环具有形成有导电部分和非导电部分的大致环形体。非导电部分在抛光期间接触基板。导电部分在抛光期间被电偏置以减少常规电化学机械处理系统倾向于发生的边缘效应。

64. 发明授权

US07229535B2 Hydrogen bubble reduction on the cathode using double-cell designs 失效
标题翻译：使用双电池设计在阴极上进行氢气还原
公开(公告)号：US07229535B2
公开(公告)日：2007-06-12
申请号：US10455861
申请日：2003-06-06
申请人： Yan Wang , Feng Q. Liu , Alain Duboust , Siew S. Neo , Liang-Yuh Chen , Yongqi Hu
发明人： Yan Wang , Feng Q. Liu , Alain Duboust , Siew S. Neo , Liang-Yuh Chen , Yongqi Hu
IPC分类号： C25F7/00 , B23H5/06 , C25F3/00 , C25F3/12 , C25F3/30 , B23H3/00
CPC分类号： B23H3/08 , B23H5/08 , B24B37/0056 , B24B37/044 , B24B37/046 , C09G1/04 , C25F3/02 , H01L21/32125 , H01L21/32134
摘要： An apparatus and method for planarizing a surface of a substrate using a chamber separated into two parts by a membrane, and two separate electrolytes is provided. The embodiments of the present invention generally provide an electrochemical mechanical polishing system that reduces the number of defects found on the substrate surface after polishing. An exemplary electrochemical apparatus includes a physical barrier that prevents any trapped gas or gas generated during processing from residing in areas that can cause defects on the substrate. The process can be aided by the addition of various chemical components to the electrolyte that tend to reduce the gas generation at the cathode surface during the ECMP anodic dissolution process.
摘要翻译：使用通过膜分离成两部分的室来平坦化基板的表面的装置和方法，以及两个单独的电解质。本发明的实施方案通常提供一种电化学机械抛光系统，其减少抛光后在基底表面上发现的缺陷数量。示例性电化学装置包括物理屏障，其防止在处理期间产生的任何捕获的气体或气体驻留在可能导致基板上的缺陷的区域中。该方法可以通过在电解质中添加各种化学成分来辅助，该电解质在ECMP阳极溶解过程期间倾向于减少阴极表面的气体产生。

65. 发明申请

US20070106720A1 Reconfigurable signal processor architecture using multiple complex multiply-accumulate units 审中-公开
标题翻译：可重构的信号处理器架构，使用多个复数乘法单元
公开(公告)号：US20070106720A1
公开(公告)日：2007-05-10
申请号：US11584175
申请日：2006-10-20
申请人： Eran Pisek , Yan Wang , Jasmin Oz
发明人： Eran Pisek , Yan Wang , Jasmin Oz
IPC分类号： G06F7/38
CPC分类号： G06F7/5443 , H04B1/0003
摘要： A reconfigurable digital signal processor (DSP) comprises: a reconfigurable data path comprising a plurality of reconfigurable multiply-accumulate (MAC) units; and a programmable finite state machine for controlling the plurality of reconfigurable MAC units. The programmable finite state machine executes a first plurality of context-related instructions that cause selected ones of the plurality of reconfigurable MAC units to perform at least one of a defined set of functions consisting essentially of: i) Fourier transform functions; and ii) filter functions. The Fourier transform functions comprise a Fast Fourier Transform (FFT) function and an Inverse Fast Fourier Transform (FFT) function and the filter functions comprise a finite impulse response (FIR) filter function and an infinite impulse response (IIR) filter function.
摘要翻译：可重配置数字信号处理器（DSP）包括：可重构数据路径，其包括多个可重构的乘法累加（MAC）单元; 以及用于控制多个可重构MAC单元的可编程有限状态机。所述可编程有限状态机执行第一多个上下文相关指令，所述第一多个上下文相关指令使得所述多个可重新配置的MAC单元中的所选择的指令执行至少一个定义的功能集合，所述功能集合主要包括：i）傅立叶变换函数; 和ii）过滤功能。傅立叶变换函数包括快速傅立叶变换（FFT）函数和快速傅里叶逆变换（FFT）函数，滤波器函数包括有限脉冲响应（FIR）滤波函数和无限脉冲响应（IIR）滤波函数。

66. 发明申请

US20070099552A1 CONDUCTIVE PAD WITH ION EXCHANGE MEMBRANE FOR ELECTROCHEMICAL MECHANICAL POLISHING 失效
标题翻译：带有离子交换膜的电化学机械电化学机械抛光
公开(公告)号：US20070099552A1
公开(公告)日：2007-05-03
申请号：US11555145
申请日：2006-10-31
申请人： Liang-Yuh Chen , Yuchun Wang , Yan Wang , Alain Duboust , Daniel Carl , Ralph Wadensweiler , Manoocher Birang , Paul Butterfield , Rashid Mavliev , Stan Tsai , You Wang , Jie Diao , Renhe Jia , Lakshmanan Karuppiah , Robert Ewald
发明人： Liang-Yuh Chen , Yuchun Wang , Yan Wang , Alain Duboust , Daniel Carl , Ralph Wadensweiler , Manoocher Birang , Paul Butterfield , Rashid Mavliev , Stan Tsai , You Wang , Jie Diao , Renhe Jia , Lakshmanan Karuppiah , Robert Ewald
IPC分类号： B23F21/03
CPC分类号： B24B37/046 , B24B27/0023 , B24B37/24 , B24B37/26 , B24D3/34 , B82Y30/00
摘要： An article of manufacture and apparatus are provided for processing a substrate surface. In one aspect, an article of manufacture is provided for polishing a substrate including polishing article comprising a body having at least a partially conductive polishing surface. An electrode is disposed below the polishing surface having a dielectric material therebetween. A plurality of apertures may be formed in the polishing surface and the dielectric material to at least partially expose the electrode to the polishing surface. A membrane may be disposed between the electrode and the polishing surface that is permeable to ions and current to promote continuity between the electrode and the polishing surface.
摘要翻译：提供了一种用于处理基板表面的制造和设备。在一个方面，提供了一种用于抛光衬底的制品，所述衬底包括具有至少部分导电的抛光表面的主体的抛光制品。电极设置在其间具有介电材料的抛光表面下方。可以在抛光表面和电介质材料中形成多个孔，以至少部分地将电极暴露于抛光表面。可以在电极和抛光表面之间设置膜，其可透过离子和电流，以促进电极和抛光表面之间的连续性。

67. 发明授权

US07207878B2 Conductive polishing article for electrochemical mechanical polishing 失效
标题翻译：电化学机械抛光用导电抛光制品
公开(公告)号：US07207878B2
公开(公告)日：2007-04-24
申请号：US11031545
申请日：2005-01-08
申请人： Yongqi Hu , Yan Wang , Alain Duboust , Feng Q. Liu , Antoine P. Manens , Siew S. Neo , Stan D. Tsai , Liang-Yuh Chen , Paul D. Butterfield , Yuan A. Tian , Sen-Hou Ko
发明人： Yongqi Hu , Yan Wang , Alain Duboust , Feng Q. Liu , Antoine P. Manens , Siew S. Neo , Stan D. Tsai , Liang-Yuh Chen , Paul D. Butterfield , Yuan A. Tian , Sen-Hou Ko
IPC分类号： B24D11/00
CPC分类号： B82Y30/00 , B23H5/08 , B23H5/10 , B24B37/046 , B24B37/14 , B24B37/16 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24B53/017 , H01L21/32125 , Y10T428/249924
摘要： Embodiments of a polishing article for processing a substrate are provided. In one embodiment, a polishing article for processing a substrate comprises a fabric layer having a conductive layer disposed thereover. The conductive layer has an exposed surface adapted to polish a substrate. The fabric layer may be woven or non-woven. The conductive layer may be comprised of a soft metal and, in one embodiment, the exposed surface may be planar.
摘要翻译：提供了用于处理基板的抛光制品的实施例。在一个实施例中，用于处理衬底的抛光制品包括其上设置有导电层的织物层。导电层具有适于抛光衬底的暴露表面。织物层可以是编织的或非织造的。导电层可以由软金属构成，并且在一个实施例中，暴露的表面可以是平面的。

68. 发明申请

US20070066201A1 CONDUCTIVE POLISHING ARTICLE FOR ELECTROCHEMICAL MECHANICAL POLISHING 有权
标题翻译：电化学机械抛光导电抛光法
公开(公告)号：US20070066201A1
公开(公告)日：2007-03-22
申请号：US11556011
申请日：2006-11-02
申请人： Liang-Yuh Chen , Yuchun Wang , Yan Wang , Alain Duboust , Daniel Carl , Ralph Wadensweiler , Manoocher Birang , Paul Butterfield , Rashid Mavliev , Stan Tsai
发明人： Liang-Yuh Chen , Yuchun Wang , Yan Wang , Alain Duboust , Daniel Carl , Ralph Wadensweiler , Manoocher Birang , Paul Butterfield , Rashid Mavliev , Stan Tsai
IPC分类号： B23F21/03
CPC分类号： B82Y30/00 , B24B37/046 , B24B37/24 , B24B37/26 , B24D3/34
摘要： An article of manufacture and apparatus are provided for planarizing a substrate surface. In one aspect, an article of manufacture is provided for polishing a substrate including polishing article comprising a body having at least a partially conductive surface adapted to polish the substrate. A plurality of perforations may be formed in the polishing article for flow of material therethrough. An electrode is also exposed to the polishing surface by at least a portion of the plurality of perforations. The article of manufacture may also include a polishing surface having a plurality of grooves, wherein a portion of the plurality of grooves intersect with a portion of the plurality of perforations.
摘要翻译：提供了一种用于平坦化基板表面的制造和设备。在一个方面，提供了一种用于抛光衬底的制品，所述衬底包括抛光制品，所述抛光制品包括具有适于抛光所述衬底的至少部分导电表面的主体。可以在抛光制品中形成多个穿孔，以使材料流过其中。电极还通过多个穿孔的至少一部分暴露于抛光表面。制品还可以包括具有多个凹槽的抛光表面，其中多个凹槽的一部分与多个穿孔的一部分相交。

69. 发明申请

US20070054851A1 Methods of and compositions for stimulation of glucose uptake into muscle cells and treatment of diseases 审中-公开
标题翻译：刺激葡萄糖摄入肌肉细胞和治疗疾病的方法和组合物
公开(公告)号：US20070054851A1
公开(公告)日：2007-03-08
申请号：US11442244
申请日：2006-05-30
申请人： Junyu Lin , Srinivas Kothakota , Ge Wu , Stephen Doberstein , Thomas Brennan , Lorianne Masuoka , Minmin Qin , Shannon Marshall , Yan Wang , Diane Hollenbaugh , Lewis Williams
发明人： Junyu Lin , Srinivas Kothakota , Ge Wu , Stephen Doberstein , Thomas Brennan , Lorianne Masuoka , Minmin Qin , Shannon Marshall , Yan Wang , Diane Hollenbaugh , Lewis Williams
IPC分类号： A61K38/18
CPC分类号： A61K38/1883 , A61K31/155 , A61K31/18 , A61K31/195 , A61K31/197 , A61K38/1808 , A61K38/26 , A61K38/28 , A61K45/06 , A61K47/60 , A61K2300/00
摘要： The present invention relates to therapeutic uses of ErbB ligands, including betacellulin. The therapeutic uses include methods of using ErbB ligand family compounds alone, or in conjunction with other agents, for reducing blood glucose levels, treating Type I and Type II diabetes, obesity, muscle wasting diseases, and cardiotoxicity.
摘要翻译：本发明涉及ErbB配体（包括β细胞素）的治疗用途。治疗用途包括单独使用ErbB配体家族化合物或与其它药物联合用于降低血糖水平，治疗I型和II型糖尿病，肥胖症，肌肉消瘦疾病和心脏毒性的方法。

70. 发明申请

US20060230187A1 Method and system for optimizing a software-defined radio system 有权
公开(公告)号：US20060230187A1
公开(公告)日：2006-10-12
申请号：US11173131
申请日：2005-07-01
申请人： Jasmin Oz , Eran Pisek , Yan Wang
发明人： Jasmin Oz , Eran Pisek , Yan Wang
IPC分类号： G06F15/16
CPC分类号： G06F15/16
摘要： A method for optimizing a software-defined radio system comprising a plurality of processors is provided. The method includes, for each of the plurality of processors, (i) providing an input burst comprising a first specified burst size, M, of input words to the processor for each of a plurality of configurations, each input word comprising an integer, and (ii) receiving from the processor an output burst comprising a second specified burst size, N, of output words generated by the processor based on the M input words for each of the configurations. An optimization factor is determined for each of the configurations based on the N output words generated by each processor for the configuration. An optimized configuration is identified from the plurality of configurations based on the optimization factor of each of the configurations.

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