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61. 发明专利

JPS56151516A MOLD FOR PLASTIC MOLDING 失效
公开(公告)号：JPS56151516A
公开(公告)日：1981-11-24
申请号：JP5546280
申请日：1980-04-28
申请人： HITACHI LTD
发明人： EBINA NAOTAKE , KANEDA AIZOU , WAKASHIMA YOSHIAKI , YOKONO ATARU
IPC分类号： B29C33/00 , B29B13/00 , B29C33/10 , B29C33/44 , B29C33/46 , B29C45/02 , B29C45/14 , B29C45/43
摘要： PURPOSE:To obtain the captioned mold improved in the mold release characteristics of a molded form, especially, the same of a semiconductor precise molded form by a method wherein guide holes, communicating with a cavity, and gas introducing ports, intersecting said guide holes, are provided in the upper and lower molds. CONSTITUTION:A top force 1 and a bottom tool 2 are closed and valve pins 9a, 9b are inserted into the guide holes 7a, 7b provided in the upper and lower molds 1, 2 so as to be communicated with the cavity 3, thus the cavity 3 is closed. A molding material is poured through a liner 4 and a gate 5 to effect the molding. Subsequently, the valve pins 9a, 9b are retreated and pressurized gas is introduced through the gas introducing holes 8a, 8b inbetween the molded form and the wall surface of the cavity 3. Subsequently, the upper and lower molds 1, 2 are opened and the molded form is released from the molds easily.

62. 发明专利

JPS56136998A FORMATION OF ELECTRODEPOSITION COATING FILM 失效
公开(公告)号：JPS56136998A
公开(公告)日：1981-10-26
申请号：JP3748180
申请日：1980-03-26
申请人： HITACHI LTD
发明人： TANAKA ISAMU , MATSUO AKIRA , OKA HITOSHI , ISOGAI TOKIO , YOKONO ATARU , YAGUCHI KOUICHI , SATOU HIROSHI , IZUMI SHIYUUSAKU , MIYAZAWA OSAMU , KIKUCHI HIROSHI
IPC分类号： C09D5/03 , C09D5/00 , C25D13/00
摘要： PURPOSE:To form an electrodeposition coating film having no residual voids by melting by heating the electrodeposited matter of the powder electrodeposition paint prepd. by adding a large amount of finely grained particles of a synthetic resin which melts when heated into an aqueous soln. of cationic resin in a vacuum then heating the same under an atmospheric pressure to allow the same to set. CONSTITUTION:A binder A of a cationic resin having water soluble performance obtained by reacting a basic resin contg. N in molecules with an acidic compound and finely grained powders B of a synthetic resin which is solid at ordinary temp. and melts when heated (e.g.; epoxy resin) are prepared. Next, the powder electrodeposition paint comprising an amount of the solids of the finely grained particles B up to 5,000pts.wt. based on 100pts.wt. the solids of the binder A into the dilute binder A soln. by water and an org. solvent is prepared. Next, the substrate is installed as a cathode in the bath of said paint which is kept at 5-30% solids, 4-6pH and 20-30 deg.C, whereby it is electrodeposited. Next, after this electrodeposited matter is washed followed by drying, it is heated in a 100-0.1torr vacuum to above the melting temp. of the paint to melt the paint, thence it is heated to 90-200 deg.C under an atmospheric pressure to allow the melt to set, whereby baking is accomplished and the intended electrodeposition coating film is formed.

63. 发明专利

JPS56136967A METHOD AND APPARATUS FOR DEIONIZING CHEMICAL COPPER PLATING BATH 失效
公开(公告)号：JPS56136967A
公开(公告)日：1981-10-26
申请号：JP3823680
申请日：1980-03-27
申请人： HITACHI LTD
发明人： KIKUCHI HIROSHI , OKA HITOSHI , YOKONO ATARU , SUZUKI HARUO , YOSHIMURA TOYOFUSA , MATSUO AKIRA , ISOGAI TOKIO , MIYAZAWA OSAMU , TANAKA ISAMU
IPC分类号： C23C18/40
摘要： PURPOSE:To regenerate an worn-out chemical copper plating bath and prevent the deterioration of a plated film in the mechanical properties by electrodialyzing the bath with deteriorated performance after pH adjustment. CONSTITUTION:When a chemical copper plating bath made of aqueous soln. contg. Cu ions, a Cu ion reducing agent, a chelating agent and alkali metal hydroxide is used in plating and deteriorated in the plating power, it is poured into pH adjusting vessel 5 from plating vessel 1. By adding one or more kinds of acids such as sulfuric acid, perchloric acid, formic acid and acetic acid to vessel 5 from acid vessel 6, the bath is adjusted to 2-8pH to release carbonate ions as gaseous CO2. It is then adjusted to 8-11pH and fed to desalting chamber 2 of electrodialytic vessel 1 to remove HCO3 , Na and other ions. The harmful ions discharged and accumulated in concn. chamber 3 of vessel 1 are refluxed to concd. soln. vessel 7. Thus, said plating bath is regenerated.

64. 发明专利

JPS56129261A THIN FILM-FORMING COATING LIQUID COMPOSITION 失效
公开(公告)号：JPS56129261A
公开(公告)日：1981-10-09
申请号：JP3273580
申请日：1980-03-17
申请人： HITACHI LTD , HITACHI CHEMICAL CO LTD
发明人： NAKATANI MITSUO , SHIYOUJI FUSAJI , WATANABE TAKESHI , SUDOU RIYOUICHI , YOKONO ATARU , ISOGAI TOKIO , MATSUYAMA HARUHIKO , AZUMA KAZUFUMI
IPC分类号： C08L83/00 , C03C17/30 , C08L83/04 , C09D183/04
摘要： PURPOSE:To provide the titled compsn. which produces a good coating film which has a uniform thickness and is pinhole-free, and is suitable for use in the production of an insulating coating film, an oriented film, etc., by adding a specified amount of dimethylpolysiloxane to a soln. consisting of a ladder type organosilicon polymer and a solvent. CONSTITUTION:0.01-10wt% Dimethylpolysiloxane (C) is blended with a soln. consisting of 0.5-20wt% ladder type organosilicon polymer (A) having phenyl group [e.g. a polyphenylsilsesquioxane having a relative viscosity (in 1wt% benzene soln. at 30 deg.C) of 1.1-3.0] and 99.5-80wt% solvent (B) having a b.p. of not lower than 180 deg.C. By the blending of dimethylpolysiloxane, a coating film which is pinhole-free and has a uniform thickness, can be obtd. when the compsn is coated on the surfaces of glass, SiOx and metal oxides by printing method.

65. 发明专利

JPS56109741A AFTERMIXER FOR REACTING INJECTION MOLDING 失效
公开(公告)号：JPS56109741A
公开(公告)日：1981-08-31
申请号：JP1149480
申请日：1980-02-04
申请人： HITACHI LTD
发明人： NAKAMURA SHIYOUZOU , GOTOU MASAO , YOKONO ATARU
IPC分类号： B29C39/24 , B29B7/76 , B29C33/00 , B29C37/00 , B29C39/00 , B29C39/02 , B29C45/00 , B29C45/62 , B29C67/24 , B29K101/10
摘要： PURPOSE:To obtain a molding excellent in the appearance and the strength by making the sectional areas of mixing ports smaller in accordance with the distance from the inflow port. CONSTITUTION:Three pairs of mixing ports 7b, 7c and 7d composing the mixing system are made smaller in the sectional areas in accordance with the distance from the inflow port 6. The sectional diameter phiA of branch inflow ports 6' and 6'' indicates the diameter of the section viewed from the line A-A, phiB the diameter of the section of the mixing port 7d viewed from the line B-B, phiC the diameter of the section of the mixing port 7 viewed from the line C-C and phiD the diameter of the section of the mixing port D. As two liquids flow at a faster rate out of the mixing port smaller in the sectional area, the liquids are mixed more quickly farther from the inflow port 6. Thus, even mixing can be performed quickly and effectively as a whole.

66. 发明专利

JPS5658959A CHEMICAL COPPERRPLATING SOLUTION 失效
公开(公告)号：JPS5658959A
公开(公告)日：1981-05-22
申请号：JP13177579
申请日：1979-10-15
申请人： HITACHI LTD
发明人： MIYAZAWA OSAMU , OKA HITOSHI , YOKONO ATARU , ISOGAI TOKIO , KIKUCHI HIROSHI , MATSUO AKIRA , TANAKA ISAMU
IPC分类号： C23C18/40
摘要： PURPOSE:To obtain the titled stable plating solution, high in plating speed as to deposited metal, by adding polynuclear phenol ethoxylate to a chemical copper- plating solution that contains water-soluble copper salt, a complexing agent of Cu , pH adjusting agent, and reducing agent of copper ions. CONSTITUTION:To a chemical copper-plating solution that contains water-soluble copper salt (e.g. copper sulplate), a complexing agent of Cu (e.g. EDTA), pH adjusting agent (e.g. alkali metal hydroxide), and reducing agent of copper ions (e.g. HCHO), the polynuclear phenol ethoxylate shown in the figure is added. Although this additive is available commercially as a surface active agent, it should be added to the plating solution so that the concentration will be 1-200mg/l. In addition, this additive is used together with metal cyanide salt (e.g. NaCN), etc., so that the effect may be exhibited remarkably.

67. 发明专利

JPS5647926A MAGNETIC RECORDING MEDIUM 失效
公开(公告)号：JPS5647926A
公开(公告)日：1981-04-30
申请号：JP12066979
申请日：1979-09-21
申请人： HITACHI LTD
发明人： NAKAGAWA NORIO , YOKONO ATARU
IPC分类号： G11B5/66 , G11B5/72 , G11B5/725 , G11B5/73
摘要： PURPOSE:To improve wear resistance and corrosion resistance by making a metal thin-film magnetic recording medium of a protective-film Ni-P alloy plated film and a film of carbon fluoride on it. CONSTITUTION:To form the protective film of a recording medium such as a magnetic disk and magnetic drum, ferromagnetic metal plated film (of Co-Ni-P alloy, etc.) 3 is formed as a recording layer on nonmagnetic base 1 with basic plated layer 2 of Cu-Sn alloy interposed. Next, protective film 4 of approximately 0.1mu is formed on layer 3 by Ni-P alloy plating. As a lubricant for abrasion, a carbon- fluoride lubricant such as perfluoroalkyl polyether is applied to form protective film 5. Ni-P alloy plating is accompanied by less defectives such as a pinhole and carbon fluoride lubricant film 5 has excellent wear resistance and corrosion resistance. With the above-mentioned combination, a recording medium of excellent wear resistance and corrosion resistance suitable for the contact, start and stop system can be obtained.

68. 发明专利

JPS5645917A POLYURETHANE COMPOSITION 失效
公开(公告)号：JPS5645917A
公开(公告)日：1981-04-25
申请号：JP12067179
申请日：1979-09-21
申请人： HITACHI LTD
发明人： HIYOSHI YASUO , NARAHARA TOSHIKAZU , NISHIKAWA AKIO , KOBAYASHI TOSHIO , YOKONO ATARU , ISOGAI TOKIO
IPC分类号： C08G18/00 , C08G18/50 , C08G18/66
摘要： PURPOSE:To improve the heat resistance and toughness of titled composition, by employing as essential components, an isocyanate compound and an alkylene adduct of the reaction product between an ethylenic carbon bond-containing dicarboxylic acid and a polyamine. CONSTITUTION:An ethylenic carbon bond-containing unsaturated dicarboxylic acid, an anhydride thereof or a functional derivative thereof is mixed and reacted with a polyamine to produce a compound (hereafter described as DCPA). An alkylene oxide is added to the DCPA in the presence of a basic catalyst to produce a polyol. As compared with conventional polyurethanes, a polyurethane composition which contains, as essential components, said polyol and an isocyanate compound, and prepared by curing the polyol with the isocyanate compound is excellent in heat resistance, toughness, reactivity, flame retardancy and dimentional stability.

69. 发明专利

JPS565355A FORMATION OF TRANSPARENT CONDUCTIVE FILM 失效
公开(公告)号：JPS565355A
公开(公告)日：1981-01-20
申请号：JP7821479
申请日：1979-06-22
申请人： HITACHI LTD , HITACHI CHEMICAL CO LTD
发明人： SUDOU RIYOUICHI , OKUNAKA MASAAKI , YOKONO ATARU , ISOGAI TOKIO , YAMAZAKI MITSUO
IPC分类号： C04B41/87 , C03C17/25 , C03C17/28 , C09D5/24 , C09D11/00
摘要： PURPOSE:To obtain a film having excellent transparency and excellent conductivity by coating a mixed solution composed primarily of specific proportions of an inorganic indium salt and a polybasic carboxylic ester on a base plate and then heating it. CONSTITUTION:A 1:0.1-2.9 (molar ratio) mixture of an inorganic indium salt, e.g., one of chlorides, nitrates, and perchlorates, and a polybasic carboxylic acid ester having two or more carboxyl groups per one molecule, in which one or more is esterified, e.g., monoethyl succinate,is dissolved in an organic solvent, e.g., methanol, where a reaction takes place almost quantitatively to form an indium complex salt. Then, the solution thus obtained is coated on a base plate, dried, and then baked at 400-900 deg.C for 15-180min, for example. In this case, an organic or inorganic composition containing tin or antimony element or a cellulosic compound, e.g., ethyl cellulose, may be added. Thus, a transparent conductive film which is excellent in transparency and conductivity can be obtained.

70. 发明专利

JPS563677A METHOD AND APPARATUS FOR CONTROLLING CHEMICAL TREATING FLUID 失效
公开(公告)号：JPS563677A
公开(公告)日：1981-01-14
申请号：JP7716279
申请日：1979-06-19
申请人： HITACHI LTD
发明人： OKA HITOSHI , NAKAMURA KENJI , YOKONO ATARU , ISOGAI TOKIO , MATSUO AKIRA , MIYAZAWA OSAMU , TANAKA ISAMU
IPC分类号： C25D21/14 , C23C22/77 , C23F1/00 , C23F1/46
摘要： PURPOSE:To make possible the automatic control of chemical treating soln., by detecting the difference in potential between a standard soln. and a mixed soln. of a chemical treating soln. with a titrating soln., which has a constant concn. and is used for detecting the concn. of a prescribed component, then by replenishing the chemical treating soln. corresponding to the deficient concn. CONSTITUTION:For example, a standard soln. (0.1 normal hydrochloric acid) is sampled from a standard soln. tank 1 by a sampling pump 4 and is delivered to the reference electrode 16 side of a detecting cell 10. A titrating soln. (136g HCOONa is dissolved in water to prepare 1l soln.) and a chemical treating soln. (1.2 normal hydrochloric acid) are sampled respectively from a titrating soln. tank 2 and a chemical treating soln. tank 3 by the sampling pump 4, mixed in a mixer 9 and the mixture is delivered to the detecting electrode 15 of the detecting cell 10, where the pH is detected as a potential by means of a silver-silver chloride electrode (a reference electrode) and a tungsten electrode (a detecting electrode) and is fed to a control unit 8. When the potential of the mixed soln. is smaller than -70mV which corresponds to the pH4.7, it is fed to a magnetic valve 6 so as to open it, and a replenish soln. (12 normal hydrochloric acid) is replenished from a replenish soln. tank 7 to the treating soln. tank 3.

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