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61. 发明专利

JPS62188334A INSPECTION APPARATUS 失效
公开(公告)号：JPS62188334A
公开(公告)日：1987-08-17
申请号：JP2881986
申请日：1986-02-14
申请人： HITACHI LTD
发明人： ISHIDA HIROYUKI , TSUKAGOSHI MASAKI , OGINO MASAYOSHI , MIYAMOTO YOSHIYUKI , ABE HIROSHI
IPC分类号： G01B11/30 , H01L21/66
摘要： PURPOSE:To reduce false determination on a substance to be checked which has a 45 deg. pattern, by comparing and determining signals from a pair of detecting means which detect light beams having different wavelengths and being reflected or transmitted by said substance, respectively. CONSTITUTION:Laser beams having different frequencies and emitted from first and second light sources 11 and 21 are applied respectively to one spot of a photomask 1 through lenses 13 and 23 while subjected to scan by galvanomirrors 12 and 22, and a first laser lambda1 and a second laser lambda2 are applied simultaneously to pellet patterns 1a and 1b. The two lasers lambda1 and lambda2 applied to the pellet patterns l1a and 1b of the photomask 1 respectively are reflected in a diffused manner and received by first and second photosensors 17 and 27 respectively. Detection signals of the two photosensors 17 and 27 are inputted to a differential amplifier element 31 respectively, and this amplifier element 31 finds a difference between the two signals. A differential signal of the amplifier element 31 is made to be binary in a binary processing element 32, and a defect determinating element 33 detects the size, position, etc. of a discordant portion on the basis of the aforesaid setting, so as to determine whether the portion is a defect or not.

62. 发明专利

JP2002353104A EXPOSURE METHOD OF SEMICONDUCTOR DEVICE, ALIGNER AND PROGRAM THEREOF 失效
公开(公告)号：JP2002353104A
公开(公告)日：2002-12-06
申请号：JP2001154779
申请日：2001-05-24
申请人： HITACHI LTD
发明人： MIWA TOSHIHARU , YOSHITAKE YASUHIRO , MIYAMOTO YOSHIYUKI
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To solve the problem in the manufacture of a semiconductor device in small amount of production of multiple types of devices that an operation coefficient of an aligner is reduced and manufacturing TAT of semiconductor device increases because an exposing condition is searched for calculating the exposure energy and focus compensation value using a test wafer for every reticle, exposing process and exposing apparatus in the exposing process when manufacturing semiconductor device. SOLUTION: In an exposure processing of semiconductor devices, average exposure conditions for each process, reticle individual difference compensation coefficient, aligner difference compensation coefficient and process-originating aligner difference compensation coefficient are calculated from the past exposure conditions, reticle circuit pattern information, the aligner difference information and semiconductor device specifications information, the exposing condition is calculated from the arithmetic processes of these coefficients and the exposure process is executed using such exposure conditions. As a result, since the fluctuations of photoresist size in the exposure process can be reduced, the manufacturing yield of semiconductor device is improved.

63. 发明专利

JP2001164906A TURBINE PROTECTION TEST DEVICE 失效
公开(公告)号：JP2001164906A
公开(公告)日：2001-06-19
申请号：JP34735199
申请日：1999-12-07
申请人： HITACHI LTD
发明人： MIYAMOTO YOSHIYUKI , NUNOKAWA MITSUHIRO
IPC分类号： F01D21/00
摘要： PROBLEM TO BE SOLVED: To support operation of the master trip solenoid valve of a turbine emergency trip device and a soundness confirming test of a control logic, in a plant under operation. SOLUTION: In generating equipment formed such that a turbine trip valve to stop rotation of the turbine of a generating plant is controlled by a turbine emergency trip device provided with mater trip solenoid valves A and B, a central control panel 27 is provided with a test controlling and monitoring device 29 having a master trip solenoid logic test panel 28 and a control logic. During a test of the aster trip solenoid valve A, a turbine trip simulated signal of an actual turbine stop command is generated by the test button 35a of a trip channel A. At the same time when the solenoid valve A is operated by a simulated signal, a turbine trip valve is brought into a non-operation state under the condition that the solenoid valve A is under a test, the solenoid valve A is tested without stopping a turbine. The same may be said of the master trip solenoid valve B.

64. 发明专利

JP2001050800A CONFIRMATION SYSTEM FOR CONFIRMING LEVEL SWITCH OPERATION 失效
公开(公告)号：JP2001050800A
公开(公告)日：2001-02-23
申请号：JP22831099
申请日：1999-08-12
申请人： HITACHI LTD
发明人： MIYAMOTO YOSHIYUKI , NUNOKAWA MITSUHIRO , SUZUMURA TAKESHI , KOIZUMI NAOTO
IPC分类号： G01F25/00 , F22B37/38 , G05B23/02 , H01H35/18
摘要： PROBLEM TO BE SOLVED: To automate a level switch operation test in a plant under operation to enhance reliability for an instrumentation system. SOLUTION: This system is an equipment wherein level switches 15 (A), (B) of multiplex system for detecting a liquid level are provided in a tank or apparatus for storing a liquid to form a level measuring system for measuring the liquid level, the first separation valves 16a, 16c are provided in an upper and lower parts thereof when an inside of the equipment is under a high temperature and high pressure, a piping 19e for injecting the liquid from an outside of the level measuring system and the second separation valves 16d, 16e therefore are installed to form a testing object level switch operation confirming line, the testing object level switch is separated from liquid level monitoring in the equipment by the first separation valves 16a, 16c at the time of a starting operation for a testing object level switch operation confirming test, and the liquid is injected, in this condition, from the outside of the system into the operation confirming line via the second separation valves 16d, 16e, so as to confirm an operation of the testing object level switch under operation of the system.

65. 发明专利

JPH11142588A REACTOR AUTOMATIC START DEVICE 失效
公开(公告)号：JPH11142588A
公开(公告)日：1999-05-28
申请号：JP30527397
申请日：1997-11-07
申请人： HITACHI LTD
发明人： ISHII YOSHIHIKO , NAKAHARA MITSUGI , MARUYAMA HIROMI , FUSHIMI ATSUSHI , MIYAMOTO YOSHIYUKI , FUKAZAWA YUKIHISA , ISHII KAZUHIKO
IPC分类号： G21C7/08 , G21D3/00
摘要： PROBLEM TO BE SOLVED: To reduce the burden of technical staffs and enable automatic start operation suitable for a reactor state by providing a reactor core reactivity calculation device utilizing a three-dimensional reactor core simulation in an automatic start device, and calculating control rod reactivity before operation of the device or at the time of stop. SOLUTION: A reactivity calculation device 27 has an input device 30 inputting control rod-pulling sequence, fuel nuclear constant library, reactor water temperature and the like, and a display device 31 outputting the calculation result of control rod reactivity and the like. The reactor water temperature can also be input from a reactor water temperature detector 16. The reactivity calculation device 27 is started by the instruction of a technical staff, and before a reactor is started or while automatic control is temporarily stopped, reactor core reactivity or a control rod value corresponding to input control rod-pulling sequence and reactor water temperature on the basis of three-dimensional calculation to output to an automatic start device 19. A calculation result is automatically transferred to a control rod automatic controller 18, and displayed and recorded on a display device 13.

66. 发明专利

JPH09211175A INTERNAL PUMP SYSTEM 失效
公开(公告)号：JPH09211175A
公开(公告)日：1997-08-15
申请号：JP4055496
申请日：1996-02-02
申请人： HITACHI LTD
发明人： SUZUKI KATSUYUKI , MIZUIDE ARITOSHI , MURATA KIMIKO , MIYAMOTO YOSHIYUKI , TANIGAWA SHOJI
IPC分类号： G21C7/26 , G21C15/243 , G21D3/08
摘要： PROBLEM TO BE SOLVED: To secure the operating condition of a highly reliable and stable internal pump system by adopting an MG set with fluid joint as a variable frequency power source and judging the condition of a pump quickly when a specific internal pump restarts. SOLUTION: In an internal pump system in a boiling water reactor power plant where a recirculation MG set with a fluid joint 4 is used as a variable frequency power source for internal pumps 1a to 1e, a pump motor where the time lag in synchronous operation occurs is identified by detecting the revolving speed of each of a recirculation MG set alternator 6 and internal pump motors 2a to 2e or a current outputted from the alternator 6 and a current inputted into the pump motors 2a to 2e and comparing the condition of synchronous operation in the alternator 6 with that of the pump motors 2a to 2e. If the time lag in the synchronous operation exceeds a prescribed value set beforehand, the internal pumps 2a to 2e are tripped.

67. 发明专利

JPH07221156A SEMICONDUCTOR DEFECTIVE ANALYTICAL SYSTEM AND SEMICONDUCTOR INSPECTING DEVICE 失效
公开(公告)号：JPH07221156A
公开(公告)日：1995-08-18
申请号：JP991594
申请日：1994-01-31
申请人： HITACHI LTD
发明人： ISHIHARA KAZUKO , ISHIKAWA SEIJI , SAKATA MASAO , MIYAZAKI ISAO , MIYAMOTO YOSHIYUKI
IPC分类号： G01R31/317 , H01L21/66
摘要： PURPOSE:To provide a semiconductor defective analytical system, which investigates fail bits in a semiconductor easily, with high accuracy and at high speed, and an inspecting device. CONSTITUTION:An inspection data analytical system 101 conducts an analysis on the basis of data, which is obtained from a foreign substance inspection 102 and a visual inspection 103 in a production line 111, data which is obtained in a wafer final inspection 112, and data which is obtained from an FB analytical system 105. The system 105 samples a defective place and a defective induction point from the form of a distribution of FBs using the data, which is obtained from the inspection 112, and LSI design information 107 and conducts an estimation 113 of a defective cause on reference to defective cause know-how information 108. An observation device 109 observes the coordinates of the defective place and the place of the defective induction point, which are delivered from the system 105, and specifies the defective cause and a defective process. An analytical device 110 conducts an analysis of the component of a foreign substance or the like detected in the device 109 and specifies the defective cause and the defective process.

68. 发明专利

JPH0549622A MAGNETIC RESONANCE IMAGING METHOD 失效
公开(公告)号：JPH0549622A
公开(公告)日：1993-03-02
申请号：JP21185991
申请日：1991-08-23
申请人： HITACHI LTD
发明人： TAKANE ATSUSHI , MIYAMOTO YOSHIYUKI
IPC分类号： A61B5/055 , G01R33/48
摘要： PURPOSE:To shorten the photographing time for moving body photographing which uses synchronization by setting a repeat time for applying a high frequency pulse at the time of measuring a signal to the shorted time, and also, dividing a projection into plural sets, and executing continuously photographing of one set of projection within one period. CONSTITUTION:In an electrocadiographical synchronization photographing method, usually an R wave becomes a trigger and after a prescribed delay time, photographing is started. Also, the time when a motion of the head seems to stand still is for about 40ms, and when photographing of 8ms repeat time is executed, photo. graphing of five projections can be executed simultaneously. Photographing of the whole can be completed by 13 periods and 26 periods, in the case of photographing of 64 projections as a whole and 128 projections, respectively. Usually, an R wave-R wave interval is about 1000ms, and photographing is finished by 13 seconds and 26 seconds in the case of 64 projections and 128 projections, respectively. On the other hand, in the case of a multi-time phase photographing method, when it is assumed that it takes 40ms for one set of photographing, photographing of 25 sets can be executed in the R wave-R wave of about 1000ms.

69. 发明专利

JPH04184511A PLANT AND ITS CENTRAL CONTROL BOARD, METHOD AND DEVICE FOR SUPPORTING OPERATION MONITORING, AND PLANT SEQUENCE CONTROL METHOD 失效
公开(公告)号：JPH04184511A
公开(公告)日：1992-07-01
申请号：JP31272890
申请日：1990-11-20
申请人： HITACHI LTD
发明人： YUMITATE TADAHIRO , MIYAMOTO YOSHIYUKI
IPC分类号： G05B19/05 , G05B19/048 , G05B23/02
摘要： PURPOSE:To display the system diagram of an object to be controlled on a screen in a method meeting the operating sense of an operator by displaying the system diagram of a relevant object to be sequentially controlled on a display screen when a master switch is turned on. CONSTITUTION:A sequential control logic circuit section 2 starts sequential control upon receiving an operating command signal 10 from a mode switch (master switch) 1. The system diagram data of sequential control systems are stored in advance in a CRT screen data storage device 6. When the signal 10 is outputted, a CRT controller 8 reads out the system diagram data corresponding to the command 10 from the device 6 and automatically displays the data on a CRT display device 9. Therefore, the optimum system diagram can be automatically displayed on the screen of the display device and the monitoring burden of operators can be reduced when the sequential control is used.

70. 发明专利

JPH0430417A SEMICONDUCTOR WAFER RETAINING AND ROTATING DEVICE 失效
公开(公告)号：JPH0430417A
公开(公告)日：1992-02-03
申请号：JP13520690
申请日：1990-05-28
申请人： HITACHI LTD
发明人： TOKISUE HIROMITSU , KITSUNAI HIROYUKI , MIYAMOTO YOSHIYUKI , TSUMAKI NOBUO
IPC分类号： G03F7/16 , B05C11/08 , G03F7/30 , H01L21/027 , H01L21/30
摘要： PURPOSE:To reduce the adhesion of dust on the rear surface of a retained wafer by providing a notch on a vacuum suction chuck. CONSTITUTION:The sucking surface 1A of a chuck 1, with which a semiconductor wafer is retained by sucking for resist coating, developing and the like, is arranged in the vicinity of the outer circumference of the wafer 2, and the chuck 1 is provided with a notched part 20 to be used to expose a part of the rear surface of the retained wafer. A groove 6 is provided on the sucking surface 1A, and the wafer 2 is held by suction to the sucking surface 1A of the chuck 1 by the difference of pressure between the negative pressure in the groove 6 and the atmospheric air pressure. The number of dust adhered to the rear surface of the wafer can be reduced by the constitution having a small area of sucking surface on the above-mentioned chuck. Also, when the chuck is positioned and stopped by the notch of a disc, which is integrally rotated, and the chuck, the wafer can be carried in and out easily by a wafer handling device.

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