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61. 发明申请

US20140045334A1 Methods of Providing Photolithography Patterns Using Feature Parameters, Systems and Computer Program Products Implementing the Same 有权
标题翻译：使用特征参数，系统和计算机程序产品提供光刻模式的方法实现相同
公开(公告)号：US20140045334A1
公开(公告)日：2014-02-13
申请号：US13950708
申请日：2013-07-25
申请人： Jin Choi , Heung-Suk Oh , Sin-jeung Park , Rae-won Yi
发明人： Jin Choi , Heung-Suk Oh , Sin-jeung Park , Rae-won Yi
IPC分类号： H01L21/308 , G06F17/50
CPC分类号： G06F17/5081 , G03F1/00 , G03F7/70433 , G03F7/70558 , H01L21/027 , H01L21/308
摘要： A method of providing a photolithography pattern can be provided by identifying at least one weak feature from among a plurality of features included in a photolithography pattern based on a feature parameter that is compared to a predetermined identification threshold value for the feature parameter. A first region of the weak feature can be classified as a first dosage region and a second region of the weak feature can be classified as a second dosage region. Related methods and apparatus are also disclosed.
摘要翻译：可以通过基于与特征参数的预定识别阈值进行比较的特征参数来识别光刻图案中包括的多个特征中的至少一个弱特征来提供提供光刻图案的方法。弱特征的第一区域可以分类为第一剂量区域，弱特征的第二区域可以分类为第二剂量区域。还公开了相关方法和装置。

62. 发明授权

US08609305B2 Methods of forming a photolithography reticle 有权
标题翻译：形成光刻掩模版的方法
公开(公告)号：US08609305B2
公开(公告)日：2013-12-17
申请号：US13443440
申请日：2012-04-10
申请人： Jin Choi , Jin-Ha Jeong , Urazaev Vladimir , Hea-Yun Lee
发明人： Jin Choi , Jin-Ha Jeong , Urazaev Vladimir , Hea-Yun Lee
IPC分类号： G03F1/78 , G03F1/80
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/78 , G03F1/80 , H01J37/3026 , H01J2237/0455 , H01J2237/31764 , H01J2237/31776
摘要： In a method of forming a reticle and electron beam exposure system, first electron beams are irradiated onto a first region of a blank reticle having a light shielding layer and a photosensitive layer, to form first shot patterns. Second electron beams having a cross-sectional area larger than the first electron beams are irradiated onto a second region of the blank reticle. The photosensitive layer is developed to form first and second mask patterns at the first and second regions, respectively. The light shielding layer is etched off using the first and second mask patterns as an etching mask, thereby forming the mother pattern including a first pattern in the first region and a second pattern in the second region. Accordingly, the enlargement of the second electron beams reduces the scan time for the blank reticle, thereby reducing the process time.
摘要翻译：在形成掩模版和电子束曝光系统的方法中，将第一电子束照射到具有遮光层和感光层的坯料掩模版的第一区域上，以形成第一射出图案。具有大于第一电子束的横截面面积的第二电子束被照射到坯料掩模版的第二区域上。感光层被显影以分别在第一和第二区域形成第一和第二掩模图案。使用第一和第二掩模图案作为蚀刻掩模蚀刻掉遮光层，从而形成包括第一区域中的第一图案和第二区域中的第二图案的母体图案。因此，第二电子束的放大减少了空白掩模版的扫描时间，从而缩短了处理时间。

63. 发明授权

US08563951B2 Exposure systems for integrated circuit fabrication 有权
标题翻译：用于集成电路制造的曝光系统
公开(公告)号：US08563951B2
公开(公告)日：2013-10-22
申请号：US13419761
申请日：2012-03-14
申请人： Jin Choi , Jin-Ha Jeong , Vladimir Urazaev , Hea-Yun Lee
发明人： Jin Choi , Jin-Ha Jeong , Vladimir Urazaev , Hea-Yun Lee
IPC分类号： G21K5/04
CPC分类号： G03F1/78 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/3026 , H01J37/3174 , H01J2237/0455 , H01J2237/30472 , H01J2237/31776
摘要： Exposure systems include a beam generator, which is configured to irradiate source beams in a direction of an object to be exposed by the source beams, along with first and second beam shapers. The first beam shaper, which is disposed proximate the beam generator, has a first aperture therein positioned to pass through the source beams received from the beam generator. The second beam shaper is disposed proximate the first beam shaper. The second beam shaper includes a plate having a second aperture therein, which is positioned to receive the source beams that are passed through the first aperture of the first beam shaper. The second beam shaper further includes a first actuator and a first shift screen mechanically coupled to the first actuator.
摘要翻译：曝光系统包括光束发生器，其被配置成沿着第一和第二光束整形器照射源光束的待曝光物体的方向上的光源射束。设置在光束发生器附近的第一光束整形器具有其中定位成穿过从光束发生器接收的源光束的第一孔。第二光束整形器靠近第一光束整形器设置。第二光束整形器包括其中具有第二孔的板，其被定位成接收穿过第一光束整形器的第一孔的源光束。第二光束整形器还包括机械耦合到第一致动器的第一致动器和第一移位屏幕。

64. 发明申请

US20120270683A1 GOLF BALL 审中-公开
标题翻译：高尔夫球
公开(公告)号：US20120270683A1
公开(公告)日：2012-10-25
申请号：US12449731
申请日：2008-02-20
申请人： Hae Cheon Choi , Jin Choi , Gwang Min Son
发明人： Hae Cheon Choi , Jin Choi , Gwang Min Son
IPC分类号： A63B37/14
CPC分类号： A63B37/0007 , A63B37/0011
摘要： Disclosed herein is a golf ball which has not only an air resistance similar to or smaller than that of a dimpled golf ball, but also a significantly reduced area ratio of grooves relative to the total surface area of the golf ball, thereby achieving an enhanced carry distance and high accuracy in the directionality of putting. The golf ball has net-shaped grooves formed on an outer surface of a sphere.
摘要翻译：本文公开了一种高尔夫球，其不仅具有与凹坑高尔夫球相似或更小的空气阻力，而且还显着减小了凹槽相对于高尔夫球的总表面积的面积比，由此实现了增强的进位距离和高精度的放置方向性。高尔夫球具有形成在球体的外表面上的网状凹槽。

65. 发明授权

US08275176B2 Method and apparatus for user authentication using face image 有权
标题翻译：使用脸部图像进行用户认证的方法和装置
公开(公告)号：US08275176B2
公开(公告)日：2012-09-25
申请号：US12298229
申请日：2007-04-25
申请人： Yun-Su Chung , Jin Choi , Jang-Hee Yoo , Kyo-Il Chung
发明人： Yun-Su Chung , Jin Choi , Jang-Hee Yoo , Kyo-Il Chung
IPC分类号： G06K9/00
CPC分类号： G06K9/00275 , G06K9/00288 , G06K9/522
摘要： A user authentication method and apparatus using a face image are provided. The method includes transforming a face image in a normalized spatial domain into frequency-domain data, extracting valid transform coefficients from the frequency-domain data based on energy-concentrated region information, extracting a feature vector from the extracted valid transform coefficients, and performing user authentication by comparing the extracted feature vector with a previously registered feature vector. Accordingly, it is possible to perform user authentication using a face image while using a minimum data dimension, thereby improving the speed and precision thereof.
摘要翻译：提供了一种使用面部图像的用户认证方法和装置。该方法包括将标准化空间域中的面部图像变换为频域数据，基于能量集中区域信息从频域数据中提取有效变换系数，从提取的有效变换系数中提取特征向量，并执行用户通过将提取的特征向量与先前登记的特征向量进行比较来进行认证。因此，可以在使用最小数据维度的同时使用面部图像进行用户认证，从而提高其速度和精度。

66. 发明申请

US20120058432A1 METHODS OF FORMING SEMICONDUCTOR DEVICES USING PHOTOLITHOGRAPHIC SHOT GROUPING 有权
标题翻译：使用光刻机分组形成半导体器件的方法
公开(公告)号：US20120058432A1
公开(公告)日：2012-03-08
申请号：US13219579
申请日：2011-08-26
申请人： Jin Choi , Byung-gook Kim , Hee-bom Kim , Sang-hee Lee
发明人： Jin Choi , Byung-gook Kim , Hee-bom Kim , Sang-hee Lee
IPC分类号： G03F7/20
CPC分类号： G03F1/38 , G03F1/70 , G03F1/76
摘要： A method of forming a semiconductor device can include determining a shot set including a plurality of shots, based on a final pattern used to form a mask. Shots included in the plurality shots can be classified as being in a first pass shot set or in a second pass shot set, where each can include a plurality of non-directly neighboring shots. A first pass exposure can be performed to radiate a reticle to provide the first pass shot set and a second pass exposure can be performed to radiate the reticle to provide the second pass shot set.
摘要翻译：形成半导体器件的方法可以包括基于用于形成掩模的最终图案来确定包括多个镜头的镜头组。包括在多个镜头中的拍摄可以被分类为处于第一传球镜头或第二镜头组中的每一个，其中每个镜头可以包括多个非直接相邻镜头。可以执行第一遍曝光以辐射掩模版以提供第一遍照射设置，并且可以执行第二曝光曝光以辐射掩模版以提供第二遍照射设置。

67. 发明申请

US20110142325A1 METHOD OF INSPECTING A MASK 有权
标题翻译：检查面膜的方法
公开(公告)号：US20110142325A1
公开(公告)日：2011-06-16
申请号：US12968725
申请日：2010-12-15
申请人： Yoonna OH , Jae-Pil Shin , Jin Choi , Moon-Hyun Yoo , Jong-Bae Lee
发明人： Yoonna OH , Jae-Pil Shin , Jin Choi , Moon-Hyun Yoo , Jong-Bae Lee
IPC分类号： G06K9/00
CPC分类号： G06T7/0006 , G03F1/84 , G06T2207/10061 , G06T2207/20068 , G06T2207/30148
摘要： In a method of inspecting a mask, an image of a pattern on the mask may be obtained. A histogram of the image by grey levels may be obtained. The histogram may be compared with information of the pattern to detect a defect of the mask. Thus, reliability of defect detection in the mask may be remarkably improved.
摘要翻译：在检查掩模的方法中，可以获得掩模上的图案的图像。可以获得灰度级的图像的直方图。可以将直方图与图案的信息进行比较以检测掩模的缺陷。因此，掩模中的缺陷检测的可靠性可以显着提高。

68. 发明申请

US20100266959A1 Pattern forming method 审中-公开
标题翻译：图案形成方法
公开(公告)号：US20100266959A1
公开(公告)日：2010-10-21
申请号：US12662402
申请日：2010-04-15
申请人： Sang-Hee Lee , Jin Choi , Byung-Gook Kim , Hee-Bom Kim
发明人： Sang-Hee Lee , Jin Choi , Byung-Gook Kim , Hee-Bom Kim
IPC分类号： G03F7/20
CPC分类号： B82Y40/00 , B82Y10/00 , G03F1/78 , H01J37/3174 , H01J2237/0451 , H01J2237/0458 , H01J2237/15 , H01J2237/31771 , H01J2237/31776
摘要： A pattern forming method includes providing a resist, irradiating a first electron beam to a first region of the resist, and irradiating a second electron beam to a second region which is defined along a boundary of the first region of the resist, wherein the first electron beam has a first cross section having a polygonal shape, and the second electron beam has a second cross section having a polygonal shape.
摘要翻译：图案形成方法包括提供抗蚀剂，将第一电子束照射到抗蚀剂的第一区域，并且将第二电子束照射到沿着抗蚀剂的第一区域的边界限定的第二区域，其中第一电子梁具有具有多边形形状的第一横截面，并且第二电子束具有具有多边形形状的第二横截面。

69. 发明申请

US20090161202A1 APPARATUS FOR OPTICAL PARAMETRIC CHIRPED PULSE AMPLIFICATION (OPCPA) USING INVERSE CHIRPING AND IDLER 审中-公开
标题翻译：光学参考激光脉冲放大装置（OPCPA）使用反向引导和IDLER
公开(公告)号：US20090161202A1
公开(公告)日：2009-06-25
申请号：US12302760
申请日：2007-01-29
申请人： Hong Jin Kong , Dong Won Lee , Jin Choi , Du Hyun Beak , Jin Woo Yoon , Tae Hyung Kim
发明人： Hong Jin Kong , Dong Won Lee , Jin Choi , Du Hyun Beak , Jin Woo Yoon , Tae Hyung Kim
IPC分类号： H01S3/00
CPC分类号： G02F1/39 , G02F2001/392
摘要： An OPCPA apparatus of the present invention includes an optical pulse stretcher (100) for temporally stretching laser light, and applying short-wavelength preceding-type chirping. Pump lasers (210, 220) emit pump laser light. A first OPA unit (310) receives the pump laser light, and a signal having passed through the optical pulse stretcher, amplifies the signal, and generates a first idler. A first optical signal separation unit (410) separates output light of the first OPA unit into the first idler and remaining light (pump and signal). A second OPA unit (320) receives the first idler and another pump laser light, amplifies the first idler, and generates a second idler. A second optical signal separation unit (420) separates output light of the second optical parametric amplification unit into an amplified first idler and remaining light (pump and second idler). An optical pulse compressor (600) temporally compresses the amplified first idler.
摘要翻译：本发明的OPCPA装置包括用于时间拉伸激光的光脉冲展宽器（100），并且应用短波长的前级线性调频。泵浦激光器（210,220）发射泵浦激光。第一OPA单元（310）接收泵激光，并且已经通过光脉冲展宽器的信号放大信号，并产生第一惰轮。第一光信号分离单元（410）将第一OPA单元的输出光分离成第一空转器和剩余的光（泵和信号）。第二OPA单元（320）接收第一惰轮和另一泵激光，放大第一惰轮并产生第二惰轮。第二光信号分离单元（420）将第二光参量放大单元的输出光分离成放大的第一空转器和剩余的光（泵和第二惰轮）。光脉冲压缩机（600）在时间上压缩放大的第一惰轮。

70. 发明申请

US20070155872A1 SALT OF CARBOXYETHYL PHOSPHINATE ESTER AND FLAME RETARDANT THERMOPLASTIC RESIN COMPOSITION CONTAINING THE SAME 有权
标题翻译：羧甲基磷酸酯酯及其阻燃剂热塑性树脂组合物
公开(公告)号：US20070155872A1
公开(公告)日：2007-07-05
申请号：US11563648
申请日：2006-11-27
申请人： Sang Hong , Jeong Ku , Su Bae , Jin Choi , Jin Kim , Min Lee
发明人： Sang Hong , Jeong Ku , Su Bae , Jin Choi , Jin Kim , Min Lee
IPC分类号： C08K5/49
CPC分类号： C07F9/3205 , C08K5/5313 , C09K21/12
摘要： A composition includes a salt of a carboxyethyl phosphinate ester compound. Additionally, the composition may also include a polymeric resin, such as a thermoplastic resin. The composition may have improved physical and chemical properties including flame retardancy, thermal stability, and hygroscopicity.
摘要翻译：组合物包括羧乙基次膦酸酯化合物的盐。另外，组合物还可以包括聚合树脂，例如热塑性树脂。组合物可具有改善的物理和化学性质，包括阻燃性，热稳定性和吸湿性。

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