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61. 发明授权

US5065184A Light amount control apparatus 失效
标题翻译：光量控制装置
公开(公告)号：US5065184A
公开(公告)日：1991-11-12
申请号：US373037
申请日：1989-06-29
申请人： Akiro Iimori , Hiroshi Matsumoto , Fumito Ide
发明人： Akiro Iimori , Hiroshi Matsumoto , Fumito Ide
IPC分类号： B41J2/44 , B41J2/45 , B41J2/455 , G03B27/72 , G03B27/80 , G03G15/04 , G03G15/043 , H04N1/04 , H04N1/23
CPC分类号： G03G15/043 , G03B27/80
摘要： A light amount control apparatus contains an exposure lamp, a photo sensor for receiving light from the lamp, an AC power source for applying an AC voltage to the lamp, a CPU for computing an electric power to be supplied to the exposure lamp in accordance with magnifications and optical densities of originals by using the data signal outputted from the photo sensor, a lamp regulator for control an electric power supplied to the exposure lamp by using a value computed by the CPU, and a zero-cross generator for causing the CPU to periodically perform the computation in synchronism with the AC voltage of AC power source applied to the lamp.
摘要翻译：光量控制装置包括曝光灯，用于接收来自灯的光的光传感器，用于向灯施加AC电压的AC电源，用于计算要提供给曝光灯的电力的CPU，根据通过使用从光传感器输出的数据信号的原稿的放大率和光密度，用于通过使用由CPU计算的值来控制提供给曝光灯的电力的灯调节器;以及零交叉发生器，用于使CPU 与施加到灯的AC电源的AC电压同步地周期性地进行计算。

62. 发明授权

US5057905A Container package for semiconductor element 失效
标题翻译：半导体元件集装箱包装
公开(公告)号：US5057905A
公开(公告)日：1991-10-15
申请号：US573406
申请日：1990-08-24
申请人： Hiroshi Matsumoto , Hiroaki Inokuchi
发明人： Hiroshi Matsumoto , Hiroaki Inokuchi
IPC分类号： H01L23/10 , H01L23/15 , H01L23/495
CPC分类号： H01L23/49582 , H01L23/10 , H01L23/15 , H01L23/49579 , H01L2224/32225 , H01L2224/48091 , H01L2224/48247 , H01L2224/73265 , H01L24/48 , H01L2924/00014 , H01L2924/01019 , H01L2924/09701 , H01L2924/15153 , H01L2924/15165 , H01L2924/16152 , H01L2924/30107
摘要： Disclosed is a container package for a semiconductor element, which comprises an insulating vessel having in the interior thereof a space for containing a semiconductor element, which comprises an insulating substrate and a lid member, an external lead terminal for connecting the semiconductor element contained in the vessel to an electric circuit and a sealing agent for sealing the vessel and external lead terminal, wherein the external lead terminal is composed of an electroconductive material having a permeability lower than 210 (CGS), a thermal expansion coefficient of from 5.times.10.sup.-6 to 12.times.10.sup.-6 /.degree.C. and an electroconductivity of at least 10% (International Annealed Copper Standard).
摘要翻译：公开了一种用于半导体元件的容器封装，其包括在其内部具有用于容纳半导体元件的空间的绝缘容器，所述绝缘容器包括绝缘基板和盖构件，外部引线端子用于将包含在所述半导体元件中的半导体元件容器到电路和用于密封容器和外部引线端子的密封剂，其中外部引线端子由导磁率低于210（CGS）的导电材料组成，热膨胀系数为5×10-6至12×10 -6 /℃，电导率至少为10％（国际退火铜标准）。

63. 发明授权

US5030550A Developer for positive type photoresists 失效
标题翻译：正型光刻胶的开发商
公开(公告)号：US5030550A
公开(公告)日：1991-07-09
申请号：US333928
申请日：1989-04-06
申请人： Yasumasa Kawabe , Hiroshi Matsumoto , Tadayoshi Kokubo
发明人： Yasumasa Kawabe , Hiroshi Matsumoto , Tadayoshi Kokubo
IPC分类号： G03C1/72 , G03F7/32 , H01L21/027
CPC分类号： G03F7/322
摘要： A positive photoresist developer containing a basic compound and from 10 to 10,000 ppm of a non-ionic surfactant represented by formula (I): ##STR1## wherein X represents an oxyethylene group; Y represents an oxypropylene group; R represents hydrogen, an alkyl group containing from 1 to 8 carbon atoms, R', or ##STR2## R' represents --O--(X).sub.m (Y).sub.n --H; R" represents R' of an alkyl group containing l carbon atoms; m and n each is an integer from 1 to 50, provided that m:n is from 20:80 to 80:20; p is 0 or 1, and q and s each is o or an integer from 1 to 4, provided that p+q+s=4; and l is an integer from 1 to 4; and r is an integer from 1 to 8, provided that l+r is an integer of 9 or more. The developer has superior art in forming properties, and prevents film residues, surface layer peeling, and film reduction.
摘要翻译：含有碱性化合物的正性光致抗蚀剂显影剂和10〜10,000ppm由式（I）表示的非离子型表面活性剂：其中X表示氧化乙烯基; Y表示氧丙烯基; R表示氢，含有1至8个碳原子的烷基，R'或R'表示-O-（X）m（Y）n -H; R“表示含有1个碳原子的烷基的R'; m和n各自为1至50的整数，条件是m：n为20:80至80:20; p为0或1，q和s各自为o或1至4的整数，条件是p + q + s = 4; l为1〜4的整数，并且r为1〜8的整数，条件是l + r为9以上的整数。显影剂具有优异的成型性能，并且防止膜残留，表面层剥离和膜还原。

64. 发明授权

US4984061A Semiconductor device in which wiring layer is formed below bonding pad 失效
标题翻译：其中布线层形成在焊盘下方的半导体器件
公开(公告)号：US4984061A
公开(公告)日：1991-01-08
申请号：US192665
申请日：1988-05-10
申请人： Hiroshi Matsumoto
发明人： Hiroshi Matsumoto
IPC分类号： H01L21/31 , H01L21/3205 , H01L21/60 , H01L21/603 , H01L23/485 , H01L23/52 , H01L23/522
CPC分类号： H01L24/85 , H01L23/5226 , H01L24/05 , H01L24/48 , H01L2224/02166 , H01L2224/04042 , H01L2224/05556 , H01L2224/05558 , H01L2224/05624 , H01L2224/45144 , H01L2224/4807 , H01L2224/48453 , H01L2224/48463 , H01L2224/48624 , H01L2224/85201 , H01L2224/85203 , H01L24/45 , H01L2924/00014 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01033 , H01L2924/01079 , H01L2924/05042 , H01L2924/1305 , H01L2924/30105
摘要： In a semiconductor device wherein a bonding pad is formed on an electrode through an insulating interlayer and a bonding wire is bonded to the bonding pad by thermocompression bonding, a through hole for connecting the bonding pad and the electrode is formed in the insulating interlayer above a contact hole for connecting the electrode and an active region formed in a semiconductor substrate. Metal columns of members of the electrode filled in the contact hole and members of the bonding pad filled in the through hole are formed under the bonding pad.

65. 发明授权

US4835324A Tetrahydrophthalimides, and their production and use 失效
标题翻译：四氢邻苯二酰亚胺及其生产和使用
公开(公告)号：US4835324A
公开(公告)日：1989-05-30
申请号：US130522
申请日：1987-12-09
申请人： Eiki Nagano , Shunichi Hashimoto , Ryo Yoshida , Hiroshi Matsumoto , Katsuzo Kamoshita
发明人： Eiki Nagano , Shunichi Hashimoto , Ryo Yoshida , Hiroshi Matsumoto , Katsuzo Kamoshita
IPC分类号： A01N37/32 , A01N43/86 , C07C205/26 , C07C205/37 , C07C205/43 , C07D209/48
CPC分类号： C07D209/48 , A01N37/32 , C07C205/26 , C07C205/37 , C07C205/43
摘要： A compound of the formula: ##STR1## wherein R is NH.sub.2 or NO.sub.2, and X is chlorine or bromine, is disclosed. These compounds are useful as intermediates in the production of herbicidal tetrahydrophthalimides of the formula: ##STR2## wherein R' is a C.sub.3 -C.sub.4 alkenyl group or a C.sub.3 -C.sub.4 alkynyl group, and X is as defined above.
摘要翻译：公开了下式的化合物：其中R是NH 2或NO 2，X是氯或溴。这些化合物可用作制备下式的除草四氢邻苯二酰亚胺的中间体：其中R'是C 3 -C 4烯基或C 3 -C 4炔基，X如上所定义。

66. 发明授权

US4762772A Desensitizing gum for lithographic printing plates 失效
标题翻译：用于平版印刷版的脱敏胶
公开(公告)号：US4762772A
公开(公告)日：1988-08-09
申请号：US916655
申请日：1986-10-08
申请人： Kesanao Kobayashi , Hiroshi Matsumoto
发明人： Kesanao Kobayashi , Hiroshi Matsumoto
IPC分类号： B41N3/00 , B41N3/08 , G03F7/00
CPC分类号： B41N3/08
摘要： A desensitizing gum comprising an aqueous solution of water-soluble and film-forming hydroxyalkylated starch, characterized in that the degree of etherification of the hydroxyalkylated starch is 0.03 to 0.08 and the gum further contains at least one member selected from the group consisting of anionic and nonionic surfactants.
摘要翻译：一种脱敏胶，其包含水溶性和成膜羟烷基化淀粉的水溶液，其特征在于所述羟烷基化淀粉的醚化度为0.03至0.08，并且所述胶进一步含有至少一种选自阴离子和非离子表面活性剂。

67. 发明授权

US4601974A Desensitizing gum for lithographic printing 失效
标题翻译：用于平版印刷的脱敏胶
公开(公告)号：US4601974A
公开(公告)日：1986-07-22
申请号：US759940
申请日：1985-07-29
申请人： Nobuyuki Kita , Hiroshi Matsumoto , Masanori Imai
发明人： Nobuyuki Kita , Hiroshi Matsumoto , Masanori Imai
IPC分类号： B41N3/08 , G03F7/00 , B41N3/00
CPC分类号： B41N3/08
摘要： A desensitizing gum for a lithographic printing plate and a gumming up process thereof are disclosed. The gum is comprised of water having dispersed therein 5 to 35 wt %, based on the total weight of the gum, of a film-forming, water-soluble compound selected from the group consisting of enzyme-decomposed dextrine and enzyme-decomposed etherified dextrine. The desensitizing gum exerts a desensitizing action on non-image areas of a lithographic printing plate and does not cause image blinding of image areas even when the plate is stored for a long period of time.
摘要翻译：公开了一种用于平版印刷版的脱敏胶及其上胶工艺。口香糖由分散在其中的5-35重量％的水组成，基于胶的总重量，成膜的水溶性化合物选自酶分解的糊精和酶分解的醚化的糊精。脱敏胶对平版印刷版的非图像区域进行脱敏作用，即使长时间存放印版，也不会引起图像区域的图像眩晕。

68. 发明授权

US4566815A Structure for mounting roller on shaft 失效
标题翻译：轴上安装辊的结构
公开(公告)号：US4566815A
公开(公告)日：1986-01-28
申请号：US553181
申请日：1983-11-18
申请人： Hiroshi Matsumoto
发明人： Hiroshi Matsumoto
IPC分类号： F16C11/04 , B41J13/02 , B41J13/076 , F16B7/04 , F16C13/00 , F16C13/02
CPC分类号： B41J13/02 , Y10T403/53 , Y10T403/535
摘要： A structure having a shaft and a paper retaining roller mounted on the shaft for use in a printer. The structure further includes a retaining element mounted on the shaft so as to be opposed to the roller for retaining the roller in a given axial position on the shaft. The roller is rotatable about the shaft and has a flange at its one end. The retaining element has a plurality of resilient retaining arms and its one end to hold the flange rotatably. At the opposite end, the retaining element is also provided with a plurality of resilient arms which are in frictional engagement with the outer periphery of the shaft. The roller can be slid axially along the shaft when a force greater than a given magnitude is applied thereto.
摘要翻译：一种具有安装在轴上用于打印机的轴和纸张保持辊的结构。该结构还包括安装在轴上的保持元件，以便与辊相对，用于将辊保持在轴上的给定轴向位置。滚筒可绕轴旋转，其一端具有凸缘。保持元件具有多个弹性保持臂，其一端可旋转地保持凸缘。在相对端，保持元件还设置有与轴的外周摩擦接合的多个弹性臂。当施加大于给定大小的力时，滚子可以沿轴滑动。

69. 发明授权

US4508562A Benzylsulfinyl pyridine-N-oxides and their herbicidal method of use 失效
标题翻译：苄基亚磺酰基吡啶-N-氧化物及其除草方法
公开(公告)号：US4508562A
公开(公告)日：1985-04-02
申请号：US498990
申请日：1983-05-27
申请人： Koji Nakayama , Ryo Yoshida , Hiroshi Matsumoto
发明人： Koji Nakayama , Ryo Yoshida , Hiroshi Matsumoto
IPC分类号： A01N43/40 , C07D213/89 , C07D213/71
CPC分类号： C07D213/89 , A01N43/40
摘要： Benzylsulfinyl pyridine-N-oxides represented by the formula: ##STR1## wherein X is a chlorine atom or a bromine atom; and Y and Z, which may be the same or different, are each a chlorine atom or a fluorine atom, is disclosed. A process for producing the same, and a herbicide containing the same as an active ingredient are also disclosed.
摘要翻译：由下式表示的苄基亚磺酰基吡啶-N-氧化物：其中X是氯原子或溴原子; 和Y和Z可以相同或不同，分别为氯原子或氟原子。还公开了一种制备该方法的方法和含有该活性成分的除草剂。

70. 发明授权

US4463011A Bis-imidazolyl-bis-phenylmethane derivatives and their use as fungicides 失效
标题翻译：双咪唑基 - 双苯基甲烷衍生物及其作为杀真菌剂的用途
公开(公告)号：US4463011A
公开(公告)日：1984-07-31
申请号：US341634
申请日：1982-01-22
申请人： Masaru Ogata , Katsuya Tawara , Yoshihachi Watanabe , Hiroshi Matsumoto , Toshio Takahashi
发明人： Masaru Ogata , Katsuya Tawara , Yoshihachi Watanabe , Hiroshi Matsumoto , Toshio Takahashi
IPC分类号： A01N43/50 , C07C53/08 , C07C55/06 , C07C55/10 , C07C59/245 , C07C59/255 , C07C59/265 , C07C65/10 , C07D233/54 , C07D233/56 , C07D233/60 , C07D521/00 , C07D403/02
CPC分类号： C07D233/64 , A01N43/50 , C07C53/08 , C07C55/06 , C07C55/10 , C07C59/245 , C07C59/255 , C07C59/265 , C07C65/10 , C07D231/12 , C07D233/56 , C07D249/08
摘要： Benzylimidazole derivatives of the formula: ##STR1## wherein X is halogen, nitro, alkyl, alkoxy, or halobenzyloxy;m is an integer of 0 to 3;Y is oxa, thia or substituted- or unsubstituted-imino;R.sup.1 is alkyl, dialkylaminoaklyl, dibenzylaminoalkyl, 1-pyrrolidinyl, 2-imidazolin-2-yl, or a group of --(CH.sub.2)n--Z--Q(wherein n is an integer of 0 to 4; Z is oxa, thia, or a single bond; and Q is substituted- or unsubstituted-phenyl or thienyl) ##STR2## is methylene, 1-(1-imidazolyl)-1-methylmethylene, 1-(1-imidazolyl)-1-phenylmethylene, 1-phenylmethylene, or substituted or unsubstituted alkylidene;the benzene ring of the above formula being optionally condensed with another benzene ringwith the proviso that when ##STR3## is methylene said benzene ring is condensed with another benzene ring, and acid addition salts thereof which are useful as an antimycotic drug or agricultural fungicide.
摘要翻译：下式的苄基咪唑衍生物：其中X是卤素，硝基，烷基，烷氧基或卤代苄氧基; m为0〜3的整数。 Y是氧杂，噻吩或取代或未取代的亚氨基; R1是烷基，二烷基氨基烷基，二苄基氨基烷基，1-吡咯烷基，2-咪唑啉-2-基或 - （CH2）nZQ（其中n是0-4的整数; Z是氧杂，硫杂或单键 ;和Q是取代或未取代的苯基或噻吩基）是甲亚甲基，1-（1-咪唑基）-1-甲基亚甲基，1-（1-咪唑基）-1-苯基亚甲基，1-苯基亚甲基，或取代或未取代的未取代的亚烷基; 上式的苯环任选地与另一个苯环稠合，条件是当亚甲基时，苯环与另一个苯环缩合，其酸加成盐可用作抗真菌药物或农药杀真菌剂。

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